Temperature measuring device and vapor deposition apparatus

Abstract

The embodiment of the present disclosure provides a temperature measuring device and a vapor deposition equipment. The temperature measuring device is used for measuring the temperature in a chamber of the vapor deposition equipment. The temperature measuring device comprises: an optical assembly arranged to pass through a cavity wall defining the chamber and at least partially extend into the chamber, for guiding infrared radiation from the chamber to outside the chamber; and a limiting piece arranged between the cavity wall of the chamber and the optical assembly, for limiting movement of the optical assembly relative to the cavity wall of the chamber, wherein the limiting piece is coaxially connected with the optical assembly through threads. The temperature measuring device can solve the problem of unstable structure of the temperature measuring device in the related art under high temperature and vacuum environment, thereby affecting the temperature measuring accuracy.

Description

Technical Field

[0001] This disclosure relates to the field of semiconductor manufacturing, and in particular to temperature measuring devices and vapor deposition equipment. Background Technology

[0002] In semiconductor manufacturing processes, such as chemical vapor deposition (CVD), these processes typically require chambers operating at high temperatures, in vacuum, or under specific atmospheres. Real-time, precise monitoring of the temperature within these chambers is crucial for ensuring stable process windows and guaranteeing the quality and yield of the final product (e.g., epitaxial layers).

[0003] However, in related technologies, temperature measuring devices used in high-temperature chambers may suffer from structural instability under harsh process environments, such as vacuuming and high-temperature cycling. This instability may cause the measurement point to deviate, thereby affecting the accuracy and consistency of temperature measurements and adversely impacting process control and product quality. Utility Model Content

[0004] The purpose of this disclosure is to provide a temperature measuring device and a vapor deposition equipment to solve the problem in the related art that the temperature measuring device is structurally unstable in high temperature and vacuum environments, which in turn affects the accuracy of temperature measurement.

[0005] The technical solution disclosed herein is implemented as follows:

[0006] In a first aspect, some embodiments of this disclosure provide a temperature measuring device that can be used to measure the temperature inside a chamber of a vapor deposition apparatus. The temperature measuring device may include:

[0007] An optical assembly arranged to pass through the cavity wall defining the cavity and extend at least partially into the cavity for guiding infrared radiation from inside the cavity to outside the cavity; and

[0008] A limiting member is disposed between the cavity wall of the chamber and the optical component to restrict the movement of the optical component relative to the cavity wall of the chamber. The limiting member and the optical component are coaxially connected by threads.

[0009] Secondly, some other embodiments of this disclosure provide a vapor deposition apparatus that includes a temperature measuring device according to the first aspect.

[0010] This disclosure provides a temperature measuring device and a vapor deposition apparatus. In this temperature measuring device, a coaxial threaded connection is provided between the optical component and the limiting member. The mechanical self-locking and rigid limiting effect of the threaded structure in the radial and axial directions securely fixes the optical component to the limiting member, and subsequently to the cavity wall. Compared to installation methods relying on tolerance fits in related technologies, this threaded connection significantly improves the installation stability and positioning accuracy of the optical component, forming a rigid whole. This structure effectively resists airflow disturbances generated during cavity vacuuming or the process, preventing the optical component from shaking or shifting. This ensures that the temperature measuring point at the front end of the optical component remains in its initial position aligned with the infrared thermometer throughout the entire process, thereby guaranteeing the long-term accuracy and stability of temperature measurement, improving process control precision, product quality, and equipment operational reliability. Attached Figure Description

[0011] Figure 1 This is a schematic cross-sectional view of a chemical vapor deposition system for related technologies.

[0012] Figure 2 for Figure 1 Another schematic cross-sectional view of a part of a chemical vapor deposition system.

[0013] Figure 3 A schematic cross-sectional view of a temperature measuring device and a portion of a vapor deposition apparatus including the temperature measuring device, provided for embodiments of the present disclosure.

[0014] Figure 4 for Figure 3 A magnified view of a portion of the image.

[0015] Figure 5 for Figure 4 A magnified view of a portion of the image.

[0016] Figure 6 A schematic cross-sectional view of a temperature measuring device and a portion of a vapor deposition apparatus including the temperature measuring device, provided for another embodiment of this disclosure.

[0017] Figure 7 for Figure 6 A magnified view of a portion of the image.

[0018] Figure 8 A schematic cross-sectional view of a temperature measuring device and a portion of a vapor deposition apparatus including the temperature measuring device, provided for yet another embodiment of this disclosure. Detailed Implementation

[0019] The technical solutions in the embodiments of this disclosure will be clearly and completely described below with reference to the accompanying drawings.

[0020] It should be noted that in the description of this disclosure, the terms "first," "second," etc., are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Furthermore, unless otherwise expressly specified and limited, the terms "installed," "connected," "joined," "fixed," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this disclosure according to the specific circumstances. In this disclosure, unless otherwise stated, "one or more" means one, two, or more.

[0021] See Figure 1 The diagram illustrates a chemical vapor deposition system 1 of the related art, which may include a chamber 14 defined by a chamber wall 12. The chamber 14 is the core location for performing chemical vapor deposition.

[0022] The cavity wall 12 may include a housing 15 of the chemical vapor deposition system and a liner, such as a rigid felt 16 for thermal insulation, disposed on the inner surface of the housing 15. The cavity wall 12 may have through holes 18 for mounting other components and a vacuum port 19 for extracting gas from the chamber 14. The through holes 18 and the vacuum port 19 may be formed through the housing 15 and the rigid felt 16.

[0023] To monitor the temperature inside chamber 14, an observation window 20 can be provided on the outside of chamber wall 12, corresponding to the position of through hole 18. An infrared thermometer RC, such as an infrared thermal imager, can be deployed outside the observation window 20. The optical system of the infrared thermometer RC is aligned with the observation window 20.

[0024] Optical component 22 can be installed in through hole 18. Infrared thermometer RC can be focused on the front end of optical component 22 through observation window 20, and the focal point G is the measurement point.

[0025] Through research and experimentation, the inventors discovered that the structure of the optical component 22 in the aforementioned chemical vapor deposition system 1 exhibits instability. Specifically, for ease of installation, mechanical tolerances and installation gaps inevitably exist between the optical component 22 and the through-hole 18. Furthermore, when the vacuum port 19 of the chemical vapor deposition system 1 operates to extract gas from the chamber 14, the gas within the chamber 14 flows, typically generating an upward airflow F, such as... Figure 2 As indicated by the arrow.

[0026] Through further analysis, the inventors realized that, according to the principles of fluid dynamics, the airflow F would exert a mechanical thrust on the optical component 22 extending into the chamber 14. For example... Figure 2 As shown, due to the installation gap, the optical component 22 will mechanically wobble when subjected to this thrust, causing it to shift, for example, radially or axially. This shift causes the original measurement point to deviate as well. Since the optical focus of the infrared thermometer RC is fixed, the shift in the measurement point causes a change in the intensity of infrared radiation received by the infrared thermometer RC, resulting in inaccurate temperature readings. This seriously affects the stability of process control and the final product quality.

[0027] In order to solve the problem of inaccurate temperature measurement caused by installation tolerances and airflow disturbances in the above-mentioned related technologies, some embodiments of this disclosure provide a temperature measuring device 2.

[0028] See Figure 3 and Figure 4 The temperature measuring device 2 can be deployed in the vapor deposition equipment 3. The temperature measuring device 2 includes an optical component 22 and a limiting component 24.

[0029] In embodiments of this disclosure, the optical component 22 is the core component for realizing the temperature measurement optical path. As shown, it is arranged to pass through a through-hole 18 in the cavity wall 12 defining the chamber 14 and extend at least partially into the chamber 14.

[0030] Optical component 22 can be used to guide infrared radiation from inside chamber 14 to outside chamber 14. See also: [link to relevant documentation] Figure 5 The optical component 22 can be in the shape of a nozzle. Specifically, the optical component 22 can be a hollow tube, and its first end 22A, i.e., the front end, which extends into the chamber 14, can be closed. For example, the first end 22A can be fitted with a lens, such as a sapphire window, that is transparent to the infrared band of the target, such as an infrared thermometer, which focuses on point G. The middle section and the second end 22B, i.e., the rear end, of the optical component 22 can be configured for connection.

[0031] In this embodiment of the disclosure, the limiting member 24 is a component used to fix the optical assembly 22 to the cavity wall 12. For example... Figure 5 As shown, the limiting member 24 is disposed between the cavity wall 12 of the cavity 14 and the optical component 22, and is used to limit the movement of the optical component relative to the cavity wall of the cavity 14.

[0032] In one specific embodiment, the limiting member 24 may be in the shape of a sleeve. Specifically, as shown below... Figure 5As shown, the limiting member 24 can be annular or tubular, and its outer surface can be tightly fitted with the through hole 18 formed through the housing 15 and the hard felt 16, i.e. through the cavity wall 12, to be mounted on the cavity wall 12. The radial inner surface of the limiting member 24 is configured for connection with the optical component 22.

[0033] For example, the limiting member 24 and the optical component 22 can be coaxially connected by threads to achieve rigid fixation of the optical component 22. See also Figure 5 The optical component 22 may have an external thread TH1 formed on its circumferential surface in its middle section or near the second end 22B. Correspondingly, the radially inner surface of the limiting member 24 is machined into an internal thread TH2 that mates with the external thread TH1. During installation, the external thread TH1 of the optical component 22 is screwed into the internal thread TH2 of the limiting member 24 and tightened. This threaded connection structure utilizes the mechanical self-locking and limiting capabilities of the threaded pair in both the radial and axial directions.

[0034] The threaded connection securely locks the optical component 22 and the limiting member 24 into a rigid unit. Figure 1 Compared to related technologies that rely on clearance fit connections, the rigid threaded connection of this disclosure eliminates the possibility of relative wobble caused by installation tolerances.

[0035] When the vapor deposition equipment 3 is in operation, and the vacuum port 19 generates a gas flow that impacts the optical component 22, the rigid connection structure is sufficient to resist the impact force of the gas flow, ensuring that the position of the optical component 22 remains absolutely stable and does not shift. This ensures that the measurement point at the first end 22A of the optical component 22 remains in the initial alignment position with the infrared thermometer RC throughout the entire process. Therefore, this embodiment guarantees the long-term accuracy and stability of infrared thermometry, ultimately achieving the technical effect of ensuring stable production temperature, improving product quality and yield.

[0036] In high-temperature, high-purity semiconductor processes such as CVD, there are extremely stringent requirements for the materials placed inside chamber 14. In some embodiments of this disclosure, the optical components 22 and the limiting member 24 are made of graphite.

[0037] The selection of graphite materials, especially high-purity, high-density isotropic graphite, is based on a series of unique physical and chemical properties. First, graphite exhibits excellent high-temperature resistance; its high melting point allows it to maintain excellent structural integrity and mechanical strength even in inert atmospheres or vacuums reaching 2000°C or even 3000°C, enabling it to fully withstand operating temperatures in CVD processes, such as 1430°C. Secondly, graphite materials can possess high purity, with its metal impurity content controlled to a high level. This ensures that during high-temperature processes, the optical components 22 and the limiting components 24 will not release metal ions or other contaminants, avoiding contamination of the process chamber 14 and the object being processed. Thirdly, graphite possesses excellent thermal shock resistance. For example, CVD equipment requires repeated heating and cooling cycles. Graphite materials have a relatively low coefficient of thermal expansion and excellent thermal conductivity, giving them excellent thermal shock resistance, preventing cracking or damage under drastic temperature changes and ensuring the long-term operational life of the equipment. Furthermore, graphite also possesses good chemical stability. In other words, graphite has good chemical inertness at high temperatures and is not prone to unexpected chemical reactions with various precursor gases commonly used in CVD processes. Moreover, high-quality isotropic graphite has good machinability and can be precisely machined into complex structures such as external threads TH1 and internal threads TH2, ensuring the accuracy and reliability of the connection.

[0038] Therefore, selecting graphite material is an important guarantee for achieving stable operation of the disclosed technical solution in environments such as CVD high temperature, high purity, and vacuum.

[0039] However, through research and experimentation, the inventors further realized that although graphite has a relatively low coefficient of thermal expansion, its cumulative thermal expansion deformation under the extreme temperature differences of the CVD process is still a key factor that must be considered.

[0040] For example, in Figure 5 In the structure shown, both the optical component 22 with external threads TH1 and the limiting component 24 with internal threads TH2 are made of graphite. The vapor deposition apparatus 3 is assembled at room temperature, but both are exposed to high temperatures during operation. The inventors discovered that if the external threads TH1 and internal threads TH2 can fit together when assembled at room temperature, both will thermally expand when the temperature rises. Significant thermal stress may be generated between them due to minute geometric differences or temperature gradients. This stress may cause the delicate graphite threads to crush or be damaged, or cause them to "seize" or "jam" at high temperatures, making the temperature measuring device 2 impossible to disassemble for subsequent maintenance.

[0041] To address this potential thermal expansion interference problem, in some embodiments of this disclosure, the threads are configured to have a clearance during room temperature assembly. This clearance exists to compensate for the thermal expansion deformation of the optical component 22 and the limiting member 24 caused by the operating temperature of the chamber 14. The allowance for this clearance Δd can be scientifically determined through thermal expansion calculations.

[0042] In one possible calculation model, the reserved fitting clearance Δd should be at least greater than or equal to the maximum relative expansion of both components at operating temperature, taking into account a certain safety factor. This expansion can be estimated by the following formula:

[0043] Δd≥∝×d×(T max -T0)×K (Equation 1)

[0044] In Equation 1, ∝ represents the linear thermal expansion coefficient of the material. For high-density isotropic graphite that may be used in some embodiments, this value can be taken as 6 × 10⁻⁶. -6 / ℃; Δd is the nominal diameter of the thread, for example, in a specific embodiment, this diameter may be approximately 29 mm; T max T0 is the maximum operating temperature of the equipment, for example, in the CVD process, this temperature can reach 1430℃; T0 is the ambient temperature during assembly, for example, it can be about 25℃; and K is the safety factor, used to cover uncertainties such as material batch differences, processing tolerances, temperature fluctuations, etc., for example, the K value can be between 1.2 and 1.5.

[0045] Substitute the above set of exemplary values ​​into the formula:

[0046] ΔT=T max -T0≈1430℃-25℃=1405℃;

[0047] Δd≥(6×10 -6 / ℃)×29mm×1405℃×1.2;

[0048] Δd≥0.293mm.

[0049] According to the calculation, for the materials and dimensions of some embodiments, the required expansion gap is approximately Δd≈0.3mm.

[0050] Based on the above calculations, and taking into account certain machining tolerances and design margins, in some embodiments of this disclosure, the fit clearance Δd can be in the range of 0.2 mm to 0.5 mm.

[0051] By precisely pre-setting a mating clearance Δd, for example, 0.3 mm, during room temperature assembly, the embodiments of this disclosure achieve a balance. On the one hand, it ensures rigidity: at room temperature, this clearance Δd is small enough that the threads still have sufficient engagement depth and contact area to provide the rigid restraint required to resist airflow impact, thereby solving the wobbling problem. On the other hand, it avoids thermal damage: at high temperatures, such as 1430°C, the optical component 22 and the restraining member 24 each thermally expand, and the pre-set mating clearance Δd is partially or completely consumed, but no destructive thermal stress or interference is generated between them, thereby preventing thread jamming or crushing and ensuring the structural stability and maintainability of the equipment.

[0052] In some embodiments of this disclosure, see Figure 6 The temperature measuring device 2 may also include a fixing component 26 and a thermal insulator 28. The fixing component 26 and the thermal insulator 28 are mainly deployed outside the chamber 14, and more specifically, arranged in the through holes 18 of the chamber wall 12 and on the outer side of the chamber wall 12.

[0053] See Figure 6 and Figure 7 The fixing component 26 can be a rigid anchoring structure having a first end 26A and a second end 26B opposite in its axial direction. The thermal insulating member 28 can be a functional connector located between the fixing component 26 and the optical component 22. The second end 26B of the fixing component 26 is fixed to the outside of the cavity wall 12.

[0054] The first end 26A of the fixing component 26, facing the chamber 14, is coaxially connected to the optical component 22 via the thermal insulator 28. Since the second end 26B of the fixing component 26 is rigidly fixed to the outside of the chamber wall 12, and the chamber wall 12, especially the metal housing 15, is the main structure of the vapor deposition apparatus 3, possessing excellent rigidity and positional stability, a reference can be securely mounted. The rigid connecting chain between the optical component 22 and the thermal insulator 28, the fixing component 26, and the threaded connection with the limiting member 24 allows for fixation of the optical component 22 at two positions in the axial direction, thereby further improving the accuracy of temperature measurement.

[0055] The choice of materials for the fixing component 26 and the thermal insulator 28 is crucial for achieving their intended functions. In a preferred embodiment of this disclosure, the thermal insulator 28 is made of zirconia ceramic. For example, yttrium-stabilized zirconia can be used. Zirconia ceramic (YSZ) was chosen as the material for the thermal insulator 28 because of its extremely low thermal conductivity.

[0056] exist Figure 6 In the structure shown, the first end 22A of the optical component 22, including, for example, a graphite material, is located in the chamber 14, where the temperature can reach as high as T. max≈1430℃. Heat will inevitably be conducted outward along the optical component 22. The inventors recognized that, without thermal insulation, heat would be directly transferred to the fixing component 26 and the cavity wall 12, resulting in a significant amount of heat loss.

[0057] More importantly, this heat conduction introduces temperature measurement errors. If a large amount of heat is conducted away from the first end 22A of the optical component 22, the actual temperature at the measurement point at the first end 22A will be lower than the actual process temperature around it. This causes the readings of the infrared thermometer RC to be systematically low, failing to accurately reflect the process temperature. Zirconia ceramic (YSZ) is commonly used as a high-temperature thermal barrier coating material, and its thermal conductivity at high temperatures is much lower than that of metals or graphite. Therefore, a thermal insulator 28 made of low thermal conductivity zirconia ceramic (YSZ) is connected in series between the high-temperature optical component 22 and the room-temperature fixed component 26, effectively providing thermal isolation.

[0058] This thermal barrier effectively prevents a large amount of heat from leaking from the cavity 14 to the outside through the temperature measuring device 2, helping to maintain the uniformity of the thermal field in the cavity 14 and reduce energy consumption. On the other hand, it ensures accurate temperature measurement and avoids measurement inaccuracies caused by temperature conduction. The presence of the thermal insulation component 28 prevents the heat of the optical component 22 from easily dissipating, and its temperature can more accurately reflect the actual process temperature inside the cavity 14, thereby significantly improving the accuracy of temperature measurement.

[0059] In addition, YSZ ceramics have a high melting point, excellent high-temperature phase stability and good high-temperature mechanical strength, making them fully capable of fulfilling the dual tasks of structural support and thermal insulation in the high-temperature environment of CVD.

[0060] In some embodiments of this disclosure, the material of the fixing component 26 includes titanium alloy.

[0061] The fixing component 26 is essentially located in the through-hole 18 within the cavity wall 12 or on the outside of the cavity wall 12, and is protected by the thermal insulator 28, with its operating temperature significantly lower than the cavity temperature. Titanium alloy was chosen as its material based on several considerations. First, titanium alloy has a high specific strength, which allows for lightweight construction while ensuring sufficient rigidity to provide stable anchoring. Secondly, titanium alloy exhibits excellent corrosion resistance. Taking CVD processes as an example, the CVD process may involve corrosive gases, and although the fixing component 26 is outside the cavity, it may still come into contact with piping or potential micro-leakage; titanium alloy's excellent corrosion resistance is crucial. Furthermore, titanium alloy has good thermal expansion matching characteristics. Its coefficient of thermal expansion is relatively close to that of zirconia ceramics and the cavity wall (e.g., stainless steel). This helps reduce thermal stress caused by thermal expansion mismatch at the interfaces of different materials during the heating and cooling cycles of the vapor deposition equipment 3, improving the overall structural reliability.

[0062] To rigidly and coaxially connect the optical component 22, the thermal insulator 28, and the fixing component 26, various mechanical connection methods can be used.

[0063] See Figure 7 In some embodiments of this disclosure, the thermal isolation element 28 is threadedly connected to the optical component 22 and the fixing component 26.

[0064] In some exemplary but non-limiting embodiments, the second end 22B of the optical component 22 may be provided with external threads. The first end 26A of the fixing component 26, i.e., the end closest to the cavity 14, may also be provided with external threads. Correspondingly, the axial inner hole of the thermal insulating member 28 is provided with internal threads 28A for engaging with the external threads on the second end 22B of the optical component 22 and the external threads on the first end 26A of the fixing component 26.

[0065] During installation, firstly, the first end 26A of the fixing component 26 can be screwed into the internal thread of the thermal insulator 28, and then the second end 26B of the fixing component 26 can be fixed to the outside of the cavity wall 12. After the fixing component 26 and the thermal insulator 28 are installed in place, the second end 22B of the optical component 22 can be screwed into the internal thread 28A of the thermal insulator 28. In this way, the three components are connected by two sets of threads to form a rigid coaxial assembly, wherein the thermal insulator 28 is located axially between the optical component 22 and the fixing component 26.

[0066] In embodiments not shown, the fixed connection can also be achieved in other ways. For example, the end of the optical component 22 can also be a smooth cylindrical surface, inserted into the smooth inner hole of the thermal insulator 28, and the two are fixed by a precision clearance fit or a high-temperature adhesive. In this case, the thermal insulator 28 is then connected to the fixing component 26 by threads. The scope of protection of this disclosure is not limited to... Figure 7 The specific thread combination shown.

[0067] See Figure 8 The second end 26B of the fixing assembly 26 is fixed to the outside of the cavity wall 12. Since the cavity 14 is a high vacuum environment, this fixing point must achieve a reliable vacuum seal.

[0068] The inventors further discovered that the observation window 20, which works in conjunction with the temperature measuring device 2, needs to be disassembled and cleaned periodically. For example, byproducts deposited on the inner surface of the window need to be removed to ensure infrared transmittance. This requires that the fixing structure of the temperature measuring device 2 be detachable.

[0069] If large-diameter threaded connections are used for fixing and sealing here, frequent disassembly and reassembly over a long period will cause thread wear, scratches, deformation, or seizing. This can easily lead to vacuum leakage, disrupt the vacuum environment required by the process, and cause serious equipment failure or process deviation.

[0070] Therefore, in a preferred embodiment of this disclosure, see [link to preferred embodiment]. Figure 8 The second end 26B of the fixing component 26 is sealed to the outside of the cavity wall 12 via a flange.

[0071] Flange sealing is a standard and reliable method of vacuum connection. For example... Figure 8 As shown, the second end 26B of the fixing component 26 is machined into a flange shape, and the outer side of the cavity wall 12 also has a corresponding flange 12A. A high-temperature resistant vacuum seal SQ is provided between the mating surfaces of the two flanges. This seal SQ can be, for example, a metal seal, such as a metal C-ring or a metal O-ring, to adapt to high vacuum and high-temperature environments and avoid the gas release and aging problems of elastomer O-rings.

[0072] The flange sealing structure offers high reliability, ease of maintenance, and good reusability. When cleaning the observation window 20 is required, the operator can simply loosen the fixing bolts to disassemble the entire temperature measuring device 2 without damaging the sealing interface. This structure reduces vacuum leakage caused by thread deformation after long-term disassembly and assembly, reduces the frequency of opening and closing the chamber for maintenance, and shortens the time for preventive maintenance, significantly improving the overall operating efficiency of the equipment.

[0073] Some embodiments of this disclosure also provide a vapor deposition apparatus 3, which includes the temperature measuring device 2 defined in the above embodiments.

[0074] It should be noted that the technical solutions described in the embodiments of this disclosure can be combined arbitrarily without conflict.

[0075] The above are merely specific embodiments of this disclosure, but the scope of protection of this disclosure is not limited thereto. Any variations or substitutions that can be easily conceived by those skilled in the art within the scope of the technology disclosed in this disclosure should be included within the scope of protection of this disclosure. Therefore, the scope of protection of this disclosure should be determined by the scope of the claims.

Claims

1. A temperature measuring device for measuring the temperature inside a chamber of a vapor deposition apparatus, characterized in that, The temperature measuring device includes: An optical assembly, arranged to pass through the cavity wall defining the cavity and extend at least partially into the cavity, for guiding infrared radiation from inside the cavity to outside the cavity; and A limiting member is disposed between the cavity wall of the chamber and the optical component to restrict the movement of the optical component relative to the cavity wall of the chamber, wherein the limiting member and the optical component are coaxially connected by a thread.

2. The temperature measuring device according to claim 1, characterized in that, The thread is configured to have a clearance during room temperature assembly to compensate for thermal expansion deformation of the optical component and the limiting member due to the operating temperature of the chamber.

3. The temperature measuring device according to claim 2, characterized in that, The optical components and the limiting element are made of graphite.

4. The temperature measuring device according to claim 2 or 3, characterized in that, The fitting clearance is in the range of 0.2 mm to 0.5 mm.

5. The temperature measuring device according to claim 1, characterized in that, The temperature measuring device further includes: a fixing component and a thermal insulation element, wherein... The fixing component has a first end and a second end opposite in its axial direction, the first end being coaxially connected to the optical component via the thermal insulator, and the second end being fixed to the outside of the cavity wall.

6. The temperature measuring device according to claim 5, characterized in that, The thermal isolation element is threadedly connected to the optical component and the fixing component.

7. The temperature measuring device according to claim 5 or 6, characterized in that, The first end of the fixing assembly is sealed to the outside of the cavity wall via a flange.

8. The temperature measuring device according to claim 5 or 6, characterized in that, The material of the thermal insulation component includes zirconia ceramic.

9. The temperature measuring device according to claim 5 or 6, characterized in that, The material of the fixing component includes titanium alloy.

10. A vapor deposition apparatus, characterized in that, The vapor deposition apparatus includes: a chamber defined by a cavity wall, and a temperature measuring device according to any one of claims 1 to 9.

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