A jacking structure for a vacuum chamber

By setting a sealing guide structure and guide ring on the outer wall of the vacuum chamber, combined with a linear telescopic drive mechanism, the problem of unstable vacuum level when lifting wafers in the vacuum chamber is solved, achieving high sealing performance and stable production quality.

CN224356624UActive Publication Date: 2026-06-12ZHISHENG SCI & TECH GUANGZHOU

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
ZHISHENG SCI & TECH GUANGZHOU
Filing Date
2025-07-09
Publication Date
2026-06-12

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    Figure CN224356624U_ABST
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Abstract

The utility model discloses a jacking structure for vacuum cavity, including the sealed guide structure of sealed connection on the outer wall of vacuum cavity, the jacking rod of being equipped with with sealed cooperation and the relative sliding of inside being worn of sealed guide structure, and the jacking rod one end is connected with the thimble, and the thimble top end is located in the vacuum cavity and both movable cooperation, and a plurality of thimbles are equipped in the vacuum cavity, and the jacking rod other end is connected with the jacking drive assembly. The jacking structure for vacuum cavity provided by the utility model can stably lift the wafer in the vacuum cavity, and meanwhile ensures not to influence the internal air pressure of the vacuum cavity.
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Description

Technical Field

[0001] This utility model relates to the field of semiconductor manufacturing, and in particular to a lifting structure for a vacuum cavity. Background Technology

[0002] A wafer is a silicon wafer used to fabricate silicon semiconductor circuits. During wafer production, certain processes (such as etching) require storage at an atmospheric pressure of 10... -3 Within a vacuum environment of Pa.

[0003] Chemical vapor deposition (CVD) is a technique used in the fabrication of microelectronic devices to deposit thin films, which may be dielectric materials or semiconductors. Physical vapor deposition (PVD), on the other hand, uses an inert gas to bombard a sputtering target, depositing the desired material onto the surface of a wafer. The high temperature and vacuum environment within the process chamber allow these metal atoms to crystallize into grains, which, after patterning and etching, yield the desired conductive circuitry.

[0004] Wafers in a vacuum chamber need to be lifted during loading or unloading to allow space for a robotic arm located within the chamber to pick up and place materials; therefore, a lifting structure is required. However, the lifting structure must maintain a vacuum level within the chamber while moving in coordination with the vacuum chamber, and traditional equipment lacks a suitable structure. Therefore, it is necessary to develop a lifting structure that can be used in a vacuum chamber. Utility Model Content

[0005] The purpose of this invention is to provide a lifting structure for a vacuum chamber that can smoothly lift a wafer in a vacuum chamber while ensuring that the internal air pressure of the vacuum chamber is not affected.

[0006] To achieve the above objectives, this utility model provides a lifting structure for a vacuum chamber, including a sealing guide structure sealed to the outer wall of the vacuum chamber, a lifting rod that is sealed and slidable relative to the sealing guide structure, a pin connected to one end of the lifting rod, the top of the pin being located inside the vacuum chamber and the two being movablely engaged, and a plurality of pins being provided inside the vacuum chamber; and a lifting drive assembly connected to the other end of the lifting rod.

[0007] As a further improvement of this utility model, the sealing guide structure includes a cylindrical support base, which is fixed relative to the vacuum cavity. The lifting rod passes through the middle of the support base and the two slide axially together. A first sealing ring is provided between the inner wall of the support base and the outer wall of the lifting rod.

[0008] As a further improvement of this utility model, the sealing guide structure also includes a pad, which is located between one end of the support base and the outer wall of the vacuum chamber. The support base, the pad, and the vacuum chamber are connected by a first connector. A second sealing ring is provided between the support base and the pad, and a third sealing ring is provided between the pad and the outer wall of the vacuum chamber. The lifting rod is slidably engaged with the middle of the pad. Both the second and third sealing rings are wrapped around the outside of the lifting rod.

[0009] As a further improvement of this utility model, a first guide ring is embedded in the end face of the support base facing the vacuum cavity, a second guide ring is embedded in the end face of the support base away from the vacuum cavity, an end cap is connected to the end face of the support base away from the vacuum cavity, and the second guide ring is sandwiched between the end cap and the support base; the lifting rod passes through the first guide ring and the second guide ring and slides with both.

[0010] As a further improvement of this utility model, the lifting drive assembly includes a linear telescopic drive mechanism, the fixed end of which is fixed relative to the vacuum cavity, and the telescopic end of which is linked to the lifting rod.

[0011] As a further improvement of this utility model, the lifting drive assembly further includes a first connecting rod and a connecting plate; one end of the first connecting rod is connected to the fixed plate, the fixed plate is fixed relative to the vacuum cavity, and the other end of the first connecting rod is connected to the fixed end of the linear telescopic drive mechanism; the connecting plate is connected to the telescopic end of the linear telescopic drive mechanism, and one end of the lifting rod is connected to the connecting plate.

[0012] Beneficial effects

[0013] Compared with the prior art, the advantages of the lifting structure for the vacuum cavity of this utility model are:

[0014] 1. By installing a sealed guide structure on the outer wall of the vacuum chamber, the lifting rod is guided by the sealed guide structure, thereby allowing several ejector pins located inside the vacuum chamber to lift the wafer. During this process, the sealed guide structure guides the lifting rod while ensuring a seal, guaranteeing the stability of the gas pressure inside the vacuum chamber, preventing a decline in wafer production quality due to changes in the vacuum level of the vacuum chamber, and ensuring product quality consistency.

[0015] 2. The cylindrical support base guides the lifting rod and achieves a seal through the first sealing ring. A second sealing ring seals the support base against the pad, and a third sealing ring seals the pad against the outer wall of the vacuum chamber, improving the sealing performance. The entire mechanism is within 10... -3 Under vacuum conditions, ΔP ≤ 4 × 10⁻⁶ Pa can be maintained. -3 Leakage rate in Pa / s.

[0016] The present invention will become clearer from the following description and in conjunction with the accompanying drawings, which are used to explain the embodiments of the present invention. Attached Figure Description

[0017] To more clearly illustrate the technical solutions in the embodiments of this utility model or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0018] Figure 1 A front sectional view of the lifting structure used in a vacuum chamber;

[0019] Figure 2 This is a front sectional view of the sealing guide structure;

[0020] Figure 3 This is a front sectional view of the lifting drive assembly. Detailed Implementation

[0021] Embodiments of the present invention will now be described with reference to the accompanying drawings.

[0022] Example

[0023] The specific embodiments of this utility model are as follows: Figures 1 to 3 As shown, a lifting structure for a vacuum chamber includes a sealing guide structure 1 sealed to the bottom of the outer wall of a vacuum chamber 2. A lifting rod 3, which is sealed and slidable relative to the sealing guide structure 1, passes through the sealing guide structure 1. One end of the lifting rod 3 is connected to a pin 4, the top of which is located inside the vacuum chamber 2 and the two are movably connected. Several pins 4 are located inside the vacuum chamber 2. The other end of the lifting rod 3 is connected to a lifting drive assembly. Each wafer (not shown in the figure) located inside the vacuum chamber 2 can be lifted by three pins 4. The upper end of the pin 4 vertically passes through the bottom of the outer wall of the vacuum chamber 2.

[0024] In this embodiment, among the three ejector pins 4 corresponding to the same wafer, each ejector pin 4 corresponds to a lifting rod 3, and each lifting rod 3 is linked to the same lifting drive assembly. Alternatively, all three ejector pins 4 can be arranged on the same lifting rod 3, and this lifting rod 3 can be linked to a lifting drive assembly.

[0025] The sealing guide structure 1 includes a cylindrical support base 11, which is vertically arranged. The support base 11 is fixed relative to the vacuum chamber 2. The lifting rod 3 passes through the middle of the support base 11 and the two are axially slidingly engaged. A first sealing ring 14 is provided between the inner wall of the support base 11 and the outer wall of the lifting rod 3. In this embodiment, the number of lifting rods 3 and support bases 11 corresponds one-to-one. In this embodiment, each support base 11 is provided with four first sealing rings 14, two of which are close to the upper end of the support base 11 and the other two are close to the lower end of the support base 11, thereby ensuring the vacuum degree is maintained during the linear movement of the lifting rod 3. Figure 2 As shown.

[0026] The sealing guide structure 1 also includes a pad 15, which is located between the upper end of the support base 11 and the bottom of the outer wall of the vacuum chamber 2. The support base 11, the pad 15, and the vacuum chamber 2 are connected by a first connector 16, which can be a first bolt. The first bolt passes through the flange at the upper end of the support base 11, the pad 15, and is threadedly connected to the vacuum chamber 2 from bottom to top. A second sealing ring 17 is provided between the support base 11 and the pad 15, and a third sealing ring 18 is provided between the pad 15 and the outer wall of the vacuum chamber 2. The lifting rod 3 slides in contact with the middle of the pad 15. Both the second sealing ring 17 and the third sealing ring 18 surround the outside of the lifting rod 3.

[0027] A first guide ring 12 is embedded in the end face (upper end face) of the support base 11 facing the vacuum chamber 2, and a second guide ring 13 is embedded in the end face (lower end face) of the support base 11 away from the vacuum chamber 2. The first guide ring 12 is sandwiched between the pad 15 and the support base 11. An end cap 19 is connected to the end face of the support base 11 away from the vacuum chamber 2, and the second guide ring 13 is sandwiched between the end cap 19 and the support base 11. A second connector, a second bolt, is provided on the end cap 19, which passes through the end cap 19 from bottom to top and is threadedly connected to the lower end of the support base 11.

[0028] The lifting rod 3 passes through and slides with the first guide ring 12 and the second guide ring 13. Both the first guide ring 12 and the second guide ring 13 are used to guide the lifting rod 3. The first guide ring 12 and the second guide ring 13 are made of polytetrafluoroethylene. The inner ring constrains the lifting rod 3 through tolerance fit to ensure the accuracy of the linear movement of the lifting rod 3, while also ensuring the vacuum degree.

[0029] The lifting drive assembly includes a linear telescopic drive mechanism 5, which can be a cylinder or a linear motor; in this embodiment, it is a cylinder. The fixed end of the linear telescopic drive mechanism 5 is fixed relative to the vacuum chamber 2, and the telescopic end 51 of the linear telescopic drive mechanism 5 is linked with the lifting rod 3.

[0030] In this embodiment, the lifting drive assembly further includes a first connecting rod 61 and a connecting plate 62. The upper end of the first connecting rod 61 is connected to the fixed plate 7, which is fixed relative to the vacuum chamber 2. The lower end of the first connecting rod 61 is connected to the fixed end of the linear telescopic drive mechanism 5. The connecting plate 62 is connected to the telescopic end 51 of the linear telescopic drive mechanism 5. The lower ends of each lifting rod 3 corresponding to the same wafer are threadedly connected to the same connecting plate 62. The first connecting rod 61 is vertically arranged and passes through the through hole on the connecting plate 62, and the two slide vertically together; the lifting rod 3 passes through the through hole on the fixed plate 7, and the two slide vertically together.

[0031] When a wafer needs to be lifted, a sealing guide structure 1 is installed on the outer wall of the vacuum chamber 2. The sealing guide structure 1 guides the lifting rod 3, so that several ejector pins 4 located in the vacuum chamber 2 can lift the wafer together. The entire mechanism is completed in 10 minutes. -3 Under vacuum conditions, ΔP ≤ 4 × 10⁻⁶ Pa can be maintained. -3 Leakage rate in Pa / s.

[0032] The present invention has been described above in conjunction with the preferred embodiments, but the present invention is not limited to the embodiments disclosed above, but should cover various modifications and equivalent combinations made in accordance with the essence of the present invention.

Claims

1. A lifting structure for a vacuum cavity, characterized in that, It includes a sealing guide structure (1) that is sealed to the outer wall of the vacuum chamber (2), and a lifting rod (3) that is sealed and can slide relative to the sealing guide structure (1). One end of the lifting rod (3) is connected to a pin (4), the top of the pin (4) is located inside the vacuum chamber (2) and the two are movable and cooperate. Several pins (4) are provided inside the vacuum chamber (2); the other end of the lifting rod (3) is connected to a lifting drive assembly.

2. The lifting structure for a vacuum cavity according to claim 1, characterized in that, The sealing guide structure (1) includes a cylindrical support seat (11), which is fixed relative to the vacuum cavity (2). The lifting rod (3) passes through the middle of the support seat (11) and the two slide in axial direction. A first sealing ring (14) is provided between the inner wall of the support seat (11) and the outer wall of the lifting rod (3).

3. The lifting structure for a vacuum cavity according to claim 2, characterized in that, The sealing guide structure (1) also includes a pad (15), which is located between one end of the support base (11) and the outer wall of the vacuum chamber (2). The support base (11), the pad (15), and the vacuum chamber (2) are connected by a first connector (16). A second sealing ring (17) is provided between the support base (11) and the pad (15), and a third sealing ring (18) is provided between the pad (15) and the outer wall of the vacuum chamber (2). The lifting rod (3) slides in the middle of the pad (15). Both the second sealing ring (17) and the third sealing ring (18) are wrapped around the outside of the lifting rod (3).

4. A lifting structure for a vacuum cavity according to claim 2 or 3, characterized in that, A first guide ring (12) is embedded on the end face of the support base (11) facing the vacuum cavity (2), and a second guide ring (13) is embedded on the end face of the support base (11) away from the vacuum cavity (2). An end cap (19) is connected to the end face of the support base (11) away from the vacuum cavity (2), and the second guide ring (13) is sandwiched between the end cap (19) and the support base (11). The lifting rod (3) passes through the first guide ring (12) and the second guide ring (13) and slides with both.

5. A lifting structure for a vacuum cavity according to claim 1, characterized in that, The lifting drive assembly includes a linear telescopic drive mechanism (5), the fixed end of which is fixed relative to the vacuum cavity (2), and the telescopic end (51) of which is linked with the lifting rod (3).

6. A lifting structure for a vacuum cavity according to claim 5, characterized in that, The lifting drive assembly also includes a first connecting rod (61) and a connecting plate (62); one end of the first connecting rod (61) is connected to the fixed plate (7), the fixed plate (7) is fixed relative to the vacuum cavity (2), and the other end of the first connecting rod (61) is connected to the fixed end of the linear telescopic drive mechanism (5); the connecting plate (62) is connected to the telescopic end (51) of the linear telescopic drive mechanism (5), and one end of the lifting rod (3) is connected to the connecting plate (62).