A single crystal furnace hot shield silicon cleaning device

Abstract

The application relates to the technical field of single crystal silicon production equipment, and provides a single crystal furnace heat shield silicon cleaning device, which comprises a releasable connecting mechanism arranged between a heat shield lifting assembly and a heat shield and used for controlling the connection and separation of the heat shield lifting assembly and the heat shield; a vibrating mechanism arranged on a single crystal furnace and comprising a vibrating part and a driving part, wherein the driving part drives the vibrating part to vibrate the heat shield under the condition that the heat shield lifting assembly is separated from the heat shield, and the vibrating direction is consistent with the lifting direction of the heat shield; and an elastic supporting piece connected between the heat shield and a fixed structure of the single crystal furnace and used for resetting the heat shield by means of elastic action after the heat shield is vibrated, wherein the elastic action direction of the elastic supporting piece is consistent with the lifting direction of the heat shield and opposite to the vibrating direction of the vibrating part. The single crystal furnace heat shield silicon cleaning device can automatically remove the silicon points on the heat shield through the synergistic effect of the releasable connection and the vibration impact, avoids the connection loosening problem caused by traditional knocking, ensures the service life of the equipment, and significantly improves the production safety and efficiency.

Description

Technical Field

[0001] This application relates to the field of monocrystalline silicon production equipment technology, and in particular to a monocrystalline furnace heat shield silicon cleaning device. Background Technology

[0002] During monocrystalline silicon production, silicon splatter easily adheres to the surface of the heat shield inside the single crystal furnace, affecting thermal stability and increasing the risk of ingot breakage. Currently, the industry commonly uses manual tapping of the heat shield after shutdown for cleaning, but this method has significant drawbacks:

[0003] 1. Direct mechanical impact can easily cause the connection between the heat shield and the lifting assembly to loosen, affecting the service life of the equipment;

[0004] 2. Manual operation in high-temperature environments poses safety hazards;

[0005] 3. Frequent start-ups and shutdowns of the furnace reduce production efficiency.

[0006] Therefore, how to quickly remove silicon spots without damaging the equipment has become a pressing problem for the industry. Utility Model Content

[0007] Based on this, the present invention provides a silicon cleaning device for a single crystal furnace hot screen to solve the technical problem that cleaning silicon points by directly hitting the hot screen can easily lead to loosening of the connection between the hot screen and the lifting component, affecting the service life and posing safety hazards.

[0008] This utility model provides a single crystal furnace heat shield silicon cleaning device, comprising:

[0009] A releasable connection mechanism is provided between the hot screen lifting assembly and the hot screen, and is used to control the connection and separation of the hot screen lifting assembly and the hot screen;

[0010] A rapping mechanism is installed on a single crystal furnace and includes a rapping component and a driving component. When the hot screen lifting assembly is separated from the hot screen, the rapping component drives the rapping component to rappel the hot screen. The rapping direction of the rapping component is consistent with the lifting direction of the hot screen.

[0011] An elastic support is connected between the hot screen and the single crystal furnace fixing structure to reset the hot screen using elasticity after the hot screen is vibrated. The elastic direction of the elastic support is consistent with the lifting direction of the hot screen and opposite to the vibration direction of the vibrating component.

[0012] In one embodiment, the releasable connection mechanism includes an active connector and a passive connector that are detachably coupled to each other;

[0013] One of the active connector and the passive connector is disposed on the hot screen lifting assembly, and the other is disposed on the hot screen.

[0014] In one embodiment, the active connector is an electromagnet and the passive connector is a magnet;

[0015] When the active connector and the passive connector are at the same horizontal level, they are in contact with each other.

[0016] In one embodiment, the heat shield includes an inlet pipe and an outlet pipe, both of which include vertical pipe sections extending upwards outwards from the outside of the single crystal furnace.

[0017] The elastic support includes a spring sleeved on a vertical section of the inlet pipe and / or the outlet pipe;

[0018] The lower end of the spring abuts against the fixed structure of the single crystal furnace, and a limiting member is provided on the vertical pipe section opposite to the upper end of the spring.

[0019] In one embodiment, a corrugated pipe is also fitted onto the vertical pipe section, and the upper end of the corrugated pipe is fixedly connected to the vertical pipe section via an upper flange.

[0020] The spring is located inside the bellows, and the upper flange constitutes the limiting member.

[0021] In one embodiment, the hot screen lifting assembly is used to drive the hot screen to rise and fall between a low position and a high position;

[0022] When the hot screen lifting assembly is separated from the hot screen, the elastic support member supports the hot screen at the lower position.

[0023] In one embodiment, the rapping component is located directly above the vertical section of the inlet pipe and / or the outlet pipe;

[0024] The driving component drives the vibrating component to vibrate the hot screen located at the low position vertically downwards, and the elastic support member resets the vibrated hot screen to the low position.

[0025] In one embodiment, the upper ends of the vertical sections of the inlet pipe and / or the outlet pipe are connected to horizontal sections via pipe joints, and the vibrating component is located directly above the pipe joint and higher than the pipe joint when the heat shield is in the high position.

[0026] In one embodiment, the driving component is a cylinder, the cylinder is fixed to the single crystal furnace, and the piston rod of the cylinder is arranged vertically downwards;

[0027] The piston rod is coaxial with the vertical pipe section, and the vibrating component is fixed to the lower end of the piston rod.

[0028] In one embodiment, a flexible cushioning pad is provided on the bottom of the rapping component and / or on the pipe joint.

[0029] Compared with the prior art, this utility model has at least the following beneficial effects:

[0030] This single-crystal furnace hot-screen silicon removal device utilizes a releasable connection mechanism to achieve controllable connection and separation of the hot-screen and its lifting assembly, replacing the traditional fixed connection method. During silicon spot removal, the hot-screen and lifting assembly can be detached. A rapping mechanism periodically vibrates the hot-screen, and elastic supports periodically push it back to its original position. This causes the hot-screen to vibrate periodically, causing the silicon spots on it to detach due to inertia, thus achieving silicon spot removal. This solution, through the synergistic effect of the releasable connection and vibration impact, automatically removes silicon spots from the hot-screen, avoiding the loosening problems caused by traditional hammering, ensuring equipment lifespan, and significantly improving production safety and efficiency. Attached Figure Description

[0031] Figure 1 This is a schematic diagram of the silicon cleaning device for a single crystal furnace heat shield in one embodiment;

[0032] Figure 2 This is a schematic diagram of the structure when the hot screen lifting component drives the hot screen to a high position in one embodiment;

[0033] Figure 3 This is a schematic diagram of the structure when the hot screen lifting component drives the hot screen to a low position in one embodiment;

[0034] Figure 4 and Figure 5 This is a schematic diagram of the rapping mechanism rapping downwards onto the hot screen in one embodiment;

[0035] Figure 6 This is a schematic diagram of an elastic support member pushing the hot screen to rise and reset in one embodiment.

[0036] The reference numerals in the accompanying drawings include:

[0037] 10 - Single crystal furnace; 11 - Furnace lid;

[0038] 20-Heat shield, 21-Heat shield body, 22-Inlet pipe, 23-Outlet pipe, 24-Vertical pipe section, 25-Horizontal pipe section, 26-Pipe connector;

[0039] 30-Heatscreen lifting assembly;

[0040] 100-Single crystal furnace heat shield silicon cleaning device, 110-Releasable connection mechanism, 111-Active connector, 112-Passive connector, 120-Elastic support, 130-Rap mechanism, 131-Rap component, 132-Drive component, 140-Limiting component, 150-Bellpipe, 151-Upper flange, 152-Lower flange, 160-Buffer pad, 170-Fixed bracket. Detailed Implementation

[0041] To make the objectives, technical solutions, and advantages of this application clearer, the following detailed description is provided in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative and not intended to limit the scope of this application.

[0042] It should be noted that the illustrations provided in this embodiment are only schematic representations of the basic concept of this utility model.

[0043] The structures, proportions, sizes, etc., shown in the accompanying drawings of this specification are only for the purpose of assisting those skilled in the art in understanding and reading the content disclosed in the specification, and are not intended to limit the conditions under which this utility model can be implemented. Any modifications to the structure, changes in the proportions, or adjustments to the size, without affecting the effects and purposes that this utility model can produce, should still fall within the scope of the technical content disclosed in this utility model.

[0044] The orientations or positional relationships indicated by terms such as "upper," "lower," "left," "right," "middle," "longitudinal," "transverse," "horizontal," "inner," "outer," "radial," and "circumferential" used in this specification are based on the orientations or positional relationships shown in the accompanying drawings and are only for the purpose of simplifying the description. They do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as limiting the present invention. Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance.

[0045] As described in the background section, in the prior art, silicon spots on the hot shield are usually cleaned by manually tapping the hot shield after the single crystal furnace is shut down. However, this method has the following problems:

[0046] 1. Direct mechanical impact can easily cause the connection between the heat shield and the lifting assembly to loosen, affecting the service life of the equipment;

[0047] 2. Manual operation in high-temperature environments poses safety hazards;

[0048] 3. Frequent start-ups and shutdowns of the furnace reduce production efficiency.

[0049] For this, see Figure 2This utility model embodiment provides a single crystal furnace heat shield silicon cleaning device, which includes:

[0050] A releasable connection mechanism 110 is located between the hot screen lifting assembly 30 and the hot screen 20, and is used to control the connection and separation of the hot screen lifting assembly 30 and the hot screen 20.

[0051] The rapping mechanism 130 is disposed on the single crystal furnace 10 and includes a rapping component 131 and a driving component 132. When the hot screen lifting assembly 30 is separated from the hot screen 20, the driving component 132 drives the rapping component 131 to rappel the hot screen 20. The movement direction of the rapping component 131 is consistent with the lifting direction of the hot screen 20.

[0052] The elastic support 120, connected between the heat shield 20 and the fixing structure of the single crystal furnace 10, uses its elasticity to reset the heat shield 20 after it is vibrated. The elastic direction of the elastic support 120 is consistent with the lifting direction of the heat shield 20 and opposite to the vibration direction of the vibrating component 131. The fixing structure of the single crystal furnace 10 can be the furnace cover 11 or the lower flange 152 as described below.

[0053] According to the single crystal furnace hot screen silicon cleaning device 100 provided in this embodiment of the present invention, the controllable connection and separation of the hot screen 20 and the hot screen lifting assembly 30 can be realized through the releasable connection mechanism 110, replacing the traditional fixed connection method, and can match the corresponding operations performed on the hot screen 20 under different working conditions. For example, in the connected state, it can provide rigid fixation to ensure the normal lifting operation of the hot screen 20 and stabilize the crystal pulling environment inside the single crystal furnace 10; in the separated state, it can release the mechanical constraints, allowing the hot screen 20 to vibrate freely under the action of external force to perform silicon cleaning operation, avoiding the loosening problem caused by vibration at the connection between the hot screen 20 and the hot screen lifting assembly 30.

[0054] The external force of vibration on the hot screen 20 is mainly provided by the rapping mechanism 130 and the elastic support 120. Specifically, when the driving component 132 drives the rapping component 131 to move closer to the hot screen 20, it can push the hot screen 20 downward and charge the elastic support 120; when the driving component 132 drives the rapping component 131 to move away from the hot screen 20, it can detach from the hot screen 20, causing the elastic support 120 to release its potential energy and push the hot screen 20 to reset upward. Based on this, when the rapping mechanism 130 periodically rapps the hot screen 20, it can cause the hot screen 20 to vibrate periodically, causing the silicon dots on the hot screen 20 to fall off under the action of inertia, thus cleaning the silicon dots on the hot screen 20.

[0055] This invention, through the synergistic effect of releasable connection and vibration impact, can automatically remove silicon spots from the heat shield 20, avoiding the connection loosening problem caused by traditional knocking, ensuring the service life of the equipment, and significantly improving production safety and efficiency.

[0056] The single crystal furnace heat shield silicon removal device 100 provided in the present invention will be described in detail below with reference to the accompanying drawings.

[0057] Since the single crystal furnace heat shield silicon cleaning device 100 needs to be used in conjunction with the single crystal furnace 10 and the heat shield 20, before describing the single crystal furnace heat shield silicon cleaning device 100, the structural parts of the single crystal furnace 10 and the heat shield 20 related to this device will be briefly described here.

[0058] like Figure 1 As shown, the heat shield 20 includes a heat shield body 21 and a water inlet pipe 22 and a water outlet pipe 23 connected to the heat shield body 21. The heat shield body 21 is located inside the single crystal furnace 10. (See attached image.) Figure 2 Both the inlet pipe 22 and the outlet pipe 23 include a vertical pipe section 24 extending upward above the furnace cover 11 of the single crystal furnace 10. The upper end of the vertical pipe section 24 is connected to a horizontal pipe section 25 at an angle to the vertical pipe section 24 via a pipe joint 26. The horizontal pipe section 25 is usually horizontal, that is, it has a 90-degree angle with the vertical pipe section 24.

[0059] like Figure 1 As shown, the furnace cover 11 of the single crystal furnace 10 is also equipped with a heat screen lifting assembly 30 for controlling the height of the heat screen 20. There are typically two sets of heat screen lifting assemblies 30, connected to the water inlet pipe 22 and the water outlet pipe 23 respectively. The lifting of the heat screen body 21 is driven by synchronously raising and lowering the water inlet pipe 22 and the water outlet pipe 23. The heat screen lifting assembly 30 specifically employs existing screw lifting mechanisms, hydraulic lifting mechanisms, etc.

[0060] according to Figure 2 An exemplary embodiment of at least one embodiment of the present invention is shown of a single crystal furnace heat shield silicon cleaning device 100, which includes: a releasable connection mechanism 110, an elastic support member 120, and a rapping mechanism 130.

[0061] The releasable connection mechanism 110 is disposed between the hot screen 20 and the hot screen lifting assembly 30. It is used to control the connection and separation of the hot screen lifting assembly 30 and the hot screen 20. That is to say, the releasable connection mechanism 110 can realize the controllable connection and separation between the hot screen 20 and the hot screen lifting assembly 30, replacing the traditional fixed connection method. It can not only meet the rigid fixation between the hot screen 20 and the hot screen lifting assembly 30 under normal conditions and ensure the normal lifting operation of the hot screen 20, but also release the mechanical constraint between the two when cleaning the silicon points of the hot screen 20, so that the hot screen 20 can be separated from the hot screen lifting assembly 30. This prevents the connection between the hot screen 20 and the hot screen lifting assembly 30 from loosening when the hot screen 20 vibrates to clean the silicon points, thus ensuring the service life of the equipment.

[0062] For details, see Figure 2 In this embodiment, the releasable connection mechanism 110 includes an active connector 111 and a passive connector 112 that are detachably coupled to each other. One of the active connector 111 and the passive connector 112 is disposed on the hot screen lifting assembly 30, and the other is disposed on the hot screen 20. For example, the active connector 111 is disposed on the water inlet pipe 22 of the hot screen 20, and the passive connector 112 is disposed on the hot screen lifting assembly 30. This configuration, by decomposing the releasable connection mechanism 110 into detachable active connector 111 and passive connector 112, and placing them on the hot screen 20 and the hot screen lifting assembly 30 respectively (e.g., active connector 111 on the hot screen 20 and passive connector 112 on the hot screen lifting assembly 30), allows the connection state of the hot screen 20 and the hot screen lifting assembly 30 to be switched by controlling the active connector 111. For example, during the crystal pulling stage, controlling the coupling of the active connector 111 and the passive connector 112 can achieve rigid fixation between the hot screen 20 and the hot screen lifting assembly 30. During the silicon clearing stage, controlling the decoupling of the active connector 111 and the passive connector 112 can achieve the separation of the hot screen 20 and the hot screen lifting assembly 30, thus meeting the different connection requirements of the hot screen 20 and the hot screen lifting assembly 30 under different working conditions.

[0063] Additionally, it should be noted that the passive connector 112 should be mounted on the lifting and lowering movable part of the hot screen lifting assembly 30, meaning that the hot screen lifting assembly 30 can drive the passive connector 112 to move up and down. For example, corresponding to an existing hydraulic lifting mechanism, the passive connector 112 should be mounted on the piston rod of the hydraulic lifting mechanism.

[0064] Furthermore, in this embodiment, the detachable engagement of the active connector 111 and the passive connector 112 is preferably a quick-release engagement, such as a plug-in engagement (e.g., a pin structure) or a magnetic engagement (e.g., a magnetic connection structure), which can realize quick connection and quick disassembly between the active connector 111 and the passive connector 112, and facilitates the rapid switching of the connection state between the hot screen 20 and the hot screen lifting assembly 30.

[0065] Furthermore, the detachable engagement between the active connector 111 and the passive connector 112 is controlled automatically. For example, corresponding to the above-described plug-in engagement embodiment, the active connector 111 can be a plug-in rod disposed on the hot screen 20. The plug-in rod is controlled to extend and retract via an electric telescopic mechanism (such as an electric push rod). The passive connector 112 can be a fixing seat disposed on the hot screen lifting assembly 30, and the fixing seat has a mating hole for the plug-in rod to be inserted. Based on this example, when it is necessary to detach the hot screen 20 from the hot screen lifting assembly 30, the plug-in rod is retracted by the electric telescopic mechanism, causing the plug-in rod to disengage from the mating hole. When it is necessary to connect and fix the hot screen 20 to the hot screen lifting assembly 30, the plug-in rod can be extended by the electric telescopic mechanism, causing the plug-in rod to be inserted into the mating hole.

[0066] In this embodiment, preferably, the active connector 111 is an electromagnet installed on the inlet and outlet pipes of the heat shield 20, which has the characteristic of generating magnetism when energized and losing its electromagnetic properties when de-energized. The passive connector 112 is a magnet, such as a permanent magnet, installed on the heat shield lifting assembly 30. Based on this, in use, when the active connector 111 is energized, it magnetically attracts the passive connector 112, fixing the heat shield 20 and the heat shield lifting assembly 30 together. When the active connector 111 is de-energized, it releases the magnetic attraction, allowing the heat shield 20 to detach from the heat shield lifting assembly 30. Compared to mechanical connections, this electromagnetic connection mechanism can achieve attraction and de-attraction simply by turning on and off the power, eliminating the need for complex mechanical structures. The structure is simpler, the operation is more convenient, and the response speed is fast and the connection is reliable.

[0067] Furthermore, in this embodiment, to ensure that the active connector 111 and the passive connector 112 can cooperate, their positions should correspond. For example, corresponding to the above-described embodiment where the active connector 111 is an electromagnet and the passive connector 112 is an iron block, then, as Figure 2 As shown, the electromagnet can be set on the inlet and outlet water pipes of the heat shield 20, and the iron block can be set on the side of the heat shield lifting assembly 30 facing the water pipe. When the electromagnet and the iron block are at the same horizontal height, they are in contact with each other, so that the electromagnet can magnetically attract the iron block after being energized.

[0068] like Figure 2As shown, in this embodiment, the elastic support 120 is connected between the hot screen 20 and the fixed structure of the single crystal furnace 10 to reset the hot screen 20 after it is vibrated. The elastic direction of the elastic support 120 is consistent with the lifting direction of the hot screen 20 and opposite to the vibrating direction of the vibrating component 131. Thus, by adding the elastic support 120 between the hot screen 20 and the fixed structure of the single crystal furnace 10, the elastic support 120 can support the hot screen 20 after the active connector 111 and the passive connector 112 are disengaged. This ensures that the initial position of the hot screen 20 is above the lower limit, allowing it room to descend and providing a basis for the vibrating mechanism 130 to vibrate the hot screen 20 downwards. The lower limit refers to the position of the hot screen 20 when it is supported on the fixed structure of the single crystal furnace 10, at which point the hot screen 20 cannot descend further due to the limitation imposed by the fixed structure of the single crystal furnace 10. In addition, the elastic support 120 can also provide a buffer for the rapping mechanism 130, preventing the hot screen 20 from making hard contact with the single crystal furnace 10. At the same time, the elastic support 120 can be elastically charged when the rapping mechanism 130 pushes the hot screen 20 downward, so that after the rapping mechanism 130 disengages from the hot screen 20, the elastic support 120 can push the hot screen 20 upward to reset, realizing the periodic vibration of the hot screen 20 and enhancing the silicon dot cleaning effect. The fixing structure of the single crystal furnace 10 can be the furnace cover 11 of the single crystal furnace 10 or a fixing component fixed to the furnace cover 11.

[0069] For example, see Figure 2 The elastic support 120 includes a spring sleeved on the vertical pipe section 24 of the inlet pipe 22 and / or outlet pipe 23. To ensure the vibration stability of the heat shield 20, it is preferable that elastic support 120 (i.e., springs) are provided on both the inlet pipe 22 and the outlet pipe 23. Furthermore, in conjunction with... Figure 2 As shown, the lower end of each spring abuts against the furnace cover 11 of the single crystal furnace 10. Simultaneously, a limiting member 140 is provided on the upper part of the vertical pipe section 24, opposite to the upper end of the spring. Based on this structural design, when the hot screen 20 is pushed downwards by the rapping mechanism 130, the limiting member 140 on the water inlet pipe 22 and water outlet pipe 23 can compress the spring downwards, energizing it. When the rapping mechanism 130 disengages from the hot screen 20, the spring releases its potential energy and elastically recovers, thereby generating an upward elastic force on the limiting member 140. This causes the limiting member 140 to drive the water inlet pipe 22 and water outlet pipe 23 upwards, achieving the upward reset of the hot screen 20. Thus, the hot screen 20 can achieve periodic movement in the vertical direction. Meanwhile, since the spring is sleeved on the inlet pipe 22 and the outlet pipe 23, the spring and the inlet and outlet pipes are coaxially arranged, which makes the elastic deformation direction of the spring consistent with the lifting direction of the heat screen 20, ensuring that the elastic reaction force is strictly applied along the lifting direction of the heat screen 20, eliminating the sway caused by the lateral component force, and improving the vibration stability of the heat screen 20.

[0070] Furthermore, the hot screen lifting assembly 30 is used to drive the hot screen 20 to rise and fall between a low position and a high position. The high position refers to the highest position that the hot screen lifting assembly 30 can reach during the crystal pulling process. Figure 2 The position shown; "low position" refers to the lowest position that the hot screen 20 can reach during the crystal pulling process, driven by the hot screen lifting component 30. Figure 3 The position shown is such that the hot plate 20 moves between this low and high position, which meets the requirement of stabilizing the crystal pulling temperature through the hot plate 20, thus ensuring the crystal pulling effect. The low position is located above the aforementioned lower limit position.

[0071] Accordingly, see Figure 3 In this embodiment, the hot screen 20 is elastically supported on the single crystal furnace 10 by the elastic support member 120 in a free state, specifically at the low position. The free state refers to the state where the active connector 111 and the passive connector 112 are detached, and the hot screen 20 is only supported by the elastic support member 120. This configuration ensures that the low position of the hot screen 20 is the same as its position when supported only by the elastic support member 120. Therefore, when it is necessary to rigidly fix the hot screen 20 and the hot screen lifting assembly 30, it is only necessary to control the passive connector 112 to move to the low position via the hot screen lifting assembly 30 to achieve alignment between the passive connector 112 and the active connector 111. This fixes the coupling position of the passive connector 112 and the active connector 111 at the designated position (low position), simplifying control.

[0072] Further, see Figure 2 Corrugated pipes 150 are installed on the vertical pipe sections 24 of both the inlet pipe 22 and the outlet pipe 23. The corrugated pipes 150 provide protection for the vertical pipe sections 24 of both the inlet pipe 22 and the outlet pipe 23. Figure 2 As shown, the upper end of the bellows 150 is fixedly connected to the upper part of the vertical pipe section 24 via the upper flange 151, and the lower end of the bellows 150 is fixedly connected to the furnace cover 11 of the single crystal furnace 10 via the lower flange 152. Meanwhile, the spring sleeved on the vertical pipe section 24 is located inside the bellows 150. In this way, not only can the spring be concealed through the bellows 150, providing a certain degree of protection for the spring, but the upper flange 151 at the upper end of the bellows 150 can also directly serve as the limiting member 140 for compressing the spring, achieving a dual-function integration of the upper flange 151, which is beneficial to the simplification of the overall structure.

[0073] In this embodiment, the rapping mechanism 130 is disposed on the single crystal furnace 10 and is used to periodically rappel downwards on the hot screen 20, causing the hot screen 20 to vibrate periodically, thereby causing the silicon dots on the hot screen 20 to fall off under inertia, thus cleaning the silicon dots on the hot screen 20. For example, the rapping mechanism 130 can rappel the water inlet pipe 22 and / or water outlet pipe 23 of the hot screen 20, which in turn drives the hot screen body 21 to vibrate, thereby cleaning the silicon dots on the hot screen body 21.

[0074] See Figure 1 To ensure the overall vibration stability of the heat shield 20, this embodiment preferably has two sets of vibration mechanisms 130, corresponding to the water inlet pipe 22 and the water outlet pipe 23 respectively, so as to achieve synchronous vibration of the water inlet pipe 22 and the water outlet pipe 23. The vibration mechanism 130 corresponding to the water inlet pipe 22 will be used as an example for explanation below with reference to the accompanying drawings.

[0075] like Figure 2 As shown, the rapping mechanism 130 specifically includes a rapping component 131 and a driving component 132. The rapping component 131 is located directly above the vertical pipe section 24 of the inlet pipe 22 and / or the outlet pipe 23. More specifically, the rapping component 131 is located directly above the connection point (pipe joint 26) between the vertical pipe section 24 and the horizontal pipe section 25 of the inlet pipe 22, and is higher than the pipe joint 26 when the heat shield 20 is in a high position. Since the pipe joint 26 corresponds exactly to the upper end of the vertical pipe section 24, and the strength of the pipe joint 26 is generally greater than the strength of the pipe section, using the pipe joint 26 as the rapping point ensures the rapping resistance of the rapping part of the inlet pipe 22 and reduces the risk of damage. The driving component 132 drives the vibrating component 131 to vibrate the hot screen 20. For example, the driving component 132 drives the vibrating component 131 to move vertically, so that the vibrating component 131 can vibrate vertically downwards towards the water inlet pipe 22 or vertically upwards away from the water inlet pipe 22. Based on this, when the driving component 132 drives the vibrating component 131 to move downwards, since the water inlet pipe 22 is just within the effective range of the vibrating component 131, the vibrating component 131 can vibrate the water inlet pipe 22 when it moves downwards, causing the hot screen body 21 to vibrate momentarily, which is beneficial for shaking off the silicon dots. Figure 4 As shown; subsequently, the vibrating component 131 continues to move downwards, which can push the entire hot screen 20 downwards. During this process, the spring is compressed and charged, as shown... Figure 5 As shown; then, the driving component 132 drives the vibrating component 131 to move upward. The vibrating component 131 quickly disengages from the water inlet pipe 22. After the spring loses the squeezing force applied by the vibrating component 131, it elastically recovers, thereby driving the heat screen 20 to return to its original position upward, as shown. Figure 6As shown; then, the driving component 132 drives the vibrating component 131 to repeat the above operation; by repeating this many times, the periodic vibration of the hot screen 20 can be achieved, thereby shaking off the silicon dots on the hot screen 20.

[0076] More specifically, in this embodiment, the driving component 132 driving the vibrating component 131 to vibrate the hot screen 20 means vibrating the hot screen 20 vertically downward when it is in a low position, that is, vibrating the hot screen 20 in a relatively static state, ensuring that the hot screen 20 can receive an instantaneous vibrating force, strengthening the inertial effect, and improving the silicon removal effect. The elastic support component 120 driving the hot screen 20 to reset upward means resetting the vibrated hot screen 20 upward to a low position.

[0077] Specifically, in this embodiment, the rapping component 131 can be a rapping block, which is made of a hard material, such as iron or steel, to ensure high strength and the ability to withstand repeated rapping. Meanwhile, to avoid structural damage to the inlet and outlet water pipes caused by long-term rigid impact from the rapping block, see [reference needed]. Figure 2 In this preferred embodiment, a flexible buffer pad 160 is provided at the bottom of the vibrating block or on the pipe joint 26 of the inlet and outlet water pipes. The buffer pad 160 buffers the rigid impact of the vibrating block and protects the inlet and outlet water pipes. Specifically, the buffer pad 160 can be a rubber pad, silicone pad, etc.

[0078] In this embodiment, the drive component 132 can be a linear drive mechanism, such as an electric actuator, a cylinder, or a hydraulic cylinder. The following description uses a cylinder as an example to illustrate the arrangement of the drive component 132.

[0079] See Figure 2 A fixed bracket 170 is provided on the furnace cover 11 of the single crystal furnace 10. The cylinder body is fixedly installed on the fixed bracket 170 by means of screws or other methods. The cylinder is arranged with the piston rod pointing vertically downwards, and the piston rod is located directly above the pipe joint 26 of the inlet and outlet water pipes. The piston rod is coaxial with the vertical pipe section 24, and the rapping component 131 is fixedly installed at the end of the piston rod. Thus, when the cylinder drives the piston rod to extend downwards, it can drive the rapping component 131 to move downwards, thereby rapping the inlet water pipe 22; when the cylinder drives the piston rod to retract upwards, it can drive the rapping component 131 to move upwards, thereby detaching the rapping component 131 from the inlet water pipe 22.

[0080] The operating principle of the single crystal furnace heat shield silicon cleaning device 100 provided in the above embodiments is as follows:

[0081] First, the hot screen 20 is moved to a lower position by the hot screen lifting assembly 30. Figure 2 high-level movement to Figure 3The low-position state. Then, the active connector 111 is de-energized, so that the active connector 111 and the passive connector 112 are decoupled, that is, the hot screen 20 and the hot screen lifting assembly 30 are disconnected.

[0082] Then the drive unit 132 is activated, which drives the vibrating unit 131 to periodically descend and rise, wherein:

[0083] During the descent of the rapping component 131, when it comes into contact with the inlet (outlet) water pipe, it generates an instantaneous impact force on the pipe, causing some silicon dots on the heat shield body 21 to be shaken off due to inertia. Figure 4 As shown. Subsequently, the vibrating component 131 pushes the inlet (outlet) water pipe to continue descending, causing the heat shield body 21 to move downwards and compressing the spring to charge it, as shown. Figure 5 As shown;

[0084] During the upward movement of the vibrating component 131, the vibrating component 131 quickly detaches from the hot screen 20, and the spring releases potential energy, causing the hot screen 20 to rise and reset. Figure 6 As shown. During this period, the elastic force of the spring causes the thermal screen 20 to vibrate, which can also shake off some of the silicon dots on the thermal screen body 21.

[0085] Once the silicon dots on the hot screen body 21 are observed to be basically cleaned, the control drive component 132 is reset and then turned off. After the hot screen 20 loses the vibration of the vibration component 131, it will gradually return to the low position under the action of the spring, so that the active connector 111 and the passive connector 112 are just aligned. Then, the active connector 111 is energized, so that the active connector 111 and the passive connector 112 are magnetically attracted, that is, the hot screen 20 and the hot screen lifting assembly 30 are rigidly fixed, so that the hot screen lifting assembly 30 can drive the hot screen 20 to rise and fall, and perform the subsequent crystal pulling operation.

[0086] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0087] The above embodiments merely illustrate several implementation methods of this application, and their descriptions are relatively specific and detailed. However, they should not be construed as limiting the scope of the utility model patent. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this application, and these all fall within the protection scope of this application. Therefore, the protection scope of this patent application should be determined by the appended claims.

Claims

1. A silicon cleaning device for a single crystal furnace heat shield, characterized in that, include: A releasable connection mechanism (110) is provided between the hot screen lifting assembly (30) and the hot screen (20) for controlling the connection and separation of the hot screen lifting assembly (30) and the hot screen (20); A rapping mechanism (130) is disposed on a single crystal furnace (10) and includes a rapping component (131) and a driving component (132). The driving component (132) drives the rapping component (131) to rappel the hot screen (20) when the hot screen lifting assembly (30) is separated from the hot screen (20). The rapping direction of the rapping component (131) is consistent with the lifting direction of the hot screen (20). An elastic support (120) is connected between the hot screen (20) and the fixed structure of the single crystal furnace (10) to reset the hot screen (20) by means of elasticity after the hot screen (20) is vibrated. The elastic direction of the elastic support (120) is consistent with the lifting direction of the hot screen (20) and opposite to the vibrating direction of the vibrating component (131).

2. The single crystal furnace heat shield silicon cleaning device according to claim 1, characterized in that: The releasable connection mechanism (110) includes an active connector (111) and a passive connector (112) that are detachably coupled to each other; One of the active connector (111) and the passive connector (112) is disposed on the hot screen lifting assembly (30), and the other is disposed on the hot screen (20).

3. The single crystal furnace heat shield silicon cleaning device according to claim 2, characterized in that: The active connector (111) is an electromagnet, and the passive connector (112) is a magnet; When the active connector (111) and the passive connector (112) are at the same horizontal level, they are in contact with each other.

4. The single crystal furnace heat shield silicon cleaning device according to claim 3, characterized in that: The heat shield (20) includes an inlet pipe (22) and an outlet pipe (23), both of which include a vertical pipe section (24) extending upwards outwards from the outside of the single crystal furnace (10). The elastic support (120) includes a spring sleeved on the vertical pipe section (24) of the inlet pipe (22) and / or the outlet pipe (23); The lower end of the spring abuts against the fixed structure of the single crystal furnace (10), and a limiting member (140) opposite to the upper end of the spring is provided on the vertical pipe section (24).

5. The single crystal furnace heat shield silicon cleaning device according to claim 4, characterized in that: A corrugated pipe (150) is also fitted on the vertical pipe section (24), and the upper end of the corrugated pipe (150) is fixedly connected to the vertical pipe section (24) through an upper flange (151); The spring is located inside the bellows (150), and the upper flange (151) constitutes the limiting member (140).

6. The single crystal furnace heat shield silicon cleaning device according to claim 4, characterized in that: The hot screen lifting assembly (30) is used to drive the hot screen (20) to rise and fall between a low position and a high position; When the hot screen lifting assembly (30) is separated from the hot screen (20), the elastic support (120) supports the hot screen (20) at the lower position.

7. The silicon cleaning device for a single crystal furnace heat shield according to claim 6, characterized in that: The vibrating component (131) is located directly above the vertical pipe section (24) of the inlet pipe (22) and / or the outlet pipe (23); The driving component (132) drives the vibrating component (131) to vibrate the hot screen (20) located at the low position vertically downward, and the elastic support (120) resets the vibrated hot screen (20) to the low position.

8. The silicon cleaning device for a single crystal furnace heat shield according to claim 7, characterized in that: The upper ends of the vertical pipe sections (24) of the water inlet pipe (22) and / or the water outlet pipe (23) are connected to horizontal pipe sections (25) through pipe joints (26). The vibrating component (131) is located directly above the pipe joint (26) and higher than the pipe joint (26) when the heat shield (20) is in the high position.

9. The silicon cleaning device for a single crystal furnace heat shield according to claim 8, characterized in that: The driving component (132) is a cylinder, which is fixed to the single crystal furnace (10), and the piston rod of the cylinder is arranged vertically downward. The piston rod is coaxial with the vertical pipe section (24), and the vibrating component (131) is fixed to the lower end of the piston rod.

10. The silicon cleaning device for a single crystal furnace heat shield according to claim 8, characterized in that: A flexible cushioning pad (160) is provided on the bottom of the vibrating component (131) and / or on the pipe joint (26).

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