A microwave plasma cleaning apparatus

Abstract

The utility model discloses a microwave plasma cleaning equipment relates to microwave plasma technical field, including equipment outer frame, the plasma reaction cavity of setting in equipment outer frame, the hanger and at least two microwave radiation antenna components of setting in plasma reaction cavity, and the plasma reaction cavity is vacuum chamber, and the hanger is used for hanging the jig of the workpiece of waiting for washing. The utility model design is reasonable, and the microwave spatial coupling of microwave radiation antenna component generation is into the vacuum chamber of plasma reaction cavity, forms super large area microwave plasma, utilizes the strong activity of microwave plasma, carries out dry method cleaning reduction to the coating jig or coating workpiece, and the improvement of traditional craft promotes, and the scheme can also be used as microwave plasma coating cleaning all -in -one, usually used for coating process, when the cavity and the film layer on the jig are too thick, can realize on -line cleaning, need not to transfer the workpiece and dismantle machine.

Description

Technical Field

[0001] This utility model relates to the field of microwave plasma technology, and more specifically to the field of microwave plasma cleaning equipment technology. Background Technology

[0002] In coating production, tooling fixtures are often used. However, these fixtures themselves are also coated during the process. After several rounds of operation, the coating layer on the tooling fixtures becomes increasingly thick, affecting the coating quality of the product. Therefore, cleaning of the tooling fixtures is necessary, traditionally achieved through sandblasting and acid pickling. Existing patents disclose the following technologies:

[0003] Patent publication number CN115463889A, entitled "Cleaning Method for Coating Fixture," discloses the following: Step 1, fixing the coating fixture; Step 2, immersing the fixed coating fixture in a chemical cleaning agent for the first time; Step 3, immersing the immersed coating fixture in an ultrasonic room-temperature pure water bath for ultrasonic cleaning; Step 4, immersing the ultrasonically cleaned coating fixture in the chemical cleaning agent for the second time; Step 5, immersing the immersed coating fixture in an ultrasonic room-temperature pure water bath for the second time for ultrasonic cleaning; Step 6, baking the ultrasonically cleaned coating fixture in a clean oven. This method can reduce processing costs, allows for the reuse of chemical cleaning agents, reduces labor intensity, achieves a 100% coating fixture cleaning yield, increases the service life of the coating fixture, and eliminates some quality defects in coating caused by the cleanliness of the fixture.

[0004] Traditional sandblasting can severely damage the surface of tooling fixtures, making them difficult to reuse, and complex tooling structures cannot be cleaned by sandblasting. The acid pickling method mentioned above has a long cleaning time, a complex process, and can also cause environmental problems such as residual liquid disposal. Utility Model Content

[0005] The purpose of this invention is to solve the aforementioned technical problems by providing a microwave plasma cleaning device. This device is suitable for tooling fixtures used in coating equipment, enabling simple, fast, and low-cost cleaning, and simultaneously achieving dual functionality for coating and cleaning.

[0006] To achieve the above objectives, this utility model specifically adopts the following technical solution:

[0007] This utility model provides a microwave plasma cleaning device, including an outer frame, a plasma reaction chamber disposed within the outer frame, a rotatable hanger disposed within the plasma reaction chamber, and at least two microwave radiation antenna assemblies. The plasma reaction chamber is a vacuum chamber, and the hanger is used to hang the tooling fixtures to be cleaned.

[0008] Specifically, in this solution, the microwave space generated by the microwave radiating antenna assembly is coupled into the vacuum cavity of the plasma reaction chamber to form an ultra-large area microwave plasma. Utilizing the strong activity of the microwave plasma, dry cleaning and restoration are performed on the coating fixtures or coated workpieces, improving upon traditional processes. This solution can also be used as an integrated microwave plasma coating and cleaning machine. Normally used for coating processes, it can achieve online cleaning when the coating layer inside the cavity and on the fixtures is too thick, without the need to transfer the fixtures or disassemble the machine.

[0009] Furthermore, this solution can effectively complete the dry cleaning of epoxy and other organic coatings, metal oxide coatings, carbon-based coatings, etc., and the products are carbon dioxide and water, which are extracted from the cavity by a vacuum pump, leaving no pollution or residue.

[0010] In one embodiment, all microwave radiating antenna assemblies are divided into two groups, and the two groups of microwave radiating antenna assemblies are arranged in an alternating manner on the outer wall of the equipment frame. The projection portions of two adjacent microwave radiating antenna assemblies overlap in the horizontal direction, and multiple radiating openings corresponding one-to-one with multiple microwave radiating antenna assemblies are provided on the outer wall of the equipment frame.

[0011] Specifically, taking six microwave radiating antenna assemblies as an example, with three assemblies in each group, the six assemblies are arranged in a staggered pattern on the outer frame of the equipment to create a plasma zone. Within this zone, there is a material area for placing the material to be processed. Once rotation begins, the material area will exhibit a uniform cleaning effect. This arrangement ensures that the plasma can evenly cover and clean the entire material area, achieving a thorough cleaning effect. The microwave power of each of the six microwave radiating antenna assemblies can be selected to be 3kW.

[0012] In one embodiment, each microwave radiating antenna assembly is suspended on the outer wall of the equipment frame in a circular array, and the outer wall of the equipment frame is provided with multiple radiating openings that correspond one-to-one with the multiple microwave radiating antenna assemblies.

[0013] Specifically, at least two microwave radiator assemblies are arranged in a ring array around the outer frame of the device. Microwave energy is fed into the outer frame through the microwave radiating antenna assembly and the radiating opening, and then uniformly coupled into the plasma reaction cavity. The ring array distribution of the microwave radiator assemblies can create a uniform electric field distribution within the plasma reaction cavity, thereby generating a uniform plasma.

[0014] In one embodiment, the device frame is connected to each microwave radiating antenna assembly via flange mounting holes.

[0015] In one embodiment, the device frame includes a cylindrical sidewall and an upper cover and a lower cover respectively disposed at the upper and lower ends of the cylindrical sidewall. The plasma reaction chamber is located inside the cylindrical sidewall, and the upper and lower ends of the cylindrical sidewall are respectively sealed to the upper cover and the lower cover. The plasma reaction chamber, the upper cover and the lower cover constitute a vacuum-sealed chamber.

[0016] Specifically, the upper and lower ends of the plasma reaction chamber are in contact with the upper and lower covers, respectively. A sealing ring ensures the airtightness of the plasma chamber, creating a vacuum chamber during operation. When the upper cover is opened, a rack carrying the workpiece to be processed is placed or removed from the upper cover.

[0017] In one embodiment, the upper cover is provided with at least two air inlets, both of which are located between the cylindrical sidewall and the bracket; the lower cover is connected to the vacuum pump and the magnetorheological fluid.

[0018] In one embodiment, the cylindrical sidewalls, the upper cap, and the lower cap are all made of metal.

[0019] In one embodiment, the cross-section of the cylindrical sidewall is a regular hexagon, and a microwave radiating antenna assembly is arranged at the center of each side of the regular hexagon along the axial direction.

[0020] In one embodiment, the plasma reaction chamber is cylindrical, with a diameter of 800 mm and a height of 800 mm, and the plasma material is a wave-transparent material.

[0021] Specifically, the plasma area generated by this scheme is extremely large, consisting of a cylindrical surface with a diameter of 800 mm and a height of 800 mm.

[0022] In one embodiment, the wave-transparent material is either quartz or ceramic.

[0023] In one embodiment, each microwave radiating antenna assembly includes an integrated microwave power supply, isolator, three pins, radiator, and sliding short circuit.

[0024] Working principle: Open the top cover and send the rack full of workpieces (tooling fixtures to be cleaned) into the top. Close the top cover and start the vacuum pump. When the vacuum level reaches 30Pa, introduce process gas (preferably 5L / min O2 + 0.5L / min CF4 gas) through several evenly distributed air inlets on the top cover. After the vacuum level in the vacuum chamber stabilizes, start the motor to drive the rack to rotate at a speed not exceeding 1rad / min. Turn on the microwave power supply, and the plasma starts working. The power supply is set to 2500W. After running for 20 minutes, the epoxy organic coating on the surface of the workpiece is cleaned. Turn off the microwave, stop introducing process gas, turn off the vacuum pump, open the top cover, remove the rack, and the cleaning is complete.

[0025] The beneficial effects of this utility model are as follows:

[0026] 1. This utility model has a reasonable design. The microwave space generated by the microwave radiation antenna assembly is coupled into the vacuum cavity of the plasma reaction chamber to form an ultra-large area microwave plasma. Utilizing the strong activity of the microwave plasma, dry cleaning and restoration of the coating tooling fixture or coated workpiece is performed, which is an improvement and enhancement of the traditional process. This solution can also be used as an integrated microwave plasma coating and cleaning machine. It is normally used for coating processes. When the film layer in the cavity and on the tooling fixture is too thick, online cleaning can be achieved without the need to transfer the tooling and disassemble the machine.

[0027] 2. It can effectively perform dry cleaning of epoxy and other organic coatings, metal oxide coatings, carbon-based coatings, etc. The products are carbon dioxide and water, which are extracted from the cavity by a vacuum pump, leaving no pollution or residue.

[0028] 3. Multiple microwave radiator components are arranged in a ring array around the outer frame of the equipment. Microwave energy is fed into the outer frame of the equipment through the microwave radiating antenna components and the radiating openings, and is uniformly coupled into the plasma reaction cavity. The ring array distribution of the microwave radiator components can form a uniform electric field distribution within the plasma reaction cavity, thereby generating a uniform plasma. Attached Figure Description

[0029] Figure 1 This is a schematic diagram of the structure of this utility model;

[0030] Figure 2 This is a schematic diagram of the structure of a microwave radiating antenna assembly;

[0031] Figure 3 This is a schematic diagram of the plasma region;

[0032] Figure 4 This is a schematic diagram of another layout of the microwave radiating antenna assembly of this utility model;

[0033] Figure 5 yes Figure 4 Top view;

[0034] Reference numerals: 1-Equipment frame, 2-Plasma reaction chamber, 3-Hanging bracket, 4-Microwave radiating antenna assembly. Detailed Implementation

[0035] To make the objectives, technical solutions, and advantages of the embodiments of this utility model clearer, the technical solutions of the embodiments of this utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this utility model, and not all embodiments. The components of the embodiments of this utility model described and shown in the accompanying drawings can generally be arranged and designed in various different configurations.

[0036] Therefore, the following detailed description of the embodiments of the present invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention, but merely to illustrate selected embodiments of the invention. All other embodiments obtained by those skilled in the art based on the embodiments of the present invention without inventive effort are within the scope of protection of the present invention.

[0037] It should be noted that similar reference numerals and letters in the following figures indicate similar items; therefore, once an item is defined in one figure, it does not need to be further defined and explained in subsequent figures. Furthermore, the terms "first," "second," etc., are used only to distinguish descriptions and should not be construed as indicating or implying relative importance.

[0038] In the description of the embodiments of this utility model, it should be noted that the terms "inner", "outer", "upper", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, or the orientation or positional relationship in which the utility model product is usually placed when in use. They are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model.

[0039] Example 1

[0040] like Figures 1 to 3 As shown, this embodiment provides a microwave plasma cleaning device, including an outer frame 1, a plasma reaction chamber 2 disposed within the outer frame 1, a rotatable hanger 3 disposed within the plasma reaction chamber 2, and at least two microwave radiation antenna assemblies 4. The plasma reaction chamber 2 is a vacuum chamber, and the hanger 3 is used to hang the tooling fixtures to be cleaned.

[0041] Specifically, in this solution, the microwave space generated by the microwave radiating antenna assembly 4 is coupled into the vacuum cavity of the plasma reaction cavity 2 to form an ultra-large area microwave plasma. Utilizing the strong activity of the microwave plasma, dry cleaning and restoration are performed on the coating fixtures or coated workpieces, which is an improvement and enhancement of the traditional process. This solution can also be used as an integrated microwave plasma coating and cleaning machine. Normally used for coating processes, when the film layer inside the cavity and on the fixtures is too thick, online cleaning can be achieved without the need to transfer the fixtures or disassemble the machine.

[0042] Furthermore, this solution can effectively complete the dry cleaning of epoxy and other organic coatings, metal oxide coatings, carbon-based coatings, etc., and the products are carbon dioxide and water, which are extracted from the cavity by a vacuum pump, leaving no pollution or residue.

[0043] Example 2

[0044] This embodiment is a further optimization based on Embodiment 1, specifically:

[0045] All microwave radiating antenna components 4 are suspended in a circular array on the outer wall of the equipment frame 1. The outer wall of the equipment frame 1 has multiple radiating openings that correspond one-to-one with the multiple microwave radiating antenna components 4.

[0046] Specifically, at least two microwave radiator components are arranged in a ring array around the outer frame 1 of the device. Microwave energy is fed into the outer frame 1 through the microwave radiating antenna component 4 via the radiating opening and uniformly coupled into the plasma reaction cavity 2. The ring array distribution of the microwave radiator components can form a uniform electric field distribution within the plasma reaction cavity 2, thereby generating a uniform plasma.

[0047] Example 3

[0048] like Figure 4 and Figure 5 As shown, this embodiment is a further optimization based on embodiment 1, specifically:

[0049] All microwave radiating antenna components 4 are divided into two groups. The two groups of microwave radiating antenna components 4 are arranged in an alternating manner on the outer wall of the equipment frame 1. The projections of two adjacent microwave radiating antenna components 4 in the horizontal direction overlap. Multiple radiating openings corresponding to multiple microwave radiating antenna components 4 are provided on the outer wall of the equipment frame 1.

[0050] Specifically, taking six microwave radiating antenna assemblies 4 as an example, with three assemblies 4 in each group, the six microwave radiating antenna assemblies 4 are arranged in a staggered manner on the outer frame 1 of the equipment to create a plasma region. Within this region, there is a material area for placing the material to be processed. Once rotation begins, the material area will exhibit a uniform cleaning effect. This arrangement ensures that the plasma can evenly cover and clean the entire material area to achieve a thorough cleaning effect. The microwave power of each of the six microwave radiating antenna assemblies 4 can be selected to be 3kW.

[0051] Example 4

[0052] This embodiment is a further optimization based on embodiment 1 or 2, specifically:

[0053] The outer frame 1 of the equipment is connected to each microwave radiating antenna assembly 4 through flange mounting holes.

[0054] The outer frame 1 of the equipment includes a cylindrical sidewall and an upper cover and a lower cover respectively disposed at the upper and lower ends of the cylindrical sidewall. The plasma reaction chamber 2 is located inside the cylindrical sidewall. The upper and lower ends of the cylindrical sidewall are respectively sealed to the upper cover and the lower cover. The plasma reaction chamber 2, the upper cover and the lower cover constitute a vacuum sealed chamber.

[0055] Specifically, the upper and lower ends of the plasma reaction chamber 2 are in contact with the upper and lower covers, respectively. The airtightness of the plasma chamber is ensured by the sealing ring, forming a vacuum chamber during operation. When the upper cover is opened, the hanger 3 carrying the workpiece to be processed is taken out from the upper cover.

[0056] Example 5

[0057] This embodiment is a further optimization based on embodiment 4, specifically:

[0058] The upper cover is provided with at least two air inlets, both of which are located between the cylindrical sidewall and the bracket 3; the lower cover is connected to the vacuum pump and the magnetorheological fluid.

[0059] The cylindrical sidewalls, upper and lower caps are all made of metal.

[0060] The cross-section of the cylindrical sidewall is a regular hexagon, and a microwave radiating antenna assembly 4 is arranged at the center of each side of the regular hexagon along the axial direction.

[0061] Example 6

[0062] This embodiment is a further optimization based on embodiment 5, specifically:

[0063] The plasma reaction chamber 2 is cylindrical, with a diameter of 800 mm and a height of 800 mm. The plasma is made of a wave-transparent material.

[0064] Specifically, the plasma area generated by this scheme is extremely large, consisting of a cylindrical surface with a diameter of 800 mm and a height of 800 mm.

[0065] The wave-transparent material can be either quartz or ceramic, or other wave-transparent materials.

[0066] Example 7

[0067] This embodiment is a further optimization based on embodiment 6, specifically:

[0068] Each microwave radiating antenna assembly 4 includes an integrated microwave power supply, isolator, three pins, radiator, and sliding short circuit.

[0069] Working principle: Open the top cover and send the hanging rack 3, which is full of workpieces (tooling fixtures to be cleaned), into the top. Close the top cover and start the vacuum pump. When the vacuum degree reaches 30Pa, process gas (preferably 5L / min O2 + 0.5L / min CF4 gas) is introduced through several evenly distributed air inlets on the top cover. After the vacuum degree in the vacuum chamber stabilizes, start the motor to drive the hanging rack 3 to rotate at a speed not exceeding 1rad / min. Turn on the microwave power supply and the plasma starts working. The power supply is set to 2500W. After running for 20 minutes, the epoxy organic coating on the surface of the workpiece is cleaned. Turn off the microwave, stop the process gas supply, turn off the vacuum pump, open the top cover, remove the hanging rack 3, and the cleaning is complete.

Claims

1. A microwave plasma cleaning device, characterized in that, The device includes an outer frame (1), a plasma reaction chamber (2) disposed within the outer frame (1), a rotatable hanger (3) disposed within the plasma reaction chamber (2), and at least two microwave radiation antenna assemblies (4). The plasma reaction chamber (2) is a vacuum chamber, and the hanger (3) is used to hang the tooling fixtures for receiving cleaning. The outer frame (1) of the device includes a cylindrical sidewall and an upper cover and a lower cover respectively disposed at the upper and lower ends of the cylindrical sidewall. The plasma reaction chamber (2) is located inside the cylindrical sidewall. The upper and lower ends of the cylindrical sidewall are respectively sealed to the upper cover and the lower cover. The plasma reaction chamber (2), the upper cover and the lower cover constitute a vacuum sealed chamber. The upper cover is provided with at least two air inlets, both of which are located between the cylindrical sidewall and the bracket (3); the lower cover is connected to the vacuum pump and the magnetorheological fluid.

2. The microwave plasma cleaning equipment according to claim 1, characterized in that, All of the microwave radiating antenna components (4) are suspended in a circular array on the outer wall of the device frame (1). The outer wall of the device frame (1) is provided with multiple radiating openings that correspond one-to-one with the multiple microwave radiating antenna components (4).

3. The microwave plasma cleaning equipment according to claim 1, characterized in that, All the microwave radiating antenna components (4) are divided into two groups. The two groups of microwave radiating antenna components (4) are arranged in an alternating manner on the outer wall of the device frame (1). The projections of two adjacent microwave radiating antenna components (4) overlap in the horizontal direction. The outer wall of the device frame (1) is provided with multiple radiating openings that correspond one-to-one with the multiple microwave radiating antenna components (4).

4. The microwave plasma cleaning equipment according to claim 1, characterized in that, The cylindrical sidewall, the upper cover, and the lower cover are all made of metal.

5. The microwave plasma cleaning equipment according to claim 1, characterized in that, The cross-section of the cylindrical sidewall is a regular hexagon, and a microwave radiating antenna assembly (4) is arranged at the center of each side of the regular hexagon along the axial direction.

6. The microwave plasma cleaning equipment according to claim 1, characterized in that, The plasma reaction chamber (2) is cylindrical, with a diameter of 800 mm and a height of 800 mm. The plasma is made of a wave-transparent material.

7. The microwave plasma cleaning equipment according to claim 6, characterized in that, The wave-transparent material is either quartz or ceramic.

8. The microwave plasma cleaning equipment according to claim 7, characterized in that, Each of the microwave radiating antenna assemblies (4) includes an integrated microwave power supply, isolator, three pins, radiator and sliding short circuit.

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