A tool for multi-target co-sputtering deposition

By adjusting the position and angle of the target material using a multi-target co-sputtering fixture, the problems of slow single-target sputtering rate and multi-element coating were solved, achieving efficient and flexible multi-element coating and improving target material utilization and coating uniformity.

CN224467897UActive Publication Date: 2026-07-07陕西华秦科技实业股份有限公司

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
陕西华秦科技实业股份有限公司
Filing Date
2025-06-26
Publication Date
2026-07-07

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    Figure CN224467897U_ABST
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Abstract

The utility model belongs to sputter coating tool technical field, concretely relates to a tool for multi-target co-sputtering coating. The utility model discloses through actual production need can be fixedly connected with multiple single target fixing devices on the connecting disc, through the position of target material support plate on the U type sliding slot, can be more flexible control the distance between multiple magnetron sputtering devices, when the target material of same magnetron sputtering device is sputtered, if the part is smaller, the distance between target material is more far, will cause the waste of target material, through the distance between target material, improve the utilization of target material. Further through the relative angle between angle positioning plate and adjusting plate, and then control target material sputtering angle, when needing to handle some curved surface parts, through adjusting target material angle realizes the uniformity of coating. The device can increase tool and fittings on the original single target coating equipment to realize multi-target different element co-sputtering, greatly reduce the purchase of new equipment, has higher economic practicality.
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