A tray structure and film forming apparatus

Abstract

The application discloses a tray structure and a film forming device, and belongs to the technical field of semiconductors. The tray structure comprises a tray main body provided with a containing space capable of bearing a substrate; an inner disc arranged at the center of the tray main body and detachably matched with the tray main body, wherein the inner disc comprises a main body part and a plurality of supporting parts; the main body part has a central axis and an upper side surface facing the containing space; and the plurality of supporting parts are arranged on the upper side surface of the main body part and are arranged at intervals around the central axis. By arranging the plurality of supporting parts on the main body part, a central groove and a plurality of exhaust grooves can be formed between the supporting parts, so that sufficient contact area between the plurality of supporting parts and the substrate is ensured, the supporting effect is improved, and in the process that the inner disc contacts the substrate, the gas between the inner disc and the substrate can be exhausted through the central groove and the exhaust grooves, so that the gas between the inner disc and the substrate does not form a gas film, and the substrate is prevented from being deviated on the inner disc.

Description

Technical Field

[0001] This application belongs to the field of semiconductor technology, and specifically relates to a tray structure and film forming apparatus. Background Technology

[0002] During wafer fabrication, substrates need to be picked up and placed in trays. When removing a substrate from the tray, an inner plate can be used to push the substrate out of the tray, and then a robotic arm can pick it up. When placing a substrate, a robotic arm can place the substrate on the inner plate, which then descends, allowing the substrate to enter the tray. Currently, picking up and placing substrates using the inner plate causes the substrate to wobble on the inner plate, resulting in low stability. Utility Model Content

[0003] Purpose of the utility model: The embodiments of this application provide a tray structure, which aims to overcome the technical problem that the substrate will shake on the inner tray when it is picked up or put down through the inner tray.

[0004] Technical solution: A pallet structure according to an embodiment of this application includes:

[0005] The tray body has a storage space capable of supporting the substrate;

[0006] An inner tray is located at the center of the tray body and is detachably fitted with the tray body. The inner tray includes a main body and multiple support parts. The main body has a central axis and an upper side facing the bearing space. The multiple support parts are located on the upper side of the main body and are arranged at intervals around the central axis. The multiple support parts cooperate to form a support plane. On the central axis, the inner tray has a central groove recessed from the support plane toward the main body. Along the circumference of the main body, an exhaust groove is provided between two adjacent support parts, and the exhaust groove communicates with the central groove.

[0007] On the supporting plane, the supporting part has a supporting end face, and the total area S1 of the orthographic projection of the supporting end face onto the upper side and the total area S2 of the upper side satisfy: 0.5≤S1 / (S2-S1)≤1.2.

[0008] In some embodiments, the orthographic projection of the support end toward the upper side surface in the radial direction of the main body has a first width, the first width being not less than one-third of the radius of the main body.

[0009] In some embodiments, a plurality of the exhaust slots are arranged at intervals around the central axis, and the included angle between two adjacent exhaust slots is the same along the circumference of the main body.

[0010] In some embodiments, adjacent support portions are rotationally symmetrical with respect to the central axis; the support portion includes a first side and a second side along the circumferential direction of the main body portion, the first side and the second side extending toward the central groove and intersecting each other.

[0011] In some embodiments, the exhaust groove extends radially along the main body portion, and the width of the exhaust groove is the same along the extension direction of the exhaust groove.

[0012] In some embodiments, the tray body includes:

[0013] The main disc body includes a support portion and a stepped portion protruding from the support portion. In the radial direction of the main disc body, the support portion includes a first support platform located outside the stepped portion and a second support platform located inside the stepped portion.

[0014] An outer ring cover is provided in a ring shape to the main tray body and cooperates with the main tray body to form the accommodating space. The outer ring cover has a mounting groove along the thickness direction of the tray body. At least a portion of the first support platform is disposed in the mounting groove. The second support platform has a second placement groove. At least a portion of the inner tray is disposed in the second placement groove.

[0015] In some embodiments, the outer ring cover includes a first top surface on a side opposite to the support portion and a side wall surface located on the inner periphery of the ring, the outer ring cover comprising:

[0016] The first chamfered portion is disposed between the first top surface and the side wall surface.

[0017] In some embodiments, the angle between the first chamfered portion and the horizontal plane is α, satisfying: 25°≤α≤35°.

[0018] In some embodiments, the second support portion includes a second top surface, and the main disk body includes:

[0019] The second chamfer is disposed between the second top surface and the side wall of the second placement groove.

[0020] This application also provides a film-forming apparatus, including the tray structure described in any one of the above embodiments.

[0021] Beneficial Effects: The tray structure of this application embodiment includes: a tray body with a receiving space capable of supporting a substrate; an inner tray disposed at the center of the tray body and detachably engaged with the tray body, the inner tray including a main body and multiple support parts, the main body having a central axis and an upper side facing the bearing space, the multiple support parts being disposed on the upper side of the main body and arranged at intervals around the central axis; the multiple support parts cooperating to form a support plane, on the central axis, the inner tray having a central groove recessed from the support plane toward the main body, and along the circumference of the main body, an exhaust groove being provided between two adjacent support parts, the exhaust groove communicating with the central groove; on the support plane, the support parts having support end faces, the total area S1 of the orthographic projection of the support end faces onto the upper side and the total area S2 of the upper side satisfy: 0.5≤S1 / (S2-S1)≤1.2. By incorporating multiple support sections on the main body, a central groove and multiple venting grooves can be formed between the support sections. This ensures sufficient contact area between the support sections and the substrate, improving the support effect. Simultaneously, during the contact between the inner disk and the substrate, gas between them can be discharged through the central groove and venting grooves, preventing the formation of a gas film that could cause substrate displacement on the inner disk. This parameter design improves the stability during substrate handling and prevents substrate wobbling on the inner disk. Attached Figure Description

[0022] To more clearly illustrate the technical solutions in the embodiments of this application, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the accompanying drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0023] Figure 1 This is a front sectional view of the tray structure according to an embodiment of this application;

[0024] Figure 2 This is a top view of a pallet structure according to an embodiment of this application, wherein the pallet structure has three support parts;

[0025] Figure 3 This is a top view of the inner disk according to an embodiment of this application, wherein the inner disk has six support portions;

[0026] Figure 4 This is a top view of the inner disk according to an embodiment of the present application, wherein the inner disk has eight support portions;

[0027] Figure 5 This is a perspective view of the tray structure according to an embodiment of this application;

[0028] Figure 6 This is an exploded structural diagram of the tray structure according to an embodiment of this application;

[0029] Figure 7 Examples of this application Figure 1 A magnified view of a portion of area A in the middle.

[0030] Explanation of reference numerals in the attached figures:

[0031] 10-Inner plate; 11-Main body; 12-Supporting part; 121-First side; 122-Second side; 123-Supporting end face; 13-Central axis; 14-Central groove; 15-Exhaust groove; 20-Outer ring cover; 21-Mounting groove; 23-First top surface; 24-First chamfer; 30-Main plate body; 31-Bearing part; 311-Second placement groove; 312-Second top surface; 313-First bearing platform; 314-Second bearing platform; 32-Step part; 33-Second chamfer; 40-Pallet body; 41-Accommodation space; X-Thickness direction. Detailed Implementation

[0032] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of them. All other embodiments obtained by those skilled in the art based on the embodiments of this application without creative effort are within the scope of protection of this application.

[0033] In the description of this application, it should be understood that the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Therefore, features defined as "first" or "second" may explicitly or implicitly include one or more features. In the description of this application, "multiple" means two or more, and "at least one" can mean one, two, or more, unless otherwise explicitly specified.

[0034] During wafer fabrication, substrates need to be picked up and placed in trays. When removing a substrate from the tray, an inner plate can be used to push the substrate out of the tray, and then a robotic arm can pick it up. When placing a substrate, a robotic arm can place the substrate on the inner plate, which then descends, allowing the substrate to enter the tray. Currently, picking up and placing substrates using the inner plate causes the substrate to wobble on the inner plate, resulting in low stability.

[0035] In view of the above, embodiments of this application provide a tray structure to overcome at least one of the above-mentioned technical problems.

[0036] Please see Figure 1 and Figure 2 In this embodiment of the application, the pallet structure includes a pallet body 40 and an inner tray 10.

[0037] The tray body 40 has an accommodating space 41 capable of supporting a substrate. The inner tray 10 is located at the center of the tray body 40 and is detachably coupled to the tray body 40. The inner tray 10 includes a main body 11 and a plurality of support parts 12. The main body 11 has a central axis 13 and an upper side (not labeled) facing the accommodating space 41. The plurality of support parts 12 are disposed on the upper side of the main body 11 and are arranged at intervals around the central axis 13. The plurality of support parts 12 cooperate to form a support plane, which can support the substrate. On the central axis 13, the inner tray 10 has a central groove 14 recessed from the support plane toward the main body 11. Along the circumference of the main body 11, an exhaust groove 15 is provided between two adjacent support parts 12, and the exhaust groove 15 communicates with the central groove 14.

[0038] Understandably, the tray structure is used to support the substrate, placing it within the receiving space 41 on the tray body 40. Both the substrate and the receiving space 41 can be circular to facilitate their coordinated placement, providing a stable environment for the substrate. The inner disk 10, located at the center of the tray body 40, can move vertically, that is, along the thickness direction X of the tray body 40. When the inner disk 10 moves upward, it can lift the substrate placed in the receiving space 41, removing it from the space. If the substrate needs to be placed in the receiving space 41, it can first be placed on the inner disk 10, and then the inner disk 10 can be moved downward, allowing the substrate lifted on the inner disk 10 to return to the receiving space 41. Figure 2 As shown, the inner disk 10 has a main body 11 and a plurality of support parts 12. One side of the main body 11 facing the accommodating space 41 is the upper side, which has a circular structure. The plurality of support parts 12 are disposed on the upper side and are arranged at intervals along the circumference of the upper side, or at intervals around the central axis 13 of the main body 11. When the substrate is supported by the inner disk 10, the plurality of support parts 12 are located at the same height and can jointly form a large support plane, through which the substrate can be supported.

[0039] When the inner disk 10 moves upward to support the substrate placed in the accommodating space 41, it compresses the gas between the inner disk 10 and the substrate. If the gas between the inner disk 10 and the substrate is not properly channeled, a gas film will form between them, making it impossible to stably support the substrate, resulting in shaking or even falling. In this application, a central groove 14 is formed by a downward indentation at the center of the support plane. When supporting the substrate, the bottom of the substrate is generally flat, and the bottom of the central groove 14 does not contact the bottom of the substrate, but there is a certain gap between them. Multiple exhaust grooves 15 are formed between the multiple support portions 12 provided on the upper side. Each exhaust groove 15 is connected to the central groove 14. The gas between the inner disk 10 and the substrate can enter the central groove 14 and the multiple exhaust grooves 15, and the gas between them can be discharged through the multiple exhaust grooves 15, thereby preventing the gas between them from being compressed to form a gas film, which can improve the stability of the inner disk 10 in the process of supporting the substrate.

[0040] On the supporting plane, the supporting part 12 has a supporting end face 123. The total area S1 of the orthographic projection of the supporting end face 123 onto the upper side and the total area S2 of the upper side satisfy: 0.5 ≤ S1 / (S2-S1) ≤ 1.2. The value of S1 / (S2-S1) can be any one of 0.5, 0.6, 0.7, 0.8, 0.9, 1.0, 1.1, 1.2 or a range between any two values. Here, S2 serves as a reference area and remains unchanged, while S1 serves as a relative area that changes relative to S2 (S1 and S2 are specific values, without units). Within the above range, when the multiple supporting parts 12 on the inner disk 10 support the substrate and drive the substrate to move up and down, the stability of the substrate movement can be improved, and the probability of substrate swaying or positional shift can be reduced. Under both sets of conditions,

[0041]

[0042]

[0043] Condition 1: Repeat the support 50 times when the center of the substrate is offset by 0.2 mm from the central axis 13, and repeat the support 50 times when the substrate is offset by 1° from the support end face 123. Condition 2: Repeat the support 50 times when the substrate undergoes concave deformation with a concave depth greater than 0.5 mm, and repeat the support 50 times when the substrate undergoes convex deformation with a convex height greater than 0.5 mm. Using a success rate of no less than 99% as the standard for the tray's load-bearing reliability, it is not difficult to find that only when 0.5 ≤ S1 / (S2-S1) ≤ 1.2 can the inner disk 10 stably support the substrate under extreme conditions be guaranteed.

[0044] Please see Figure 2In conjunction with the above embodiments, in some embodiments, the orthographic projection of the support end face 123 onto the upward side in the radial direction of the main body 11 has a first width L, and the first width L is not less than one-third of the radius R of the main body 11. This is to avoid the problem that when the inner disk 10 supports the substrate after it has undergone concave deformation, the bottom of the central groove 14 of the inner disk 10 contacts the substrate before the support portion 12, thereby causing the substrate to slip.

[0045] Please see Figure 2 , Figure 3 and Figure 4 In conjunction with the above embodiments, in some embodiments, a plurality of exhaust grooves 15 are arranged at intervals around the central axis 13, and the included angle between two adjacent exhaust grooves 15 is the same along the circumference of the main body 11.

[0046] Understandably, since the spacing between adjacent support portions 12 is the same, the spacing of the exhaust grooves 15 formed between the multiple support portions 12 in the circumferential direction of the main body 11 is also the same. The multiple exhaust grooves 15 are arranged symmetrically around the central axis 13, dividing the circular main body 11 into equal parts. This structure allows the forces acting on the inner disk 10 when the multiple exhaust grooves 15 discharge gas to cancel each other out, ensuring the balance of gas flow between the inner disk 10 and the substrate (that is, ensuring the balance of the forces acting on the substrate when the gas flows between the two), and further ensuring the stability of the substrate.

[0047] Please see Figure 2 In conjunction with the above embodiments, in some embodiments, adjacent support portions 12 are rotationally symmetrical with respect to the central axis 13; the support portion 12 includes a first side surface 121 and a second side surface 122 along the circumference of the main body portion 11, the first side surface 121 and the second side surface 122 extend toward the central groove 14 and intersect each other.

[0048] It is understood that the first side surface 121 and the second side surface 122 on the support portion 12 are planar, and the two first side surfaces 121 on two adjacent support portions 12 are arranged opposite each other to form the two side walls of the exhaust groove 15; or the two second side surfaces 122 on two adjacent support portions 12 are arranged opposite each other to form the two side walls of the exhaust groove 15; or the first side surface 121 on one of the support portions 12 is arranged opposite to the second side surface 122 on the adjacent support portion 12 to form the two side walls of the exhaust groove 15. The first side surface 121 and the second side surface 122 are both inclined to a certain extent relative to the thickness direction X, so that the opening area of ​​the exhaust groove 15 is larger than the bottom area. When the inner disk 10 moves upward to lift the substrate, it is convenient for the gas between the two to quickly enter into each exhaust groove 15 and be discharged from between them, thereby improving the exhaust efficiency and avoiding the formation of a gas film due to untimely exhaust. The first side 121 and the second side 122 on the support part 12 intersect, and the intersection point is set towards the central groove 14. This can guide the gas in the central groove 14 to a certain extent, so that the gas in the central groove 14 can be evenly distributed and discharged from different exhaust grooves 15, thus ensuring the balance of gas flow to a certain extent.

[0049] Please see Figure 2 In conjunction with the above embodiments, in some embodiments, the exhaust groove 15 extends radially along the main body 11, and the width of the exhaust groove 15 is the same along the extension direction of the exhaust groove 15.

[0050] It is understandable that each exhaust groove 15 has the same width, and since each inner wall of the exhaust groove 15 is a plane, the gas flow is relatively uniform and the flow rate does not change. This ensures that the flow rate of gas discharged from each exhaust groove 15 is the same, thereby ensuring that the force acting on the substrate when the gas is discharged from between the inner disk 10 and the substrate can remain balanced. This makes the exhaust volume in each exhaust groove 15 consistent, improving the stability during the substrate lifting process (if the width of each exhaust groove 15 is different, the flow rate of the gas passing through will be different, and the force exerted on the substrate by the gas with different flow rates will be different, which will cause the substrate to shake during the lifting process).

[0051] Please see Figure 1 , Figure 5 and Figure 6 In conjunction with the above embodiments, in some embodiments, the tray body 40 includes a main tray body 30 and an outer ring cover 20.

[0052] The main tray body 30 includes a support portion 31 and a stepped portion 32 protruding from the support portion 31. In the radial direction of the main tray body 30, the support portion 31 includes a first support platform 313 located outside the stepped portion 32 and a second support platform 314 located inside the stepped portion 32. An outer ring cover 20 is annularly fitted onto the main tray body 30 and cooperates with the main tray body 30 to form an accommodating space 41. The outer ring cover 20 has a mounting groove 21 along the thickness direction X of the tray body 40. At least a portion of the first support platform 313 is disposed in the mounting groove 21, and the second support platform 314 has a second placement groove 311. At least a portion of the inner tray 10 is disposed in the second placement groove 311.

[0053] Understandably, the main tray body 30 of the tray body 40 is provided with a support portion 31 and a step portion 32. The step portion 32 protrudes upward, facilitating its insertion into the inner side of the outer ring cover 20 of the tray body 40, thus enabling the main tray body 30 and the outer ring cover 20 to be assembled. The outer ring cover 20 serves to position and limit the movement of the main tray body 30. The step portion 32 can be an annular structure. Using the position of the step portion 32 as a boundary, the portion of the support portion 31 outside the step portion 32 is divided into a first support platform 313, and the portion of the support portion 31 inside the step portion 32 is divided into a second support platform 314. When the outer ring cover 20 is placed on the main tray body 30, at least a portion of the first support platform 313 can be inserted into the mounting groove 21 of the outer ring cover 20, completing the assembly of the main tray body 30 and the outer ring cover 20 and improving the stability of the assembly. A second placement groove 311 is formed at the center of the second support platform 314. The second placement groove 311 has a stepped structure, which allows the inner disk 10 to be configured to cooperate with it, thus facilitating the placement of the inner disk 10 in the second placement groove 311. Since the second placement groove 311 faces the central region of the accommodating space 41, when the substrate is placed inside the accommodating space 41 and the inner disk 10 is placed inside the second placement groove 311, moving the inner disk 10 upward can support the central position of the substrate, ensuring balance during the support process and improving the stability of the substrate movement.

[0054] Please see Figure 6 and Figure 7 In conjunction with the above embodiments, in some embodiments, the outer ring cover 20 includes a first top surface 23 on the side opposite to the supporting part 31 and a side wall surface located on the inner periphery of the ring. The outer ring cover 20 includes a first chamfered part 24, which is disposed between the first top surface 23 and the side wall surface.

[0055] Understandably, a first chamfered portion 24 is provided between the first top surface 23 of the outer ring cover 20 and the side wall surface of the inner circumference of the ring. The first chamfered portion 24 is also ring-shaped. Before the substrate is placed in the receiving space 41, the position of the substrate may be offset in the horizontal direction, causing the substrate to not be able to be properly embedded in the receiving space 41. At this time, the substrate may partially overlap the first chamfered portion 24 at the edge of the receiving space 41. Under the action of the substrate's own gravity and with the guiding effect of the first chamfered portion 24, the substrate can be completely slid into the interior of the receiving space 41, ensuring the accuracy of the substrate's placement position on the tray structure without the need for additional position adjustment.

[0056] Please see Figure 7 In conjunction with the above embodiments, in some embodiments, the angle between the first chamfered portion 24 and the horizontal plane is α, satisfying: 25°≤α≤35°. When α is in the range of 25° to 35°, it can ensure that the substrate overlapping the first chamfered portion 24 can slide into the interior of the receiving space 41. When α is less than 25°, the first chamfered portion 24 tends to be horizontal. When the substrate overlaps on it, due to the large friction, the substrate cannot slide into the interior of the receiving space 41. When α is greater than 35°, the first chamfered portion 24 tends to be vertical. When placing the substrate, it is easy to place a part of the substrate on the first top surface 23. At this time, the first chamfered portion 24 does not have a guiding function and cannot allow the substrate to slide into the interior of the receiving space 41.

[0057] Please see Figure 6 In conjunction with the above embodiments, in some embodiments, the second support platform 314 includes a second top surface 312, and the main plate body 30 includes a second chamfered portion 33, which is disposed between the second top surface 312 and the side wall of the second placement groove 311.

[0058] It is understandable that when the inner disk 10 descends and enters the second placement slot 311, its position may shift horizontally due to external forces. To ensure that the inner disk 10 can smoothly enter the second placement slot 311, a second chamfer 33 can be provided between the second top surface 312 on the second support platform 314 and the side wall of the second placement slot 311. The second chamfer 33 has a ring structure and surrounds the second placement slot 311. If the inner disk 10 partially contacts the second chamfer 33 during the process of embedding into the second placement slot 311, the guiding effect of the second chamfer 33 can ensure that the inner disk 10 smoothly enters the second placement slot 311.

[0059] This application also provides a film-forming apparatus, including the tray structure described above, which has all the technical features and beneficial effects of the tray structure described above, and will not be elaborated further here.

[0060] In the above embodiments, the descriptions of each embodiment have different focuses. For parts not described in detail in a certain embodiment, please refer to the relevant descriptions in other embodiments.

[0061] The tray structure and film-forming device provided in the embodiments of this application have been described in detail above, and specific examples have been used to illustrate the principles and implementation methods of this application. The description of the above embodiments is only for the purpose of helping to understand the technical solutions and core ideas of this application. Those skilled in the art should understand that they can still modify the technical solutions described in the foregoing embodiments, or make equivalent substitutions for some of the technical features; and these modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of this application.

Claims

1. A tray structure, characterized in that, include: The tray body (40) has a receiving space (41) capable of supporting the substrate; An inner tray (10) is disposed at the center of the tray body (40) and is detachably fitted with the tray body (40). The inner tray (10) includes a main body (11) and a plurality of support parts (12). The main body (11) has a central axis (13) and an upper side facing the accommodating space (41). The plurality of support parts (12) are disposed on the upper side of the main body (11) and are arranged at intervals around the central axis (13). The plurality of support parts (12) cooperate to form a support plane. On the central axis (13), the inner tray (10) is recessed from the support plane toward the main body (11) with a central groove (14). Along the circumference of the main body (11), an exhaust groove (15) is provided between two adjacent support parts (12). The exhaust groove (15) communicates with the central groove (14). On the supporting plane, the supporting part (12) has a supporting end face (123), and the total area S1 of the orthographic projection of the supporting end face (123) onto the upper side and the total area S2 of the upper side satisfy: 0.5≤S1 / (S2-S1)≤1.

2.

2. The pallet structure according to claim 1, characterized in that, In the radial direction of the main body (11), the orthographic projection of the support end face (123) onto the upper side has a first width, the first width being not less than one-third of the radius of the main body (11).

3. The pallet structure according to claim 1, characterized in that, Multiple exhaust slots (15) are arranged at intervals around the central axis (13), and the included angle between two adjacent exhaust slots (15) is the same along the circumference of the main body (11).

4. The pallet structure according to claim 1, characterized in that, The adjacent support portions (12) are rotationally symmetrical with respect to the central axis (13); the support portion (12) includes a first side surface (121) and a second side surface (122) along the circumference of the main body portion (11), the first side surface (121) and the second side surface (122) extend toward the central groove (14) and intersect each other.

5. The pallet structure according to claim 1, characterized in that, The exhaust groove (15) extends radially along the main body (11), and the width of the exhaust groove (15) is the same along the extension direction of the exhaust groove (15).

6. The pallet structure according to claim 1, characterized in that, The tray body (40) includes: The main plate (30) includes a support portion (31) and a stepped portion (32) protruding from the support portion (31). In the radial direction of the main plate (30), the support portion (31) includes a first support platform (313) located outside the stepped portion (32) and a second support platform (314) located inside the stepped portion (32). An outer ring cover (20) is provided in a ring shape over the main tray body (30) and cooperates with the main tray body (30) to form the accommodating space (41). The outer ring cover (20) has a mounting groove (21) along the thickness direction (X) of the tray body (40). At least a portion of the first support platform (313) is disposed in the mounting groove (21). The second support platform (314) has a second placement groove (311). At least a portion of the inner tray (10) is disposed in the second placement groove (311).

7. The pallet structure according to claim 6, characterized in that, The outer ring cover (20) includes a first top surface (23) on the side opposite to the supporting part (31) and a side wall surface located on the inner circumference of the ring. The outer ring cover (20) includes: The first chamfer (24) is disposed between the first top surface (23) and the side wall surface.

8. The pallet structure according to claim 7, characterized in that, The angle between the first chamfered part (24) and the horizontal plane is α, which satisfies: 25°≤α≤35°.

9. The pallet structure according to claim 6, characterized in that, The second support platform (314) includes a second top surface (312), and the main plate (30) includes: The second chamfer (33) is disposed between the second top surface (312) and the side wall of the second placement groove (311).

10. A film-forming apparatus, characterized in that, Includes the tray structure as described in any one of claims 1 to 9.

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