A spin coating device for liquid phase epitaxy layer-by-layer growth of MOF thin films

Abstract

The utility model discloses a kind of spin coating devices for layer-by-layer growth MOF film of liquid phase epitaxy, belong to the technical field of MOF film growth equipment, spin coating device includes shell, spin coating seat, drop component, driving part and gas conveying component;Shell is equipped with spin coating cavity and the gas inlet hole being communicated with spin coating cavity;Spin coating seat is set in spin coating cavity;Spin coating seat is used for fixedly to substrate in spin coating cavity;Drop component includes drop tube, control component and multiple liquid storage containers;Control component is used for controlling the liquid drop of corresponding liquid storage container is added in substrate located in spin coating seat;Driving part is connected to spin coating seat, and is used for driving spin coating seat rotation;Gas conveying component transports specific gas to spin coating cavity through gas inlet hole, drop of liquid in corresponding liquid storage container is controlled by control component to substrate, the rotation of spin coating seat drives substrate high-speed rotation, make solution even spread, simultaneously, the problem of complex operation such as solution frequent replacement in sequential spin coating process is solved.

Description

Technical Field

[0001] This utility model belongs to the technical field of MOF thin film growth equipment, and specifically relates to a spin coating device for liquid phase epitaxial layer-by-layer growth of MOF thin films. Background Technology

[0002] Metal-organic frameworks (MOFs) are a class of porous materials formed by the self-assembly of metal ions and organic ligands through coordination bonds, and they have shown broad application prospects in gas storage, separation, catalysis, sensing and other fields.

[0003] Currently, methods for preparing MOF thin films include spraying, electrochemical deposition, and liquid-phase epitaxy layer-by-layer (LPE-LBL) growth. Compared to the other two methods, LPE-LBL requires less complex equipment and has extremely low energy consumption and cost. Using this method, the operator simply needs to alternately immerse the substrate in solutions of metal precursors and organic ligands, allowing the MOF to grow layer by layer on the substrate surface. MOF thin films grown using this method are uniform, dense, and exhibit higher performance.

[0004] Currently, commonly used LPE-LBL methods include soaking and brushing. However, traditional methods involving prolonged and repeated operations are cumbersome and result in significant solution consumption and waste. Utility Model Content

[0005] The purpose of this invention is to provide a spin-coating device for liquid phase epitaxial layer-by-layer growth of MOF thin films, which solves the problem of complex operations such as frequent solution changes in sequential spin-coating.

[0006] The technical solution adopted to solve the above-mentioned technical problems is as follows:

[0007] A spin-coating apparatus for liquid-phase epitaxial layer-by-layer growth of MOF thin films according to an embodiment of the present invention includes:

[0008] The outer casing is provided with a spin coating chamber and an air inlet communicating with the spin coating chamber;

[0009] A spin coating stand is disposed within the spin coating cavity; the spin coating stand is used to fix the substrate into the spin coating cavity.

[0010] The dispensing assembly includes a dispensing tube, a control component, and multiple liquid storage containers, which are used to hold different solutions. The dispensing tube is connected to each of the multiple liquid storage containers and has a liquid outlet that extends into the spin coating chamber. The control component is used to control the liquid from the corresponding liquid storage container to be dispensed onto the substrate located on the spin coating base.

[0011] A driving component is connected to the spin coater and is used to drive the spin coater to rotate;

[0012] A gas delivery component is connected to the air inlet and is used to deliver gas into the spin coating chamber through the air inlet.

[0013] According to an embodiment of the present invention, a spin-coating apparatus for liquid-phase epitaxial layer-by-layer growth of MOF thin films is provided, wherein the liquid storage container is provided with a liquid storage tube, the liquid storage tube being connected to the dropper; the control component includes a plurality of valve bodies, each valve body corresponding to one of the liquid storage containers, and the valve body being disposed on the corresponding liquid storage tube to adjust the opening degree of the liquid storage tube.

[0014] According to an embodiment of the present invention, a spin-coating apparatus for liquid phase epitaxial layer-by-layer growth of MOF thin films includes a valve body comprising a valve seat and a baffle. A valve hole is formed in the valve seat and is arranged along the length direction of the liquid storage tube. The baffle is disposed on the valve seat and moves along the radial direction of the liquid storage tube to block or open the valve hole.

[0015] According to an embodiment of the present invention, a spin-coating apparatus for liquid phase epitaxial layer-by-layer growth of MOF thin films includes a valve body further comprising a reset member and a button. The reset member connects the stop member and the valve seat, and the button is connected to the stop member. The reset member is located on the side of the stop member away from the button, and the stop member has a through hole. The reset member provides an elastic force to the stop member, causing the through hole to be misaligned with the valve hole to block the valve hole. Pressure is applied to the stop member by the button, causing the through hole to communicate with the valve hole.

[0016] According to an embodiment of the present invention, a spin-coating apparatus for liquid phase epitaxial layer-by-layer growth of MOF thin films includes a droplet assembly further comprising an adapter, a liquid storage tube comprising a horizontal tube and a vertical tube that are interconnected, the vertical tube being connected to the bottom of the liquid storage tube, one end of the horizontal tube being connected to the vertical tube, and the other end being connected to the droplet tube via the adapter.

[0017] According to an embodiment of the present invention, a spin coating apparatus for liquid phase epitaxial layer-by-layer growth of MOF thin films is provided. The spin coating apparatus further includes an air extraction component. The spin coating base is provided with an air extraction port, an adsorption port, and an adsorption channel connecting the air extraction port and the adsorption port. The air extraction component performs an air extraction operation on the adsorption channel through the air extraction port. The adsorption port is used to adsorb and fix the substrate.

[0018] According to an embodiment of the present invention, a spin coating apparatus for liquid phase epitaxial layer-by-layer growth of MOF thin films is provided. The spin coating apparatus further includes a water pumping component. The outer shell is provided with a water outlet communicating with the spin coating chamber. The water pumping component extracts the liquid in the spin coating chamber through the water outlet.

[0019] According to an embodiment of the present invention, a spin coating apparatus for liquid phase epitaxial layer-by-layer growth of MOF thin films is provided at the bottom of the spin coating cavity, and the spin coating seat is located on the boss; a guide groove is formed between the boss and the side wall of the spin coating cavity, and the guide groove is connected to the water outlet.

[0020] According to an embodiment of the present invention, a spin coating apparatus for liquid phase epitaxial layer-by-layer growth of MOF thin films includes a top cover and a housing. The housing has an opening, and the top cover is detachably installed in the opening. The top cover has a through hole for the dropper to pass through.

[0021] According to an embodiment of the present invention, a spin coating apparatus for liquid phase epitaxial layer-by-layer growth of MOF thin films includes a housing further comprising a sealing ring disposed on the outer periphery of the top cover to seal the gap between the top cover and the housing.

[0022] The present invention has at least the following beneficial effects:

[0023] Different solutions are placed in their respective storage containers, and the treated substrate is placed on a spin coater, which rotates under the drive of a drive unit. A gas delivery component supplies a specific gas to the spin coater cavity through an air inlet. A control component controls the droplet addition of liquid from the corresponding storage container to the substrate. The rotation of the spin coater causes the substrate to rotate at high speed, ensuring uniform spread of the solution. This also solves the problem of frequent solution changes and other complex operations in sequential spin coater processes. After the solution is dropped onto the substrate, it evaporates. The gas delivery component continuously supplies a specific gas to the spin coater cavity, which can adjust the solvent evaporation rate on the sample surface and control the gas atmosphere inside the cavity, which is beneficial for achieving liquid-phase epitaxial layer-by-layer growth of MOF films on the substrate surface. Attached Figure Description

[0024] The present invention will be further described below with reference to the accompanying drawings and embodiments;

[0025] Figure 1 This is a schematic diagram of the overall structure of the spin-coating device for liquid-phase epitaxial layer-by-layer growth of MOF thin films provided in this embodiment of the present invention.

[0026] Figure 2 This is a cross-sectional view of the spin-coating apparatus for liquid-phase epitaxial layer-by-layer growth of MOF thin films provided in this embodiment of the present invention;

[0027] Figure 3 This is a schematic diagram of the valve seat of the spin coating device for liquid phase epitaxial layer-by-layer growth of MOF thin films provided in this embodiment of the present invention;

[0028] Figure 4This is a schematic diagram of the overall structure of the valve body of a spin-coating device for liquid-phase epitaxial layer-by-layer growth of MOF thin films provided in another embodiment of this utility model;

[0029] Figure 5 This is a schematic diagram of the overall structure of the valve body of the spin coating device for liquid phase epitaxial layer-by-layer growth of MOF thin films provided in this embodiment of the present invention.

[0030] The following labels are shown in the attached diagram:

[0031] 100. Outer shell; 110. Spin coating chamber; 111. Air inlet; 120. Boss; 130. Guide groove; 140. Top cover; 150. Shell;

[0032] 200. Spin coating stand;

[0033] 300. Drip assembly; 310. Drip tube; 311. Discharge end; 320. Valve body; 321. Valve seat; 3211. Valve hole; 3212. Sliding groove; 322. Stop; 3221. Through hole; 323. Reset component; 324. Button; 330. Liquid storage container; 331. First liquid storage container; 332. Second liquid storage container; 333. Third liquid storage container; 334. Liquid storage tube; 340. Adapter;

[0034] 400, base;

[0035] 500. Gas pipeline;

[0036] 600. Water pump pipe. Detailed Implementation

[0037] This section will describe in detail the specific embodiments of the present utility model. The preferred embodiments of the present utility model are shown in the accompanying drawings. The purpose of the drawings is to supplement the textual description with graphics, so that people can intuitively and vividly understand each technical feature and the overall technical solution of the present utility model, but they should not be construed as limiting the scope of protection of the present utility model.

[0038] In the description of this utility model, it should be understood that the directional descriptions, such as up, down, front, back, left, right, etc., indicate the directional or positional relationship based on the directional or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model.

[0039] In the description of this utility model, the use of terms such as "several" means one or more, with "multiple" meaning two or more. Terms like "greater than," "less than," and "exceeding" are understood to exclude the stated number, while "above," "below," and "within" are understood to include the stated number. The use of terms like "first," "second," and "third" is merely for distinguishing technical features and should not be construed as indicating or implying relative importance, the quantity of indicated technical features, or the sequential relationship between indicated technical features.

[0040] In the description of this utility model, unless otherwise explicitly defined, terms such as "setting," "installation," and "connection" should be interpreted broadly, and those skilled in the art can reasonably determine the specific meaning of the above terms in this utility model in conjunction with the specific content of the technical solution.

[0041] Reference Figures 1 to 5 The following are several embodiments of a spin-coating apparatus for liquid phase epitaxial layer-by-layer growth of MOF thin films according to the present invention.

[0042] like Figures 1 to 2 As shown in the figure, a spin coating apparatus for liquid-phase epitaxial layer-by-layer growth of MOF thin films according to an embodiment of the present invention includes a housing 100, a spin coating holder 200, a dropper assembly 300, a driving component, and a gas supply component; the housing 100 is provided with a spin coating cavity 110 and an air inlet 111 communicating with the spin coating cavity 110; the spin coating holder 200 is disposed in the spin coating cavity 110; the spin coating holder 200 is used to fix a substrate 400 to the spin coating cavity 110; the dropper assembly 300 includes a dropper tube 310, a control component, and multiple liquid storage containers 330, and multiple The liquid storage container 330 is used to hold different solutions; the drip tube 310 is connected to multiple liquid storage containers 330 respectively, and the drip tube 310 has a liquid outlet end 311, which extends into the spin coating cavity 110; the control component is used to control the liquid of the corresponding liquid storage container 330 to be dripped onto the substrate 400 located in the spin coating base 200; the drive component is connected to the spin coating base 200 and is used to drive the spin coating base 200 to rotate; the gas supply component is connected to the air inlet 111 and is used to supply gas into the spin coating cavity 110 through the air inlet 111.

[0043] Different solutions are placed in their respective storage containers 330, and the treated substrate 400 is placed on the spin coater 200, which rotates under the drive of the drive unit. The gas supply component delivers a specific gas to the spin coater 110 through the gas inlet 111. The control component controls the droplet addition of liquid from the corresponding storage container 330 to the substrate 400. The rotation of the spin coater 200 drives the substrate 400 to rotate at high speed, so that the solution is evenly spread. At the same time, it solves the problem of frequent solution replacement and other complex operations in the sequential spin coater process. After the solution is dropped onto the substrate 400, it evaporates. The gas supply component continuously delivers a specific gas into the spin coater 110, which can adjust the solvent evaporation rate on the sample surface and control the gas atmosphere inside the spin coater 110, which is beneficial to achieve liquid phase epitaxial layer-by-layer growth of MOF thin films on the surface of the substrate 400.

[0044] like Figure 2 As shown, in this embodiment, there are three liquid storage containers 330: a first liquid storage container 331, a second liquid storage container 332, and a third liquid storage container 333. The first liquid storage container 331 contains a metal ion solution, the second liquid storage container 332 contains an organic ligand solution, and the third liquid storage container 333 contains a rinsing solution. While the spin coater 200 is rotating, the metal ion solution in the first liquid storage container 331 is dripped onto the substrate 400 through the dropper 310. After the solution on the surface of the substrate 400 evaporates, the third liquid storage container 333... The rinsing solution in container 310 is added dropwise to substrate 400 through dropper 310, rinsing away any residual solution on substrate 400. After the solution on the surface of substrate 400 evaporates, the organic ligand solution in the second storage container 332 is added dropwise to substrate 400 through dropper 310. After the solution on the surface of substrate 400 evaporates, the rinsing solution in the third storage container 333 is added dropwise to substrate 400 through dropper 310, rinsing away any residual solution on substrate 400. After an evaporation process of a preset time, one cycle of growth is completed. The above operation can be repeated multiple times according to the operator's needs, and the thickness of the grown MOF film can be controlled by controlling the number of growth cycles. The rinsing solution can be anhydrous ethanol. Both the outer shell 100 and the rotating base are rotationally symmetrical components.

[0045] The spin-coating apparatus of this embodiment introduces spin-coating into the layer-by-layer growth of MOF films. During spin-coating, the centrifugal force generated by the high-speed rotation of the substrate 400 can effectively disperse the precursor solution, achieving rapid and uniform spreading of the reactants while reducing the amount of solution used. Uniform solution spreading helps the MOF to grow uniformly and directionally on the surface of the substrate 400.

[0046] This invention is based on a liquid-phase epitaxial layer-by-layer MOF thin film growth method. By using a control component, a dropper 310, and multiple liquid storage containers 330 to drop different liquids onto a substrate 400, it solves the problem of frequent solution changes and other complex operations in sequential spin coating, enabling rapid and controllable MOF thin film growth using spin coating. A specific gas is introduced into the spin coating chamber 110 by a gas supply component, maintaining a constant atmosphere within the chamber. Combined with the strong centrifugal and shear forces generated by high-speed spin coating, this achieves rapid and uniform spreading of the reactants while reducing solution consumption. Uniform solution spreading facilitates the uniform and directional growth of MOFs on the substrate 400 surface.

[0047] The driving component can be a motor, the output shaft of which is connected to the spin coater 200, so that the spin coater 200 rotates relative to the spin coater cavity 110; for example... Figure 1 As shown, the liquid storage container 330 can be a tank; the dripping tube 310 is elongated and has an outlet at its outlet end 311, facilitating the dripping tube 310 to extend into the spin coating chamber 110 to drip liquid onto the substrate 400. The gas supply component can include a gas tank, a gas supply pipe 500, and a gas pump; the gas supply pipe 500 connects the gas tank and the gas inlet, and the gas pump is installed on the gas supply pipe 500 to drive the flow of a specific gas within the gas supply pipe 500; the specific gas can be a mixed gas (e.g., a specific ratio of nitrogen and air), and introducing the specific gas into the spin coating chamber 110 can reduce the humidity within the spin coating chamber 110; the spin coating device also includes an outlet pipe and a recovery tank; the outlet pipe connects the spin coating chamber 110 and the recovery tank, and the specific gas flows from the outlet pipe into the recovery tank after passing through the spin coating chamber 110.

[0048] like Figure 1 As shown, in some embodiments, the liquid storage container 330 is provided with a liquid storage tube 334, which is connected to the dripping tube 310. The control component includes multiple valve bodies 320, each corresponding to a liquid storage container 330. The valve body 320 is disposed on the corresponding liquid storage tube 334 to adjust the opening of the liquid storage tube 334. Each liquid storage container 330 is equipped with an independent liquid storage tube 334 and an independent valve body 320. When a specific solution needs to be added, the opening of the corresponding liquid storage tube 334 can be adjusted by controlling the valve body 320 on the corresponding liquid storage tube 334, so that the solution is directionally delivered to the dripping tube 310 through the liquid storage tube 334 at a preset flow rate, avoiding cross-contamination of different solutions. By controlling the opening and closing actions and opening values ​​of different valve bodies 320, different solutions can be injected into the spin coating chamber 110 in sequence in a precise and controllable manner.

[0049] like Figure 3 and Figure 5As shown, in some embodiments, the valve body 320 includes a valve seat 321 and a stop 322. A valve hole 3211 is formed in the valve seat 321, and the valve hole 3211 is arranged along the length direction of the liquid storage tube 334. The solution in the liquid storage tube 334 flows from one side of the valve seat 321 through the valve hole 3211 to the other side of the valve seat 321. The stop 322 is disposed on the valve seat 321 and moves along the radial direction of the liquid storage tube 334 to block or open the valve hole 3211, thereby controlling the opening degree of the valve hole 3211. Figure 5 As shown, the stop 322 moves radially along the liquid storage tube 334. When the stop 322 blocks the valve orifice 3211, the valve orifice 3211 closes, thereby blocking the flow of solution in the liquid storage tube 334. A sliding groove 3212 is provided on the valve seat 321, which extends radially along the liquid storage tube 334. The stop 322 is slidably disposed in the sliding groove 3212 to achieve the movement of the stop 322 along the radial direction of the liquid storage tube 334.

[0050] like Figure 3 and Figure 5 As shown, in some embodiments, the valve body 320 further includes a reset member 323 and a button 324. The reset member 323 connects the stop member 322 and the valve seat 321, and the button 324 is connected to the stop member 322. The reset member 323 is located on the side of the stop member 322 away from the button 324. The stop member 322 is provided with a through hole 3221. The reset member 323 provides an elastic force to the stop member 322, causing the through hole 3221 to be misaligned with the valve hole 3211, thereby blocking the valve hole 3211. The button 324 applies pressure to the stop member 322, causing the through hole 3221 to communicate with the valve hole 3211. That is, as shown... Figure 4 As shown, button 324 can drive the stop 322 to move toward the reset member 323, so that the through hole 3221 and the valve hole 3211 are connected. At this time, the stop 322 no longer blocks the solution from passing through the valve hole 3211, and the reset member 323 contracts to store elastic potential energy; Figure 5 As shown, when button 324 is released, reset member 323 releases elastic potential energy, causing stop member 322 to move away from reset member 323, thereby causing through hole 3221 to be misaligned with valve hole 3211 to block valve hole 3211. At this time, stop member 322 prevents solution from passing through valve hole 3211. The opening degree of component hole 3211 can be controlled by controlling the force of pressing button 324, thereby controlling the flow rate of solution in liquid storage tube 334. Among them, reset member 323 is a spring, button 324 can be a bolt, and bolt and stop member 322 are threadedly connected.

[0051] like Figure 1As shown, in some embodiments, the dripping assembly 300 further includes an adapter 340. The storage tube 334 includes a horizontal tube and a vertical tube that are interconnected. The vertical tube is connected to the bottom of the storage tube 334. One end of the horizontal tube is connected to the vertical tube, and the other end is connected to the dripping tube 310 through the adapter 340. The L-shaped storage tube 334, formed by the vertical tube and the horizontal tube, is connected to the dripping tube 310 through the adapter 340. While connecting multiple storage containers 330, the dripping tube 310 can be ensured to be vertically positioned, so that the solution is subject to gravity flow, thereby reducing liquid retention. The vertical tube is vertically connected to the bottom of the storage container 330, and the solution is driven into the storage container 330 by gravity, without the need for an additional power source. After the solution flows downward through the vertical tube, it flows into the horizontally extending horizontal tube to reduce liquid retention. The horizontal tubes corresponding to the multiple storage containers 330 are sealed and connected to the dripping tube 310 through the adapter 340. This sealing structure achieves airtightness and ensures that the solution will not leak during transportation.

[0052] In some embodiments, the spin coating apparatus further includes an air extraction component. The spin coating base 200 is provided with an air extraction port, an adsorption port, and an adsorption channel connecting the air extraction port and the adsorption port. The adsorption port is used to adsorb and fix the substrate 400. The air extraction component continuously extracts air from the adsorption channel through the air extraction port of the spin coating base 200, so that a negative pressure is formed in the adsorption channel, and the substrate 400 is tightly adsorbed onto the surface of the spin coating base 200 by the negative pressure. The adsorption port is located on the upper surface of the spin coating base 200 so that the substrate 400 is stably placed on the spin coating base 200. The air extraction component can be a vacuum pump. The air extraction component is provided with an air extraction pipe, which is connected to the adsorption channel to extract air from the adsorption channel. A rotating head can be provided at the end of the air extraction pipe. The rotating head includes a first rotating tube and a second rotating tube that are connected to each other. The first rotating tube and the second rotating tube are rotatably connected. The first rotating tube is connected to the air extraction pipe, and the second rotating tube is connected to the adsorption channel to prevent the air extraction pipe from tangling and knotting due to the rotation of the spin coating base 200.

[0053] In some embodiments, the spin coating apparatus further includes a water pumping component. The housing 100 is provided with a water outlet communicating with the spin coating chamber 110. The water pumping component extracts the liquid from the spin coating chamber 110 through the water outlet. The water outlet at the bottom of the housing 100 cooperates with the water pumping component to discharge the liquid from the spin coating chamber 110 during the spin coating process. The centrifugal force generated by the rotation of the spin coating seat 200 throws the liquid radially to the inner wall surface of the spin coating chamber 110. The liquid flows downward to the water outlet due to gravity and is then pumped away from the spin coating chamber 110 by the water pumping component. The water pumping component includes a water pump and a water pumping pipe 600. The water pump is connected to the water outlet through the water pumping pipe 600. Two water pumping pipes 600 can be provided to improve drainage efficiency. Generally, the water outlet is located at the bottom of the spin coating chamber 110 for convenient drainage.

[0054] like Figure 1 and Figure 2As shown, in some embodiments, a boss 120 is provided at the bottom of the spin coating cavity 110, and the spin coating seat 200 is located on the boss 120. The boss 120 can appropriately increase the height of the spin coating seat 200 to prevent water from entering the substrate 400. A guide channel 130 is formed between the boss 120 and the side wall of the spin coating cavity 110, and the guide channel 130 is connected to the water outlet. The solution that has rinsed the substrate 400 flows into the guide channel 130 under the action of gravity and is discharged through the water outlet and the pumping component.

[0055] like Figure 1 and Figure 2 As shown, in some embodiments, the outer casing 100 includes a top cover 140 and a housing 150. The housing 150 has an opening, and the top cover 140 is detachably installed in the opening. The top cover 140 has an opening for the dropper 310 to pass through. The top cover 140 and the housing 150 can be quickly disassembled or installed, enabling the spin coating chamber 110 to be opened and closed quickly, facilitating the placement of the substrate 400 inside the spin coating chamber 110. The opening on the top cover 140 for the dropper 310 to pass through is located above the spin coating base 200, allowing the dropper 310 to drop solution onto the substrate 400.

[0056] In some embodiments, the housing 100 further includes a sealing ring disposed on the outer periphery of the top cover 140 to seal the gap between the top cover 140 and the housing 150, so that the spin coating cavity 110 forms a relatively closed cavity, which is beneficial to realize the liquid phase epitaxial layer-by-layer growth of MOF thin film on the surface of the substrate 400.

[0057] The preferred embodiments of the present invention have been described in detail above, but the present invention is not limited to the described embodiments. Those skilled in the art can make various equivalent modifications or substitutions without departing from the spirit of the present invention, and these equivalent modifications or substitutions are all included within the scope defined by the claims of this application.

Claims

1. A spin-coating apparatus for liquid-phase epitaxial layer-by-layer growth of MOF thin films, characterized in that, include: The outer casing is provided with a spin coating chamber and an air inlet communicating with the spin coating chamber; A spin coating stand is disposed within the spin coating cavity; The spin coating holder is used to fix the substrate into the spin coating cavity; The dispensing assembly includes a dispensing tube, a control component, and multiple liquid storage containers, which are used to hold different solutions. The dropper is connected to a plurality of liquid storage containers respectively, and the dropper has a liquid outlet end that extends into the spin coating chamber; the control component is used to control the liquid from the corresponding liquid storage container to be dripped onto the substrate located on the spin coating seat; A driving component is connected to the spin coater and is used to drive the spin coater to rotate; A gas delivery component is connected to the air inlet and is used to deliver gas into the spin coating chamber through the air inlet.

2. The spin-coating apparatus for liquid-phase epitaxial layer-by-layer growth of MOF thin films according to claim 1, characterized in that, The liquid storage container is provided with a liquid storage tube, which is connected to the drip tube; the control component includes multiple valve bodies, each corresponding to a liquid storage container, and each valve body is disposed on a corresponding liquid storage tube to adjust the opening degree of the liquid storage tube.

3. The spin-coating apparatus for liquid-phase epitaxial layer-by-layer growth of MOF thin films according to claim 2, characterized in that, The valve body includes a valve seat and a stop. A valve hole is formed in the valve seat and is arranged along the length of the liquid storage tube. The stop is disposed on the valve seat and moves along the radial direction of the liquid storage tube to block or open the valve hole.

4. The spin-coating apparatus for liquid-phase epitaxial layer-by-layer growth of MOF thin films according to claim 3, characterized in that, The valve body further includes a reset member and a button. The reset member connects the stop and the valve seat, and the button is connected to the stop. The reset member is located on the side of the stop away from the button, and the stop has a through hole. The reset member provides an elastic force to the stop, causing the through hole to be misaligned with the valve hole to block the valve hole. The button applies pressure to the stop, causing the through hole to communicate with the valve hole.

5. A spin-coating apparatus for liquid-phase epitaxial layer-by-layer growth of MOF thin films according to claim 2, characterized in that, The dripping assembly also includes an adapter, and the liquid storage tube includes a horizontal tube and a vertical tube that are interconnected. The vertical tube is connected to the bottom of the liquid storage tube, one end of the horizontal tube is connected to the vertical tube, and the other end is connected to the dripping tube through the adapter.

6. A spin-coating apparatus for liquid-phase epitaxial layer-by-layer growth of MOF thin films according to any one of claims 1 to 4, characterized in that, The spin coating device further includes an air extraction component. The spin coating base is provided with an air extraction port, an adsorption port, and an adsorption channel connecting the air extraction port and the adsorption port. The air extraction component performs an air extraction operation on the adsorption channel through the air extraction port. The adsorption port is used to adsorb and fix the substrate.

7. A spin-coating apparatus for liquid-phase epitaxial layer-by-layer growth of MOF thin films according to any one of claims 1 to 4, characterized in that, The spin coating device also includes a water pumping component. The outer shell is provided with a water outlet that communicates with the spin coating chamber. The water pumping component extracts the liquid in the spin coating chamber through the water outlet.

8. A spin-coating apparatus for liquid-phase epitaxial layer-by-layer growth of MOF thin films according to claim 7, characterized in that, A boss is provided at the bottom of the spin coating cavity, and the spin coating seat is located on the boss; a guide groove is formed between the boss and the side wall of the spin coating cavity, and the guide groove is connected to the water outlet.

9. A spin-coating apparatus for liquid-phase epitaxial layer-by-layer growth of MOF thin films according to any one of claims 1 to 4, characterized in that, The outer casing includes a top cover and a housing. The housing has an opening, and the top cover is detachably installed in the opening. The top cover has a through hole for the drip tube to pass through.

10. A spin-coating apparatus for liquid-phase epitaxial layer-by-layer growth of MOF thin films according to claim 9, characterized in that, The housing also includes a sealing ring disposed on the outer periphery of the top cover to seal the gap between the top cover and the housing.

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