Plasma enhanced atomic layer deposition equipment
CN223316781UActive Publication Date: 2025-09-09HARBIN INSTITUTE OF TECHNOLOGY (SHENZHEN) (INSTITUTE OF SCIENCE AND TECHNOLOGY INNOVATION HARBIN INSTITUTE OF TECHNOLOGY SHENZHEN)
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Patent Information
- Application Number
- CN202422814684.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-11-19
- Publication Date
- 2025-09-09
- Estimated Expiration
- 2034-11-19
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Figure CN223316781U_ABST
Abstract
The utility model relates to the field of plasma coating, in particular to plasma enhanced atomic layer deposition equipment. The device comprises a vacuum cavity assembly, a rotating bed assembly and a plasma generation assembly, the vacuum cavity assembly comprises a rotating bed sealing cavity, a sealing end cover and a rotating bed suite, the rotating bed assembly comprises a powder rotating bed, a rotating bed end cover and an air outlet rotating shaft, the air outlet rotating shaft is installed in the rotating bed sealing cavity, and the rotating bed assembly is located in the rotating bed sealing cavity. One end of the powder rotating bed is connected with the rotating bed end cover, the rotating bed end cover is connected with the air outlet rotating shaft, the rotating bed suite is connected to the inner side of the sealing end cover, the sealing end cover is connected with the rotating bed sealing cavity, the other end of the powder rotating bed is in clearance fit with the rotating bed suite, and the outer side of the sealing end cover is in butt joint with the plasma generation assembly. The powder material deposition mode is improved, the rotating bed is subjected to quick release design, and the material treatment efficiency is improved.
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