Wafer substrate appearance inspection device
By designing a wafer substrate appearance inspection device, and employing the coordinated operation of a feeding line, a dual-gripper assembly for picking up materials, a transfer and unloading line, and a vision inspection component, the device solves the problems of low transmission efficiency and poor positioning accuracy of traditional equipment. This enables efficient and accurate wafer substrate appearance inspection, meeting the high-precision inspection needs of the semiconductor industry.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- SUZHOU SHOLASER TECH CO LTD
- Filing Date
- 2025-06-11
- Publication Date
- 2026-06-30
AI Technical Summary
Traditional wafer substrate inspection equipment suffers from low transmission efficiency, poor positioning accuracy, and low automation, failing to meet the semiconductor industry's demand for high-precision and high-efficiency inspection.
Design a wafer substrate appearance inspection device, which adopts a feeding line, a dual gripper assembly, a transfer unloading line, an inspection carrier assembly, and a vision inspection assembly. Through the coordinated cooperation of the components, efficient material transfer and accurate inspection are achieved, thereby improving the level of automation.
It improves the efficiency and accuracy of wafer substrate appearance inspection, realizes full-process automation, reduces labor costs, avoids human error, and meets the high-precision inspection requirements of the semiconductor industry.
Smart Images

Figure CN224436162U_ABST