A fixing tool for processing a single crystal silicon wafer

Abstract

The utility model discloses a kind of fixed tool for monocrystalline silicon wafer processing, it is related to monocrystalline silicon wafer processing technical field, including fixed tool frame, the inside of fixed tool frame is provided with first adjusting limiting slot and second adjusting limiting slot, the inside rotating installation of first adjusting limiting slot has driving threaded rod. By setting the driving threaded rod rotation inside first adjusting limiting slot and second adjusting limiting slot, so that driving sliding block can be driven to slide adjusting position inside first adjusting limiting slot and second adjusting limiting slot, so that the spacing between the first monocrystalline silicon wafer fixed clamp of two sides can be adjusted, by the rotation adjustment of first adjusting turntable first height adjusting threaded rod in the inside top position of first height adjusting frame, so that the height of first monocrystalline silicon wafer fixed clamp can be adjusted, and then for the monocrystalline silicon wafer fixed by first monocrystalline silicon wafer fixed clamp clamping is realized different height adaptive adjustment, according to the height of actual processing equipment, it can be adjusted.

Description

Technical Field

[0001] This utility model relates to the field of single-crystal silicon wafer processing technology, and in particular to a fixed tooling for single-crystal silicon wafer processing. Background Technology

[0002] The silicon content in the wafer reaches 25.8%, providing an inexhaustible source for the production of monocrystalline silicon. Since silicon is one of the most abundant elements in the Earth's crust, its abundance is one of the reasons why silicon has become a primary material for photovoltaics, especially for products like solar cells destined for large-scale markets. However, existing silicon wafer processing methods often suffer from drawbacks due to a lack of fixed fixtures, leading to wafer breakage during cutting, increased production costs, and significant errors. Furthermore, during clamping, the central portion can sink under gravity, causing overall deformation and damaging the photovoltaic panel. Traditional equipment clamps the monocrystalline silicon wafer from both sides, resulting in the center of the wafer being unloaded and damaging it during processing. Therefore, we have redesigned a fixed fixture for processing monocrystalline silicon wafers. Utility Model Content

[0003] The purpose of this invention is to provide a fixture for processing single-crystal silicon wafers.

[0004] To solve the above-mentioned technical problems, this utility model provides the following technical solution: a fixing fixture for processing monocrystalline silicon wafers, including a fixing fixture frame, wherein the fixing fixture frame has a first adjustment limiting groove and a second adjustment limiting groove inside, a drive threaded rod is rotatably installed inside the first adjustment limiting groove, a drive sliding block is movably installed on one side surface of the drive threaded rod, a first height adjusting frame is fixedly connected to one side top of the drive sliding block, a first height adjusting threaded rod is movably installed on one side top surface of the first height adjusting frame, a first adjusting turntable is fixedly connected to one side bottom end of the first height adjusting threaded rod, a first monocrystalline silicon wafer fixing clamp is rotatably connected to one side top end of the first height adjusting threaded rod, and drive motors are fixedly installed on both sides top ends of the fixing fixture frame.

[0005] Preferably, the drive threaded rod passes through the interior of the drive sliding block, the drive threaded rod and the drive sliding block are connected by a threaded connection, the drive sliding block is located inside the first adjusting limit groove, the drive sliding block and the first adjusting limit groove are connected by a sliding connection, and the first adjusting limit groove and the second adjusting limit groove have the same internal structure.

[0006] Preferably, the first height adjusting threaded rod passes through the top end of the first height adjusting frame, the first height adjusting threaded rod and the first height adjusting frame are connected by a threaded connection, and the first adjusting turntable is located inside the first height adjusting frame.

[0007] Preferably, the first monocrystalline silicon wafer fixing clamp includes a clamping disk, the clamping disk having a clamping groove inside, a clamping threaded rod threadedly connected to one side of the top surface of the clamping disk, a clamping limiting disk rotatably connected to one side of the bottom end of the clamping threaded rod, and a clamping rotating disk fixedly connected to one side of the top end of the clamping threaded rod.

[0008] Preferably, a side sliding cabinet is fixedly installed on the top surface of one side of the fixed tooling frame, a sliding base is slidably connected to the top surface of one side of the side sliding cabinet, an auxiliary sliding handle is fixedly installed on the outer wall of one side of the sliding base, a second height adjustment frame is fixedly connected to the top surface of one side of the sliding base, a second height adjustment threaded rod is movably connected to the top surface of one side of the second height adjustment frame, a second adjustment turntable is fixedly connected to the bottom end of one side of the second height adjustment threaded rod, and a second monocrystalline silicon wafer fixing clamp is rotatably connected to the top surface of one side of the second height adjustment threaded rod.

[0009] Preferably, the second monocrystalline silicon wafer fixing clamp has the same structure as the first monocrystalline silicon wafer fixing clamp, the second height adjusting threaded rod passes through the inner top of the second height adjusting frame, the connection between the second height adjusting threaded rod and the second height adjusting frame is a threaded connection, and the second adjusting turntable is located inside the second height adjusting frame.

[0010] Compared with related technologies, the fixture for processing single-crystal silicon wafers provided by this utility model has the following advantages:

[0011] 1. This utility model provides a fixing fixture for processing monocrystalline silicon wafers. By setting a first adjusting limit groove and a second adjusting limit groove, the drive threaded rod inside the groove rotates, thereby driving the drive sliding block to slide and adjust its position inside the first adjusting limit groove and the second adjusting limit groove. This allows for adjustment of the distance between the two first monocrystalline silicon wafer fixing clamps. By rotating the first adjusting turntable, the first height adjusting threaded rod is positioned at the top of the first height adjusting frame, thereby adjusting the height of the first monocrystalline silicon wafer fixing clamp. This allows for different height adjustments for the monocrystalline silicon wafers clamped by the first monocrystalline silicon wafer fixing clamp. The adjustment can be made according to the height of the actual processing equipment. The clamping adjustment of the monocrystalline silicon wafers by the first monocrystalline silicon wafer fixing clamp is achieved by rotating the clamping turntable to adjust the position of the clamping threaded rod at the top of the clamping turntable, thereby adjusting the position height of the clamping limit table inside the clamping groove to achieve the clamping operation.

[0012] 2. This utility model provides a fixing fixture for processing monocrystalline silicon wafers. By adjusting the position of the sliding base on the side sliding cabinet, the position of the second monocrystalline silicon wafer fixing clamp can be controlled. The position of the second height adjusting threaded rod at the top of the second height adjusting frame is adjusted by adjusting the second adjusting turntable, thereby adjusting the position and height of the second monocrystalline silicon wafer fixing clamp to adapt to the position of the first monocrystalline silicon wafer fixing clamp. The second monocrystalline silicon wafer fixing clamp and the first monocrystalline silicon wafer fixing clamp have the same structure, so the fixing method of the monocrystalline silicon wafer is the same. At this time, the monocrystalline silicon wafer is fixed by force in three directions, which can increase the processing stability of the monocrystalline silicon wafer. The auxiliary sliding handle can assist the sliding adjustment of the sliding base. Attached Figure Description

[0013] Figure 1 This is a three-dimensional structural diagram of the present invention;

[0014] Figure 2 This is a schematic diagram of the device's side top view structure according to this utility model;

[0015] Figure 3 This is a schematic side view of the overall structure of the device of this utility model;

[0016] Figure 4 This utility model Figure 3 A magnified structural diagram at point A.

[0017] The following are the labeling elements in the diagram: 1. Fixed fixture; 2. First adjusting limit groove; 3. Second adjusting limit groove; 4. Drive threaded rod; 5. Drive sliding block; 6. First height adjusting frame; 7. First height adjusting threaded rod; 8. First adjusting turntable; 9. First monocrystalline silicon wafer fixing clamp; 91. Clamping plate; 92. Clamping groove; 93. Clamping threaded rod; 94. Clamping limit plate; 95. Clamping rotating plate; 10. Drive motor; 11. Side sliding cabinet; 12. Sliding base; 13. Auxiliary sliding handle; 14. Second height adjusting frame; 15. Second height adjusting threaded rod; 16. Second adjusting turntable; 17. Second monocrystalline silicon wafer fixing clamp. Detailed Implementation

[0018] Example 1:

[0019] Please see Figure 1-4This utility model provides a technical solution: a fixed fixture for processing monocrystalline silicon wafers, including a fixed fixture frame 1. The fixed fixture frame 1 has a first adjusting limiting groove 2 and a second adjusting limiting groove 3 inside. A drive threaded rod 4 is rotatably installed inside the first adjusting limiting groove 2. A drive sliding block 5 is movably installed on one side surface of the drive threaded rod 4. A first height adjusting frame 6 is fixedly connected to the top of one side of the drive sliding block 5. A first height adjusting threaded rod 7 is movably installed on the top surface of one side of the first height adjusting frame 6. A first adjusting turntable 8 is fixedly connected to the bottom of one side of the first height adjusting threaded rod 7. A first monocrystalline silicon wafer fixing clamp 9 is rotatably connected to the top of one side of the first height adjusting threaded rod 7. A drive motor 10 is fixedly installed on the tops of both sides of the fixed fixture frame 1. The drive threaded rod 4 passes through the interior of the drive sliding block 5. The connection between 4 and the driving sliding block 5 is a threaded connection. The driving sliding block 5 is located inside the first adjusting limit groove 2. The connection between the driving sliding block 5 and the first adjusting limit groove 2 is a sliding connection. The internal structures of the first adjusting limit groove 2 and the second adjusting limit groove 3 are the same. The first height adjusting threaded rod 7 passes through the top of the first height adjusting frame 6. The connection between the first height adjusting threaded rod 7 and the first height adjusting frame 6 is a threaded connection. The first adjusting turntable 8 is located inside the first height adjusting frame 6. The first single crystal silicon wafer fixing clamp 9 includes a clamping plate 91. A clamping groove 92 is opened inside the clamping plate 91. A clamping threaded rod 93 is threadedly connected to the top surface of one side of the clamping plate 91. A clamping limit plate 94 is rotatably connected to the bottom end of one side of the clamping threaded rod 93. A clamping rotating plate 95 is fixedly connected to the top end of one side of the clamping threaded rod 93.

[0020] In the implementation scheme, by setting the drive threaded rod 4 inside the first adjustment limiting groove 2 and the second adjustment limiting groove 3 to rotate, the drive sliding block 5 can be driven to slide and adjust its position inside the first adjustment limiting groove 2 and the second adjustment limiting groove 3, thereby adjusting the distance between the two sides of the first monocrystalline silicon wafer fixing clamp 9. By rotating the first adjustment turntable 8, the position of the first height adjusting threaded rod 7 inside the first height adjusting frame 6 is adjusted, thereby adjusting the height of the first monocrystalline silicon wafer fixing clamp 9. Thus, the monocrystalline silicon wafer clamped and fixed by the first monocrystalline silicon wafer fixing clamp 9 can be adjusted to different heights. The adjustment can be made according to the height of the actual processing equipment. The clamping adjustment of the monocrystalline silicon wafer by the first monocrystalline silicon wafer fixing clamp 9 is achieved by rotating the clamping turntable 95 to adjust the position of the clamping threaded rod 93 inside the clamping disc 91, thereby adjusting the position height of the clamping limiting disc 94 inside the clamping groove 92 to achieve the clamping operation.

[0021] Example 2:

[0022] Please see Figure 1-4This utility model provides a technical solution: a fixed fixture for processing monocrystalline silicon wafers, including a fixed fixture frame 1 with a side sliding cabinet 11 fixedly installed on one side top surface, a sliding base 12 slidably connected to one side top of the side sliding cabinet 11, an auxiliary sliding handle 13 fixedly installed on one side outer wall of the sliding base 12, a second height adjustment frame 14 fixedly connected to one side top of the sliding base 12, a second height adjustment threaded rod 15 movably connected to one side top of the second height adjustment frame 14, a second adjustment turntable 16 fixedly connected to one side bottom of the second height adjustment threaded rod 15, and a second monocrystalline silicon wafer fixing clamp 17 rotatably connected to one side top of the second height adjustment threaded rod 15. The second monocrystalline silicon wafer fixing clamp 17 and the first monocrystalline silicon wafer fixing clamp 9 have the same structure. The second height adjustment threaded rod 15 passes through the inner top of the second height adjustment frame 14, and the connection between the second height adjustment threaded rod 15 and the second height adjustment frame 14 is a threaded connection. The second adjustment turntable 16 is located inside the second height adjustment frame 14.

[0023] In the implementation scheme, the position of the second monocrystalline silicon wafer fixing clamp 17 can be controlled by adjusting the position of the sliding base 12 on the side sliding cabinet 11. The position of the second height adjusting threaded rod 15 at the top of the second height adjusting frame 14 is adjusted by adjusting the second adjusting turntable 16, thereby adjusting the position and height of the second monocrystalline silicon wafer fixing clamp 17 to adapt to the position of the first monocrystalline silicon wafer fixing clamp 9. The second monocrystalline silicon wafer fixing clamp 17 and the first monocrystalline silicon wafer fixing clamp 9 have the same structure, so the fixing method of the monocrystalline silicon wafer is the same. At this time, the monocrystalline silicon wafer is fixed by force in three directions, which can increase the processing stability of the monocrystalline silicon wafer. The auxiliary sliding handle 13 can assist the sliding adjustment of the sliding base 12.

[0024] Working principle:

[0025] By rotating the drive threaded rod 4 inside the first adjustment limit groove 2 and the second adjustment limit groove 3, the drive sliding block 5 can be driven to slide and adjust its position inside the first adjustment limit groove 2 and the second adjustment limit groove 3, thereby adjusting the distance between the two first monocrystalline silicon wafer fixing clamps 9. By rotating the first adjustment turntable 8, the first height adjustment threaded rod 7 is adjusted to the top position inside the first height adjustment frame 6, thereby adjusting the height of the first monocrystalline silicon wafer fixing clamp 9. Thus, the monocrystalline silicon wafers clamped and fixed by the first monocrystalline silicon wafer fixing clamp 9 can be adjusted to different heights. The adjustment can be made according to the height of the actual processing equipment. The clamping adjustment of the monocrystalline silicon wafers by the first monocrystalline silicon wafer fixing clamp 9 is achieved by rotating the clamping turntable 95 to adjust the position of the clamping threaded rod 93 inside the clamping disc 91, thereby adjusting the position height of the clamping limit disc 94 inside the clamping groove 92 to achieve the clamping operation.

[0026] The position of the second monocrystalline silicon wafer fixing clamp 17 can be controlled by adjusting the position of the sliding base 12 on the side sliding cabinet 11. The position of the second height adjusting threaded rod 15 at the top of the second height adjusting frame 14 can be adjusted by adjusting the second adjusting turntable 16, thereby adjusting the position and height of the second monocrystalline silicon wafer fixing clamp 17 to adapt to the position of the first monocrystalline silicon wafer fixing clamp 9. The second monocrystalline silicon wafer fixing clamp 17 and the first monocrystalline silicon wafer fixing clamp 9 have the same structure, so the fixing method of the monocrystalline silicon wafer is the same. At this time, the monocrystalline silicon wafer is fixed by force in three directions, which can increase the processing stability of the monocrystalline silicon wafer. The auxiliary sliding handle 13 can assist the sliding adjustment of the sliding base 12.

Claims

1. A fixture for processing monocrystalline silicon wafers, comprising a fixture frame (1), wherein the fixture frame (1) has a first adjustment limiting groove (2) and a second adjustment limiting groove (3) inside, characterized in that: The first adjustment limiting groove (2) is rotatably mounted with a drive threaded rod (4), and a drive sliding block (5) is movably mounted on one side surface of the drive threaded rod (4). A first height adjustment frame (6) is fixedly connected to the top of one side of the drive sliding block (5). A first height adjustment threaded rod (7) is movably mounted on the top surface of one side of the first height adjustment frame (6). A first adjustment turntable (8) is fixedly connected to the bottom of one side of the first height adjustment threaded rod (7). A first single crystal silicon wafer fixing clamp (9) is rotatably connected to the top of one side of the first height adjustment threaded rod (7). A drive motor (10) is fixedly mounted on the top of both sides of the fixed tooling frame (1).

2. The fixture for processing single-crystal silicon wafers according to claim 1, characterized in that, The drive threaded rod (4) passes through the interior of the drive sliding block (5). The drive threaded rod (4) and the drive sliding block (5) are connected by a threaded connection. The drive sliding block (5) is located inside the first adjustment limiting groove (2). The drive sliding block (5) and the first adjustment limiting groove (2) are connected by a sliding connection. The internal structures of the first adjustment limiting groove (2) and the second adjustment limiting groove (3) are the same.

3. The fixture for processing single-crystal silicon wafers according to claim 1, characterized in that, The first height adjusting threaded rod (7) passes through the top of the first height adjusting frame (6), and the connection between the first height adjusting threaded rod (7) and the first height adjusting frame (6) is a threaded connection. The first adjusting turntable (8) is located inside the first height adjusting frame (6).

4. The fixture for processing single-crystal silicon wafers according to claim 1, characterized in that, The first single-crystal silicon wafer fixing clamp (9) includes a clamping disk (91), the clamping disk (91) has a clamping groove (92) inside, a clamping threaded rod (93) is threadedly connected to the top surface of one side of the clamping disk (91), a clamping limiting disk (94) is rotatably connected to the bottom end of one side of the clamping threaded rod (93), and a clamping rotating disk (95) is fixedly connected to the top end of one side of the clamping threaded rod (93).

5. The fixture for processing single-crystal silicon wafers according to claim 1, characterized in that, A side sliding cabinet (11) is fixedly installed on the top surface of one side of the fixed tooling frame (1). A sliding base (12) is slidably connected to the top surface of one side of the side sliding cabinet (11). An auxiliary sliding handle (13) is fixedly installed on the outer wall of one side of the sliding base (12). A second height adjustment frame (14) is fixedly connected to the top surface of one side of the sliding base (12). A second height adjustment threaded rod (15) is movably connected to the top surface of one side of the second height adjustment frame (14). A second adjustment turntable (16) is fixedly connected to the bottom end of one side of the second height adjustment threaded rod (15). A second single crystal silicon wafer fixing clamp (17) is rotatably connected to the top surface of one side of the second height adjustment threaded rod (15).

6. The fixture for processing single-crystal silicon wafers according to claim 5, characterized in that, The second monocrystalline silicon wafer fixing clamp (17) has the same structure as the first monocrystalline silicon wafer fixing clamp (9). The second height adjusting threaded rod (15) passes through the top of the interior of the second height adjusting frame (14). The connection between the second height adjusting threaded rod (15) and the second height adjusting frame (14) is a threaded connection. The second adjusting turntable (16) is located inside the second height adjusting frame (14).

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