Vacuum suction device
CN224347449UActive Publication Date: 2026-06-12CHANGSHA HUASHI SEMICON CO LTD
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- CHANGSHA HUASHI SEMICON CO LTD
- Filing Date
- 2026-04-01
- Publication Date
- 2026-06-12
AI Technical Summary
⚠Technical Problem
In the existing technology, the wax bonding process used to fix the workpiece during the processing of silicon components has the problems of low processing efficiency and impurity contamination.
⚗Method used
The vacuum adsorption device uses a vacuum pump to create negative pressure and uses an adsorption unit to fix the workpiece, avoiding the steps of heating to melt wax and cleaning, simplifying the processing flow, and improving the applicability and stability of the device through the adaptive switching mechanism of the adsorption unit.
🎯Benefits of technology
It improves processing efficiency, reduces the risk of impurity contamination, enhances processing quality and the applicability and reliability of the equipment, and reduces the risk of damage to the workpiece.
✦ Generated by Eureka AI based on patent content.
Smart Images
Figure CN224347449U_ABST
Abstract
The application discloses a vacuum adsorption device, a tool main body has a first chamber, a bearing surface for bearing a workpiece, and a plurality of adsorption holes arranged at intervals on the bearing surface, a vacuum extraction assembly is communicated with the first chamber, an adsorption unit is arranged in each adsorption hole, and the plurality of adsorption units are communicated with the first chamber. Wherein, the adsorption unit is arranged to be shielded by the workpiece to maintain a conduction state so that the workpiece is adhered to the bearing surface under the action of negative pressure, and is not shielded by the workpiece to maintain a closed state. The application fixes the workpiece through vacuum adsorption, has high processing efficiency, and improves the pollution of impurities such as wax to the workpiece. Meanwhile, each adsorption unit can be independently closed, so that the vacuum adsorption device can adapt to workpieces of different sizes or different shapes. In the processing process, even if individual adsorption units are closed due to deformation or displacement of the workpiece, the adsorption effect of other adsorption units will not be affected, thereby improving the adsorption stability and reliability of the vacuum adsorption device.
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