A vacuum-assisted crystallization thin film preparation apparatus

Abstract

This utility model discloses a vacuum-assisted crystallization thin film preparation device, belonging to the field of solar cell technology. To achieve vacuum-assisted crystallization of large-area thin films, the device includes a vacuum chamber (18), a gas supply system, and a vacuum extraction system. The vacuum chamber (18) contains a chamber wall (19), a chamber door (2), and a vacuum chamber (20). The thin film (21) to be processed can be placed inside the vacuum chamber (20). The gas supply system can supply gas to the vacuum chamber (20). The vacuum extraction system is connected to an exhaust port (16) and can evacuate gas from the vacuum chamber (20). This vacuum-assisted crystallization thin film preparation device can control the solvent evaporation rate and the material crystallization process, thereby improving the controllability and repeatability of the thin film material during the crystallization process.

Description

Technical Field

[0001] This utility model relates to the field of solar cell technology, specifically a vacuum-assisted crystallization thin film preparation device. Background Technology

[0002] In recent years, metal halide perovskites, as a novel semiconductor material, have attracted widespread attention in fields such as solar cells due to their advantages including low cost, solution-processability, and broad application prospects. Currently, solar cells based on perovskite thin films have gradually moved from the laboratory stage to the large-scale production stage, and the performance of perovskite solar cells mainly depends on the quality of the perovskite thin film. The corresponding crystallization processes are mainly anti-solvent crystallization and annealing crystallization. However, in practical applications, anti-solvent crystallization is not suitable for the crystallization of large-area perovskite thin films. Therefore, annealing crystallization has become one of the directions for preparing large-area perovskite thin films. However, direct annealing can lead to uncontrollable crystallization, resulting in low uniformity of the prepared film.

[0003] To address this, vacuum-assisted crystallization before formal annealing can effectively extract the solvent, resulting in a more uniform and better-forming film. However, current equipment has failed to effectively extract the solvent in large-area film preparation, which affects the film-forming properties, crystallinity, and uniformity of perovskite films, thus impacting the performance of large-area perovskite solar cell devices. Utility Model Content

[0004] To achieve vacuum-assisted crystallization of large-area thin films, this invention provides a vacuum-assisted crystallization thin film preparation device. The device can control the solvent evaporation rate and the crystallization process of the material, thereby improving the controllability and repeatability of the thin film material during the crystallization process.

[0005] The technical solution adopted by this utility model embodiment to solve its technical problem is:

[0006] A vacuum-assisted crystallization thin film preparation apparatus, comprising:

[0007] The vacuum chamber includes a chamber wall, a chamber door, and a vacuum chamber. The chamber wall is provided with an air inlet, an air outlet, and a chamber opening. The chamber door can be opened or closed. The film to be processed can be placed in the vacuum chamber. The vacuum chamber is provided with a honeycomb perforated plate. The gas blown out of the air inlet can flow through the honeycomb perforated plate and then flow to the film to be processed.

[0008] A gas supply system, which is connected to an air inlet, is capable of supplying gas into the vacuum chamber.

[0009] A vacuum system is provided, which is connected to an exhaust port and is capable of evacuating air from the vacuum chamber.

[0010] The chamber wall consists of an upper wall section and a lower wall section connected vertically. The upper wall section has a conical structure, and the lower wall section has a cubic structure. The chamber opening is located on the rear side of the lower wall section. The film to be processed can be laid flat in the vacuum chamber corresponding to the lower wall section. A support column is connected to the bottom of the chamber wall.

[0011] The vacuum chamber is also equipped with a sliding frame and a first slide rail. The film to be processed can be laid flat on the sliding frame. The two first slide rails are spaced apart on the left and right. The left and right ends of the sliding frame are connected to the two first slide rails one by one. The first slide rails extend in the front-back direction. The sliding frame can move forward to enter the vacuum chamber from the opening, and the sliding frame can also move backward to leave the vacuum chamber from the opening.

[0012] The air inlet is located at the lower end of the bin wall, the sliding frame is located above the air inlet, the honeycomb perforated plate is horizontal, multiple honeycomb perforated plates are stacked and connected, the perforations of the multiple honeycomb perforated plates are staggered, and the multiple honeycomb perforated plates are located between the sliding frame and the air inlet.

[0013] A guide plate is also installed inside the vacuum chamber. The guide plate is horizontal and located between the honeycomb plate and the air inlet.

[0014] The silo wall is also equipped with a sealing ring and a second slide rail. The sealing ring is located around the outside of the silo opening, and the second slide rail is located on the upper and lower sides of the outside of the silo opening. The second slide rail extends in the left and right direction. The upper and lower ends of the silo door are connected to the two second slide rails one by one. The silo door can be sealed with the sealing ring and can move left and right.

[0015] Multiple air inlets are located at the lower end of the silo wall and are arranged in regular rows. The air supply system includes an air source and an air delivery pipeline. The two ends of the air delivery pipeline are connected to the air inlets and the air source, respectively. The air delivery pipeline is equipped with an air delivery check valve, a flow regulating valve and a flow meter.

[0016] The exhaust vent is located at the upper end of the chamber wall. The vacuum system includes a vacuum pump and an air extraction pipeline. The two points of the air extraction pipeline are connected to the exhaust vent and the vacuum pump, respectively. A one-way valve for air extraction is installed on the air extraction pipeline.

[0017] A vacuum tank is installed on the evacuation pipeline, and the vacuum tank is located between the evacuation check valve and the vacuum pump.

[0018] The vacuum-assisted crystallization thin film preparation apparatus further includes:

[0019] A pressure monitoring system, which is capable of monitoring the pressure value inside a vacuum chamber, includes a pressure gauge connected to the chamber wall.

[0020] The control terminal can control the gas supply system to supply gas to the vacuum chamber, and can also control the vacuum pumping system to evacuate gas from the vacuum chamber. The pressure sensor is connected to the control terminal, and the control terminal can display the pressure value detected by the pressure sensor.

[0021] The beneficial effects of this utility model embodiment are:

[0022] 1. The vacuum-assisted crystallization thin film preparation device can regulate the solvent evaporation rate and the material crystallization process, thereby improving the controllability and repeatability of the thin film material during the crystallization process, and thus controlling the film quality of the material (such as perovskite) thin film.

[0023] 2. The vacuum-assisted crystallization thin film preparation device can be used not only for the preparation of perovskite thin films, but also for other materials that require vacuum flash evaporation, such as polymer thin film materials and inorganic thin film materials. Attached Figure Description

[0024] The accompanying drawings, which form part of this application, are used to provide a further understanding of the present invention. The illustrative embodiments of the present invention and their descriptions are used to explain the present invention and do not constitute an improper limitation of the present invention.

[0025] Figure 1 This is a schematic diagram of the vacuum-assisted crystallization thin film preparation apparatus of this utility model.

[0026] Figure 2 This is a front view schematic diagram of the vacuum chamber.

[0027] Figure 3 It is along Figure 2 Cross-sectional view along the AA direction.

[0028] Figure 4 It is along Figure 3 Cross-sectional view along the BB direction.

[0029] Figure 5 This is a top view of the first type of sliding frame.

[0030] Figure 6 This is a top view of the second type of sliding frame.

[0031] Figure 7 This is a top view of a honeycomb perforated plate.

[0032] Figure 8 This is a top view schematic diagram of the staggered arrangement of holes in multiple honeycomb perforated plates 6.

[0033] Figure 9 This is a top view of the air deflector.

[0034] Figure 10 This is a schematic diagram of the gas supply system.

[0035] Figure 11 This is a schematic diagram of a vacuum system.

[0036] The annotations in the attached figures are explained as follows:

[0037] 1. Support column; 2. Chamber door; 3. Sealing ring; 4. Sliding frame; 5. Guide plate; 6. Honeycomb perforated plate; 7. Pressure gauge; 8. Gas source; 9. Gas delivery check valve; 10. Gas delivery pipeline; 11. Flow meter; 12. Vacuum pump; 13. Extraction pipeline; 14. Extraction check valve; 15. Control terminal; 16. Exhaust port; 17. Inlet port; 18. Vacuum chamber; 19. Chamber wall; 20. Vacuum chamber; 21. Membrane to be treated; 22. Chamber opening; 23. Upper wall section; 24. Lower wall section; 25. First slide rail; 26. Second slide rail; 27. Flow regulating valve; 28. Vacuum tank; 29. ​​Gas passage; 30. Crossbeam; 31. Connecting rod; 32. Guide vane. Detailed Implementation

[0038] It should be noted that, unless otherwise specified, the embodiments and features described in this application can be combined with each other. The present invention will now be described in detail with reference to the accompanying drawings and embodiments.

[0039] For ease of understanding and description, the following description of this utility model uses absolute positional relationships. Unless otherwise specified, the directional word "above" indicates... Figure 2 The direction above, the directional word "down" indicates Figure 2 The lower side of the middle, the directional word "left" indicates Figure 2 The left side of the direction, the directional word "right" indicates Figure 2 The right-hand direction in the text, the directional word "front" indicates perpendicular to. Figure 2 The direction of the paper and the direction pointing inwards; the directional word "back" indicates perpendicular to. Figure 2 The direction of the orientation is towards the outside of the paper. This invention is described from the perspective of a reader or user, but the aforementioned directional terms should not be construed as limiting the scope of protection of this invention. Regarding the material, weight, size, angle, and parameters of the components, those skilled in the art can determine or replace them based on actual needs or a limited number of experiments.

[0040] like Figure 1 , Figure 2 As shown in the figure, a vacuum-assisted crystallization thin film preparation apparatus according to an embodiment of the present invention includes:

[0041] Vacuum chamber 18 includes chamber wall 19, chamber door 2, and vacuum chamber 20. Chamber wall 19 is provided with air inlet 17, air outlet 16, and chamber opening 22. Chamber door 2 and chamber wall 19 can be sealed together. Chamber door 2 can open or close chamber opening 22. The film to be processed 21 can be placed in vacuum chamber 20. Honeycomb perforated plate 6 is provided in vacuum chamber 20. Gas blown out of air inlet 17 can flow through honeycomb perforated plate 6 to the film to be processed 21. Honeycomb perforated plate 6 can make the airflow blown to the film to be processed 21 through air inlet 17 uniform and stabilize the air pressure in vacuum chamber 20, thereby improving the uniformity of film to be processed 21.

[0042] A gas supply system is connected to the air inlet 17 and is capable of supplying gas into the vacuum chamber 20.

[0043] A vacuum system is provided, which is connected to the exhaust port 16, and is capable of evacuating air from the vacuum chamber 20.

[0044] As one possible implementation method, such as Figure 2 , Figure 3 , Figure 4 As shown, the material of the bin wall 19 can be high-stress deformation resistant steel. The bin wall 19 has an upper wall section 23 and a lower wall section 24 connected vertically. The upper wall section 23 has a conical structure, and the upper end area of ​​the upper wall section 23 is smaller than the lower end area of ​​the upper wall section 23. The lower wall section 24 has a cubic structure and has a front side, a left side, a rear side and a right side connected in sequence. The bin opening 22 is located on the rear side of the lower wall section 24. The film to be processed 21 can be laid flat in the vacuum chamber 20 corresponding to the lower wall section 24. Four support columns 1 are connected to the bottom of the bin wall 19.

[0045] As an alternative implementation, the vacuum chamber 20 is further provided with a sliding frame 4 and two first slide rails 25, spaced apart horizontally. The sliding frame 4 is horizontal, with its left and right ends connected to the two first slide rails 25 respectively. The first slide rails 25 extend in the front-to-back direction. The sliding frame 4 can slide forward to enter the vacuum chamber 20 through the opening 22, and can also slide backward to leave the vacuum chamber 20 through the opening 22. The film to be processed 21 can be laid flat on the sliding frame 4, and the projected area of ​​the film to be processed 21 on the horizontal plane is 1000 cm². 2 -1500cm 2 The film to be processed 21 can move back and forth with the sliding frame 4, and the film to be processed 21 can be sent into or out of the vacuum chamber 20 through the sliding frame 4.

[0046] As one possible implementation method, such as Figure 5As shown, the sliding frame 4 can be a plate-like structure, containing multiple air passages 29 arranged in a regular row and column. Alternatively, as... Figure 6 As shown, the sliding frame 4 contains two horizontal beams 30 spaced apart from each other on the left and right. Both horizontal beams 30 extend in the front-back direction. The two horizontal beams 30 are connected to two first slide rails 25 in a one-to-one correspondence. Multiple connecting rods 31 are connected between the two horizontal beams. The multiple connecting rods 31 extend in the left and right direction and are arranged at intervals in the front-back direction.

[0047] The sliding frame 4 can be connected to a first drive mechanism. The first drive mechanism can cause the sliding frame 4 to slide out of the vacuum chamber 20, the sliding frame 4 to enter the vacuum chamber 20, and the sliding frame 4 to lock its position. The first drive mechanism can be an existing electric mechanism, hydraulic mechanism, pneumatic mechanism, or electromagnetic mechanism.

[0048] As one possible implementation method, such as Figure 3 , Figure 4 As shown, the air inlet vent 17 is located at the lower end of the bin wall 19, and the sliding frame 4 is located above the air inlet vent 17. The sliding frame 4 and the air inlet vent 17 are arranged vertically at intervals. The honeycomb perforated plate 6 is horizontal, and multiple honeycomb perforated plates 6 are stacked and connected, with each honeycomb perforated plate 6 located between the sliding frame 4 and the air inlet vent 17. The perforations of the multiple honeycomb perforated plates 6 are staggered to further ensure uniform airflow. Figure 7 , Figure 8 As shown.

[0049] As one possible implementation method, such as Figure 1 , Figure 3 , Figure 4 , Figure 9 As shown, a baffle plate 5 is also provided inside the vacuum chamber 20. The baffle plate 5 has a louvered structure and is horizontal. The baffle plate 5 contains multiple guide vanes 32, which are arranged at intervals along the horizontal direction. The guide vanes 32 can be vertical or inclined. The baffle plate 5 is located between the honeycomb perforated plate 6 and the air inlet 17, that is, the lower side wall of the chamber wall 19, the baffle plate 5, and the honeycomb perforated plate 6 are stacked and connected sequentially from bottom to top. The baffle plate 5 and the honeycomb perforated plate 6 can be made of high pressure-resistant materials.

[0050] As one possible implementation method, such as Figure 1 , Figure 3As shown, a sealing ring 3 and a second slide rail 26 are also provided on the bin wall 19. The sealing ring 3 is located around the outside of the bin opening 22, and its shape matches the bin opening 22. The sealing ring 3 is made of wear-resistant and corrosion-resistant material. The second slide rail 26 is located on the upper and lower sides outside the bin opening 22 and extends in the left and right direction. The upper and lower ends of the bin door 2 are connected to the two second slide rails 26 one by one, so that the bin door 2 can be sealed with the sealing ring 3 and can move left and right. For example, the bin door 2 can move to the right to open the bin opening 22, and the bin door 2 can move to the left to close the bin opening 22.

[0051] The door 2 can be connected to a second drive mechanism. The second drive mechanism can open the door 22, close the door 22, and lock the door 2 in place. The second drive mechanism can be an existing electric, hydraulic, pneumatic, or electromagnetic mechanism.

[0052] As one possible implementation, multiple air inlet holes 17 are located at the lower end (i.e., the lower sidewall) of the compartment wall 19, and the multiple air inlet holes 17 are arranged in regular rows and columns. For example... Figure 10 As shown, the gas supply system includes a gas source 8 and a gas pipeline 10. The two ends of the gas pipeline 10 are connected to the air inlet 17 and the gas source 8, respectively. The gas pipeline 10 is equipped with a gas delivery check valve 9, a flow regulating valve 27 and a flow meter 11.

[0053] The function of the gas supply check valve 9 is to allow gas discharged from gas source 8 to enter vacuum chamber 20, while preventing gas in vacuum chamber 20 from entering gas source 8. Gas source 8 can be a pressure bottle containing compressed gas, such as nitrogen, argon, or other inert gases.

[0054] As one possible implementation method, such as Figure 1 , Figure 11 As shown, the exhaust port 16 has a relatively large diameter and is located at the upper end of the chamber wall 19. The vacuum system includes a vacuum pump 12 and an extraction pipeline 13. The extraction pipeline 13 can be a high-pressure pipeline with a large inner diameter. Two points of the extraction pipeline 13 are connected to the exhaust port 16 and the vacuum pump 12, respectively. A one-way valve 14 is installed on the extraction pipeline 13. The vacuum pump 12 can be a mechanical pump, a molecular pump, or a combination of both. The function of the one-way valve 14 is to ensure that the gas in the vacuum chamber 20 can only be discharged through the extraction pipeline 13 and cannot flow back.

[0055] As one possible implementation method, such as Figure 11As shown, a vacuum tank 28 can be installed on the evacuation pipeline 13. The vacuum tank 28 is located between the evacuation check valve 14 and the vacuum pump 12. By adding the vacuum tank 28 in the middle of the evacuation pipeline 13, the vacuum tank 28 and the evacuation pipeline 13 are evacuated before the vacuum chamber 20 is evacuated, which can make the vacuum chamber 20 reach the set vacuum pressure more quickly.

[0056] When evacuating by vacuum pump 12, the pressure of the evacuation pipeline and / or vacuum tank can be set to the ideal value first. When the vacuum chamber 20 is quickly evacuated by the evacuation pipeline and / or vacuum tank and vacuum pump, the ideal pressure in the vacuum chamber 20 can be adjusted by the air intake through the air inlet 17, and the pressure of the entire chamber can be stabilized by the gas guide plate, so as to directly perform uniform vacuum treatment on the precursor wet film.

[0057] As one possible implementation method, such as Figure 1 As shown, the vacuum-assisted crystallization thin film preparation apparatus further includes a pressure monitoring system and a control terminal 15. The pressure monitoring system is capable of monitoring the pressure value inside the vacuum chamber 20 in real time. The pressure monitoring system includes a pressure gauge 7, which is connected to the chamber wall 19. The pressure gauge 7 can be a pressure sensor or a vacuum gauge, and it can be connected to a display. The pressure gauge 7 can detect pressure values ​​within the vacuum chamber 20 in the range of 0.001 Pa to 101325 Pa.

[0058] The control terminal 15 can control the gas supply system to supply gas into the vacuum chamber 20. For example, the flow regulating valve 27 can be an electrically controlled valve, and the control terminal 15 can control the flow regulating valve 27 and the gas delivery check valve 9. The control terminal 15 can also control the vacuum pumping system to evacuate gas from the vacuum chamber 20. For example, the control terminal 15 can control the switching on and off of the vacuum pump 12 and the evacuation check valve 14. The pressure gauge 7 is electrically connected to the control terminal 15, and the control terminal 15 can display the pressure value detected by the pressure gauge 7 in the vacuum chamber 20. The control terminal 15 can be a computer, and control operations can be performed on the control terminal 15.

[0059] The working process of the vacuum-assisted crystallization thin film preparation device is described below.

[0060] First, place the wet film substrate (film 21 to be processed) on the sliding frame 4 and push it into the vacuum chamber 20. Push the chamber door 2 to close the vacuum chamber 18. Set the vacuum pressure of the vacuum system, the vacuum pressure inside the vacuum chamber 18, and the airflow rate of the gas supply system. Close the gas supply check valve 9 and the gas extraction check valve 14. Vacuum the gas extraction pipeline 13 through the vacuum pump 12. Open the gas extraction check valve 14 to vacuum the vacuum chamber 20. At the same time, open the gas supply check valve 9 to allow gas from the gas source 8 to enter the vacuum chamber 20 evenly through the guide plate 5 and the honeycomb plate 6 at the set flow rate. Keep the vacuum chamber 20 at the set pressure. After the vacuum processing time is reached, close the gas extraction check valve 14. Gas can enter the vacuum chamber 20 at the set second gas flow rate to make the vacuum chamber 20 reach atmospheric pressure. Close the gas supply check valve 9. At this time, the perovskite intermediate film can be obtained. Take out the substrate and perform subsequent annealing treatment on the substrate.

[0061] The above description is merely a specific embodiment of this utility model and should not be construed as limiting the scope of its implementation. Therefore, any substitution of equivalent components or equivalent changes and modifications made within the scope of protection of this utility model should still fall within its coverage. Furthermore, the technical features, technical solutions, and embodiments of this utility model can be freely combined and used.

Claims

1. An apparatus for the production of thin films by vacuum assisted crystallization, characterized in that, The vacuum-assisted crystallization thin film preparation apparatus includes: Vacuum chamber (18) includes chamber wall (19), chamber door (2) and vacuum chamber (20). The chamber wall (19) is provided with air inlet hole (17), air outlet hole (16) and chamber opening (22). The chamber door (2) can open or close the chamber opening (22). The film to be processed (21) can be placed in the vacuum chamber (20). The vacuum chamber (20) is provided with honeycomb perforated plate (6). The gas blown out by the air inlet hole (17) can flow through the honeycomb perforated plate (6) and then flow to the film to be processed (21). A gas supply system is connected to an air inlet (17) and is capable of supplying gas into the vacuum chamber (20). A vacuum system is connected to an exhaust port (16) and is capable of evacuating air from the vacuum chamber (20).

2. The vacuum assisted crystallized thin film manufacturing apparatus according to claim 1, wherein, The bin wall (19) contains an upper wall section (23) and a lower wall section (24) connected vertically. The upper wall section (23) has a conical structure, and the lower wall section (24) has a cubic structure. The bin opening (22) is located on the rear side of the lower wall section (24). The film to be processed (21) can be laid flat in the vacuum chamber (20) corresponding to the lower wall section (24). A support column (1) is connected to the bottom of the bin wall (19).

3. The vacuum assisted crystallized thin film manufacturing apparatus according to claim 1, wherein, The vacuum chamber (20) is also equipped with a sliding frame (4) and a first slide rail (25). The film to be processed (21) can be laid flat on the sliding frame (4). The two first slide rails (25) are spaced apart on the left and right. The left and right ends of the sliding frame (4) are connected to the two first slide rails (25) one by one. The first slide rails (25) extend in the front and back direction. The sliding frame (4) can move forward and enter the vacuum chamber (20) from the opening (22). The sliding frame (4) can also move backward and leave the vacuum chamber (20) from the opening (22).

4. The vacuum assisted crystallized thin film manufacturing apparatus according to claim 3, wherein, The air inlet hole (17) is located at the lower end of the bin wall (19), the sliding frame (4) is located above the air inlet hole (17), the honeycomb perforated plate (6) is horizontal, multiple honeycomb perforated plates (6) are stacked and connected, the holes of the multiple honeycomb perforated plates (6) are staggered, and the multiple honeycomb perforated plates (6) are located between the sliding frame (4) and the air inlet hole (17).

5. The vacuum assisted crystallized thin film manufacturing apparatus according to claim 4, wherein, A guide plate (5) is also provided inside the vacuum chamber (20). The guide plate (5) is horizontal and is located between the honeycomb perforated plate (6) and the air inlet hole (17).

6. The vacuum assisted crystallized thin film manufacturing apparatus according to claim 1, wherein, The bin wall (19) is also provided with a sealing ring (3) and a second slide rail (26). The sealing ring (3) is located around the outside of the bin opening (22), and the second slide rail (26) is located on the upper and lower sides outside the bin opening (22). The second slide rail (26) extends in the left and right direction. The upper and lower ends of the bin door (2) are connected to the two second slide rails (26) one by one. The bin door (2) can be sealed with the sealing ring (3) and can move left and right.

7. The vacuum assisted crystallized thin film manufacturing apparatus according to claim 1, wherein Multiple air inlet holes (17) are located at the lower end of the silo wall (19). The multiple air inlet holes (17) are arranged in regular rows. The air supply system includes an air source (8) and an air delivery pipeline (10). The two ends of the air delivery pipeline (10) are connected to the air inlet holes (17) and the air source (8) respectively. An air delivery check valve (9), a flow regulating valve (27) and a flow meter (11) are provided on the air delivery pipeline (10).

8. The vacuum assisted crystallized thin film manufacturing apparatus according to claim 1, wherein, The exhaust port (16) is located at the upper end of the bin wall (19). The vacuum system includes a vacuum pump (12) and an exhaust pipe (13). Two points of the exhaust pipe (13) are connected to the exhaust port (16) and the vacuum pump (12) respectively. An exhaust check valve (14) is provided on the exhaust pipe (13).

9. The vacuum assisted crystallization thin film production apparatus according to claim 8, wherein, A vacuum tank (28) is installed on the air extraction pipeline (13), and the vacuum tank (28) is located between the air extraction check valve (14) and the vacuum pump (12).

10. The vacuum assisted crystallized thin film manufacturing apparatus according to claim 1, wherein, The vacuum-assisted crystallization thin film preparation apparatus further includes: A pressure monitoring system is provided, which is capable of monitoring the pressure value inside the vacuum chamber (20). The pressure monitoring system includes a pressure gauge (7) which is connected to the chamber wall (19). The control terminal (15) can control the gas supply system to supply gas to the vacuum chamber (20). The control terminal (15) can also control the vacuum pumping system to pump gas into the vacuum chamber (20). The pressure sensor (7) is connected to the control terminal (15). The control terminal (15) can display the pressure value detected by the pressure sensor (7).

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