A reaction chamber for a photovoltaic tubular high temperature apparatus
By designing cavity units with rectangular or elliptical cross-sections and zoned heating, the problem of insufficient strength of quartz tubes was solved, achieving higher space utilization and temperature uniformity, thereby improving the production efficiency of the equipment and the quality of the products.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- DONGGUAN JIATUO RISHENG INTELLIGENT TECH CO LTD
- Filing Date
- 2024-07-31
- Publication Date
- 2026-07-14
AI Technical Summary
The quartz tubes in existing tubular high-temperature equipment are not strong enough and are easily damaged, making replacement difficult, which affects production efficiency and capacity, and also results in low space utilization and serious gas waste.
Design cavity units with rectangular or elliptical cross-sections, use a slide boat placed directly on a paddle for zoned heating, use high-temperature resistant materials such as quartz, silicon carbide or thermally conductive ceramics, set up furnace door insulation structure and cooling circulation pipes, and optimize gas supply and exhaust systems.
It improves space utilization, increases the amount of substrate, reduces gas and energy consumption, simplifies the reaction chamber structure, enhances temperature uniformity and product quality, and extends equipment life.
Smart Images
Figure CN224503866U_ABST
Abstract
Description
Technical Field
[0001] This utility model belongs to the technical field of photovoltaic cell manufacturing equipment, and in particular relates to a reaction chamber of a photovoltaic tube-type high-temperature equipment. Background Technology
[0002] Solar energy is the cleanest, safest, and most reliable energy source for the future, and it has the advantage of being inexhaustible, which is why it has received widespread attention from countries around the world.
[0003] In terms of solar cell manufacturing equipment, tubular and plate-type equipment are currently the main types. Plate-type equipment features silicon wafers placed horizontally on a tray, resulting in a smaller wafer capacity. Tubular equipment, on the other hand, inserts many silicon wafers into a wafer carrier boat and stacks them, allowing for a much larger wafer capacity. However, tubular equipment also suffers from low space utilization around the tube walls. Currently, tubular high-temperature equipment mainly includes: tubular diffusion, tubular oxidation, tubular annealing, and tubular LPCVD.
[0004] Furthermore, current tubular high-temperature equipment uses a cylindrical quartz tube inside, surrounded by a cylindrical furnace body. After the quartz tube is sealed at one end, it forms an independent vacuum-sealed space. The furnace body uses electrically heated metal heating wires and is wrapped with insulation material. As the demand for wafers increases, the diameter and length of the quartz tubes also increase, leading to insufficient strength and easy breakage. Traditional tubular high-temperature equipment can only disassemble and install the quartz tubes on the loading platform side. Because the quartz tubes are large and heavy, and easily broken during disassembly and installation, coupled with the numerous loading mechanisms on the loading platform side resulting in limited space, the disassembly and replacement of quartz tubes is difficult, impacting production efficiency and becoming one of the problems with tubular high-temperature equipment.
[0005] In traditional tubular high-temperature equipment, once the quartz tube is damaged, it often results in large-scale damage to the furnace tube during production, which is difficult to predict and avoid, leading to the scrapping of the entire furnace and causing significant economic losses.
[0006] The above analysis clearly shows that the current tubular high-temperature equipment reaction chamber structure suffers from low space utilization, low production capacity, and gas waste. In addition, the quartz tube is difficult to replace when it breaks. To address these issues, developing a new reaction chamber for photovoltaic tubular high-temperature equipment is of significant practical importance. Utility Model Content
[0007] In view of the above-mentioned problems, this utility model discloses a reaction chamber for a photovoltaic tube-type high-temperature device.
[0008] The present invention adopts the following technical solution:
[0009] A reaction chamber for a photovoltaic tubular high-temperature device includes a wafer carrier boat unit, a cavity unit, a heating unit, a furnace door, and a furnace tail cover. The wafer carrier boat unit is located inside the cavity unit. The cross-sections of the cavity unit and the heating unit are rectangular, elliptical, or approximately elliptical. The heating unit surrounds the periphery of the cavity unit. The furnace door and the furnace tail cover are located at opposite ends of the cavity unit. The furnace tail cover is located at the tail side of the cavity unit, and the furnace door is located at the furnace opening side of the cavity unit. The cavity unit forms a sealed structure through the furnace door and the furnace tail cover.
[0010] Furthermore, the film carrier unit includes small boats and paddles. The film carrier unit includes multiple small boats and two parallel paddles. Two boss support rods are provided on the outer sides of the two sides of each small boat. Multiple small boats are placed on the two parallel paddles in sequence through the boss support rods. The lateral width of the small boat matches the distance between the two parallel paddles.
[0011] Furthermore, two or more of the aforementioned slide carrier units are simultaneously arranged within the cavity unit, and the multiple slide carrier units are arranged side by side inside the cavity unit, including either vertical arrangement or horizontal arrangement.
[0012] Furthermore, the cavity unit is constructed from materials including quartz, silicon carbide, or thermally conductive ceramics.
[0013] Furthermore, the heating unit is composed of three or more temperature zones, and the temperature of each temperature zone is independently controlled.
[0014] Furthermore, the temperature zone is composed of an upper heating surface, a lower heating surface, a left heating surface, and a right heating surface, and the temperatures of the upper heating surface, the lower heating surface, the left heating surface, and the right heating surface are independently controlled.
[0015] Furthermore, a furnace opening side insulation ring is provided on the edge of the heating unit near the furnace door, and a furnace tail cover side insulation ring is provided on the edge of the heating unit near the furnace tail cover.
[0016] Furthermore, the furnace door is provided with a furnace door heat insulation structure, which is a structure that protrudes from the furnace door into the cavity. The edge of the furnace door heat insulation structure is in clearance fit with the inner sidewall of the cavity unit. A furnace door heat-blocking boss is provided around the outer edge of the protruding structure. A furnace door sealing ring is provided around the outer edge of the furnace door heat-blocking boss. An "S"-shaped cooling circulation pipe is provided on the outer side of the furnace door.
[0017] Furthermore, the end face of the furnace tail cover is provided with an air inlet pipe, a tail exhaust pipe, a gas supply pipe, and an inner coupling pipe. The air inlet pipe enters from the end face of the furnace tail cover and leads to the furnace opening side. The gas supply pipe enters from the end face of the furnace tail cover and leads to the middle of the cavity unit. A spray pipe is provided at the outlet of the gas supply pipe at the middle of the cavity unit. The surfaces of the cavity unit, furnace door, and furnace tail cover are treated with ceramic plating and silicon carbide plating.
[0018] Furthermore, the side of the cavity unit is composed of four square side plates, including an upper side plate, a lower side plate, a left side plate, and a right side plate. The upper and lower side plates form the top and bottom of the cavity, and the left and right side plates form the left and right side walls of the cavity. The upper, lower, left, and right side plates form the cavity structure. The side plates are arc-shaped plates or flat plates, and the connection method at the sides of the upper, lower, left, and right side plates is a sealed connection.
[0019] Beneficial effects:
[0020] This invention designs the cross-section of the sealed cavity unit as rectangular, elliptical, or approximately elliptical, which allows for a more rational arrangement of space, optimizes the utilization of cavity space, enables a larger number of wafers to be carried, increases the number of products that can be placed, improves product output, and at the same time helps to reduce gas consumption and energy consumption.
[0021] By setting temperature zones, the reaction chamber can implement temperature control more flexibly, which is more conducive to improving product quality.
[0022] The small boat holding the silicon wafer is placed directly on the paddle. During the manufacturing process, the part of the paddle that carries the small boat is placed in the reaction chamber and does not leave the reaction chamber. This structural design greatly simplifies the reaction chamber structure, which is beneficial to the uniformity of reaction gases and temperature in the reaction chamber, and improves gas utilization, thereby reducing costs and improving quality. Attached Figure Description
[0023] To more clearly illustrate the technical solutions of the embodiments of this utility model, the drawings used in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.
[0024] Figure 1 This is a schematic diagram of the cross-sectional structure of the reaction chamber of a photovoltaic tube-type high-temperature device according to this utility model;
[0025] Figure 2 This is a schematic diagram of the structure of the slide carrier unit of this utility model;
[0026] Figure 3 This is a schematic diagram of the arrangement of the slide carrier unit within the cavity of this utility model. Figure 1 ;
[0027] Figure 4 This is a schematic diagram of the arrangement of the slide carrier unit within the cavity of this utility model. Figure 2 ;
[0028] Figure 5 This is a schematic diagram of the arrangement of the slide carrier unit within the cavity of this utility model. Figure 3 ;
[0029] Figure 6 This is a schematic diagram of the overall structure of the cavity unit of this utility model;
[0030] Figure 7 This is a schematic diagram of the overall structure of the heating unit of this utility model;
[0031] Figure 8 This is a schematic diagram of the temperature zone subdivision structure of this utility model;
[0032] Figure 9 This is a schematic diagram of the furnace door structure of this utility model. Figure 1 ;
[0033] Figure 10 This is a schematic diagram of the furnace door structure of this utility model. Figure 2 ;
[0034] Figure 11 This is a schematic diagram of the side plate structure of the cavity unit of this utility model.
[0035] Illustrations: Carrier boat unit-1, cavity unit-2, heating unit-3, furnace door-4, furnace tail cover plate-5, paddle-11, small boat-12, upper side plate-21, lower side plate-22, left side plate-23, right side plate-24, furnace mouth side insulation ring-31, furnace tail cover plate side insulation ring-32, first temperature zone section-33, second temperature zone section-34, third temperature zone section-35, fourth temperature zone section-36, upper heating surface-331, lower heating surface-332, left heating surface-333, right heating surface-334, furnace door heat insulation structure-41, furnace door heat-blocking boss-42, furnace door sealing ring-43, "S" shaped cooling circulation pipe-44, air inlet pipe-51, tailpipe-52, make-up air pipe-53, inner coupling pipe-54. Detailed Implementation
[0036] To better understand the technical solution of this utility model, the embodiments of this utility model will be described in detail below with reference to the accompanying drawings.
[0037] It should be understood that the described embodiments are merely some embodiments of this utility model, and not all embodiments. All other embodiments obtained by those skilled in the art based on the embodiments of this utility model without creative effort are within the scope of protection of this utility model.
[0038] Example 1
[0039] like Figure 1 As shown, a reaction chamber for a photovoltaic tubular high-temperature device includes a wafer carrier boat unit 1, a cavity unit 2, a heating unit 3, a furnace door 4, and a furnace tail cover plate 5. The wafer carrier boat unit 1 is located inside the cavity unit 2. The cross-sections of the cavity unit 2 and the heating unit 3 are rectangular, elliptical, or approximately elliptical. The heating unit 3 surrounds the periphery of the cavity unit 2. Figure 6 As shown, the furnace door 4 and the furnace tail cover 5 are located at opposite ends of the cavity unit 2. The furnace tail cover 5 is located at the tail side of the cavity unit 2, and the furnace door 4 is located at the furnace opening side of the cavity unit 2. The cavity unit 2 forms a sealed structure through the furnace door 4 and the furnace tail cover 5. The cross-section of the cavity unit is rectangular, elliptical, or approximately elliptical. This design solves the problem of low space utilization in the reaction chamber, is more conducive to the placement of the slide boat, and also reduces the demand for reaction gases, thus reducing gas waste.
[0040] Furthermore, such as Figure 2 As shown, the wafer carrier boat unit 1 includes small boats 12 and paddles 11. The wafer carrier boat unit 1 includes multiple small boats 12 and two parallel paddles 11. Two protruding support rods are respectively provided on the outer sides of both sides of each small boat 12. Multiple small boats 12 are sequentially placed on the two parallel paddles 11 via the protruding support rods. The lateral width of each small boat 12 matches the distance between the two parallel paddles 11. The small boats holding the silicon wafers are placed directly on the paddles. During the manufacturing process, the portion of the paddle carrying the small boats is placed within the reaction chamber and does not exit the reaction chamber. This structural design significantly simplifies the reaction chamber structure, improves the uniformity of the reaction gases and temperature within the reaction chamber, and increases gas utilization, thus reducing costs and improving quality.
[0041] Furthermore, such as Figure 3 , 4 As shown in Figure 5, two or more of the slide carrier units 1 are simultaneously arranged in the cavity unit 2, and the multiple slide carrier units 1 are arranged side by side inside the cavity unit 2. The side by side arrangement includes vertical arrangement or horizontal arrangement.
[0042] Furthermore, the cavity unit 2 is constructed from materials including quartz, silicon carbide, or thermally conductive ceramics.
[0043] Furthermore, such as Figure 7 As shown, the heating unit 3 is composed of three or more temperature zones, and the temperature of each temperature zone is independently controlled.
[0044] Furthermore, such as Figure 8 As shown, the temperature zone is composed of an upper heating surface 331, a lower heating surface 332, a left heating surface 333, and a right heating surface 334. The temperatures of the upper heating surface 331, lower heating surface 332, left heating surface 333, and right heating surface 334 are independently controlled. This temperature zone design facilitates better control of the reaction chamber temperature, promotes temperature uniformity within the reaction chamber, and improves the quality of the prepared product.
[0045] Furthermore, such as Figure 7 As shown, the heating unit 3 has a furnace opening side insulation ring 31 near the furnace door, and the heating unit 3 has a furnace tail cover side insulation ring 32 near the furnace tail cover 5.
[0046] Furthermore, such as Figure 9 , 10 As shown, the furnace door 4 is equipped with a furnace door heat insulation structure 41, which is a protruding structure of the furnace door towards the cavity. The edge of the furnace door heat insulation structure 41 is clearance-fitted with the inner sidewall of the cavity unit. A furnace door heat-blocking boss 42 is provided around the outer edge of the protruding structure. A furnace door sealing ring 43 is provided around the outer edge of the furnace door heat-blocking boss 42. An "S"-shaped cooling circulation pipe 44 is provided on the outer side of the furnace door. The clearance of the clearance fit is mostly less than 15mm.
[0047] Furthermore, such as Figure 6 As shown, the furnace tail cover 5 is provided with an air inlet pipe 51, a tail exhaust pipe 52, a gas supply pipe 53, and an inner coupling pipe 54. The air inlet pipe 51 enters from the end face of the furnace tail cover 5 and leads to the furnace opening side. The gas supply pipe 53 enters from the end face of the furnace tail cover 5 and leads to the middle of the cavity unit. The outlet of the gas supply pipe 53 at the middle of the cavity unit is provided with a spray pipe. The surfaces of the cavity unit, furnace door, and furnace tail cover are treated with ceramic plating and silicon carbide plating.
[0048] Furthermore, such as Figure 11As shown, the cavity unit 2 is composed of four square side plates, including an upper side plate 21, a lower side plate 22, a left side plate 23, and a right side plate 24. The upper side plate 21 and the lower side plate 22 form the top and bottom of the cavity, and the left side plate 23 and the right side plate 24 form the left and right side walls of the cavity. The upper side plate 21, the lower side plate 22, the left side plate 23, and the right side plate 24 form the cavity structure. The side plates are either curved or flat. The connection method at the sides of the upper side plate 21, the lower side plate 22, the left side plate 23, and the right side plate 24 is a sealed connection. The sealed connection method includes welding, bonding, or high-temperature firing.
[0049] Example 2
[0050] A reaction chamber for a photovoltaic tubular high-temperature device, such as Figure 1 , 6 As shown, the furnace includes a wafer carrier boat unit 1, a cavity unit 2, a heating unit 3, a furnace door 4, and a furnace tail cover plate 5. Both the cavity unit 2 and the heating unit 3 have rectangular, elliptical, or approximately elliptical cross-sections. The cavity unit 2 is arranged inside the heating unit 3. The cavity unit, together with the furnace door and furnace tail cover plate, forms a vacuum-sealed structure. The wafer carrier boat unit 1 includes a small boat 12 and a paddle 11, as shown... Figure 2 As shown.
[0051] Currently used slide carrier boats have rectangular or similar cross-sections. Therefore, the existing circular cross-section chambers waste space on the outer side of the slide carrier, leading to wasted reaction gas and energy consumption. Changing the chamber to a rectangular cross-section allows for a more rational space arrangement, shortens the reaction chamber length, optimizes space utilization, improves product quality, and reduces gas and energy consumption.
[0052] The cavity unit 2 is constructed from quartz, silicon carbide, and thermally conductive ceramics. It is formed into a rectangular or similar rectangular cross-section cavity through welding, bonding, and high-temperature firing. These materials have good high-temperature resistance, corrosion resistance, oxidation resistance, and thermal conductivity. Silicon carbide and ceramics also have advantages such as high strength, high hardness, and high wear resistance. Therefore, these materials can be used to manufacture the reaction chamber cavity of photovoltaic tube high-temperature equipment.
[0053] Heating unit 3 is divided into three or more temperature zones along its length, and each temperature zone can be controlled independently. In the axial direction along the length of the reaction chamber, the actual temperature will vary at different locations due to factors such as the low temperature on the two sides of the furnace body and the structure of the carrier boat unit. For example, the temperature near the furnace door is often the lowest. Therefore, dividing the heater unit into three or more temperature zones along its length, and allowing each temperature zone to be controlled independently, is beneficial for temperature control and balance in the axial direction of the reaction chamber, thereby improving product quality.
[0054] Each temperature zone of the heating unit is further subdivided into four sub-temperature zones in the up, down, left, and right directions. The temperature of each sub-temperature zone can be controlled individually or through parallel or series connection. In each temperature zone, the actual temperature will vary at different positions due to factors such as the structure of the carrier boat unit and airflow. Therefore, each temperature zone is further subdivided into four sub-temperature zones in the up, down, left, and right directions. Each sub-temperature zone can be controlled individually or through parallel or series connection, allowing for more flexible temperature control and achieving higher product quality.
[0055] Each temperature zone is equipped with a temperature sensor to detect the temperature of the reaction chamber, thereby achieving precise temperature control. There are generally two types of temperature sensor structures: one is an external coupler, which is inserted into the outer wall of the furnace body; the other is an internal coupler, which is inserted into a long tube from the end face of the furnace tail cover or the end face of the furnace mouth, with the temperature sensor installed inside the tube.
[0056] Two or more wafer carrier boat units are arranged on the cross-section of the reaction chamber within the cavity; this structural arrangement can multiply the equipment's production capacity, bringing greater economic value to customers, such as... Figure 3 , 4 As shown in Figure 5.
[0057] The two propellers 11 of the film carrier boat unit are respectively arranged on the two sides of the small boat 12, as follows: Figure 2 As shown, the non-circular cross-section allows for customized length and width ratios. The optimized structure features two propellers 11, positioned on either side of the small boat 12, further reducing the cross-sectional area and saving gas and energy. The small boat 12, which holds the silicon wafers, is placed directly on the propellers 11, eliminating the boat support. During the process, the portion of the propeller carrying the small boat remains within the reaction chamber and does not exit. Currently, most high-temperature tubular equipment in the industry uses a soft-landing approach, meaning the propellers 11 are outside the reaction chamber during the process. Structurally, silicon wafers are typically arranged in the small boat, which is then placed on a boat support, and finally, one or two boat supports are placed on the propellers. One application of this invention is to place the small boat holding the silicon wafers directly on the propellers, eliminating the boat support. During the process, the portion of the propeller carrying the small boat remains within the chamber and does not exit, significantly simplifying the reaction chamber structure. This improves the uniformity of the reaction gas and temperature within the chamber, reducing costs and improving product quality.
[0058] The reaction chamber of this photovoltaic tubular high-temperature equipment has an air inlet at the furnace opening, with optional gas supply options including gas supply from the center of the furnace or gas supply via a spray pipe. Figure 6As shown, the inlet pipe 51 is inserted from the end face of the furnace tail cover plate of the reaction chamber and leads to the furnace mouth, providing process gas for the reaction. A tailpipe 52 is installed on the furnace tail cover plate, connected to an exhaust device such as a vacuum pump. Under the action of the exhaust device, a vacuum environment is achieved in the reaction chamber, while simultaneously discharging the waste gas after the reaction. As the reaction gas moves from the furnace mouth to the furnace tail cover plate, its concentration gradually decreases. Therefore, it is possible to use either furnace middle gas supply or spray pipe gas supply. Furnace middle gas supply involves inserting a gas supply pipe from the furnace tail cover plate to the middle of the furnace to provide process gas for the reaction. Spray pipe gas supply involves arranging several inlet holes on the gas supply pipe, which is beneficial for uniform gas intake.
[0059] The furnace door 4 is equipped with a furnace door sealing ring and a cooling mechanism. The furnace door is water-cooled, and a heat-insulating structure is installed near the furnace door sealing ring. The cavity unit, furnace door, and furnace tail cover are treated with ceramic plating and silicon carbide plating surface treatment processes.
[0060] The reaction chamber of high-temperature equipment experiences extremely high temperatures, typically between 700-1100℃, and also contains corrosive gases. Therefore, by adding a coating surface treatment process to the surfaces of the chamber unit 2, furnace door 4, and furnace tail cover 5, the lifespan of related components can be significantly extended, and the maintenance cycle can be increased. Common coating processes include ceramic plating and silicon carbide plating.
[0061] The embodiments of this utility model have been described in detail above. Specific examples have been used to illustrate the principles and implementation methods of this utility model. The description of the above embodiments is only for the purpose of helping to understand the method and core ideas of this utility model. At the same time, for those skilled in the art, there will be changes in the specific implementation methods and application scope based on the ideas of this utility model. Therefore, the content of this specification should not be construed as a limitation of this utility model.
Claims
1. A reaction chamber for a photovoltaic tubular high-temperature device, the reaction chamber comprising a wafer carrier boat unit, a cavity unit, a heating unit, a furnace door, and a furnace tail cover, wherein the wafer carrier boat unit is located inside the cavity unit, characterized in that, The cross-section of the cavity unit and the heating unit is rectangular, elliptical, or approximately elliptical. The heating unit surrounds the periphery of the cavity unit. The furnace door and the furnace tail cover are located at both ends of the cavity unit, respectively. The furnace tail cover is located at the tail side of the cavity unit, and the furnace door is located at the furnace opening side of the cavity unit. The cavity unit forms a sealed structure through the furnace door and the furnace tail cover.
2. The reaction chamber of the photovoltaic tubular high-temperature equipment according to claim 1, characterized in that, The film carrier boat unit includes small boats and paddles. The film carrier boat unit includes multiple small boats and two parallel paddles. Two boss support rods are provided on the outer sides of the two sides of each small boat. The multiple small boats are placed on the two parallel paddles in sequence through the boss support rods.
3. The reaction chamber of the photovoltaic tubular high-temperature equipment according to claim 2, characterized in that, Two or more slide carrier units are simultaneously arranged within the cavity unit, and the multiple slide carrier units are arranged side by side inside the cavity unit, including vertical arrangement or horizontal arrangement.
4. The reaction chamber of the photovoltaic tubular high-temperature equipment according to claim 3, characterized in that, The cavity unit is constructed from materials including quartz, silicon carbide, or thermally conductive ceramics.
5. The reaction chamber of the photovoltaic tubular high-temperature equipment according to claim 1, characterized in that, The heating unit is composed of three or more temperature zones, and the temperature of each temperature zone is independently controlled.
6. The reaction chamber of the photovoltaic tubular high-temperature equipment according to claim 5, characterized in that, The temperature zone is composed of an upper heating surface, a lower heating surface, a left heating surface, and a right heating surface, and the temperatures of the upper heating surface, the lower heating surface, the left heating surface, and the right heating surface are independently controlled.
7. The reaction chamber of the photovoltaic tubular high-temperature equipment according to claim 1, characterized in that, The heating unit has a furnace opening side insulation ring near the furnace door, and the heating unit has a furnace tail cover side insulation ring near the furnace tail cover.
8. The reaction chamber of the photovoltaic tubular high-temperature equipment according to claim 1, characterized in that, The furnace door is equipped with a furnace door heat insulation structure, which is a protruding structure of the furnace door towards the cavity. The edge of the furnace door heat insulation structure is clearance-fitted with the inner sidewall of the cavity unit. A furnace door heat-blocking boss is provided around the outer edge of the protruding structure. A furnace door sealing ring is provided around the outer edge of the furnace door heat-blocking boss. An "S"-shaped cooling circulation pipe is provided on the outer side of the furnace door.
9. The reaction chamber of the photovoltaic tubular high-temperature equipment according to claim 1, characterized in that, The tail cover plate is equipped with an air inlet pipe, a tail exhaust pipe, a gas supply pipe, and an inner coupling pipe. The air inlet pipe enters from the end face of the tail cover plate and leads to the furnace opening side. The gas supply pipe enters from the end face of the tail cover plate and leads to the middle of the cavity unit. A spray pipe is provided at the outlet of the gas supply pipe at the middle of the cavity unit. The surfaces of the cavity unit, furnace door, and tail cover plate are treated with ceramic plating and silicon carbide plating.
10. The reaction chamber of the photovoltaic tubular high-temperature equipment according to claim 1, characterized in that, The side of the cavity unit is composed of four square side plates, including an upper side plate, a lower side plate, a left side plate, and a right side plate. The upper and lower side plates form the top and bottom of the cavity, and the left and right side plates form the left and right side walls of the cavity. The upper, lower, left, and right side plates form the cavity structure. The side plates are either curved or flat. The connection method at the sides of the upper, lower, left, and right side plates is a sealed connection.