A feeding device and a crystal pulling furnace

By using a feeding device composed of a quartz cone and a quartz tube, staged feeding is achieved, which solves the problem of thermal field contamination and safety hazards caused by material splashing in monocrystalline silicon crystal pulling production, improves production safety and reduces operational risks.

CN224494409UActive Publication Date: 2026-07-14XIAN ESWIN MATERIAL TECHNOLOGY CO LTD +1

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
XIAN ESWIN MATERIAL TECHNOLOGY CO LTD
Filing Date
2025-08-26
Publication Date
2026-07-14

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Abstract

The utility model provides a kind of feeding device and crystal pulling furnace, belong to the field of semiconductor manufacturing technology.The feeding device includes: quartz cone (1), including: base (101) and stem (102), stem (102) is fixed in base (101), base (101) includes first table body (1021) and second table body (1022), first table body (1021) is fixed on second table body (1022), and at least part side surface of first table body (1021) and at least part side surface of second table body (1022) are ramped;Quartz tube (2), including: inner layer tube wall (201) and outer layer tube wall (202), form cavity (203);Stem (102) passes through inner layer tube wall (201);In one end of quartz tube (2), outer layer tube wall (202) exceeds inner layer tube wall (201).The utility model can effectively slow down the occurrence of splashing material phenomenon, improve production safety.
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Description

Technical Field

[0001] This utility model relates to the field of semiconductor manufacturing technology, and in particular to a feeding device and a crystal pulling furnace. Background Technology

[0002] In the process of producing monocrystalline silicon crystals, in order to make full use of the space in the quartz crucible, it is usually necessary to use a quartz tube for secondary feeding.

[0003] However, during this secondary feeding process, when the solid silicon material falls vertically into the molten silicon liquid under the action of gravity, the splashing phenomenon caused by the conversion of kinetic energy (i.e., "splashing") can easily cause serious pollution to the thermal field, and may even cause the silicon melt to splash onto the heater, causing sparking, which poses a significant safety hazard.

[0004] Existing anti-splash solutions typically reduce impact energy by raising the crucible position to decrease the height difference during feeding, but this is not very effective. Increasing the number of secondary feeding cycles is another option, but this requires more personnel, increasing risks and costs. Utility Model Content

[0005] This invention provides a feeding device and a crystal pulling furnace, which can effectively reduce the occurrence of material splashing and improve production safety.

[0006] To achieve the above objectives, the technical solution adopted in this utility model embodiment is as follows:

[0007] A feeding device, comprising:

[0008] A quartz cone includes: a base and a rod, the rod being vertically fixed to the center of the base; the base includes a first platform and a second platform, the lower surface of the first platform being fixed to the upper surface of the second platform, and at least a portion of the side surfaces of the first platform and at least a portion of the side surfaces of the second platform being sloped.

[0009] A quartz tube includes: an inner tube wall and an outer tube wall arranged coaxially, with an annular cavity formed between the inner tube wall and the outer tube wall, and at least two connecting parts provided between the inner tube wall and the outer tube wall, the connecting parts keeping the inner tube wall and the outer tube wall relatively fixed in the axial and radial directions;

[0010] The snap ring is fitted onto the quartz tube and connected to the outer tube wall;

[0011] The quartz cone is movably connected to the quartz tube.

[0012] One end of the rod passes through the inner tube wall and extends out of the quartz tube;

[0013] At the end of the quartz tube facing the base, the outer tube wall extends beyond the inner tube wall, creating a length difference.

[0014] There is a space between the quartz cone and the inner tube wall.

[0015] In some embodiments, the first body includes:

[0016] The base is cylindrical.

[0017] The cone is cone-shaped, with its lower surface coinciding with the upper surface of the base and fixedly connected.

[0018] In some embodiments, the second platform is frustum-shaped, and the area of ​​the upper surface of the second platform is greater than the area of ​​the lower surface of the second platform.

[0019] In some embodiments, the snap ring is a flange.

[0020] In some embodiments, at least two connecting portions are evenly spaced apart in the circumferential direction of the quartz tube.

[0021] In some embodiments, the connecting part is cylindrical, the axis of the connecting part is parallel to the axis of the quartz tube, and the connecting part is connected to the outer surface of the inner tube wall and the inner surface of the outer tube wall, respectively.

[0022] In some embodiments, the number of connecting parts is one or more.

[0023] In some embodiments, the outer diameter of the first body matches the inner diameter of the inner tube wall.

[0024] In some embodiments, the outer diameter of the second body matches the inner diameter of the outer tube wall.

[0025] This utility model embodiment also provides a crystal pulling furnace, including the feeding device as described above.

[0026] The beneficial effects of this utility model are:

[0027] In this embodiment, when the feeding device adds material into the crystal pulling furnace, the quartz cone drives the quartz tube downward. When the retaining ring on the quartz tube contacts the limiting claw of the auxiliary furnace chamber, the quartz tube is locked by the limiting claw and remains stationary relative to the auxiliary furnace chamber. Afterward, the quartz cone continues to move downward. As the quartz cone descends, the lower end of the quartz tube gradually separates from the base of the quartz cone. During the separation process, the silicon material stored between the inner and outer tube walls is released first, and the silicon material stored in the accommodating space is released later. Therefore, the effect of adding silicon material in stages can be achieved, which can effectively prevent and slow down the occurrence of splashing and reduce the damage to the thermal field caused by splashing. Attached Figure Description

[0028] Figure 1 A schematic diagram illustrating the feeding device of this utility model feeding material into a crystal pulling furnace;

[0029] Figure 2This is a schematic diagram showing the structure of the quartz cone in the feeding device according to an embodiment of the present invention;

[0030] Figure 3 A schematic diagram showing the structural changes of the feeding device in the feeding process according to an embodiment of this utility model;

[0031] Figure 4 This is a schematic cross-sectional view of the quartz tube in the feeding device of this utility model embodiment. Detailed Implementation

[0032] To make the objectives, technical solutions, and advantages of the embodiments of this utility model clearer, the technical solutions of the embodiments of this utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this utility model. All other embodiments obtained by those skilled in the art based on the described embodiments of this utility model are within the protection scope of this utility model.

[0033] To address the aforementioned technical problems, this utility model provides a feeding device and a crystal pulling furnace, which can effectively reduce material splashing and improve production safety.

[0034] like Figures 1 to 4 As shown, this utility model embodiment provides a feeding device, including: a quartz cone 1, a quartz tube 2, and a snap ring 3.

[0035] Among them, such as Figure 2 As shown, the quartz cone 1 includes a base 101 and a rod 102. The rod 102 is vertically fixed to the center of the base 101. The base 101 includes a first platform 1021 and a second platform 1022. The lower surface of the first platform 1021 is fixed to the upper surface of the second platform 1022, and at least a portion of the side surface of the first platform 1021 and at least a portion of the side surface of the second platform 1022 are sloped.

[0036] Here, the rod 102 can be a molybdenum rod, that is, a rod-shaped object made of molybdenum. In some alternative examples, it can also be made into a rod-shaped object of other materials and then coated with molybdenum on its surface. The main reason for using molybdenum to prepare the rod 102 is to prevent the rod 102 from undergoing chemical changes in the high-temperature crystal pulling furnace 4.

[0037] like Figure 3 As shown, the quartz tube 2 includes: an inner tube wall 201 and an outer tube wall 202 arranged coaxially, an annular cavity 203 is formed between the inner tube wall 201 and the outer tube wall 202, and at least two connecting parts 204 are provided between the inner tube wall 201 and the outer tube wall 202, the connecting parts 204 keep the inner tube wall 201 and the outer tube wall 202 relatively fixed in the axial and radial directions.

[0038] The quartz cone 1 is movably connected to the quartz tube 2; one end of the rod 102 passes through the inner tube wall 201 and extends out of the quartz tube 2; at the end of the quartz tube 2 facing the base 101, the outer tube wall 202 extends beyond the inner tube wall 201 to form a length difference; there is an accommodating space 205 between the quartz cone 1 and the inner tube wall 201.

[0039] like Figure 3 As shown, when the quartz cone 1 is connected to the quartz tube 2, the lower end of the quartz tube 2 contacts the base 101 of the quartz cone 1. The base 101 supports and lifts the quartz tube 2, so that the quartz tube 2 can descend or rise together with the quartz cone 1.

[0040] It should be noted that the annular cavity 203 formed between the inner tube wall 201 and the outer tube wall 202 can be used to store silicon material, and the accommodating space 205 formed between the quartz cone 1 and the inner tube wall 201 can also be used to store silicon material. The silicon material in these two spaces can be added to the crystal pulling furnace 4 in stages.

[0041] like Figure 1 , Figure 3 As shown, the snap ring 3 is fitted onto the quartz tube 2 and connected to the outer tube wall 202. In some specific examples, the snap ring 3 is a flange. Since the snap ring 3 protrudes from the outer surface of the quartz tube 2, when the feeding device feeds material into the crystal pulling furnace 4, the snap ring 3 can snap onto the limiting claw 401 on the crystal pulling furnace 4, so that the quartz tube 2 is stationary relative to the crystal pulling furnace 4 (equivalent to the quartz tube 2 being suspended in the crystal pulling furnace 4).

[0042] In this embodiment, such as Figure 3 As shown, when the feeding device is used to feed material into the crystal pulling furnace 4, the quartz cone 1 drives the quartz tube 2 to move downward. When the retaining ring 3 on the quartz tube 2 contacts the limiting claw 401 of the auxiliary furnace chamber, the quartz tube 2 is locked by the limiting claw 401 and the quartz tube 2 remains stationary relative to the auxiliary furnace chamber. After that, the quartz cone 1 continues to move downward (for example, it descends by stroke L1). As the quartz cone 1 descends, the lower end of the quartz tube 2 gradually separates from the base 101 of the quartz cone 1. During the separation process, the silicon material stored between the inner tube wall 201 and the outer tube wall 202 is released first, and the silicon material stored in the accommodating space 205 is released later (for example, after descending by stroke L2). Therefore, the effect of adding silicon material in stages can be achieved, which can effectively prevent and slow down the occurrence of splashing and reduce the damage to the thermal field caused by splashing.

[0043] In some embodiments, the outer diameter of the first body 1021 matches the inner diameter of the inner tube wall 201.

[0044] like Figure 3As shown, in an optional example, the inner diameter of the inner tube wall 201 is equal to the outer diameter of the first body 1021, and before feeding the crystal pulling furnace 4, the lower end of the inner tube wall 201 is usually in contact with the side of the second body 1022, and the inner surface of the inner tube wall 201 is close to part of the side of the first body 1021. In this way, silicon material can be stored in the accommodating space 205 formed between the inner tube wall 201 and the first body 1021.

[0045] In some embodiments, the outer diameter of the second body 1022 matches the inner diameter of the outer tube wall 202.

[0046] like Figure 3 As shown, in an optional example, the inner diameter of the outer tube wall 202 is equal to or slightly smaller than the outer diameter of the second body 1022, and before feeding into the crystal pulling furnace 4, the lower end of the outer tube wall 202 is usually in contact with the side of the second body 1022, so that silicon material can be stored in the cavity 203 between the outer tube wall 202, the inner tube wall 201 and the second body 1022.

[0047] like Figure 3 As shown, the accommodating space 205 can hold more silicon material, while the cavity 203 can hold relatively less silicon material.

[0048] It is understandable that the outer diameter of the first body 1021 refers to the diameter of the largest circle in the cross-section of the first body 1021, and the outer diameter of the second body 1022 refers to the diameter of the largest circle in the cross-section of the second body 1022.

[0049] In some embodiments, the first body 1021 includes a base and a cone. The base is cylindrical; the cone is conical, with its lower surface coinciding with and fixedly connected to the upper surface of the base.

[0050] It should be noted that the cylindrical base has a certain height (which can be set according to specific circumstances, such as the amount of silicon material added each time). Before the addition of silicon material to the crystal pulling furnace 4 begins and for a period of time after the addition begins, the inner surface of the inner tube wall 201 is always in contact with part of the side of the first body 1021 (that is, the outer surface of the cylindrical base). This ensures that the silicon material in the accommodating space 205 waits until the silicon material in the cavity 203 has been partially or completely released before it begins to be released, thus achieving the purpose of adding silicon material in batches. In this way, by adding silicon material in batches, the risk of melt splashing caused by the addition of silicon material can be effectively reduced, the erosion of the thermal field caused by splashed silicon material can be reduced, and the risk of arcing caused by splashing silicon material can be reduced.

[0051] In some embodiments, the second platform 1022 is frustum-shaped, and the area of ​​the upper surface of the second platform 1022 is greater than the area of ​​the lower surface of the second platform 1022.

[0052] like Figure 4 As shown, in some embodiments, at least two connecting portions 204 are evenly spaced around the quartz tube. Exemplarily, the number of connecting portions 204 is three or four.

[0053] In this embodiment, the connecting part 204 can connect the inner tube wall 201 and the outer tube wall 202, making the structure of the quartz tube 2 more stable.

[0054] In some embodiments, the connecting part 204 is cylindrical, the axis of the connecting part 204 is parallel to the axis of the quartz tube 2, and the connecting part 204 is connected to the outer surface of the inner tube wall 201 and the inner surface of the outer tube wall 202 respectively.

[0055] In this embodiment, when the feeding device feeds material into the crystal pulling furnace 4, the quartz cone 1 lifts the quartz tube 2, and the two move downwards together. When the retaining ring 3 on the quartz tube 2 contacts the limiting claw 401 of the auxiliary furnace chamber, the quartz tube 2 is locked by the limiting claw 401, so that the quartz tube 2 remains stationary relative to the auxiliary furnace chamber and no longer descends. Afterwards, the quartz cone 1 continues to move downwards. As the quartz cone 1 descends, the lower end of the quartz tube 2 gradually separates from the base 101 of the quartz cone 1. During the separation process, the inner tube wall 201 and the outer tube wall 201 separate. The silicon material stored between 02 is released first. At this time, the inner tube wall 201 is attached to the outer surface of the cylindrical base of the first body 1021, and the silicon material in the accommodating space 205 will not be released. Afterward, as the quartz cone 1 continues to descend, the inner tube wall 201 separates from the cylindrical base, and the silicon material stored in the accommodating space 205 also begins to be released. In this way, the effect of adding silicon material in stages can be achieved, which can effectively prevent and slow down the occurrence of splashing and reduce the damage to the thermal field caused by splashing.

[0056] like Figure 1 As shown, this embodiment of the present invention also provides a crystal pulling furnace 4, including the feeding device described above. The crystal pulling furnace 4 is provided with a limiting claw 401. When the feeding device adds silicon material to the crystal pulling furnace 4, the retaining ring 3 sleeved on the quartz tube 2 engages with the limiting claw 401 on the crystal pulling furnace 4, so that the quartz tube 2 remains stationary relative to the crystal pulling furnace 4.

[0057] It should be noted that, Figure 1 The image shows only a portion of the structure of the crystal pulling furnace 4, not the entire structure. The limiting claw 401 is one of the components on the crystal pulling furnace 4.

[0058] It should be noted that the various embodiments in this specification are described in a progressive manner, and the same or similar parts between the various embodiments can be referred to mutually. Each embodiment focuses on describing the differences from other embodiments. In particular, since the embodiments are basically similar to the product embodiments, the descriptions are relatively simple, and the relevant parts can be referred to the descriptions of the product embodiments.

[0059] Unless otherwise defined, the technical or scientific terms used in this disclosure shall have the ordinary meaning understood by one of ordinary skill in the art to which this disclosure pertains. The terms “first,” “second,” and similar terms used in this disclosure do not indicate any order, quantity, or importance, but are merely used to distinguish different components. Terms such as “comprising” or “including” mean that the element or object preceding the word encompasses the elements or objects listed following the word and their equivalents, without excluding other elements or objects. Terms such as “connected” or “linked” are not limited to physical or mechanical connections, but can include electrical connections, whether direct or indirect. Terms such as “upper,” “lower,” “left,” and “right” are used only to indicate relative positional relationships, and these relative positional relationships may change accordingly when the absolute position of the described objects changes.

[0060] It is understandable that when a component such as a layer, film, region, or substrate is referred to as being "above" or "below" another component, the component may be "directly" located "above" or "below" the other component, or there may be intermediate components present.

[0061] In the description of the above embodiments, specific features, structures, materials, or characteristics may be combined in any suitable manner in one or more embodiments or examples.

[0062] The above description is merely a specific embodiment of this disclosure, but the scope of protection of this disclosure is not limited thereto. Any variations or substitutions that can be easily conceived by those skilled in the art within the scope of the technology disclosed in this disclosure should be included within the scope of protection of this disclosure. Therefore, the scope of protection of this disclosure should be determined by the scope of the claims.

Claims

1. A feeding device, characterized in that, include: A quartz cone (1) includes: a base (101) and a rod (102), wherein the rod (102) is vertically fixed to the center of the base (101), and the base (101) includes a first platform (1021) and a second platform (1022), wherein the lower surface of the first platform (1021) is fixed to the upper surface of the second platform (1022), and at least a portion of the side surface of the first platform (1021) and at least a portion of the side surface of the second platform (1022) are sloped. A quartz tube (2) includes: an inner tube wall (201) and an outer tube wall (202) arranged coaxially, an annular cavity (203) is formed between the inner tube wall (201) and the outer tube wall (202), and at least two connecting parts (204) are provided between the inner tube wall (201) and the outer tube wall (202), the connecting parts (204) keeping the inner tube wall (201) and the outer tube wall (202) relatively fixed in the axial and radial directions; A snap ring (3) is fitted onto the quartz tube (2) and connected to the outer tube wall (202); The quartz cone (1) is movably connected to the quartz tube (2); One end of the rod (102) passes through the inner tube wall (201) and extends out of the quartz tube (2); At one end of the quartz tube (2) facing the base (101), the outer tube wall (202) extends beyond the inner tube wall (201) to form a length difference; There is an accommodating space (205) between the quartz cone (1) and the inner tube wall (201).

2. The feeding device according to claim 1, characterized in that, The first platform (1021) includes: The base is cylindrical. The cone is conical in shape, and its lower surface coincides with the upper surface of the base and is fixedly connected.

3. The feeding device according to claim 1, characterized in that, The second platform (1022) is frustum-shaped, and the area of ​​the upper surface of the second platform (1022) is greater than the area of ​​the lower surface of the second platform (1022).

4. The feeding device according to claim 1, characterized in that, The snap ring (3) is a flange.

5. The feeding device according to claim 1, characterized in that, The at least two connecting parts (204) are evenly spaced around the quartz tube (2).

6. The feeding device according to claim 1 or 5, characterized in that, The connecting part (204) is cylindrical, and the axis of the connecting part (204) is parallel to the axis of the quartz tube (2). The connecting part (204) is connected to the outer surface of the inner tube wall (201) and the inner surface of the outer tube wall (202) respectively.

7. The feeding device according to claim 1 or 5, characterized in that, The number of connecting parts (204) is 3 or 4.

8. The feeding device according to claim 1, characterized in that, The outer diameter of the first platform (1021) matches the inner diameter of the inner tube wall (201).

9. The feeding device according to claim 1, characterized in that, The outer diameter of the second platform (1022) matches the inner diameter of the outer tube wall (202).

10. A crystal pulling furnace, characterized in that, Includes the feeding device as described in any one of claims 1 to 9.