A silicon wafer etching and cleaning equipment
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- WUXI MINGYAN INTELLIGENT EQUIP CO LTD
- Filing Date
- 2025-08-19
- Publication Date
- 2026-07-03
Smart Images

Figure CN224460442U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of solar energy processing equipment, and in particular to a silicon wafer etching and cleaning device. Background Technology
[0002] In the production of solar cells, etching and cleaning are key processes, and their efficiency and stability directly affect the production quality and capacity of the cells. Current chain-type etching and cleaning equipment typically uses a limited number of transport channels (e.g., 6-8), limiting the number of cells processed per cycle and making it difficult to meet high-capacity demands.
[0003] Meanwhile, the roller drive system of traditional equipment has the following drawbacks:
[0004] The high friction between the support shafts and bushings at both ends of the roller causes severe wear on the tooth surfaces of the transmission gears, which can easily lead to gear runout and affect the smoothness of the battery cell transmission.
[0005] The rollers are too long and have no support in the middle. They are prone to deformation after long-term use, which can cause the battery cells to shift and affect the stability of transmission.
[0006] The main and auxiliary tanks adopt a separate structure. When preparing the solution, all the solution must be added to the auxiliary tank first and then pumped into the main tank. The auxiliary tank has a large volume, the calculation of the solution usage is complicated, and the equipment maintenance is inconvenient. Utility Model Content
[0007] In order to overcome the shortcomings of the prior art, this application proposes a silicon wafer etching and cleaning device to solve the problems existing in the prior art.
[0008] To solve the above-mentioned technical problems, this utility model provides the following technical solution:
[0009] A silicon wafer etching and cleaning device, comprising
[0010] The main body of the equipment is provided with a feeding area, a water film protection area 1, an etching tank 1, a water film protection area 2, an etching tank 2, a washing tank, a drying tank and a unloading area in sequence along the solar cell conveying direction. Each area is connected in a straight line to form a continuous processing path.
[0011] The system includes 14 transmission channels that run from the loading area to the unloading area. Each transmission channel includes several transmission rollers arranged at intervals along the transmission direction. The axes of the transmission rollers are parallel to each other and equidistantly distributed in the horizontal direction, used to synchronously carry and transmit solar cells. The transmission channels have the same spacing, and the height of the transmission rollers in each channel is consistent.
[0012] The transmission system includes a drive shaft, plastic bearings, and transmission rollers. The drive shaft and transmission rollers are connected by a pair of helical gears. The two ends of the transmission rollers are rotatably supported on the side frame of the main body of the equipment by plastic bearings. The inner ring of the plastic bearing is interference-fitted with the shaft of the transmission roller, and the outer ring is limited and fixed to the roller guide rail by a guide rail pressure plate. The guide rail pressure plate is bolted to the roller guide rail to form a mounting cavity for accommodating the plastic bearing.
[0013] A roller support assembly includes a driven roller bracket and a driven roller. The driven roller bracket is fixed to the bottom frame of the main body of the equipment and is positioned at the middle of the transmission roller for each transmission channel. The driven roller is rotatably connected to the driven roller bracket via a rotating shaft, and its outer circumferential surface makes rolling contact with the outer circumferential surface of the transmission roller to provide intermediate support for the transmission roller.
[0014] A chemical solution treatment system is provided, corresponding to etching tank 1, etching tank 2, and a water washing tank. The system includes a main tank, a secondary tank, a main tank liquid sensor, and a secondary tank liquid sensor. The main tank and secondary tank are arranged side-by-side. The main tank liquid sensor is installed on the inner wall of the main tank, and the secondary tank liquid sensor is installed on the inner wall of the secondary tank. Both are used to detect the liquid level in the tanks. The main tank and secondary tank are connected by a pipe, and a control valve is provided on the pipe.
[0015] As a further technical solution of this utility model: the axes of the transmission rollers in the 14 roller transmission channels are parallel to each other.
[0016] As a further technical solution of this utility model: the main body of the plastic bearing is made of polyetheretherketone (PEEK) material, and the ball bearing is made of silicon carbide material.
[0017] As a further technical solution of this utility model: the main tank and the auxiliary tank are integrally injection molded, and a pneumatic valve is provided in the flow channel. The liquid sensor of the main tank and the liquid sensor of the auxiliary tank are connected to the pneumatic valve through a programmable logic controller and a solenoid valve.
[0018] As a further technical solution of this utility model: the liquid sensor in the main tank and the liquid sensor in the auxiliary tank are both magnetostrictive liquid level sensors, which are respectively installed on the inner sidewalls of the main tank and the auxiliary tank, and the detection range covers the lowest liquid level to the highest liquid level of the main tank and the auxiliary tank.
[0019] One or more technical solutions provided in the embodiments of this application have at least the following technical effects or advantages:
[0020] 1. The 14 parallel transmission channels significantly increase the processing capacity per cycle, thereby greatly improving productivity;
[0021] 2. Plastic bearings reduce transmission friction, decrease gear wear and roller runout, and improve transmission smoothness;
[0022] 3. The intermediate support assembly effectively prevents roller deformation through soft plastic driven rollers, while simultaneously transmitting offset;
[0023] 4. The main and auxiliary tanks are designed as a single unit, combined with a liquid level detection device, which simplifies the liquid preparation process, saves space and materials, and facilitates maintenance. Attached Figure Description
[0024] Figure 1 This is the main structure diagram.
[0025] Figure 2 This is a structural diagram of the etching tank.
[0026] Figure 3 This is a structural diagram of the conveyor rollers.
[0027] Figure 4 This is a diagram of the roller support structure.
[0028] In the diagram: 1-Main body of equipment, 2-Feeding area, 3-Water film protection area 1, 4-Etching tank 1, 5-Water film protection area 2, 6-Etching tank 2, 7-Washing tank, 8-Drying tank, 9-Feeding area, 10-Main tank liquid sensor, 11-Main tank, 12-Secondary tank, 13-Secondary tank liquid sensor, 14-Drive shaft, 15-Guide rail pressure plate, 16-Plastic bearing, 17-Roller support, 18-Roller guide rail, 19-Transfer roller, 20-Driven roller bracket, 21-Driven roller. Detailed Implementation
[0029] The technical solutions in the embodiments of this utility model will be clearly and completely described below. Obviously, the described embodiments are only some embodiments of this utility model, and not all embodiments. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the protection scope of this utility model.
[0030] like Figures 1-4 As shown, a silicon wafer etching and cleaning equipment is provided. The main body of the equipment 1 is provided with a feeding area 2, a water film protection area 1 3, an etching tank 1 4, a water film protection area 2 5, an etching tank 2 6, a water washing tank 7, a drying tank 8 and a discharging area 9 in sequence along the transmission direction. 14 parallel roller transmission channels run through each area.
[0031] like Figure 2 As shown, the main tank 11 and the auxiliary tank 12 are integrally formed and connected at the bottom through a flow channel with a pneumatic valve. Both are equipped with magnetostrictive liquid level sensors on their inner side walls.
[0032] like Figure 3As shown, the drive shaft 14 and the transmission roller 19 are connected by a drive helical gear. The two ends of the transmission roller 19 are supported on the side frame of the main body 1 by plastic bearings 16. The inner ring of the plastic bearing 16 is interference-fitted with the transmission roller shaft, and the outer ring is limited and fixed to the roller guide rail 18 by the guide rail pressure plate 15.
[0033] like Figure 4 As shown, the driven roller 21 of the intermediate support assembly is connected to the driven roller bracket 20 through a bearing. The two driven rollers 21 are symmetrically distributed below the transmission roller 19 and are in rolling contact with the transmission roller 19.
[0034] During operation, solar cells enter 14 transmission channels from the loading area 2, and sequentially pass through water film protection, etching, water washing, and drying before being output from the unloading area 9. The transmission system drives the transmission rollers through the transmission shaft 14, with plastic bearings 16 reducing transmission friction and intermediate support components preventing roller deformation. The chemical solution flows as needed in the integrated main and auxiliary tank structure, with liquid sensors 10 in the main tank and 13 in the auxiliary tank monitoring in real time to ensure stable treatment results.
[0035] It will be apparent to those skilled in the art that this invention is not limited to the details of the exemplary embodiments described above, and that it can be implemented in other specific forms without departing from the spirit or essential characteristics of this invention. Therefore, the embodiments should be considered exemplary and non-limiting in all respects, and the scope of this invention is defined by the appended claims rather than the foregoing description. Thus, it is intended that all variations falling within the meaning and scope of equivalents of the claims be included within this invention.
[0036] Furthermore, it should be understood that although this specification describes embodiments, not every embodiment contains only one independent technical solution. This way of describing the specification is only for clarity. Those skilled in the art should regard the specification as a whole, and the technical solutions in each embodiment have been appropriately combined to form other embodiments that are easy for those skilled in the art to understand.
Claims
1. A silicon wafer etching cleaning apparatus, characterized by comprising: include The main body of the equipment (1) is provided with a feeding area (2), a water film protection area 1 (3), an etching tank 1 (4), a water film protection area 2 (5), an etching tank 2 (6), a water washing tank (7), a drying tank (8), and a discharging area (9) in sequence along the solar cell conveying direction. Each area is connected in a straight line to form a continuous processing path. There are 14 transmission channels that run through the loading area (2) to the unloading area (9). Each transmission channel includes several transmission rollers (19) arranged at intervals along the transmission direction. The axes of the transmission rollers (19) are parallel to each other and are equidistantly distributed in the horizontal direction to synchronously carry and transmit solar cells. The transmission channels have the same spacing and the transmission rollers (19) of each channel have the same height. The transmission system includes a drive shaft (14), a plastic bearing (16), and a transmission roller. The drive shaft (14) and the transmission roller are connected by a pair of helical gears. The two ends of the transmission roller (19) are rotatably supported on the side frame of the main body (1) of the equipment by the plastic bearing (16). The inner ring of the plastic bearing (16) is interference-fitted with the shaft of the transmission roller, and the outer ring is limited and fixed to the roller guide rail (18) by the guide rail pressure plate (15). The guide rail pressure plate (15) and the roller guide rail (18) are bolted together to form an installation cavity for accommodating the plastic bearing (16). The roller support assembly includes a driven roller bracket (20) and a driven roller (21). The driven roller bracket (20) is fixed to the bottom frame of the main body of the equipment (1) and is positioned at the middle of the transmission roller (19) of each transmission channel. The driven roller (21) is rotatably connected to the driven roller bracket (20) via a rotating shaft, and its outer circumferential surface rolls in contact with the outer circumferential surface of the transmission roller (19) to provide intermediate support for the transmission roller (19). The liquid treatment system is configured to correspond to etching tank 1 (4), etching tank 2 (6), and washing tank (7), including a main tank (11), a secondary tank (12), a liquid sensor (10) for the main tank, and a liquid sensor (13) for the secondary tank. The main tank (11) and the secondary tank (12) are arranged side by side. The liquid sensor (10) for the main tank is installed on the inner wall of the main tank (11), and the liquid sensor (13) for the secondary tank is installed on the inner wall of the secondary tank (12). Both are used to detect the liquid level in the tank. The main tank (11) and the secondary tank (12) are connected by a pipe, and a control valve is provided on the pipe.
2. The apparatus of claim 1, wherein the gas source is a gas cylinder. The axes of the 14 roller conveyor channels are parallel to each other.
3. The apparatus of claim 1 wherein the gas source is a source of hydrogen gas. The main body of the plastic bearing (16) is made of polyetheretherketone, and the balls are made of silicon carbide.
4. The apparatus of claim 1 wherein, The main tank (11) and the secondary tank (12) are integrally injection molded. A pneumatic valve is provided in the flow channel. The liquid sensor (10) of the main tank and the liquid sensor (13) of the secondary tank are connected to the pneumatic valve through a programmable logic controller and a solenoid valve.
5. The apparatus of claim 1 wherein, The main tank liquid sensor (10) and the auxiliary tank liquid sensor (13) are both magnetostrictive liquid level sensors, which are respectively installed on the inner sidewalls of the main tank (11) and the auxiliary tank (12), and the detection range covers the lowest liquid level to the highest liquid level of the main tank (11) and the auxiliary tank (12).