A high-throughput edge exposure system

Abstract

The utility model discloses a kind of high productivity edge exposure systems, including rack, the rack is equipped with bottom plate, the bottom plate is equipped with first edge finding mechanism and second edge finding mechanism, the first edge finding mechanism and second edge finding mechanism are symmetrically arranged, the bottom plate is located between first edge finding mechanism and second edge finding mechanism and is equipped with light source assembly. The utility model, two sets of edge finding mechanism can realize uninterrupted operation, simultaneously running translation system has buffer station, can realize that its double-station system can not be interrupted and carry out edge exposure operation, can reach higher productivity, the utilization of light source is greatly improved;And double-station operation improves productivity, improves machine table beat simultaneously, more products are made in same time, improve the utilization of light source, and save machine table occupied space.

Description

Technical Field

[0001] This utility model relates to the field of wafer processing technology, specifically a high-capacity edge exposure system. Background Technology

[0002] In the semiconductor field, there are many traditional methods for removing silicon wafer edges, but they can be broadly categorized into two main types: chemical edge removal and edge exposure. Edge exposure involves vacuum-adsorbing the silicon wafer onto a rotating platform, fixing a UV exposure lens above the wafer edge to generate a uniform illumination spot of a specific size, and then using the rotation of the platform to expose the wafer edge. Compared to chemical edge removal, edge exposure offers advantages such as higher production efficiency, lower equipment cost, and easier process control.

[0003] Current edge exposure systems generally adopt a single-station approach. For example, CN 219163372U, "A wafer edge exposure device", includes a chuck, an exposer, and a linear CCD, and also includes a rack. For example, CN 110068989 A, "A Wafer Edge Exposure Apparatus," includes: a silicon wafer support stage for adsorbing and fixing silicon wafers and for moving or rotating silicon wafers; a silicon wafer adsorption and transfer mechanism for achieving precise transfer of silicon wafers; a pre-alignment lens group, which cooperates with the silicon wafer support stage to achieve centering and orientation of the silicon wafer; an edge exposure lens group, which cooperates with the silicon wafer support stage to achieve exposure at different positions of the silicon wafer; an aperture and an aperture switching axis, which are used to adjust the size of the exposure field of view according to the edge exposure requirements. In existing technologies, a single moving and rotating station corresponds to a single light source system, allowing one wafer to run at a time. Moreover, due to the high precision, edge searching is required before edge exposure, and the light source is used for a considerable period of time to wait. The light source is always lit, and it is a consumable that needs to be replaced regularly and is expensive. Therefore, a high-capacity edge exposure system that efficiently utilizes the light source has emerged.

[0004] Current edge exposure mechanisms use a one-to-one correspondence between light source and edge-finding system, which limits process operations and results in low throughput. With technological advancements, the throughput requirements for edge exposure devices are increasing, and the existing structure cannot meet these demands. Furthermore, light sources have a limited lifespan; their energy begins to decay after illumination, leading to low utilization of the light source in the current structure. Utility Model Content

[0005] The purpose of this invention is to provide a high-capacity edge exposure system to solve the problems in the prior art.

[0006] To achieve the above objectives, this utility model provides the following technical solution: a high-capacity edge exposure system, including a frame, a base plate mounted on the frame, a first edge-finding mechanism and a second edge-finding mechanism mounted on the base plate, the first edge-finding mechanism and the second edge-finding mechanism being symmetrically arranged, and a light source assembly mounted on the base plate between the first edge-finding mechanism and the second edge-finding mechanism.

[0007] Preferably, the first edge-finding mechanism includes a first suction cup, a first rotating component, a first linear module, a first temporary storage platform, and a first edge-finding component. The first linear module is mounted on a base plate, and the first rotating component is mounted on the first linear module. The first suction cup is mounted on the top of the first rotating component. The first temporary storage platform and the first edge-finding component are both mounted on the base plate. The second edge-finding mechanism includes a second suction cup, a second rotating component, a second linear module, a second temporary storage platform, and a second edge-finding component.

[0008] Preferably, the first linear module includes a linear module body and a first connecting plate, the linear module body drives the first connecting plate to reciprocate; the first rotating assembly includes a motor, a hollow shaft, a hollow swing platform and a rotary joint, the first suction cup is fixed on the hollow swing platform, and the bottom of the first suction cup passes through the hollow swing platform and is connected to the rotary joint.

[0009] Preferably, the first temporary storage platform includes a first lifting device, a first in-situ sensor, a first ejector pin, a first adjusting nut, and a first lifting base plate. The first lifting device drives the first lifting base plate to rise and fall. The first lifting base plate is provided with a plurality of first ejector pins. The first lifting base plate is equipped with a first adjusting nut for adjusting the height of the first ejector pins. The first lifting base plate is equipped with a first in-situ sensor.

[0010] Preferably, the light source assembly includes a first bracket and a second bracket. The first bracket is equipped with a Z-axis adjustment component, the Z-axis adjustment component is equipped with a light source fixing component, an exposure light source is installed on the top of the light source fixing component, a mask is installed on the bottom of the light source fixing component, and a light intensity sensor is installed on the second bracket below the mask.

[0011] Compared with the prior art, the beneficial effects of this utility model are: the two sets of edge-finding mechanisms can achieve uninterrupted operation, and the simultaneous operation and translation system has a buffer station, which can realize that the dual-station system can perform edge exposure operation without interruption, thereby achieving higher production capacity and significantly improving the utilization rate of the light source; in addition, the dual-station operation increases production capacity while increasing the machine cycle time, producing more products in the same amount of time, improving the utilization rate of the light source, and saving machine space. Attached Figure Description

[0012] The accompanying drawings are provided to further illustrate the present invention and form part of the specification. They are used together with the embodiments of the present invention to explain the present invention, but do not constitute a limitation thereof. In the drawings:

[0013] Figure 1 This is a schematic diagram of the structure of this utility model;

[0014] Figure 2 This is a structural schematic diagram of the first rotating component and the first linear module of this utility model;

[0015] Figure 3 This is a utility model Figure 2 A structural diagram from another perspective;

[0016] Figure 4 This is a schematic diagram of the structure of the first temporary storage platform of this utility model;

[0017] Figure 5 This is a schematic diagram of the structure of the light source assembly of this utility model.

[0018] In the diagram: 3. Light source assembly; 4. Base plate; 11. First suction cup; 12. First rotating assembly; 13. First linear module; 14. First temporary storage platform; 15. First edge-finding assembly; 21. Second suction cup; 22. Second rotating assembly; 23. Second linear module; 24. Second temporary storage platform; 25. Second edge-finding assembly; 31. Exposure light source; 32. Light source fixing component; 33. Z-axis adjustment assembly; 34. Mask plate; 35. Light intensity sensor; 121. Motor; 122. Rotary joint; 131. First connecting plate; 141. First lifting device; 142. First in-situ sensor; 143. First ejector pin; 144. First adjusting nut; 145. First lifting base plate. Detailed Implementation

[0019] To make the objectives, technical solutions, and advantages of the embodiments of this utility model clearer, the technical solutions of the embodiments of this utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this utility model. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this utility model. Therefore, the following detailed description of the embodiments of this utility model provided in the accompanying drawings is not intended to limit the scope of the claimed utility model, but merely to represent selected embodiments of this utility model.

[0020] Please see Figures 1-5In this embodiment of the present invention, a high-capacity edge exposure system includes a frame, a base plate 4 is mounted on the frame, a first edge-finding mechanism and a second edge-finding mechanism are mounted on the base plate 4, the first edge-finding mechanism and the second edge-finding mechanism are symmetrically arranged, and a light source assembly 3 is mounted on the base plate 4 between the first edge-finding mechanism and the second edge-finding mechanism.

[0021] The first edge-finding mechanism includes a first suction cup 11, a first rotating component 12, a first linear module 13, a first temporary storage platform 14, and a first edge-finding component 15. The first linear module 13 is mounted on the base plate 4, and the first rotating component 12 is mounted on the first linear module 13. The first suction cup 11 is mounted on the top of the first rotating component 12. The first temporary storage platform 14 and the first edge-finding component 15 are both mounted on the base plate 4. The first edge-finding component 15 has a precision optical function and can detect the outer contour of the wafer for subsequent exposure path calculation. The second edge-finding mechanism includes a second suction cup 21, a second rotating component 22, a second linear module 23, a second temporary storage platform 24, and a second edge-finding component 25.

[0022] The first linear module 13 includes a linear module body and a first connecting plate 131. The linear module body drives the first connecting plate 131 to reciprocate. The first rotating assembly 12 includes a motor 121, a hollow shaft, a hollow swing stage, and a rotary joint 122. The first suction cup 11 is fixed on the hollow swing stage. The bottom of the first suction cup 11 passes through the hollow swing stage and is connected to the rotary joint 122. The rotary joint 122 is connected to a vacuum, so that the first suction cup 11 can hold the wafer. The first suction cup 11 realizes the translation and rotation of the wafer through the first linear module 13 and the first rotating assembly 12.

[0023] The first temporary storage platform 14 includes a first lifting device 141, a first presence sensor 142, a first ejector pin 143, a first adjusting nut 144, and a first lifting base plate 145. The first lifting device 141 drives the first lifting base plate 145 to rise and fall. The first lifting base plate 145 is provided with a plurality of first ejector pins 143. The first lifting base plate 145 is equipped with a first adjusting nut 144 for adjusting the height of the first ejector pins 143. The first lifting base plate 145 is equipped with a first presence sensor 142. The first ejector pins 143 are provided with a first adjusting nut 144 for adjusting the level. The first lifting base plate 145 is also provided with a first presence sensor 142 for detecting whether the wafer is in place.

[0024] The light source assembly 3 includes a first bracket and a second bracket. The first bracket is equipped with a Z-axis adjustment component 33, and the Z-axis adjustment component 33 is equipped with a light source fixing component 32. An exposure light source 31 is installed on the top of the light source fixing component 32, and a mask plate 34 is installed on the bottom of the light source fixing component 32. A light intensity sensor 35 is installed on the second bracket below the mask plate 34. The Z-axis adjustment component 33 drives the light source to adjust in the vertical direction. The light source assembly 3 is also equipped with a light intensity sensor 35 for detecting the light intensity of the exposure light source 31.

[0025] The working principle of this utility model is as follows: The first suction cup 11 is in the pick-and-place station. A wafer is placed on the first suction cup 11, the vacuum is opened, and the first suction cup 11 adsorbs the wafer. The first linear module 13 moves the first suction cup 11, thereby moving the wafer to the edge-finding station. The edge of the wafer is located at the position of the first edge-finding component 15. The first rotating component 12 rotates the wafer one revolution, and the first edge-finding component 15 calculates the outer contour of the wafer. The first linear module 13 moves the first suction cup 11, thereby moving the wafer to the exposure station. The edge of the wafer is located under the light source component 3. The outer contour of the wafer is fitted using polar coordinates through the cooperation of the first linear module 13 and the first rotating component 12 to perform the edge exposure process. After the edge exposure process is completed, the first linear module 13 moves the first suction cup 11, thereby moving the wafer to the pick-and-place station. The vacuum of the first suction cup 11 is disconnected, and the first lifting device 141 of the first temporary storage platform 14 lifts the wafer. The next wafer is placed on the first suction cup 11, and the operation is repeated.

[0026] Finally, it should be noted that the above description is merely a preferred embodiment of this utility model and is not intended to limit the utility model. Although the utility model has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions described in the foregoing embodiments or make equivalent substitutions for some of the technical features. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this utility model should be included within the protection scope of this utility model.

Claims

1. A high-throughput edge exposure system, comprising a rack, characterized in that, The frame is equipped with a base plate (4), and the base plate (4) is equipped with a first edge-finding mechanism and a second edge-finding mechanism. The first edge-finding mechanism and the second edge-finding mechanism are symmetrically arranged. The base plate (4) is equipped with a light source assembly (3) located between the first edge-finding mechanism and the second edge-finding mechanism.

2. The high-yield edge exposure system according to claim 1, characterized in that, The first edge-finding mechanism includes a first suction cup (11), a first rotating component (12), a first straight module (13), a first temporary storage platform (14), and a first edge-finding component (15). The first straight module (13) is mounted on the base plate (4). The first straight module (13) is equipped with the first rotating component (12). The first rotating component (12) is mounted on the top of the first rotating component (12). The first suction cup (11) is mounted on the top of the first rotating component (12). The first temporary storage platform (14) and the first edge-finding component (15) are both mounted on the base plate (4). The second edge-finding mechanism includes a second suction cup (21), a second rotating component (22), a second straight module (23), a second temporary storage platform (24), and a second edge-finding component (25).

3. The high-yield edge exposure system according to claim 2, characterized in that, The first linear module (13) includes a linear module body and a first connecting plate (131), the linear module body drives the first connecting plate (131) to reciprocate; the first rotating assembly (12) includes a motor (121), a hollow shaft, a hollow swing table and a rotary joint (122), the first suction cup (11) is fixed on the hollow swing table, and the bottom of the first suction cup (11) passes through the hollow swing table and is connected to the rotary joint (122).

4. The high-yield edge exposure system according to claim 3, characterized in that, The first temporary storage platform (14) includes a first lifting device (141), a first in-situ sensor (142), a first ejector pin (143), a first adjusting nut (144), and a first lifting base plate (145). The first lifting device (141) drives the first lifting base plate (145) to rise and fall. The first lifting base plate (145) is provided with a plurality of first ejector pins (143). The first lifting base plate (145) is equipped with a first adjusting nut (144) for adjusting the height of the first ejector pins (143). The first lifting base plate (145) is equipped with a first in-situ sensor (142).

5. A high-yield edge exposure system according to claim 1, characterized in that, The light source assembly (3) includes a first bracket and a second bracket. The first bracket is equipped with a Z-axis adjustment assembly (33), the Z-axis adjustment assembly (33) is equipped with a light source fixing component (32), the top of the light source fixing component (32) is equipped with an exposure light source (31), the bottom of the light source fixing component (32) is equipped with a mask plate (34), and the second bracket is equipped with a light intensity sensor (35) located below the mask plate (34).

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