A double-sided exposure motion platform
By setting motion devices and exposure machines on the upper and lower sides of the exposure platform respectively, double-sided exposure of the substrate can be achieved in one clamping, which solves the problems of cumbersome operation and low precision of traditional single-sided exposure, and improves production efficiency and exposure accuracy.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- ANJI XINJUNZHE PRECISION TECHNOLOGY CO LTD
- Filing Date
- 2025-06-27
- Publication Date
- 2026-06-19
AI Technical Summary
Traditional single-sided exposure motion platforms are cumbersome to operate, requiring multiple substrate flips, which leads to positional deviations and low exposure accuracy, failing to meet the high-volume and rapid delivery requirements of the modern electronics manufacturing industry.
Design a double-sided exposure motion platform. By setting motion devices and exposure machines above and below the exposure platform respectively, the upper and lower surfaces of the substrate can be exposed simultaneously, simplifying the operation steps and improving production efficiency.
This technology enables double-sided exposure of substrates to be completed in a single clamping operation, simplifying the operation steps, improving exposure accuracy and production efficiency, and meeting the high-volume and rapid delivery requirements of the modern electronics manufacturing industry.
Smart Images
Figure CN224383589U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of precision motion platform technology, and more specifically, to a double-sided exposure motion platform. Background Technology
[0002] With the rapid development of industries such as 3D mobile phone cover plates, PCB circuit boards, and various irregularly shaped automotive glass, the requirements for the exposure process in the manufacturing process of these objects have also increased. Currently, the exposure of these objects is carried out through an exposure motion platform.
[0003] Traditional exposure platforms employ single-sided exposure technology, meaning that one side of the substrate is exposed first, then flipped over to perform the same exposure operation on the other side. While this single-sided exposure method meets basic manufacturing requirements, the actual production process is cumbersome, requiring multiple flips and repositionings of the substrate. This not only increases the workload for operators but can also lead to positional deviations in the substrate during flipping, affecting exposure accuracy. Furthermore, single-sided exposure has low production efficiency, failing to meet the demands of modern electronics manufacturing for high throughput and rapid delivery. Utility Model Content
[0004] The purpose of this invention is to provide a double-sided exposure motion platform that can complete the double-sided exposure of a substrate in one clamping, simplifying the operation steps and improving exposure accuracy and production efficiency.
[0005] The embodiments of this utility model can be implemented as follows:
[0006] This utility model provides a double-sided exposure motion platform, comprising:
[0007] Base;
[0008] An exposure platform is fixed on the base. A first motion device is provided on the exposure platform. A fixing member is installed on the first motion device. The first motion device drives the fixing member to move along a first direction. An exposure groove is provided on the exposure platform.
[0009] The second motion device is fixedly connected to the exposure platform and located above the exposure platform. A first mounting component is installed on the second motion device. The first mounting component is used to install the exposure machine. The second motion device drives the first mounting component to move along a second direction, which is perpendicular to the first direction.
[0010] A third motion device is fixedly connected to the exposure platform and located below the exposure platform. A second mounting component is installed on the third motion device. The second mounting component is used to install the exposure machine. The third motion device drives the second mounting component to move along the second direction. The second mounting component is correspondingly arranged with the exposure tank.
[0011] In an optional embodiment, an upper column is fixed above the exposure platform, an upper crossbeam is fixed on the upper column, and the second motion device is installed on the upper crossbeam.
[0012] In an optional embodiment, the second motion device includes a second linear motor and a second guide rail. The second guide rail is fixedly mounted on the upper crossbeam. The first mounting member is slidably connected to the second guide rail. The direction of the second guide rail is the same as the second direction. The second linear motor drives the first mounting member to slide along the second guide rail.
[0013] In an optional embodiment, a lower crossbeam is fixedly connected below the exposure platform, and the third motion device is mounted on the lower crossbeam.
[0014] In an optional embodiment, the third motion device includes a third linear motor and a third guide rail. The third guide rail is fixedly mounted on the lower crossbeam. The second mounting member is slidably connected to the third guide rail. The direction of the third guide rail is the same as the second direction. The third linear motor drives the second mounting member to slide along the third guide rail.
[0015] In an optional embodiment, the first motion device includes a first linear motor and a first guide rail. The first guide rail is fixedly mounted on the exposure platform. The fixing member is slidably connected to the first guide rail. The direction of the first guide rail is the same as the first direction. The first linear motor drives the fixing member to slide along the first guide rail.
[0016] In an optional embodiment, the first motion device further includes a first grating ruler, which is disposed along the first direction.
[0017] In an optional embodiment, a fourth motion device and a fifth motion device are also included. The fourth motion device is disposed on the first mounting member and is used to drive the exposure machine on the first mounting member to move in a vertical direction. The fifth motion device is disposed on the second mounting member and is used to drive the exposure machine on the second mounting member to move in a vertical direction.
[0018] In an optional embodiment, the exposure platform is further provided with an adjustment port, which is located on one side of the exposure tank.
[0019] In an optional embodiment, the base includes a frame and several columns, the columns are fixed to the frame, the exposure platform is fixed to the columns, and a buffer pad is provided between the exposure platform and the columns.
[0020] The beneficial effects of the double-sided exposure motion platform provided in this embodiment of the invention include:
[0021] This utility model discloses a double-sided exposure motion platform, comprising a base, an exposure platform, a second motion device, and a third motion device. The exposure platform is fixed to the base. A first motion device is mounted on the exposure platform. A fixing member is installed on the first motion device. The first motion device drives the fixing member to move along a first direction. An exposure groove is formed on the exposure platform. The second motion device is fixedly connected to the exposure platform and located above the exposure platform. A first mounting member is mounted on the second motion device. The first mounting member is used to mount an exposure machine. The second motion device drives the first mounting member to move along a second direction. The second direction is perpendicular to the first direction. The third motion device is fixedly connected to the exposure platform and located below the exposure platform. A second mounting member is mounted on the third motion device. The second mounting member is used to mount an exposure machine. The third motion device drives the second mounting member to move along the second direction. The second mounting member is correspondingly arranged with respect to the exposure groove. By setting the second motion device and the third motion device above and below the exposure platform respectively, and installing the exposure machine above and below the exposure platform respectively, the fixing member is used to clamp the substrate, and the substrate is moved along the first direction by the first motion device. The second motion device and the third motion device are used to perform exposure operations on the upper and lower surfaces of the substrate respectively. This invention enables double-sided exposure of a substrate in a single clamping operation, simplifying the operation steps and improving exposure accuracy and production efficiency. Attached Figure Description
[0022] To more clearly illustrate the technical solutions of the embodiments of this utility model, the drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of this utility model and should not be regarded as a limitation on the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.
[0023] Figure 1 This is a schematic diagram of the structure of the double-sided exposure motion platform provided in this embodiment from a first-view perspective;
[0024] Figure 2 This is a schematic diagram of the structure of the double-sided exposure motion platform provided in this embodiment from a second perspective.
[0025] Icons: 100-Double-sided exposure motion platform; 10-Base; 11-Frame; 111-Support feet; 112-Support steel plate; 12-Column; 13-Buffer pad; 20-Exposure platform; 21-Exposure tank; 22-Adjustment port; 23-First motion device; 231-First guide rail; 232-First linear motor; 233-First grating ruler; 24-Fixing component; 25-Upper column; 26-Upper crossbeam; 30-Second motion device; 31-Second guide rail; 32-First mounting component; 33-Second linear motor; 40-Third motion device. Detailed Implementation
[0026] To make the objectives, technical solutions, and advantages of the embodiments of this utility model clearer, the technical solutions of the embodiments of this utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this utility model, and not all embodiments. The components of the embodiments of this utility model described and shown in the accompanying drawings can generally be arranged and designed in various different configurations.
[0027] Therefore, the following detailed description of the embodiments of the present invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention, but merely to illustrate selected embodiments of the invention. All other embodiments obtained by those skilled in the art based on the embodiments of the present invention without inventive effort are within the scope of protection of the present invention.
[0028] It should be noted that similar labels and letters in the following figures indicate similar items. Therefore, once an item is defined in one figure, it does not need to be further defined and explained in subsequent figures.
[0029] In the description of this utility model, it should be noted that if terms such as "upper," "lower," "inner," or "outer" are used to indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, or the orientation or positional relationship in which the utility model product is usually placed during use, they are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model.
[0030] Furthermore, the terms "first" and "second" are used only to distinguish descriptions and should not be interpreted as indicating or implying relative importance.
[0031] It should be noted that, where there is no conflict, the features in the embodiments of this utility model can be combined with each other.
[0032] Please refer to Figure 1The double-sided exposure motion platform 100 provided by this utility model is applied to PCB manufacturing and is mainly used to transfer circuit patterns onto a substrate through photolithography.
[0033] This double-sided exposure motion platform 100 includes a base 10, an exposure platform 20, a second motion device 30, and a third motion device 40. The exposure platform 20 is fixed to the base 10. A first motion device 23 is provided on the exposure platform 20. A fixing member 24 is mounted on the first motion device 23. The first motion device 23 drives the fixing member 24 to move along a first direction. An exposure groove 21 is formed on the exposure platform 20. The second motion device 30 is fixedly connected to the exposure platform 20 and located above the exposure platform 20. A first mounting member 32 is mounted on the second motion device 30. The first mounting member 32 is used to mount an exposure machine. The second motion device 30 drives the first mounting member 32 to move along a second direction. The second direction is perpendicular to the first direction. The third motion device 40 is fixedly connected to the exposure platform 20 and located below the exposure platform 20. A second mounting member is mounted on the third motion device 40. The second mounting member is used to mount an exposure machine. The third motion device 40 drives the second mounting member to move along the second direction. The second mounting member is correspondingly positioned with respect to the exposure groove 21.
[0034] It is understood that in this embodiment, the exposure platform 20 is used to mount a substrate (not shown). Specifically, the substrate is clamped onto the fixing member 24. The fixing member 24 is driven to move by the first motion device 23, thereby enabling the substrate to move along a first direction on the exposure platform 20.
[0035] In this embodiment, the second motion device 30 and the third motion device 40 are respectively used to drive the first mounting member 32 and the second mounting member to move along the second direction. Both the first mounting member 32 and the second mounting member are used to mount the exposure machine. It is understood that the exposure machine is used to perform exposure operations on the substrate. The first direction is perpendicular to the second direction. The substrate moves along the first direction, and the exposure machine moves along the second direction, thereby enabling the exposure machine to expose any position on the substrate.
[0036] An exposure groove 21 is formed on the exposure platform 20, and a second motion device 30 and a third motion device 40 are respectively set on the upper and lower sides of the exposure platform 20. Exposure machines are also set on the upper and lower sides of the exposure platform 20. The exposure machine above the exposure platform 20 is used to expose the upper surface of the substrate, and the exposure machine below the exposure platform 20 is used to expose the lower surface of the substrate. It can be understood that the substrate is mounted on the exposure platform 20, the exposure machine above the exposure platform 20 can directly expose the substrate, and the exposure machine below the exposure platform 20 exposes the lower surface of the substrate through the exposure groove 21.
[0037] This invention features slidable exposure machines on both sides of the exposure platform 20, with slots cut into the platform 20. This allows the fixing member 24 to clamp the substrate once, enabling exposure of both sides of the substrate without the need to flip the substrate, thus simplifying the operation and improving exposure efficiency.
[0038] Specifically, in this embodiment, the exposure platform 20 is a marble platform. Of course, in other embodiments, the exposure platform 20 can be made of other materials, such as granite, stainless steel, etc. This utility model does not limit the material of the exposure platform 20.
[0039] In this embodiment, the exposure platform 20 is 4.5 meters long and 4 meters wide, which meets the requirements for processing substrates that are 2.5 meters long and 1.5 meters wide, thus satisfying the processing needs of large workpieces. Of course, in other embodiments, the exposure platform 20 can be designed to any other size according to the size of the substrate; this utility model does not limit the size of the exposure platform 20.
[0040] In this embodiment, the exposure platform 20 is a square platform. In other embodiments, the exposure platform 20 may take other shapes, such as circular, etc. The present invention does not limit the shape of the exposure platform 20.
[0041] To facilitate the fixing of the second motion device 30, in this embodiment, an upper column 25 is fixed above the exposure platform 20. An upper crossbeam 26 is fixed on the upper column 25. The second motion device 30 is mounted on the upper crossbeam 26. Specifically, in this embodiment, two upper columns 25 are respectively fixed on both sides of the exposure platform 20, and both ends of the upper crossbeam 26 are respectively fixedly connected to the upper columns 25. It can be understood that by setting the upper columns 25 and the upper crossbeam 26, the first mounting component 32 can be spaced a certain distance from the substrate surface, thereby accurately controlling the exposure position and parameters of the exposure machine.
[0042] In this embodiment, the upper column 25 and the upper crossbeam 26 are fixed at the middle position of the exposure platform 20 along the first direction. It can be understood that by placing the upper crossbeam 26 at the middle position of the exposure platform 20, the movement stroke of the substrate along the first direction can be reduced.
[0043] Further, the second motion device 30 includes a second linear motor 33 and a second guide rail 31. The second guide rail 31 is fixedly mounted on the upper crossbeam 26. The first mounting member 32 is slidably connected to the second guide rail 31. The direction of the second guide rail 31 is the same as the second direction. The second linear motor 33 drives the first mounting member 32 to slide along the second guide rail 31. Specifically, the second motion device 30 is disposed on the side of the upper crossbeam 26. By setting the second guide rail 31 and the second linear motor 33, the first mounting member 32 can slide along the second direction on the side of the upper crossbeam 26. In this embodiment, the extending direction of the upper crossbeam 26 is the same as the second direction.
[0044] To facilitate the fixation of the third motion device 40, a lower crossbeam is fixed below the exposure platform 20 in this embodiment. The third motion device 40 is mounted on the lower crossbeam. Specifically, in this embodiment, the lower crossbeam is directly fixed to the lower surface of the exposure platform 20. It can be understood that in this embodiment, the exposure platform 20 has a certain thickness, and the substrate is mounted above the exposure platform 20. By directly mounting the lower crossbeam to the lower surface of the exposure platform 20, a certain distance can be achieved between the second mounting component and the lower surface of the substrate, thereby accurately controlling the exposure position and parameters of the exposure machine.
[0045] In this embodiment, the lower crossbeam is fixed at the middle position of the exposure platform 20 along the first direction. It can be understood that by placing the lower crossbeam at the middle position of the exposure platform 20, the movement stroke of the substrate along the first direction can be reduced.
[0046] In this embodiment, the upper crossbeam 26 and the lower crossbeam are arranged opposite to each other. Specifically, the second motion device 30 of the upper crossbeam 26 is arranged opposite to the exposure groove 21, and the third motion device 40 of the lower crossbeam is arranged opposite to the exposure groove 21. In other embodiments, the upper crossbeam 26 and the lower crossbeam can be staggered. The second motion device 30 of the upper crossbeam 26 is staggered to the exposure groove 21, and the third motion device 40 of the lower crossbeam is arranged opposite to the exposure groove 21. As long as the third motion device 40 and the second mounting member are arranged opposite to the exposure groove 21, the position of the upper crossbeam 26 is not limited in this invention.
[0047] Furthermore, the third motion device 40 includes a third linear motor and a third guide rail. The third guide rail is fixedly mounted on the lower crossbeam. The second mounting member is slidably connected to the third guide rail. The direction of the third guide rail is the same as the second direction. The third linear motor drives the second mounting member to slide along the third guide rail. Specifically, the third motion device 40 is disposed on the side of the lower crossbeam. By providing the third guide rail and the third linear motor, the second mounting member can slide along the second direction on the side of the lower crossbeam. In this embodiment, the extension direction of the lower crossbeam is the same as the second direction.
[0048] Furthermore, the first motion device 23 includes a first linear motor 232 and a first guide rail 231. The first guide rail 231 is fixedly mounted on the exposure platform 20. The fixing member 24 is slidably connected to the first guide rail 231. The direction of the first guide rail 231 is the same as the first direction. The first linear motor 232 drives the fixing member 24 to slide along the first guide rail 231.
[0049] Specifically, in this embodiment, the exposure groove 21 is a strip-shaped groove, and the exposure groove 21 is arranged along the second direction. The first guide rail 231 includes two long guide rails and several short guide rails. The two long guide rails are respectively arranged on both sides of the exposure groove 21 along the second direction. The short guide rails are respectively arranged on both sides of the exposure groove 21 along the first direction. This leaves a gap at the exposure groove 21, which facilitates the exposure machine below the exposure platform 20 to expose the substrate.
[0050] Furthermore, in this embodiment, the fixing member 24 is a square frame structure. The edges of the fixing member 24 are slidably connected to the long guide rail and the short guide rail respectively, thereby exposing the lower surface of the substrate, which facilitates the exposure machine below to expose the substrate. In other embodiments, the fixing member 24 can also adopt a "U" shaped frame structure. As long as the lower surface of the substrate can be exposed, the shape of the fixing member 24 is not limited in this invention.
[0051] Furthermore, in this embodiment, to improve the movement accuracy of the fixing member 24, the first motion device 23 also includes a first grating ruler 233. The first grating ruler 233 is arranged along a first direction. It can be understood that the first grating ruler 233 is used to measure and provide feedback on the movement of the fixing member 24, thereby reducing movement errors.
[0052] Similarly, in this embodiment, the second motion device 30 further includes a second grating ruler, and the third motion device 40 further includes a third grating ruler. The second grating ruler is used to measure and provide feedback on the motion of the first mounting member 32, and the third grating ruler is used to measure and provide feedback on the motion of the second mounting member.
[0053] Furthermore, this embodiment also includes a fourth motion device and a fifth motion device. The fourth motion device is disposed on the first mounting member 32 and is used to drive the exposure machine on the first mounting member 32 to move in the vertical direction. The fifth motion device is disposed on the second mounting member and is used to drive the exposure machine on the second mounting member to move in the vertical direction. It can be understood that, in addition to realizing the planar movement between the substrate and the exposure machine, this utility model can also realize the relative height adjustment between the substrate and the exposure machine, thereby more accurately controlling the exposure position and parameters and improving the exposure accuracy.
[0054] In this embodiment, the exposure platform 20 is also provided with an adjustment port 22. The adjustment port 22 is located on one side of the exposure tank 21. It can be understood that by providing the adjustment port 22, it is convenient for operators to adjust the equipment below the exposure platform 20 from above the exposure platform 20.
[0055] Please refer to Figure 1 and Figure 2 In this embodiment, the base 10 includes a frame 11 and several columns 12. The columns 12 are fixed to the frame 11. The exposure platform 20 is fixed to the columns 12. A buffer pad 13 is provided between the exposure platform 20 and the columns 12. It can be understood that by providing the columns 12 connecting the frame 11 and the exposure platform 20, installation space is provided for the lower crossbeam and the third motion device 40. By providing the buffer pad 13 between the exposure platform 20 and the columns 12, the stability of the double-sided exposure motion platform 100 is improved.
[0056] Furthermore, several supporting feet 111 are provided below the frame 11, and supporting steel plates 112 are provided below the supporting feet 111. By providing supporting feet 111 and supporting steel plates 112, the load-bearing capacity of the double-sided exposure motion platform 100 can be improved.
[0057] The beneficial effects of the double-sided exposure motion platform 100 provided in this embodiment of the present invention include:
[0058] The double-sided exposure motion platform 100 of this utility model includes a base 10, an exposure platform 20, a second motion device 30, and a third motion device 40. The exposure platform 20 is fixed to the base 10. A first motion device 23 is provided on the exposure platform 20. A fixing member 24 is installed on the first motion device 23. The first motion device 23 drives the fixing member 24 to move along a first direction. An exposure groove 21 is formed on the exposure platform 20. The second motion device 30 is fixedly connected to the exposure platform 20 and located above the exposure platform 20. A first mounting member 32 is installed on the second motion device 30. The first mounting member 32 is used to mount an exposure machine. The second motion device 30 drives the first mounting member 32 to move along a second direction. The second direction is perpendicular to the first direction. The third motion device 40 is fixedly connected to the exposure platform 20 and located below the exposure platform 20. A second mounting member is installed on the third motion device 40. The second mounting member is used to mount an exposure machine. The third motion device 40 drives the second mounting member to move along the second direction. The second mounting member is correspondingly positioned with respect to the exposure groove 21. By setting a second motion device 30 and a third motion device 40 above and below the exposure platform 20 respectively, and installing an exposure machine above and below the exposure platform 20 respectively, the present invention enables double-sided exposure of a substrate in a single clamping operation, simplifies the operation steps, and improves exposure accuracy and production efficiency. A second motion device 30 and a third motion device 40 are respectively arranged above and below the exposure platform 20. The second motion device 30 and the third motion device 40 are used to perform exposure operations on both the upper and lower surfaces of the substrate.
[0059] The above description is only a specific embodiment of this utility model, but the protection scope of this utility model is not limited thereto. Any changes or substitutions that can be easily conceived by those skilled in the art within the technical scope disclosed in this utility model should be included within the protection scope of this utility model.
Claims
1. A double-sided exposure motion platform, characterized in that, include: Base; An exposure platform is fixed on the base. A first motion device is provided on the exposure platform. A fixing member is installed on the first motion device. The first motion device drives the fixing member to move along a first direction. An exposure groove is provided on the exposure platform. The second motion device is fixedly connected to the exposure platform and located above the exposure platform. A first mounting component is installed on the second motion device. The first mounting component is used to install the exposure machine. The second motion device drives the first mounting component to move along a second direction, which is perpendicular to the first direction. A third motion device is fixedly connected to the exposure platform and located below the exposure platform. A second mounting component is installed on the third motion device. The second mounting component is used to install the exposure machine. The third motion device drives the second mounting component to move along the second direction. The second mounting component is correspondingly arranged with the exposure tank.
2. The double-sided exposure motion platform according to claim 1, characterized in that, An upper column is fixed above the exposure platform, an upper crossbeam is fixed on the upper column, and the second motion device is installed on the upper crossbeam.
3. The double-sided exposure motion platform according to claim 2, characterized in that, The second motion device includes a second linear motor and a second guide rail. The second guide rail is fixedly mounted on the upper crossbeam. The first mounting member is slidably connected to the second guide rail. The direction of the second guide rail is the same as the second direction. The second linear motor drives the first mounting member to slide along the second guide rail.
4. The double-sided exposure motion platform according to claim 1 or 2, characterized in that, A lower crossbeam is fixedly connected below the exposure platform, and the third motion device is installed on the lower crossbeam.
5. The double-sided exposure motion platform according to claim 4, characterized in that, The third motion device includes a third linear motor and a third guide rail. The third guide rail is fixedly mounted on the lower crossbeam. The second mounting member is slidably connected to the third guide rail. The direction of the third guide rail is the same as the second direction. The third linear motor drives the second mounting member to slide along the third guide rail.
6. The double-sided exposure motion platform according to claim 1, characterized in that, The first motion device includes a first linear motor and a first guide rail. The first guide rail is fixedly mounted on the exposure platform. The fixing member is slidably connected to the first guide rail. The direction of the first guide rail is the same as the first direction. The first linear motor drives the fixing member to slide along the first guide rail.
7. The double-sided exposure motion platform according to claim 6, characterized in that, The first motion device further includes a first grating ruler, which is arranged along the first direction.
8. The double-sided exposure motion platform according to claim 1, characterized in that, It also includes a fourth motion device and a fifth motion device. The fourth motion device is disposed on the first mounting member and is used to drive the exposure machine on the first mounting member to move in the vertical direction. The fifth motion device is disposed on the second mounting member and is used to drive the exposure machine on the second mounting member to move in the vertical direction.
9. The double-sided exposure motion platform according to claim 1, characterized in that, The exposure platform is also provided with an adjustment port, which is located on one side of the exposure tank.
10. The double-sided exposure motion platform according to claim 1, characterized in that, The base includes a frame and several columns. The columns are fixed to the frame, the exposure platform is fixed to the columns, and a buffer pad is provided between the exposure platform and the columns.