Water pump film structure of photovoltaic chain type cleaning equipment

By designing a water pump coating structure for a photovoltaic chain cleaning device, the problems of chemical splashing and high water pump resistance were solved, achieving uniform water film and long pump life, and improving coating quality and water system stability.

CN224479034UActive Publication Date: 2026-07-10JIANGSU FULM LASER TECH CO LTD

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
JIANGSU FULM LASER TECH CO LTD
Filing Date
2025-08-27
Publication Date
2026-07-10

AI Technical Summary

Technical Problem

In photovoltaic chain cleaning equipment, chemicals are easily splashed onto the non-etched surface of silicon wafers, causing accidental etching, and the water pump outlet resistance is high, which shortens its service life.

Method used

Design a water pump membrane structure for a photovoltaic chain cleaning device, including a water film pump, a 90° elbow pipe, a Y-type tee pipe, a drip pipe, a drip knife, a water film auxiliary tank, and a one-way valve. By reasonably diverting and adjusting the water flow rate, the water pump outlet resistance is reduced, ensuring the uniformity and stability of the water film.

Benefits of technology

It effectively reduces the water pump outlet resistance, extends service life, ensures the formation of a uniform water film on the non-etched surface of the silicon wafer, and improves the coating quality and the stability of the water system.

✦ Generated by Eureka AI based on patent content.

Smart Images

  • Figure CN224479034U_ABST
    Figure CN224479034U_ABST
Patent Text Reader

Abstract

This utility model discloses a water pump coating structure for a photovoltaic chain cleaning device, including a water film pump. The water film pump has an inlet and an outlet on one side. A 90° elbow is connected to the outlet, and a Y-shaped tee is connected to the 90° elbow. One end of the Y-shaped tee is connected to a drip pipe, and the output end of the drip pipe is connected to a drip knife for coating the non-etched surface of the silicon wafer. The drip pipe is equipped with a speed control valve for controlling the flow rate of the drip knife. The other end of the Y-shaped tee is connected to a secondary water film groove to reduce the resistance at the outlet of the water film pump. This utility model features uniform coating and a long service life.
Need to check novelty before this filing date? Find Prior Art

Description

Technical Field

[0001] This utility model relates to the technical field of photovoltaic wet chain cleaning equipment, specifically a water pump membrane structure for photovoltaic chain cleaning equipment. Background Technology

[0002] In the single-sided etching process of photovoltaic chain cleaning equipment, the core requirement is to ensure that the chemicals only come into contact with and react with the surface of the silicon wafer to be etched. However, in actual operation, when the chemicals come into contact with the surface of the silicon wafer to be etched, the surrounding chemicals are easily splashed onto the non-etched surface of the silicon wafer, causing the non-etched area to be accidentally etched. To avoid this problem, a uniform water film needs to be pre-laid on the non-etched surface of the silicon wafer to block the contact between the chemicals and the front side of the silicon wafer, thus playing a protective role. Therefore, the uniformity of the water film is crucial.

[0003] However, the amount of water required for each silicon wafer is relatively small, usually in the range of tens of milliliters. Therefore, the outlet diameter of the drip knife is usually small, which leads to greater resistance at the water pump outlet. Long-term operation under high resistance will significantly increase the additional wear and tear on the water pump and shorten its service life.

[0004] Therefore, it is essential to design a water pump coating structure for a photovoltaic chain cleaning device that features uniform coating and a long service life. Utility Model Content

[0005] The purpose of this invention is to provide a water pump coating structure for a photovoltaic chain cleaning device to solve the problems mentioned in the background art.

[0006] To solve the above-mentioned technical problems, this utility model provides the following technical solution: a water pump membrane structure for a photovoltaic chain cleaning device, including a water film pump, wherein the water film pump is provided with an inlet end and an outlet end on one side;

[0007] The water outlet is connected to a 90° elbow pipe, and a Y-shaped tee pipe is connected to the 90° elbow pipe. One end of the Y-shaped tee pipe is connected to a drip pipe, and the output end of the drip pipe is connected to a drip knife for coating the non-etched surface of the silicon wafer. The drip pipe is equipped with a speed regulating valve for controlling the water flow rate of the drip knife.

[0008] The other end of the Y-shaped tee is connected to a secondary water film trough to reduce the resistance at the outlet of the water film pump.

[0009] In one embodiment of this utility model, the water film sub-tank is connected to the Y-shaped three-way pipe through a diversion pipe, and the diversion pipe is provided with a first one-way valve.

[0010] In one embodiment of this utility model, a second one-way valve is provided on the side of the drip tube near the drip knife.

[0011] In one embodiment of this utility model, the water inlet end is connected to a water inlet pipe, and one end of the water inlet pipe is connected to the water film auxiliary tank.

[0012] In one embodiment of the present invention, the water film pump is provided with an acid and alkali resistant outer shell, and a power cord is provided at the upper end of the water film pump, which extends through the outer shell to the outside.

[0013] In one embodiment of the present invention, the drip knife includes an outer shell and an inner shell, the inner shell being embedded inside the outer shell, the top of the outer shell having a water inlet connected to a drip pipe, and the bottom of the inner shell having a water outlet, the water inlet and the water outlet being coaxially arranged.

[0014] Compared with the prior art, the beneficial effects achieved by this utility model are:

[0015] (1) By setting up a water film pump, a water film sub-trough, a Y-type three-way pipe, a diversion pipe and a first check valve, the water film pump provides a stable water flow pressure, the Y-type three-way pipe reasonably diverts the water flow to the drip pipe and the water film sub-trough, the water film sub-trough can divert part of the water flow to reduce the resistance at the outlet of the water film pump, effectively solving the problem of excessive outlet resistance of the water film pump due to the small diameter of the drip knife outlet, avoiding the extra consumption caused by excessive resistance of the water film pump, and improving the service life of the water film pump. The first check valve on the diversion pipe can prevent the water in the water film sub-trough from flowing back, ensuring the stability of the water system pressure, ensuring the smoothness of the overall water flow, and effectively optimizing the pressure distribution of the water system.

[0016] (2) By setting up a drip pipe, a drip knife, a speed control valve and a second check valve, the speed control valve can flexibly adjust the water flow of the drip knife so that the water output of the drip knife can be adapted to the coating requirements of silicon wafers of different specifications, ensuring that a uniform and complete water film is formed on the non-etched surface. The second check valve prevents water backflow at the drip knife, avoids backflow affecting the water film formed by the drip knife, and ensures the stability of the coating quality. Attached Figure Description

[0017] The accompanying drawings are provided to further illustrate the present invention and form part of the specification. They are used together with the embodiments of the present invention to explain the present invention, but do not constitute a limitation thereof. In the drawings:

[0018] Figure 1 This is a schematic diagram of the structural composition of this utility model;

[0019] Figure 2 yes Figure 1 Enlarged view of point A in the middle;

[0020] Figure 3 yes Figure 1 Enlarged view at point B in the middle;

[0021] In the diagram: 10. Water film pump; 11. Inlet; 12. Outlet; 13. Outer casing; 14. Power cord; 20. 90° elbow; 21. Y-type tee; 22. Drip pipe; 221. Speed ​​control valve; 222. Second check valve; 23. Diverter pipe; 231. First check valve; 24. Inlet pipe; 30. Drip knife; 31. Outer casing; 32. Inner casing; 33. Inlet; 34. Outlet; 40. Sub-tank for water film. Detailed Implementation

[0022] To enable those skilled in the art to better understand the present invention, the solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort should fall within the protection scope of the present invention.

[0023] This utility model provides a technical solution: a water pump membrane structure for a photovoltaic chain cleaning device, including a water film pump 10, an acid and alkali resistant outer shell 13 on the outside of the water film pump 10, and a power cord 14 at the upper end of the water film pump 10, which extends through the outer shell 13 to the outside; the acid and alkali resistant outer shell 13 can effectively resist the corrosion of acid and alkali solutions that may be encountered during the photovoltaic chain cleaning process, and avoid the outer shell 13 from being damaged by corrosion and affecting the normal operation of the pump body; the power cord 14 provides a convenient power connection method for the water film pump 10.

[0024] The water film pump 10 has an inlet end 11 and an outlet end 12 on one side. The outlet end 12 is connected to a 90° elbow pipe 20. A Y-shaped tee pipe 21 is connected to the 90° elbow pipe 20. One end of the Y-shaped tee pipe 21 is connected to a drip pipe 22. The output end of the drip pipe 22 is connected to a drip knife 30 for coating the non-etched surface of the silicon wafer. The drip knife 30 includes an outer shell 31 and an inner shell 32. The inner shell 32 is embedded inside the outer shell 31. The top of the outer shell 31 is provided with an inlet 33, which is connected to the drip pipe 22. The bottom of the inner shell 32 is provided with an outlet 34. The inlet 33 and the outlet 34 are coaxially arranged to ensure that the water flows smoothly out of the outlet 34 in a straight direction. The inlet 33 at the top of the outer shell 31 can stably receive the water flow and guide it to the outlet 34 of the inner shell 32. The drip pipe 22 is equipped with a speed regulating valve 221 for controlling the water flow rate of the drip knife 30. The speed regulating valve 221 flexibly adjusts the water output of the drip knife 30 according to actual needs to ensure that a water film of uniform thickness is formed on the non-etched surface of the silicon wafer. The other end of the Y-shaped tee pipe 21 is connected to a water film auxiliary groove 40 for reducing the resistance of the water film pump 10 outlet 12. After the water is pressurized by the water film pump 10, it is transported to the Y-shaped tee pipe 21 through the 90° elbow pipe 20. The branch end of the Y-shaped tee pipe 21 introduces part of the water flow into the water film auxiliary groove 40 to reduce the resistance of the water film pump 10 outlet 12. The other part of the water flow flows to the drip knife 30 through the drip pipe 22.

[0025] The water film sub-trough 40 is connected to the Y-type three-way pipe 21 via a diversion pipe 23, which is equipped with a first one-way valve 231. The diversion pipe 23 provides an independent water flow channel between the Y-type three-way pipe 21 and the water film sub-trough 40, ensuring a smoother diversion process and preventing water flow turbulence at the branch points. The first one-way valve 231 effectively prevents water in the water film sub-trough 40 from flowing back into the Y-type three-way pipe 21, avoiding water flow turbulence caused by backflow. This ensures a stable water output in the drip pipe 22, making the water output of the drip knife 30 more precise and further improving the uniformity of the coating on the non-etched surface of the silicon wafer.

[0026] The drip tube 22 is provided with a second one-way valve 222 on the side near the drip knife 30; the second one-way valve 222 effectively prevents the water at the drip knife 30 from flowing back into the drip tube 22, avoiding fluctuations in the drip volume caused by backflow, and ensuring that the non-etched surface of the silicon wafer can continuously obtain a uniform amount of water.

[0027] The water inlet 11 is connected to a water inlet pipe 24, one end of which is connected to the water film auxiliary tank 40. The water inlet pipe 24 directly connects the water film auxiliary tank 40 to the water inlet 11 of the water film pump 10, so that water can directly enter the water film pump 10 from the water film auxiliary tank 40, providing a stable water supply path for the water film pump 10.

[0028] Working principle: Water enters the inlet end 11 of the water film pump 10 from the water film auxiliary tank 40 through the inlet pipe 24, and is discharged from the outlet end 12 after being pressurized by the water film pump 10. It then flows through the 90° elbow pipe 20 and enters the Y-type tee pipe 21.

[0029] The water flow is divided into two paths at the Y-type tee pipe 21. One path flows into the water film auxiliary tank 40 through the diversion pipe 23, thereby reducing the resistance at the outlet end 12 of the water film pump 10. The first one-way valve 231 on the diversion pipe 23 can prevent the water in the water film auxiliary tank 40 from flowing back into the Y-type tee pipe 21.

[0030] Another water flow enters the drip pipe 22. The speed control valve 221 on the drip pipe 22 adjusts the water flow to the drip knife 30 according to the coating requirements of the non-etched surface of the silicon wafer. The water flows in the drip pipe 22, passes through the second one-way valve 222 and enters the water inlet 33 at the top of the outer shell 31 of the drip knife 30. Then it is guided by the water inlet 33 to the inner shell 32. Since the water inlet 33 and the water outlet 34 are coaxially set, the water flows smoothly out of the water outlet 34 at the bottom of the inner shell 32 in a straight line, accurately forming a uniform water film on the non-etched surface of the silicon wafer, thus completing the coating operation.

[0031] In the description of this utility model, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer," etc., indicating the orientation or positional relationship, are based on the orientation or positional relationship shown in the accompanying drawings and are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation or specific orientation structure and operation, and therefore should not be construed as a limitation of this utility model; the terms "first," "second," and "third" are used for descriptive purposes only and should not be construed as indicating or implying relative importance. In addition, unless otherwise explicitly specified and limited, the terms "installed," "connected," and "linked" should be interpreted broadly, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium; it can be a connection within two components. For those skilled in the art, the specific meaning of the above terms in this utility model can be understood according to the specific circumstances.

[0032] In the description of this utility model, the terms "one embodiment," "some embodiments," "example," "specific example," or "some examples," etc., refer to specific features, structures, materials, or characteristics described in connection with that embodiment or example, which are included in at least one embodiment or example of this utility model. In this utility model, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in a suitable manner in any one or more embodiments or examples. Moreover, those skilled in the art can combine different embodiments or examples and features of different embodiments or examples described in this utility model without contradiction.

[0033] Although embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the present invention, the scope of which is defined by the appended claims and their equivalents.

Claims

1. A water pump membrane structure for a photovoltaic chain cleaning device, comprising a water film pump (10), wherein the water film pump (10) is provided with an inlet end (11) and an outlet end (12) on one side. Its features are: The water outlet (12) is connected to a 90° elbow pipe (20), and a Y-type tee pipe (21) is connected to the 90° elbow pipe (20). One end of the Y-type tee pipe (21) is connected to a drip pipe (22), and the output end of the drip pipe (22) is connected to a drip knife (30) for coating the non-etched surface of the silicon wafer. The drip pipe (22) is provided with a speed regulating valve (221) for controlling the water flow of the drip knife (30). The other end of the Y-shaped tee (21) is connected to a water film sub-trough (40) for reducing the resistance of the water film pump (10) outlet (12).

2. The water pump membrane structure of the photovoltaic chain cleaning equipment according to claim 1, characterized in that: The water film sub-tank (40) is connected to the Y-type three-way pipe (21) through the diversion pipe (23), and the diversion pipe (23) is equipped with a first one-way valve (231).

3. The water pump membrane structure of the photovoltaic chain cleaning equipment according to claim 1, characterized in that: The drip pipe (22) is provided with a second one-way valve (222) on the side near the drip knife (30).

4. The water pump membrane structure of a photovoltaic chain cleaning device according to claim 2, characterized in that: The water inlet (11) is connected to a water inlet pipe (24), one end of which is connected to the water film sub-tank (40).

5. The water pump membrane structure of a photovoltaic chain cleaning device according to claim 1, characterized in that: The water film pump (10) is provided with an acid and alkali resistant outer shell (13) on the outside, and a power cord (14) is provided at the upper end of the water film pump (10). The power cord (14) extends through the outer shell (13) to the outside.

6. The water pump membrane structure of a photovoltaic chain cleaning device according to claim 1, characterized in that: The drip knife (30) includes an outer shell (31) and an inner shell (32). The inner shell (32) is embedded inside the outer shell (31). The top of the outer shell (31) is provided with a water inlet (33), which is connected to the drip pipe (22). The bottom of the inner shell (32) is provided with a water outlet (34). The water inlet (33) and the water outlet (34) are coaxially arranged.