Atomic layer deposition apparatus

Abstract

This application relates to an atomic layer deposition apparatus, comprising: a cavity having interconnected first and second chambers arranged sequentially along a first direction; an air guide including an air guide tube and a support portion, the air guide tube including an inlet end and an outlet end connected to each other, the support portion connected to the inlet end and disposed within the first chamber, and the air guide tube disposed within the second chamber; a carrier boat disposed within the first chamber and supported on the support portion; the air guide further comprising a first flow equalization plate connected to the inlet end, the projection of the first flow equalization plate along the first direction covering the carrier boat, the airflow flowing through the carrier boat entering the air guide tube via the first flow equalization plate and being discharged to the outside via the outlet end. Because the first flow equalization plate can achieve uniform airflow distribution, under the equalization effect of the first flow equalization plate, the airflow can flow evenly through all parts of the tail end of the carrier boat, ensuring the film thickness deposited on the edge of the tail end, thereby ensuring the uniformity of film thickness for each part.

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