A multi-axis clean conveying device for materials based on a microwave plasma cleaning machine
By designing a multi-axis clean material transfer device based on a microwave plasma cleaner, and employing automated feeding and vacuum sealing technologies, the problem of easy contamination of material surfaces after plasma cleaning was solved, achieving contamination-free material transfer.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- 无锡奥威赢科技有限公司
- Filing Date
- 2025-07-10
- Publication Date
- 2026-06-09
AI Technical Summary
After plasma cleaning, the surface activity of the material is high, and it is easy to adsorb pollutants when exposed to the atmosphere, especially difficult-to-filter particles of 0.1-1μm, which leads to secondary pollution problems.
Design a multi-axis clean material transfer device based on a microwave plasma cleaner. The device uses a multi-axis clean transfer channel, pre-purifies the material through an automatic feeding unit, and vacuum seals it through a vacuum treatment unit to isolate it from environmental gases and avoid contamination.
It enables automated material transport without contamination after cleaning, avoiding contact between materials and ambient gases after cleaning and ensuring clean material transport.
Smart Images
Figure CN224332976U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of plasma cleaning, specifically a multi-axis clean material transfer device based on a microwave plasma cleaner. Background Technology
[0002] Plasma cleaning is a novel high-tech technology that utilizes plasma to achieve results that conventional cleaning methods cannot. Within a vacuum chamber, a radio frequency power supply generates high-energy, disordered plasma under certain pressure. This plasma bombards the surface of the product being cleaned, achieving the cleaning purpose. The core of plasma cleaning lies in ionizing inert or reactive gases through a high-voltage electric field or radio frequency energy, forming plasma composed of electrons, ions, and free radicals. This process typically occurs in a vacuum or low-pressure environment. By adjusting the gas type, pressure, and energy input, the active state of the plasma can be precisely controlled. Plasma cleaning achieves deep cleaning through two mechanisms: high-energy ions, accelerated by the electric field, collide with the material surface, breaking the molecular bonds of contaminants and causing them to peel off. This mechanism is highly effective against stubborn stains such as metal oxides and organic residues. Active free radicals react chemically with surface molecules, generating volatile gases, thus achieving residue-free cleaning. For example, oxygen plasma can effectively decompose hydrocarbons. Compared to traditional radio frequency plasma, microwave plasma, due to its higher frequency, higher ion concentration, and lower energy, is particularly suitable for the non-destructive cleaning of sensitive devices such as semiconductor chips.
[0003] Currently, a vacuum environment must be achieved before ionizing the gas to generate plasma, and this vacuum environment allows for control over the type of gas to ensure the repeatability of the process. However, the surface after plasma treatment is in an "active ultra-clean" state. After cleaning in a vacuum environment, the surface activity is high, making it more prone to adsorbing contaminants when exposed to the atmosphere than ordinary clean surfaces. In particular, active surfaces can adsorb airborne particles, especially difficult-to-filter particles of 0.1-1μm. Residual free radicals can react with oxygen / water vapor to form new oxide layers, making secondary pollution problems more likely to occur during manual handling. The sources of this pollution are complex and the effects are irreversible.
[0004] This application aims to set up a multi-axis clean transport channel for dual-track linkage transport of materials. The materials are automatically fed into the plasma cleaner for cleaning and then automatically discharged into the vacuum chamber for packaging and unloading. This integrated clean transport of materials isolates them from environmental gases and avoids material contamination. Utility Model Content
[0005] The purpose of this invention is to provide a multi-axis clean material transfer device based on a microwave plasma cleaner, so as to solve the problems in the prior art.
[0006] To achieve the above objectives, this utility model provides the following technical solution:
[0007] A multi-axis clean material transfer device based on a microwave plasma cleaner is disclosed. The device includes a cleaning table for plasma cleaning of materials. The cleaning table contains a plasma cleaner, a loading area and a unloading area for loading and unloading cleaning of materials, and an operation chamber for transferring and cleaning materials. The cleaning table is equipped with loading and unloading guide rails for material transfer near the loading and unloading areas, respectively. The loading area contains an automatic loading unit for automated material loading, and the unloading area contains a vacuum treatment unit for cleaning materials.
[0008] By adopting the above technical solution: the plasma cleaner inside the cleaning station can comprehensively clean the materials with plasma. The feeding and unloading areas are used to clean the materials during feeding and unloading, respectively, to avoid the materials from coming into contact with the ambient gas after cleaning and causing pollution. The automatic feeding unit can automatically feed the materials while pre-purifying them, and the vacuum treatment unit can perform vacuum treatment on the unloaded materials to prevent the cleaned materials from coming into contact with the environment and causing pollution.
[0009] Further configuration: The automatic feeding unit includes a material frame for placing materials. A slider is provided on the feeding guide rail for moving the material frame. The slider is located at the four corners of the material frame, and a telescopic rod is provided between the slider and the material frame for raising and lowering the material frame. A discharge platform is provided near the material frame in the feeding area for placing materials into the plasma cleaner for cleaning. The discharge platform is inclined. The plasma cleaner includes a cleaning chamber and a system control room. Inside the operating chamber is a cleaning platform for placing and cleaning materials. A lifting guide rail is provided on the inner wall of the operating chamber for raising and lowering the cleaning platform. The lifting guide rail is located at the four corners of the cleaning platform, and the cleaning platform is hinged to the lifting guide rail. A lifting cylinder is provided inside the lifting guide rail for raising and lowering the cleaning platform. A robotic arm is provided on the cleaning platform for discharging and retrieving materials from the cleaning platform into the cleaning chamber. The cleaning chamber is equipped with a telescopic door.
[0010] By adopting the above technical solution: the material frame can place the feeding material, the slider can drive the material inside the material frame to be fed, the telescopic rod can drive the material frame to extend and retract, and the telescopic rod is set at the four corners of the material frame, which can drive the extension and retraction height of the two sides of the material frame to tilt the material frame and tilt the material inside the material frame to discharge. The discharge platform can buffer the material being discharged from the tilted material frame. The discharge platform can discharge the material according to inertia to the upper operating chamber of the plasma cleaner. The cleaning platform collects the material on the discharge platform and cleans it. The lifting guide rail can drive the cleaning platform to rise and fall. The lifting guide rail is set at the four corners of the cleaning platform and can drive the cleaning platform to rise and fall simultaneously. The material is fed into the cleaning chamber by the robot arm for cleaning. The robot arm can grab the material on the cleaning platform and place it into the cleaning chamber. After cleaning, the material is taken out from the cleaning chamber.
[0011] Further features: A lifting port is located at the top of the operating chamber near the discharge platform. The cleaning platform slides between the lifting port and the operating chamber. Several baffles are located near the lifting port in the loading area to protect the material falling from the discharge platform. A moving groove is located inside the discharge platform. A moving sealing plate is located inside the moving groove to move and seal the lifting port. The moving sealing plate is slidably connected inside the moving groove. A moving cylinder is located inside the moving groove to move the moving sealing plate. A sealing groove is located on the baffle corresponding to the position of the moving sealing plate to seal and limit the movement of the moving sealing plate to the position of the lifting port.
[0012] By adopting the above technical solution: the lifting port is set close to the discharge platform, which can move the cleaning platform to the lifting port to collect the material on the discharge platform. The baffle can prevent the material from being bumped and damaged when it moves down, and can also limit the material inside the cleaning platform. The movable sealing plate is slidably connected inside the discharge platform, which can seal the lifting port in the operating chamber. The movable cylinder can drive the movable sealing plate to move. The sealing groove on the baffle can lock and seal the movable sealing plate, which facilitates the cleaning of materials in the operating chamber in a vacuum environment.
[0013] Further configuration: The vacuum processing unit includes a double-layer vacuum chamber for vacuum transfer of the cleaned material. The double-layer vacuum chamber includes an inner cavity and an outer cavity. A slider is provided on the feeding guide rail to move the double-layer vacuum chamber. A feeding port is provided at the bottom of the operating chamber near the double-layer vacuum chamber. A lifting guide rail is laid on the feeding port. The cleaning material platform slides on the feeding port. A sealing telescopic plate is provided at the bottom of the system control chamber to seal the feeding port. The sealing telescopic plate is detachably connected to the system control chamber. A vacuum pump is provided in the outer cavity to evacuate the inner cavity. An opening and closing telescopic plate is provided near the outer cavity of the double-layer vacuum chamber to seal and open the inner cavity.
[0014] By adopting the above technical solution: the double-layer vacuum box can provide double protection for the cleaned material to avoid material contamination. The slider can drive the double-layer vacuum box to move and transport on the feeding slide rail. The feeding port can move the material on the cleaning platform down to the top of the double-layer vacuum box via the lifting guide rail. The robotic arm on the cleaning platform can then perform the feeding operation. The lifting guide rail is laid at the four corners of the cleaning platform, which can move the cleaning platform down to the top of the double-layer vacuum box, thereby feeding the material on the cleaning platform into the double-layer vacuum box for vacuum sealing and transportation. The sealing telescopic plate can seal the feeding port. The vacuum pump can evacuate the inner cavity of the double-layer vacuum box to vacuum seal the material fed into the inner cavity. The double-layer vacuum box can be opened and closed by the opening and closing telescopic plate.
[0015] Further features: The inner cavity is equipped with a protective plate for protecting the material during feeding, and an isolation plate is provided between the inner and outer cavities to isolate and protect the inner cavity. The isolation plate is equipped with several nitrogen nozzles that form a nitrogen curtain to isolate contamination when the material is fed from the cleaning platform to the double-layer vacuum box. The outer cavity is equipped with a gas storage tank, and the nitrogen nozzles are connected to the gas storage tank through pipelines.
[0016] By adopting the above technical solutions: the protective plate can protect the material during the process of the cleaning platform being unloaded by the robot arm, avoiding collisions during material unloading; the isolation plate can seal and cover the inner cavity; the inner cavity is vacuumed by a vacuum pump; and a nitrogen curtain is formed by a nitrogen nozzle during material unloading on the cleaning platform to isolate contamination and ensure clean material transport.
[0017] Further features: The material frame is equipped with a telescopic limiting baffle for limiting the material feeding on the side near the feeding platform. The telescopic limiting baffle is telescopically connected inside the material frame. The feeding platform is equipped with a limiting movement groove for limiting the movement of the material. The limiting movement groove is equipped with a brush for electrostatic adsorption of larger dust particles on the surface of the material.
[0018] By adopting the above technical solution: the telescopic limiting baffle can limit the material flow inside the material frame; opening the telescopic limiting baffle can open the material frame, making it easier for the material inside the material frame to tilt and be discharged; the limiting moving groove can limit the material discharge position, making it easier for the material to be discharged onto the cleaning platform; and the brush can pre-treat larger dust particles on the material surface with electrostatic adsorption.
[0019] Compared with the prior art, the beneficial effects of this utility model are: it aims to set up a multi-axis clean transmission channel to carry out dual-track linkage transmission of materials, automatically feed materials into the plasma cleaner for cleaning, and then automatically discharge materials into the vacuum chamber for packaging and unloading. It integrates the clean transmission of materials, isolates them from contact with environmental gases, and avoids material contamination. Attached Figure Description
[0020] To make the contents of this utility model easier to understand, the present utility model will be further described in detail below with reference to specific embodiments and accompanying drawings.
[0021] Figure 1 This is a schematic diagram of the external structure of a multi-axis clean material transfer device based on a microwave plasma cleaner according to this utility model.
[0022] Figure 2 This is a partial cross-sectional view of a multi-axis clean material transfer device based on a microwave plasma cleaner according to this utility model.
[0023] Figure 3 This is an overall cross-sectional view of a multi-axis clean material transfer device based on a microwave plasma cleaner according to this utility model.
[0024] In the diagram, 1 is the loading area; 2 is the unloading area; 3 is the operating chamber; 4 is the loading guide rail; 5 is the unloading guide rail; 6 is the material frame; 7 is the unloading platform; 8 is the cleaning and processing chamber; 9 is the lifting guide rail; 10 is the robot arm; 11 is the moving sealing plate; 12 is the double-layer vacuum box; 13 is the sealing telescopic plate; and 14 is the nitrogen nozzle. Detailed Implementation
[0025] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.
[0026] Please see Figures 1-3 In this embodiment of the present invention, a multi-axis clean material transfer device based on a microwave plasma cleaner is provided. The device includes a cleaning table for plasma cleaning of materials. The cleaning table includes a plasma cleaner, a loading area 1 and a unloading area 2 for loading and unloading cleaning of materials, and an operation chamber 3 for transferring and cleaning materials. The electrical components in the loading area 1, unloading area 2 and operation chamber 3 are all connected to an external power supply for control. The operation chamber 3 is provided with a viewing window. The loading area 1 and unloading area 2 are provided with loading ports and unloading ports. The cleaning table is provided with loading guide rails 4 and unloading guide rails 5 for transferring materials near the loading area 1 and unloading area 2, respectively. The cleaning table, loading guide rails 4 and unloading guide rails 5 are all provided with supports.
[0027] The plasma cleaner inside the cleaning station can perform comprehensive plasma cleaning on the materials. The loading and unloading areas 1 and 2 respectively clean the materials during loading and unloading. The cleaning station is equipped with a vacuum pump for evacuating the operating chamber 3 to prevent the materials from coming into contact with the ambient gas and causing pollution during the cleaning and transfer process.
[0028] The feeding area 1 is equipped with an automatic feeding unit for automatically feeding materials, and the unloading area 2 is equipped with a vacuum treatment unit for cleaning materials. The automatic feeding unit can automatically feed materials while pre-purifying them, and the vacuum treatment unit can vacuum-treat the unloaded materials to prevent the cleaned materials from coming into contact with the environment and causing pollution.
[0029] The automatic feeding unit includes a material frame 6 for placing materials. The feeding guide rail 4 is equipped with sliders for moving the material frame 6. The sliders are located at the four corners of the material frame 6, and there are telescopic rods between the sliders and the material frame 6 for raising and lowering the material frame 6. The feeding area 1 is equipped with a discharge platform 7 near the material frame 6 for placing materials into a plasma cleaner for cleaning. The discharge platform 7 is inclined. The material frame 6 is equipped with a telescopic limiting baffle for limiting the material discharge on the side near the discharge platform 7. The telescopic limiting baffle is telescopically connected to the inside of the material frame 6. The discharge platform 7 is equipped with a limiting movement groove for limiting the movement of materials. The limiting movement groove is equipped with a brush for electrostatic adsorption of larger dust particles on the surface of the material.
[0030] The telescopic limiting baffle can limit the material flow inside the material frame 6. By opening the telescopic limiting baffle, the material frame 6 can be opened, making it easier for the material inside the material frame 6 to tilt and be discharged. The limiting moving groove can limit the material discharge position, making it easier for the material to be discharged onto the cleaning platform. The brush can pre-treat larger dust particles on the material surface with electrostatic adsorption.
[0031] The plasma cleaner includes a cleaning chamber 8 and a system control room. The operating chamber 3 is equipped with a cleaning platform for placing and cleaning materials. The inner wall of the operating chamber 3 is equipped with lifting guide rails 9 for raising and lowering the cleaning platform. The lifting guide rails 9 are located at the four corners of the cleaning platform and are hinged to the cleaning platform. The lifting guide rails 9 are equipped with lifting cylinders for raising and lowering the cleaning platform. The cleaning platform is equipped with a robotic arm 10 for loading and unloading materials into the cleaning chamber 8. The cleaning chamber 8 is equipped with a telescopic door. The cleaning platform is equipped with positioning sensors for positioning the telescopic door and the material position. The robotic arm 10 can sense the door of the cleaning chamber 8 and place the materials.
[0032] The material frame 6 can hold the feeding material. The slider can drive the material inside the material frame 6 to be fed. The telescopic rod can drive the material frame 6 to extend and retract. The telescopic rod is located at the four corners of the material frame 6, which can cause the two sides of the material frame 6 to extend and retract at different heights, thereby causing the material frame 6 to tilt and the material inside the material frame 6 to be tilted and discharged. The discharge platform 7 can buffer the material being discharged from the tilted material frame 6. The material can be discharged by inertia to the upper operating chamber 3 of the plasma cleaner. The cleaning platform collects the material on the discharge platform 7 and cleans it. The lifting guide rail 9 can drive the cleaning platform to rise and fall. The lifting guide rail 9 is located at the four corners of the cleaning platform and can drive the cleaning platform to rise and fall at the same time. The material is fed into the cleaning treatment chamber 8 by the robot arm 10 for cleaning. The robot arm 10 can grab the material on the cleaning platform and place it into the cleaning treatment chamber 8. After cleaning, the material is taken out from the cleaning treatment chamber 8.
[0033] The top of the operating chamber 3 is provided with a lifting port near the discharge platform 7. The cleaning platform slides inside the lifting port and the operating chamber 3. The loading area 1 is provided with several baffles near the lifting port to protect the material falling from the discharge platform 7. The discharge platform 7 is provided with a moving groove. The moving groove is provided with a moving sealing plate 11 for moving and sealing the lifting port. The moving sealing plate 11 is slidably connected inside the moving groove. The moving groove is provided with a moving cylinder for moving the moving sealing plate 11. The baffle is provided with a sealing groove corresponding to the position of the moving sealing plate 11 for sealing and limiting the movement of the moving sealing plate 11 to the position of the lifting port.
[0034] The lifting port is positioned close to the discharge platform 7, allowing the cleaning platform to be moved up to the lifting port for material collection. The baffle prevents material from being bumped and damaged during downward movement and also confines the material inside the cleaning platform. The movable sealing plate 11 is slidably connected inside the discharge platform 7, sealing the lifting port in the operating chamber 3. The movable cylinder can move the movable sealing plate 11, and the sealing groove on the baffle can lock and seal the movable sealing plate 11, facilitating material cleaning in the operating chamber 3 under vacuum.
[0035] The vacuum processing unit includes a double-layer vacuum box 12 for vacuum transfer of cleaned materials. The double-layer vacuum box 12 includes an inner cavity and an outer cavity. A slider is provided on the feeding guide rail 5 to move the double-layer vacuum box 12. A feeding port is provided at the bottom of the operating chamber 3 near the double-layer vacuum box 12. A lifting guide rail 9 is laid on the feeding port. The cleaning material platform slides on the feeding port. A sealing telescopic plate 13 is provided at the bottom of the system control room for sealing the feeding port. The sealing telescopic plate 13 is detachably connected to the system control room. A vacuum pump is provided in the outer cavity for evacuating the inner cavity. An opening and closing telescopic plate is provided near the outer cavity of the double-layer vacuum box 12 for sealing and opening the inner cavity.
[0036] The double-layer vacuum box 12 provides double protection for the cleaned materials, preventing contamination. A slider moves the double-layer vacuum box 12 along the feeding rail. The feeding port lowers the materials from the cleaning platform onto the double-layer vacuum box 12 via the lifting guide rail 9, where the robotic arm 10 performs the feeding operation. The lifting guide rail 9, positioned at the four corners of the cleaning platform, lowers the platform onto the double-layer vacuum box 12, thus feeding the materials into the double-layer vacuum box 12 for vacuum sealing and transport. The sealing telescopic plate 13 seals the feeding port. A vacuum pump evacuates the inner cavity of the double-layer vacuum box 12, vacuum-sealing the materials inside. The opening and closing telescopic plate seals and opens / closes the double-layer vacuum box 12.
[0037] The inner cavity is equipped with a protective plate for protecting the material during feeding. An isolation plate is provided between the inner cavity and the outer cavity to isolate and protect the inner cavity. The isolation plate is equipped with several nitrogen nozzles 14 for forming a nitrogen curtain to isolate contamination when the material is fed from the cleaning platform to the double-layer vacuum box 12. The outer cavity is equipped with a gas storage tank, and the nitrogen nozzles 14 are connected to the gas storage tank through pipelines.
[0038] The protective plate can protect the material during the process of the cleaning platform being unloaded by the robot arm 10, preventing the material from being bumped or knocked. The isolation plate can seal and cover the inner cavity. The inner cavity is vacuumed by a vacuum pump. A nitrogen curtain is formed by a nitrogen nozzle 14 during the unloading of the cleaning platform to isolate contamination and ensure the clean transmission of the material.
[0039] The working principle of this utility model is as follows: The operator places the material to be cleaned inside the material frame 6, opens the feeding guide rail 4 to transport the material frame 6 to the top of the cleaning table, opens the telescopic rod and telescopic limit baffle on the slider of the feeding guide rail 4, the telescopic rod can adjust the different heights on both sides of the material frame 6, thereby causing the material frame 6 to tilt, and the material frame 6 can be opened by opening the telescopic limit baffle, so that the material inside the material frame 6 can be tilted and discharged onto the discharge platform 7. The brush on the discharge platform 7 pre-treats the larger dust on the surface of the material with electrostatic adsorption. The material moves down onto the cleaning material platform by inertia through the tilted discharge platform 7, opens the lifting guide rail 9, and the lifting guide rail 9 drives the cleaning material platform to move to the telescopic door position of the cleaning treatment chamber 8, opens the moving cylinder, and the moving cylinder can drive the moving sealing plate 11 to move. The sealing groove on the baffle can lock and seal the moving sealing plate 11.
[0040] The robotic arm 10 is activated, and it places the material into the cleaning chamber 8 according to the position located by the positioning sensor. If necessary, the robotic arm 10 can be controlled externally. After the material is cleaned, the robotic arm 10 takes out the material and places it on the cleaning platform. The lifting guide rail 9 is activated to move the cleaning platform down to the discharge port. It is confirmed that the double-layer vacuum box 12 is above the discharge port. The robotic arm 10 on the cleaning platform performs the material discharge operation. The nitrogen nozzle 14 is activated to form a nitrogen curtain to isolate contamination when the material is discharged from the cleaning platform. After the material is discharged, the double-layer vacuum box 12 is sealed by opening and closing the telescopic plate. The vacuum tube is activated to draw a vacuum into its inner cavity. The material discharge guide rail 5 is activated to transport the material.
[0041] It will be apparent to those skilled in the art that this invention is not limited to the details of the exemplary embodiments described above, and that it can be implemented in other specific forms without departing from the spirit or essential characteristics of this invention. Therefore, the embodiments should be considered illustrative and non-limiting in all respects, and the scope of this invention is defined by the appended claims rather than the foregoing description. Thus, it is intended that all variations falling within the meaning and scope of equivalents of the claims be included within this invention. No reference numerals in the claims should be construed as limiting the scope of the claims.
Claims
1. A multi-axis clean material transfer device based on a microwave plasma cleaner, characterized in that: The equipment includes a cleaning table for plasma cleaning of materials. The cleaning table includes a plasma cleaner, a loading area (1) and a unloading area (2) for loading and unloading cleaning of materials, and an operation chamber (3) for transferring and cleaning materials. The cleaning table is equipped with a loading guide rail (4) and an unloading guide rail (5) for transferring materials near the loading area (1) and the unloading area (2), respectively. The loading area (1) is equipped with an automatic loading unit for automatically loading materials, and the unloading area (2) is equipped with a vacuum treatment unit for cleaning materials.
2. The multi-axis clean material transfer device based on a microwave plasma cleaner according to claim 1, characterized in that... The automatic feeding unit includes a material frame (6) for placing materials. A slider is provided on the feeding guide rail (4) for moving the material frame (6). The slider is located at the four corners of the material frame (6). A telescopic rod is provided between the slider and the material frame (6) for raising and lowering the material frame (6). A feeding platform (7) for placing materials into the plasma cleaner is provided near the material frame (6) in the feeding area (1). The feeding platform (7) is inclined. The plasma cleaner includes a cleaning treatment chamber (8) and a system control room and an operation chamber (3). The interior is equipped with a cleaning platform for placing and cleaning materials. The inner wall of the operating chamber (3) is equipped with a lifting guide rail (9) for lifting the cleaning platform. The lifting guide rail (9) is located at the four corners of the cleaning platform and the cleaning platform is hinged to the lifting guide rail (9). The lifting guide rail (9) is equipped with a lifting cylinder for lifting the cleaning platform. The cleaning platform is equipped with a robotic arm (10) for placing and picking up materials on the cleaning platform inside the cleaning processing chamber (8). The cleaning processing chamber (8) is equipped with a telescopic door.
3. A multi-axis clean material transfer device based on a microwave plasma cleaner according to claim 1, characterized in that... The operating chamber (3) is provided with a lifting port at the top near the feeding platform (7). The cleaning platform slides inside the lifting port and the operating chamber (3). The feeding area (1) is provided with several baffles near the lifting port to protect the material falling from the feeding platform (7). The feeding platform (7) is provided with a moving groove. The moving groove is provided with a moving sealing plate (11) for moving and sealing the lifting port. The moving sealing plate (11) is slidably connected inside the moving groove. The moving groove is provided with a moving cylinder for moving the moving sealing plate (11). The baffle is provided with a sealing groove corresponding to the position of the moving sealing plate (11) for sealing and limiting the movement of the moving sealing plate (11) to the position of the lifting port.
4. A multi-axis clean material transfer device based on a microwave plasma cleaner according to claim 1, characterized in that... The vacuum processing unit includes a double-layer vacuum box (12) for vacuum transfer of cleaned materials. The double-layer vacuum box (12) includes an inner cavity and an outer cavity. A slider is provided on the feeding guide rail (5) for moving the double-layer vacuum box (12). A feeding port is provided at the bottom of the operating chamber (3) near the double-layer vacuum box (12). A lifting guide rail (9) is laid on the feeding port. The cleaning material platform slides on the feeding port. A sealing telescopic plate (13) is provided at the bottom of the system control room for sealing the feeding port. The sealing telescopic plate (13) is detachably connected to the system control room. A vacuum pump is provided in the outer cavity for vacuuming the inner cavity. An opening and closing telescopic plate is provided near the outer cavity of the double-layer vacuum box (12) for sealing and opening the inner cavity.
5. A multi-axis clean material transfer device based on a microwave plasma cleaner according to claim 4, characterized in that... The inner cavity is provided with a protective plate for protecting the material during feeding. An isolation plate is provided between the inner cavity and the outer cavity for isolating and protecting the inner cavity. The isolation plate is provided with several nitrogen nozzles (14) for forming a nitrogen curtain to isolate contamination when the material is fed from the cleaning platform to the double-layer vacuum box (12). The outer cavity is provided with a gas storage tank. The nitrogen nozzles (14) are connected to the gas storage tank through pipelines.
6. A multi-axis clean material transfer device based on a microwave plasma cleaner according to claim 2, characterized in that... The material frame (6) is provided with a telescopic limiting baffle for limiting the material feeding on the side near the feeding platform (7). The telescopic limiting baffle is telescopically connected inside the material frame (6). The feeding platform (7) is provided with a limiting moving groove for limiting the material movement. The limiting moving groove is provided with a brush for electrostatic adsorption of larger dust on the surface of the material.