A sealing structure of lower electrode of CVD vacuum chamber
By employing a sealing structure consisting of an end cap, a back plate, and a Shaft column in the lower electrode of the CVD vacuum chamber, combined with multiple O-rings, the problem of vacuum leakage caused by weld cracking was solved, enabling continuous vacuum operation and extending the service life of the equipment.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- 芜湖通潮精密机械股份有限公司
- Filing Date
- 2025-05-23
- Publication Date
- 2026-05-29
Smart Images

Figure CN224301360U_ABST
Abstract
Description
Technical Field
[0001] This utility model belongs to the field of CVD vacuum chambers. Specifically, this utility model relates to a sealing structure for the lower electrode of a CVD vacuum chamber. Background Technology
[0002] The CVD vacuum chamber is a key component in the chemical vapor deposition (CVD) process, providing the necessary vacuum environment. The LCD panel manufacturing process mainly includes the front-end array process, the middle-end cell process, and the back-end module process. The lower electrode is a crucial component in the front-end array process, primarily responsible for maintaining the flatness and temperature uniformity of the glass to ensure uniform film formation. During film formation, the entire equipment operates under vacuum. The glass is placed onto the lower electrode by a robotic arm, and the lower electrode is heated by pre-embedded heating wires and temperature-controlled by pre-embedded thermocouples. The heating wires and thermocouples are sealed to the lower electrode via a cover and then led out through a metal shader inside the lower electrode to connect with external equipment.
[0003] In actual manufacturing, the lower electrode is repeatedly heated and cooled during operation. Due to the principle of thermal expansion and contraction, cracks inevitably occur at the weld over time. Since the equipment operates in a vacuum environment, once the weld of the lower electrode body cracks, atmospheric air will enter the equipment chamber through the end of the metal shaft (the outlet of the heating wire and thermocouple), causing the entire equipment to be unable to complete the vacuum process and thus unable to work.
[0004] To address the aforementioned issues, patent application number 2023228951356 discloses a high-sealing semiconductor CVD cavity sealing device, comprising a cover and a base. The cover is embedded in the upper end face of the base, and a spiral coil is provided on the outer end face of the cover. An annular groove is provided at the bottom of the base, and a sealing ring is provided inside the annular groove. A heat insulation cavity is provided at the upper end of the annular groove, and an air cavity is provided inside the sealing ring. An air-filling core that communicates with the air cavity is provided on the upper end face of the base, but this device fails to solve the aforementioned problems.
[0005] Therefore, in order to improve or solve at least one of the above problems, a CVD vacuum chamber lower electrode sealing structure with good sealing performance is provided, which can divide the inner cavity of the lower electrode into two sealed spaces and maintain the vacuum state of the equipment when the weld is damaged. Utility Model Content
[0006] This utility model is designed to solve the aforementioned problems. Its purpose is to provide a CVD vacuum chamber lower electrode sealing structure with good sealing performance, capable of dividing the lower electrode cavity into two sealed spaces, and maintaining the vacuum state of the equipment even when weld damage occurs. To achieve the above objective, the technical solution adopted by this utility model is as follows:
[0007] This utility model provides a sealing structure for the lower electrode of a CVD vacuum chamber, which includes an end cap, a back plate, and a Shaft column. The end cap is disposed on the back plate, and the end cap and the back plate are disposed on the Shaft column. A sealing unit is provided between the end cap, the back plate, and the Shaft column.
[0008] The CVD vacuum chamber lower electrode sealing structure provided by this utility model may also include a nickel rod, a thermocouple wire, and a thermocouple protective sleeve. The nickel rod passes through the end cover and the back plate, the thermocouple protective sleeve passes through the end cover and the back plate, and the thermocouple wire passes through the thermocouple protective sleeve.
[0009] The CVD vacuum chamber lower electrode sealing structure provided by this utility model may also have the following feature: the end cover is provided with a first sealing ring groove, and the sealing unit includes a first sealing ring, which is sleeved on the end cover and located in the first sealing ring groove.
[0010] The CVD vacuum chamber lower electrode sealing structure provided by this utility model may also have the following features: the outer diameter of the first sealing ring is 82mm, the cross-sectional diameter is 3.5mm, and the compression amount of the first sealing ring is 0.75mm.
[0011] The CVD vacuum chamber lower electrode sealing structure provided by this utility model may also have the following feature: a second sealing ring groove is provided on the back plate, and the sealing unit includes a second sealing ring, which is sleeved on the back plate and located in the second sealing ring groove.
[0012] The CVD vacuum chamber lower electrode sealing structure provided by this utility model may also have the following features: the outer diameter of the second sealing ring is 80mm, the cross-sectional diameter is 2mm, and the compression amount of the second sealing ring is 0.5mm.
[0013] The CVD vacuum chamber lower electrode sealing structure provided by this utility model may also have the following feature: a third sealing ring groove is provided on the back plate, and the sealing unit includes a third sealing ring, which is sleeved on the nickel rod and located in the third sealing ring groove.
[0014] The CVD vacuum chamber lower electrode sealing structure provided by this utility model may also have the following features: the outer diameter of the third sealing ring is 10mm, the cross-sectional diameter is 3.1mm, and the compression amount of the third sealing ring is 0.7mm.
[0015] The CVD vacuum chamber lower electrode sealing structure provided by this utility model may also have the following feature: a fourth sealing ring groove is provided on the back plate, the sealing unit includes a fourth sealing ring, the fourth sealing ring is sleeved on the thermocouple protective sleeve and located in the fourth sealing ring groove.
[0016] The CVD vacuum chamber lower electrode sealing structure provided by this utility model may also have the following features: the outer diameter of the fourth sealing ring is 14mm, the cross-sectional diameter is 3.1mm, and the compression amount of the fourth sealing ring is 0.7mm.
[0017] The technical advantages of this utility model are as follows: The CVD vacuum chamber lower electrode sealing structure provided by this utility model includes an end cap, a back plate, and a Shaft column. The end cap is set on the back plate, and the end cap and the back plate are set on the Shaft column. A sealing unit is provided between the end cap, the back plate, and the Shaft column. The sealing unit helps to improve the sealing performance of the lower electrode cavity, and can divide the lower electrode cavity into two sealed spaces. When the weld is damaged, it can maintain the vacuum state of the equipment, which helps to extend the service life of the equipment.
[0018] Therefore, the CVD vacuum chamber lower electrode sealing structure provided by this utility model has good sealing performance and can divide the lower electrode inner cavity into two sealed spaces. It can maintain the vacuum state of the equipment when the weld is damaged, which is beneficial to extending the service life of the equipment. Attached Figure Description
[0019] This manual includes the following figures, which illustrate the following:
[0020] Figure 1 This is a schematic diagram of the sealing structure of the lower electrode of the CVD vacuum chamber in an embodiment of this utility model. Figure 1 ;
[0021] Figure 2 This is a schematic diagram of the sealing structure of the lower electrode of the CVD vacuum chamber in an embodiment of this utility model. Figure 2 ;
[0022] Figure 3 This is a cross-sectional view of the lower electrode sealing structure of the CVD vacuum chamber in an embodiment of this utility model.
[0023] Figure 4 This is a schematic diagram of the structure of the end cap and the first sealing ring in an embodiment of this utility model;
[0024] Figure 5 This is a schematic diagram of the structure of the back plate and the second sealing ring in an embodiment of this utility model;
[0025] Figure 6 This is a schematic diagram of the back plate in a top view of an embodiment of this utility model;
[0026] Figure 7 This is a schematic diagram of the structure of the third and fourth sealing rings in an embodiment of this utility model. The markings in the figure are: end cap-10, first sealing ring groove-11, back plate-20, second sealing ring groove-21, third sealing ring groove-22, fourth sealing ring groove-23, Shaft column-30, sealing unit-40, first sealing ring-41, second sealing ring-42, third sealing ring-43, fourth sealing ring-44, nickel rod-50, thermocouple wire-60, and thermocouple protective sleeve-70. Detailed Implementation
[0027] The specific embodiments of the present invention will be further described in detail below with reference to the accompanying drawings, in order to help those skilled in the art to have a more complete, accurate and in-depth understanding of the inventive concept and technical solution of the present invention, and to facilitate its implementation.
[0028] Figure 1 This is a schematic diagram of the sealing structure of the lower electrode of the CVD vacuum chamber in an embodiment of this utility model. Figure 1 ; Figure 2 This is a schematic diagram of the sealing structure of the lower electrode of the CVD vacuum chamber in an embodiment of this utility model. Figure 2 ; Figure 3 This is a cross-sectional view of the lower electrode sealing structure of the CVD vacuum chamber in an embodiment of this utility model.
[0029] like Figure 1 , Figure 2 as well as Figure 3 As shown, the CVD vacuum chamber lower electrode sealing structure provided by this utility model includes an end cap 10, a back plate 20, and a Shaft column 30. The end cap 10 is disposed on the back plate 20, and the end cap 10 and the back plate 20 are disposed on the Shaft column 30. The end cap 10 and the Shaft column 30 are welded together. A sealing unit 40 is provided between the end cap 10, the back plate 20, and the Shaft column 30. The sealing unit 40 is beneficial to improving the sealing performance of the lower electrode cavity, and can divide the lower electrode cavity into two sealed spaces. When the weld is damaged, it can maintain the vacuum state of the equipment, which is beneficial to extending the service life of the equipment.
[0030] like Figure 1 , Figure 2 as well as Figure 3As shown, the CVD vacuum chamber lower electrode sealing structure provided by this utility model also includes nickel rods 50, thermocouple wires 60, and thermocouple protective sleeves 70. The nickel rods 50 are inserted through the end cap 10 and the back plate 20, the thermocouple protective sleeves 70 are inserted through the end cap 10 and the back plate 20, and the thermocouple wires 60 are inserted inside the thermocouple protective sleeves 70. Eight nickel rods 50 are evenly inserted through the end cap 10 and the back plate 20, and five thermocouple protective sleeves 70 are evenly inserted through the end cap 10 and the back plate 20.
[0031] Figure 4 This is a schematic diagram of the end cap and the first sealing ring in an embodiment of this utility model.
[0032] like Figure 3 and Figure 4 As shown, the end cap 10 is provided with a first sealing ring groove 11, and the sealing unit 40 includes a first sealing ring 41. The first sealing ring 41 is sleeved on the end cap 10 and located in the first sealing ring groove 11. The first sealing ring 41 is located between the inner wall of the end cap 10 and the Shaft post 30. The first sealing ring 41 forms a seal through compression between the inner wall of the end cap 10 and the Shaft post 30, which helps to improve the overall sealing performance. The first sealing ring 41 is an O-ring, with an outer diameter of 82 mm, a cross-sectional diameter of 3.5 mm, a compression amount of 0.75 mm, and a sealing surface roughness Ra of 0.8 μm.
[0033] Figure 5 This is a schematic diagram of the structure of the back plate and the second sealing ring in an embodiment of this utility model.
[0034] like Figure 3 and Figure 5 As shown, the back plate 20 is provided with a second sealing ring groove 21. The sealing unit 40 includes a second sealing ring 42, which is sleeved on the back plate 20 and located within the second sealing ring groove 21. The second sealing ring 42 is located between the back plate 20 and the inner wall of the Shaft column 30. The second sealing ring 42 forms a seal through compression between the back plate 20 and the inner wall of the Shaft column 30, which helps to improve the overall sealing performance. The second sealing ring 42 is an O-ring, with an outer diameter of 80 mm, a cross-sectional diameter of 2 mm, a compression amount of 0.5 mm, and a sealing surface roughness Ra of 0.8 μm.
[0035] Figure 6 This is a schematic diagram of the back plate in a top view of an embodiment of this utility model; Figure 7 This is a schematic diagram of the structure of the third and fourth sealing rings in an embodiment of this utility model.
[0036] Such as 6 and Figure 7As shown, the back plate 20 is provided with a third sealing ring groove 22, and the sealing unit 40 includes a third sealing ring 43. The third sealing ring 43 is sleeved on the nickel rod 50 and located in the third sealing ring groove 22. The third sealing ring 43 is located between the end cap 10 and the back plate 20. The third sealing ring 43 forms a seal through compression between the inner walls of the end cap 10 and the back plate 20, which helps to improve the overall sealing performance. The third sealing ring 43 is an O-ring, with an outer diameter of 10 mm, a cross-sectional diameter of 3.1 mm, a compression amount of 0.7 mm, and a sealing surface roughness Ra of 0.8 μm.
[0037] Such as 6 and Figure 7 As shown, the back plate 20 is provided with a fourth sealing ring groove 23. The sealing unit 40 includes a fourth sealing ring 44, which is fitted onto the thermocouple protective sleeve 70 and located within the fourth sealing ring groove 23. The fourth sealing ring 44 is located between the end cap 10 and the back plate 20. The fourth sealing ring 44 forms a seal through compression between the inner walls of the end cap 10 and the back plate 20, which helps to improve the overall sealing performance. The fourth sealing ring 44 is an O-ring, with an outer diameter of 14 mm, a cross-sectional diameter of 3.1 mm, a compression amount of 0.7 mm, and a sealing surface roughness Ra of 0.8 μm.
[0038] In the CVD vacuum chamber lower electrode sealing structure provided by this utility model, the sealing performance between the end cap 10, the back plate 20, and the Shaft column 30 can be effectively improved by the first sealing ring 41, the second sealing ring 42, the third sealing ring 43, and the fourth sealing ring 44. The first sealing ring 41, the second sealing ring 42, the third sealing ring 43, and the fourth sealing ring 44 are used to seal the nickel rod 50 and the thermocouple at the lead end, dividing the entire lower electrode cavity into two sealed spaces. Even if the weld between the end cap 10 and the Shaft column 30 is damaged, it will not affect the vacuum state of the equipment.
[0039] The role and effect of the embodiments
[0040] The CVD vacuum chamber lower electrode sealing structure provided by this utility model includes an end cap 10, a back plate 20, and a Shaft column 30. The end cap 10 is disposed on the back plate 20, and the end cap 10 and the back plate 20 are disposed on the Shaft column 30. The end cap 10 and the Shaft column 30 are welded together. A sealing unit 40 is provided between the end cap 10, the back plate 20, and the Shaft column 30. The sealing unit 40 is beneficial to improving the sealing performance of the lower electrode cavity, and can divide the lower electrode cavity into two sealed spaces. It can maintain the vacuum state of the equipment when the weld is damaged, which is beneficial to extending the service life of the equipment.
[0041] The present invention has been described above by way of example with reference to the accompanying drawings. Obviously, the specific implementation of the present invention is not limited to the above-described manner. Any non-substantial improvements made using the inventive concept and technical solution of the present invention; or the direct application of the inventive concept and technical solution to other situations without modification, are all within the protection scope of the present invention.
Claims
1. A sealing structure for the lower electrode of a CVD vacuum chamber, characterized in that, It includes an end cap (10), a back plate (20), and a Shaft post (30). The end cap (10) is disposed on the back plate (20), and the end cap (10) and the back plate (20) are disposed on the Shaft post (30). A sealing unit (40) is provided between the end cap (10), the back plate (20), and the Shaft post (30).
2. The CVD vacuum chamber lower electrode sealing structure according to claim 1, characterized in that, It also includes a nickel rod (50), a thermocouple wire (60), and a thermocouple protective sleeve (70). The nickel rod (50) passes through the end cap (10) and the back plate (20), the thermocouple protective sleeve (70) passes through the end cap (10) and the back plate (20), and the thermocouple wire (60) passes through the thermocouple protective sleeve (70).
3. The CVD vacuum chamber lower electrode sealing structure according to claim 2, characterized in that, The end cap (10) is provided with a first sealing ring groove (11), and the sealing unit (40) includes a first sealing ring (41), which is sleeved on the end cap (10) and located in the first sealing ring groove (11).
4. The CVD vacuum chamber lower electrode sealing structure according to claim 3, characterized in that, The outer diameter of the first sealing ring (41) is 82 mm, the cross-sectional diameter is 3.5 mm, and the compression of the first sealing ring (41) is 0.75 mm.
5. The CVD vacuum chamber lower electrode sealing structure according to claim 3, characterized in that, The back plate (20) is provided with a second sealing ring groove (21), and the sealing unit (40) includes a second sealing ring (42), which is sleeved on the back plate (20) and located in the second sealing ring groove (21).
6. The CVD vacuum chamber lower electrode sealing structure according to claim 5, characterized in that, The outer diameter of the second sealing ring (42) is 80 mm, the cross-sectional diameter is 2 mm, and the compression of the second sealing ring (42) is 0.5 mm.
7. The CVD vacuum chamber lower electrode sealing structure according to claim 5, characterized in that, The back plate (20) is provided with a third sealing ring groove (22), and the sealing unit (40) includes a third sealing ring (43), which is sleeved on the nickel rod (50) and located in the third sealing ring groove (22).
8. The CVD vacuum chamber lower electrode sealing structure according to claim 7, characterized in that, The outer diameter of the third sealing ring (43) is 10 mm, the cross-sectional diameter is 3.1 mm, and the compression of the third sealing ring (43) is 0.7 mm.
9. The CVD vacuum chamber lower electrode sealing structure according to claim 7, characterized in that, The back plate (20) is provided with a fourth sealing ring groove (23), and the sealing unit (40) includes a fourth sealing ring (44). The fourth sealing ring (44) is sleeved on the thermocouple protective sleeve (70) and located in the fourth sealing ring groove (23).
10. The CVD vacuum chamber lower electrode sealing structure according to claim 9, characterized in that, The outer diameter of the fourth sealing ring (44) is 14mm, the cross-sectional diameter is 3.1mm, and the compression of the fourth sealing ring (44) is 0.7mm.