A reactor module having a gradient porosity flow conductor insert

Abstract

The utility model discloses a reactor module with gradient porosity flow guide insert, including reactor base body and apron, and the both ends of reactor base body are equipped with material joint, and the inside forms microchannel. Gradient porosity flow guide insert is equipped in microchannel, and gradient porosity flow guide insert includes rotatable flow guide fin, and is equipped with a plurality of gradient overflow holes with gradient change of aperture on flow guide fin. Flow guide fin can flow guide and grading overflow to material, and produce rotation retreat when being extruded by material. The utility model can take into account material passability and flow guide shunt effect, and reduce the risk of the formation of sustained rigid block of flow guide structure.

Description

Technical Field

[0001] This utility model relates to the field of chemical reaction equipment technology, and in particular to a reactor module with a gradient pore flow guide plug. Background Technology

[0002] Microchannel reactors typically incorporate microchannels within the reactor matrix to facilitate material flow, which are then sealed with cover plates. Due to their large specific surface area and short mass and heat transfer distances, microchannels are highly valuable for applications in continuous reactions, rapid mixing reactions, and strongly exothermic reactions.

[0003] In practical applications, to improve the mixing degree of materials within microchannels, existing technologies often incorporate guide vanes, baffles, orifice plates, or other static mixing structures within the microchannels. These structures are typically fixed within the microchannels, enhancing turbulence by altering the material flow direction or allowing the material to pass through the orifices, thereby improving mixing and heat exchange effects.

[0004] However, when localized particle clusters, crystals, or deposits compress the flow-guiding structure within the microchannel, the fixed flow-guiding structure can only act as a rigid structure to withstand the impact and cannot release the local obstruction through its own action, easily leading to persistent obstruction. If the flow-guiding structure is reduced or the channel space is expanded to mitigate this risk, the flow guidance, diversion, and mixing enhancement effects within the microchannel will be weakened.

[0005] Furthermore, the aperture of existing orifice plates or perforated guide vanes is usually relatively uniform. If the aperture is set too large, although it is beneficial for material passage, the dispersion and disturbance effect of the material after passing through the orifice plate is weak; if the aperture is set too small, although it can enhance local flow division and disturbance, it will increase the resistance to material passage and has poor adaptability to materials containing solids or with high viscosity. Therefore, a fixed perforated structure with a single aperture cannot simultaneously achieve both passage and flow division and disturbance effects.

[0006] Therefore, it is necessary to provide a new reactor module that, while retaining the functions of guiding, diverting, and enhancing mixing, reduces the risk of a fixed guiding structure forming a continuous rigid barrier when the material is locally obstructed. Utility Model Content

[0007] The purpose of this invention is to provide a reactor module with a gradient pore flow guide insert to solve the problems of existing fixed flow guide structures being unable to yield when materials are locally obstructed and easily forming continuous rigid blocks, as well as the problems of existing single-aperture perforated structures being unable to balance flow passage and flow diversion disturbance effects.

[0008] To achieve the above objectives, the present invention adopts the following technical solution: A reactor module with a gradient pore flow guide insert includes a reactor substrate and a cover plate covering the reactor substrate. Material inlets are located at both ends of the reactor substrate, and microchannels communicating with the material inlets are formed within the reactor substrate. A gradient pore flow guide insert is installed within the microchannel. The gradient pore flow guide insert includes at least one flow guide vane, which is rotatably disposed within the microchannel. The flow guide vane has multiple gradient flow holes, which constitute a gradient pore structure.

[0009] Furthermore, the flow guide vane includes a free end near the center of the microchannel and a connecting end near the sidewall of the reactor substrate, and the aperture of multiple gradient flow holes gradually decreases from the free end to the connecting end.

[0010] Furthermore, there are multiple guide vanes, which are respectively arranged on opposite sides of the microchannel, and the guide vanes on opposite sides are staggered along the material flow direction; the free ends of the guide vanes do not cross the central area of ​​the microchannel, so as to form a continuous passage area in the middle of the microchannel.

[0011] Furthermore, the guide vanes are connected to a limiting component, and the reactor substrate is provided with a guide groove that cooperates with the limiting component. The limiting component can move along the guide groove to limit the rotational stroke of the guide vanes.

[0012] Furthermore, the limiting member includes a guide portion and a rotating portion. The rotating portion is rotatably connected to the guide vane, and the guide portion extends into the guide groove and can slide along the guide groove. When the guide portion abuts against the end of the guide groove, it restricts the guide vane from continuing to rotate.

[0013] Furthermore, a fixing component is fixedly provided inside the reactor substrate, and a rotating shaft is fixedly connected to the guide vane. The rotating shaft is rotatably installed inside the fixing component. A torsion spring for resetting the guide vane is sleeved on the rotating shaft. The torsion spring includes a first torsion arm and a second torsion arm. The first torsion arm is fixed to the rotating shaft by a pressure bar, and the second torsion arm is connected to the fixing component.

[0014] Furthermore, the cover plate is connected to the reactor base by fastening bolts, and a sealing gasket is provided between the cover plate and the reactor base; the lower surface of the cover plate is provided with clamping ribs, which press against the edges of the microchannels on both sides of the reactor base.

[0015] Compared with the prior art, the beneficial effects of this utility model are as follows: This invention incorporates a gradient pore flow guide insert within a microchannel. The insert includes rotatable guide vanes that guide the material within the microchannel. When the material is partially obstructed and squeezes the guide vanes, the vanes can rotate and retract, thereby reducing the risk of the flow guide structure forming a continuous rigid blockage.

[0016] Meanwhile, multiple gradient flow holes are set on the guide vane, so that the guide vane has the functions of graded flow passage and flow diversion; the diameter of the gradient flow holes gradually decreases from the free end of the guide vane to the connection end, which is beneficial to take into account both material passage and local flow diversion disturbance effect.

[0017] Furthermore, the rotational stroke of the guide vanes is limited by the cooperation of the limiting component and the guide slot, preventing excessive rotation. The combination of the rotating shaft, torsion spring, fixing component, and pressure strip ensures that the guide vanes return to their original position after being rotated under pressure. The staggered arrangement of multiple guide vanes, forming a continuous passage area in the center of the microchannel, helps reduce obstruction of the main material flow and improves the stability of the module's operation. Attached Figure Description

[0018] Figure 1 This is a schematic diagram of the overall structure of a reactor module with a gradient pore flow guide plug.

[0019] Figure 2 This is a schematic diagram of an explosion in a reactor module with a gradient pore flow guide.

[0020] Figure 3 This is a half-section schematic diagram of a reactor module with a gradient pore flow guide plug.

[0021] Figure 4 This is a top view of a reactor module with a gradient pore flow guide insert.

[0022] Figure 5 This is an enlarged schematic diagram of the flow guide vane structure in a reactor module with a gradient pore flow guide plug.

[0023] Figure 6 This is a cross-sectional schematic diagram of the flow guide vane structure in a reactor module with a gradient pore flow guide insert.

[0024] Attached icon numbers: 1. Reactor base; 11. Material connector; 12. Guide slot; 2. Cover plate; 21. Fastening bolt; 22. Compression rib; 3. Sealing gasket; 4. Guide vane; 41. Gradient flow hole; 42. Limiting component; 421. Guide part; 422. Rotating part; 43. Rotating shaft; 44. Torsion spring; 45. Pressure strip; 5. Fixing component. Detailed Implementation

[0025] The technical solutions of this application will now be clearly and completely described with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. The components of this application described and shown in the accompanying drawings can generally be arranged and designed in various different configurations. Therefore, the following detailed description of the embodiments of this application provided in the accompanying drawings is not intended to limit the scope of the claimed application, but merely to illustrate selected embodiments of this application.

[0026] like Figures 1 to 6 As shown, this embodiment provides a reactor module with a gradient pore flow guide insert, which includes a reactor base 1, a cover plate 2, a sealing gasket 3, and flow guide vanes 4 disposed inside the reactor base 1. The reactor base 1 can be a metal block structure, such as a stainless steel block, an alloy steel block, or other corrosion-resistant materials suitable for chemical reaction environments. Microchannels for material flow are formed inside the reactor base 1, and material inlets 11 are respectively provided at both ends of the reactor base 1, both of which are connected to the microchannels. In actual use, one material inlet 11 serves as the feed end, and the other material inlet 11 serves as the discharge end. The material enters the microchannels inside the reactor base 1 from the feed end, and after the flow guide, flow passage, and reaction process, it is discharged from the discharge end.

[0027] A cover plate 2 is placed on top of the reactor substrate 1 to seal the microchannels within the reactor substrate 1. The cover plate 2 is connected to the reactor substrate 1 by multiple fastening bolts 21. Specifically, the cover plate 2 may have mounting holes for the fastening bolts 21 to pass through, and the reactor substrate 1 has threaded holes corresponding to the fastening bolts 21. During assembly, the fastening bolts 21 pass through the cover plate 2 and are screwed into the reactor substrate 1, pressing the cover plate 2 tightly against the reactor substrate 1. A sealing gasket 3 is placed between the cover plate 2 and the reactor substrate 1, surrounding the microchannels to seal the mating surface between the cover plate 2 and the reactor substrate 1, preventing leakage of reactants from the mating surface. The sealing gasket 3 can be a frame-shaped sealing gasket or an annular seal adapted to the opening area of ​​the microchannels.

[0028] The lower surface of the cover plate 2 is provided with clamping ribs 22. The clamping ribs 22 can be strip-shaped protrusions extending along the length of the microchannel, or localized protrusions corresponding to the positions of the opening edges on both sides of the microchannel. The function of the clamping ribs 22 is to press against the opening edges on both sides of the microchannel on the reactor substrate 1 when the cover plate 2 is tightened by the fastening bolts 21, thereby improving the clamping stability of the cover plate 2 in the periphery of the microchannel. The clamping ribs 22 are mainly used to enhance the sealing and clamping effect between the cover plate 2 and the reactor substrate 1, and are not used to directly clamp the guide vanes 4, limiting components 42, rotating shafts 43, or fixing components 5. This design avoids interference from the cover plate 2 on the rotation of the guide vanes 4, while ensuring good sealing reliability in the periphery of the microchannel.

[0029] like Figure 3 and Figure 4 As shown, multiple guide vanes 4 are arranged within the microchannel. These guide vanes 4 constitute a gradient pore flow guiding structure within the microchannel. Each guide vane 4 is a plate-like component, with one end near the sidewall of the reactor substrate 1 and the other end extending towards the center of the microchannel. For ease of description, the end of the guide vane 4 near the sidewall of the reactor substrate 1 is called the connecting end, and the end of the guide vane 4 towards the center of the microchannel is called the free end. The guide vanes 4 do not completely block the channel laterally within the microchannel; instead, they are arranged at an angle, allowing the material to be guided during flow while still maintaining a certain amount of mainstream passage space.

[0030] Multiple guide vanes 4 are preferably disposed on opposite sides of the microchannel. The guide vane 4 on one side extends obliquely from near its sidewall towards the center of the microchannel, while the guide vane 4 on the other side extends obliquely from near its other sidewall towards the center of the microchannel. The guide vanes 4 on opposite sides are staggered along the material flow direction; that is, the guide vanes 4 on the left and right sides are not completely opposite each other on the same cross-section, but are staggered along the length of the microchannel. Through this staggered arrangement, as the material flows along the microchannel, it is guided sequentially by the guide vanes 4 on different sides, resulting in some material flowing laterally or undergoing local redistribution, thereby improving the material distribution within the microchannel.

[0031] The free end of the guide vane 4 does not extend beyond the central region of the microchannel. In other words, the guide vane 4 extends from the side to the center of the microchannel, but does not extend to a position that completely closes the center of the microchannel. A continuous passage area is maintained between the left and right guide vanes 4 in the center of the microchannel, and this continuous passage area runs through the material flow direction. This structure allows particles, local agglomerates, or high-viscosity components in the material to pass mainly along the center of the microchannel, reducing the obstruction of the guide vane 4 to the entire flow cross-section. At the same time, the guide vane 4 can still guide the material near the side, so that the microchannel has both mainstream flow and local diversion functions.

[0032] like Figure 5 and Figure 6 As shown, the guide vane 4 is provided with multiple gradient flow holes 41. These multiple gradient flow holes 41 constitute a gradient pore structure on the guide vane 4. Preferably, the diameter of the multiple gradient flow holes 41 gradually decreases from the free end to the connecting end of the guide vane 4. That is, a larger diameter gradient flow hole 41 is provided in the free end region near the center of the microchannel, a smaller diameter gradient flow hole 41 is provided in the connecting end region near the sidewall of the reactor substrate 1, and a transition hole with a diameter between the two can be provided in the region between the free end and the connecting end.

[0033] After gradient flow holes 41 are provided on the guide vane 4, the guide vane 4 is no longer a simple solid guide plate. When material flows through the guide vane 4, part of the material is guided along the surface of the guide vane 4 and its flow direction is changed, while another part of the material can pass through the guide vane 4 through the gradient flow holes 41. The large hole area near the free end helps to reduce the obstruction of the guide vane 4 to the mainstream material in the middle of the microchannel, allowing the material to pass through more smoothly; the small hole area near the connecting end helps to form a finer flow of material near the side of the microchannel, enhancing local fluid disturbance. Thus, the guide vane 4 can form a graded flow effect while playing a guiding role, which is beneficial to taking into account both material passage and flow diversion disturbance effect.

[0034] The gradient flow holes 41 can be circular, elliptical, oblong, or other shapes that are easy to process and suitable for material passage. Multiple gradient flow holes 41 can be arranged in multiple rows according to a specific direction, or they can be arranged in an arc, stepped, or array pattern depending on the shape of the guide vane 4. The aperture variation can be continuous or can be divided into large aperture regions, transition aperture regions, and small aperture regions. As long as the multiple gradient flow holes 41 can form an aperture variation relationship from large to small or from small to large on the guide vane 4, the gradient pore structure described in this embodiment can be achieved.

[0035] The guide vane 4 is rotatably disposed within the microchannel. Specifically, as shown... Figure 5 and Figure 6 As shown, a fixing member 5 is fixedly installed inside the reactor base 1, and a rotating shaft 43 is fixedly connected to the flow guide vane 4. The rotating shaft 43 is rotatably installed inside the fixing member 5. The fixing member 5 can be a base, sleeve, clamp, or other structure capable of supporting the rotation of the rotating shaft 43. The fixing member 5 and the reactor base 1 can be fixed by means of integral molding, welding, screwing, clamping, or embedding. The rotating shaft 43 is fixedly connected to the flow guide vane 4, so that the flow guide vane 4 can rotate relative to the fixing member 5 together with the rotating shaft 43.

[0036] Under normal operating conditions, the guide vane 4 remains in a preset guiding position, extending obliquely into the microchannel to guide and divert the material flowing through it. When localized material within the microchannel exerts pressure on the guide vane 4, the guide vane 4 can rotate around the pivot 43, thus swinging from the normal guiding position to a yielding position. After rotation, the guide vane 4 reduces its obstruction of localized material, increasing the passable space at the corresponding position within the microchannel, thereby reducing the risk of the guide vane 4 continuously obstructing material in a fixed posture.

[0037] To limit the rotation range of the guide vane 4, a limiting member 42 is connected to the guide vane 4. The limiting member 42 includes a guide portion 421 and a rotating portion 422. The rotating portion 422 is rotatably connected to the guide vane 4, allowing the limiting member 42 to change angle relative to the guide vane 4. A guide groove 12 is provided on the reactor substrate 1, and the guide portion 421 extends into the guide groove 12 and can slide along the guide groove 12. The guide groove 12 can be a long groove, an arc-shaped groove, or a guide groove structure adapted to the rotation trajectory of the guide vane 4.

[0038] When the guide vane 4 rotates around the pivot 43, the limiting member 42 moves along with the guide vane 4, and the guide portion 421 slides within the guide slot 12. Because the guide portion 421 is constrained by the guide slot 12, the rotational stroke of the guide vane 4 is limited to a predetermined range. When the guide portion 421 moves to the end of the guide slot 12 and abuts against the end of the guide slot 12, the guide vane 4 cannot continue to rotate in the corresponding direction. This structure prevents the guide vane 4 from over-rotating, preventing it from colliding with adjacent guide vanes 4 or affecting the continuous passage area in the middle of the microchannel, and also prevents excessive deformation of the torsion spring 44 (described later).

[0039] The reason for providing the rotating part 422 in the limiting member 42 is that the relative angle between the limiting member 42 and the guide vane 4 changes when the guide vane 4 rotates around the pivot 43. If the limiting member 42 is rigidly fixed to the guide vane 4, the guide part 421 may get stuck when sliding in the guide groove 12. By rotatably connecting the rotating part 422 to the guide vane 4, the limiting member 42 can automatically adjust its angle when the guide part 421 moves along the guide groove 12, allowing the guide part 421 to slide more smoothly in the guide groove 12, thereby improving the reliability of the limiting and guiding actions.

[0040] like Figure 6 As shown, a torsion spring 44 is fitted onto the rotating shaft 43. The torsion spring 44 is used to reset the guide vane 4 after it is rotated under force. The torsion spring 44 includes a first torsion arm and a second torsion arm, wherein the first torsion arm is fixed to the rotating shaft 43 by a pressure strip 45, and the second torsion arm is connected to the fixing member 5. The pressure strip 45 is used to reliably press or fix the first torsion arm of the torsion spring 44 onto the rotating shaft 43, so that the torsion spring 44 can apply a reset torque to the rotating shaft 43. The fixing member 5 serves as a support structure for the other end of the torsion spring 44, allowing the torsion spring 44 to undergo torsional deformation and store elastic potential energy when the rotating shaft 43 rotates.

[0041] When the guide vane 4 rotates the shaft 43 under the pressure of material extrusion, the torsion spring 44 is twisted. At this time, the guide vane 4 moves from the normal guiding position to the retracting position, and the guide portion 421 of the limiting member 42 slides along the guide groove 12. When the guide vane 4 rotates to the preset maximum angle, the guide portion 421 abuts against the end of the guide groove 12, thereby restricting the guide vane 4 from continuing to rotate. When the extrusion pressure decreases or disappears, the torsion spring 44 releases its elastic potential energy and drives the guide vane 4 to rotate in the opposite direction through the shaft 43, so that the guide vane 4 returns to the normal guiding position. Thus, the guide vane 4 can switch between the normal guiding position and the retracting position.

[0042] In this embodiment, the guide vane 4 and the gradient flow holes 41 disposed on the guide vane 4 constitute the main flow guiding part of the gradient pore flow guiding plug; the rotating shaft 43, the limiting member 42, the guide groove 12, the torsion spring 44, the pressure strip 45, and the fixing member 5 are used to realize the rotational installation, stroke limitation, and reset of the guide vane 4. This gradient pore flow guiding plug is not a simple fixed orifice plate structure, but includes a guide vane 4 that can rotate and retract, and gradient flow holes 41 disposed on the guide vane 4. Under normal conditions, the guide vane 4 can guide and grade flow, can rotate and retract when locally compressed, and can reset under the action of the torsion spring 44 after the external force is released. This retains the flow guiding and diversion function while reducing the risk of the flow guiding structure forming a continuous rigid blockage.

[0043] The assembly process of this embodiment can be performed as follows. First, the fixing member 5 is installed at a predetermined position inside the reactor base 1, so that the fixing member 5 corresponds to the installation area of ​​the guide vane 4. Then, the guide vane 4 is fixedly connected to the rotating shaft 43, and the rotating shaft 43 is rotatably installed in the fixing member 5. Next, the torsion spring 44 is sleeved on the rotating shaft 43, so that the first torsion arm of the torsion spring 44 is fixed to the rotating shaft 43 by the pressure strip 45, and the second torsion arm of the torsion spring 44 is connected to the fixing member 5. Then, the rotating part 422 of the limiting member 42 is connected to the guide vane 4, and the guide part 421 of the limiting member 42 extends into the guide groove 12 on the reactor base 1. Multiple guide vanes 4 can be installed sequentially in the above manner, so that they are located on both sides of the microchannel and staggered along the material flow direction.

[0044] After installing the guide vanes 4 and related structures, place the sealing gasket 3 on the corresponding sealing position on the reactor base 1, arranging the sealing gasket 3 around the microchannel. Then, cover the reactor base 1 with the cover plate 2, aligning the mounting holes on the cover plate 2 with the threaded holes on the reactor base 1, and press the clamping ribs 22 on the lower surface of the cover plate 2 against the edges of the microchannels on both sides of the reactor base 1. Finally, pass the fastening bolts 21 through the cover plate 2 and screw them into the reactor base 1, forming a sealed connection between the cover plate 2, the sealing gasket 3, and the reactor base 1.

[0045] The working process of this embodiment is as follows. The material enters the microchannel in the reactor matrix 1 through the material inlet 11 at one end and flows along the microchannel to the material inlet 11 at the other end. Under normal flow conditions, the guide vanes 4 are held in the preset guiding position under the action of the torsion spring 44. Since multiple guide vanes 4 are staggered along both sides of the microchannel, the material will be guided by the guide vanes 4 on different sides when it flows through different positions. A part of the material changes its flow direction along the surface of the guide vane 4, and another part of the material passes through the guide vane 4 through the gradient flow holes 41 on the guide vane 4, thereby forming a flow mode that combines guiding and staged flow.

[0046] When the material contains localized particle clusters, crystals, sediments, or highly viscous agglomerates, and exerts significant extrusion pressure on a certain guide vane 4, the guide vane 4 drives the rotating shaft 43 to rotate relative to the fixed member 5. As the guide vane 4 rotates, the guide portion 421 of the limiting member 42 slides along the guide groove 12, which restricts the swing range of the guide vane 4. After the guide vane 4 rotates, its obstruction of localized material decreases, increasing the localized passage space of the microchannel. Once the localized extrusion pressure is released, the torsion spring 44 drives the rotating shaft 43 to rotate in the opposite direction, causing the guide vane 4 to return to the preset guide position.

[0047] Compared to fixed guide vanes, the guide vanes 4 in this embodiment have rotatable and retractable capabilities, so they do not need to maintain a fixed blocking posture during localized material compression. Compared to perforated structures with a single aperture, the guide vanes 4 in this embodiment are provided with multiple gradient flow holes 41, with larger flow holes near the center of the microchannel and smaller flow holes near the sidewall of the reactor substrate 1, thus balancing material flow and localized flow disturbance effects. Furthermore, the multiple guide vanes 4 do not completely seal the center of the microchannel, but rather form a continuous passage area in the center of the microchannel, which helps reduce the full-section obstruction of the mainstream material.

[0048] It should be noted that in this embodiment, the number, spacing, and tilt angle of the guide vanes 4, as well as the number, diameter, and arrangement of the gradient flow holes 41, can all be adjusted according to the size of the reactor module, the material characteristics, and the required flow intensity. The guide vanes 4 can be made of sheet metal, or of corrosion-resistant alloy materials, coated metal materials, or other materials suitable for chemical reaction environments. The guide slot 12 can be set as a straight slot, an arc slot, or a composite slot. The fixing member 5 can be integrally processed with the reactor base 1, or it can be fixedly installed in the reactor base 1 as an independent part. The above changes do not affect the basic structural relationship of this utility model, which realizes flow guidance, graded flow, limiting and resetting through the rotatable guide vanes 4, gradient flow holes 41, limiting member 42, guide slot 12, rotating shaft 43, and torsion spring 44.

[0049] The above description is merely a preferred embodiment of this application and is not intended to limit this application. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of this application should be included within the protection scope of this application.

Claims

1. A reactor module with a gradient pore flow guide, comprising a reactor substrate (1) and a cover plate (2) covering the reactor substrate (1), wherein material inlets (11) are respectively provided at both ends of the reactor substrate (1), and microchannels communicating with the material inlets (11) are formed inside the reactor substrate (1), characterized in that: The microchannel is provided with a gradient pore flow guide plug, which includes at least one flow guide vane (4). The flow guide vane (4) is rotatably disposed in the microchannel. The flow guide vane (4) is provided with multiple gradient flow holes (41), and the multiple gradient flow holes (41) constitute a gradient pore structure.

2. The reactor module with a gradient pore flow guide insert according to claim 1, characterized in that: The guide vane (4) includes a free end near the middle of the microchannel and a connecting end near the side wall of the reactor substrate (1), and the aperture of the plurality of gradient flow holes (41) gradually decreases from the free end to the connecting end.

3. The reactor module with a gradient pore flow guide insert according to claim 2, characterized in that: There are multiple guide vanes (4), which are respectively disposed on opposite sides of the microchannel, and the guide vanes (4) on opposite sides are staggered along the material flow direction; the free ends of the guide vanes (4) do not cross the central area of ​​the microchannel, so as to form a continuous passage area in the middle of the microchannel.

4. A reactor module with a gradient pore flow guide insert according to claim 1, characterized in that: The guide vane (4) is connected to a limiting member (42). The reactor substrate (1) is provided with a guide slot (12) that cooperates with the limiting member (42). The limiting member (42) can move along the guide slot (12) to limit the rotation stroke of the guide vane (4).

5. A reactor module with a gradient pore flow guide insert according to claim 4, characterized in that: The limiting member (42) includes a guide part (421) and a rotating part (422). The rotating part (422) is rotatably connected to the guide vane (4). The guide part (421) extends into the guide groove (12) and can slide along the guide groove (12). When the guide part (421) abuts against the end of the guide groove (12), it restricts the guide vane (4) from continuing to rotate.

6. A reactor module with a gradient pore flow guide insert according to claim 1, characterized in that: A fixing member (5) is fixedly provided inside the reactor base (1). The guide vane (4) is fixedly connected to a rotating shaft (43). The rotating shaft (43) is rotatably installed inside the fixing member (5). A torsion spring (44) for resetting the guide vane (4) is sleeved on the rotating shaft (43). The torsion spring (44) includes a first torsion arm and a second torsion arm. The first torsion arm is fixed to the rotating shaft (43) by a pressure strip (45), and the second torsion arm is connected to the fixing member (5).

7. A reactor module with a gradient pore flow guide insert according to claim 1, characterized in that: The cover plate (2) is connected to the reactor base (1) by fastening bolts (21), and a sealing gasket (3) is provided between the cover plate (2) and the reactor base (1); the lower surface of the cover plate (2) is provided with a pressing rib (22), and the pressing rib (22) presses against the edge of the reactor base (1) located on both sides of the microchannel.

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