清洁系统

By designing an automatically controlled water valve and sealing structure between the surface cleaning equipment and the base station, the problem of water overflow when the surface cleaning equipment is frequently replenished with water is solved, improving the convenience and safety of water replenishment.

CN224505331UActive Publication Date: 2026-07-17DREAM INNOVATION TECH (SUZHOU) CO LTD

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
DREAM INNOVATION TECH (SUZHOU) CO LTD
Filing Date
2025-06-04
Publication Date
2026-07-17

AI Technical Summary

Technical Problem

Existing surface cleaning equipment requires frequent water replenishment when cleaning large areas, which poses a high risk of water overflow and is inconvenient to operate.

Method used

Design a cleaning system including a surface cleaning device and a base station. The device is equipped with a water inlet docking structure, and the base station is equipped with a water replenishment docking structure. The two are connected and disconnected by a water valve to ensure automatic opening and closing during docking and separation. Combined with a sealing structure, the risk of water overflow is reduced.

Benefits of technology

It enables automatic control of the water circuit opening and closing during docking and separation, reducing the risk of water overflow and improving the convenience and safety of water replenishment.

✦ Generated by Eureka AI based on patent content.

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Abstract

本实用新型公开一种清洁系统,包括表面清洁设备和基站;其中,表面清洁设备的主机清水箱设置进水对接结构;基站包括与进水对接结构对接的的补水对接结构,进水对接结构包括第一水阀,补水对接结构包括第二水阀,当补水对接结构与进水对接结构对接的情况下,第一水阀和第二水阀相互抵压而均处于打开状态,主机清水箱和补水管路连通;当补水对接结构与进水对接结构分离,第一水阀和第二水阀自动恢复到关闭状态,从而实现水通路的自动封闭,降低溢水风险。
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Claims

1. A cleaning system, characterized by include: A surface cleaning device includes a floor brush and a main unit water tank disposed on the floor brush, wherein the main unit water tank includes a water inlet connection structure; The base station includes a base for supporting and docking the surface cleaning equipment, a water replenishment docking structure disposed on the base, and a water replenishment pipeline. One end of the water replenishment pipeline is connected to the water replenishment docking structure, and the other end is connected to a water source. When the surface cleaning equipment is docked with the base, the water replenishment docking structure is docked and connected with the water inlet docking structure. The water inlet connection structure includes a first water valve, and the water replenishment connection structure includes a second water valve. When the water replenishment connection structure is connected to the water inlet connection structure, the first water valve and the second water valve press against each other and are both in the open state, and the main unit's clean water tank and the water replenishment pipeline are connected. When the water replenishment connection structure is separated from the water inlet connection structure, the first water valve and the second water valve automatically return to the closed state.

2. The cleaning system of claim 1, wherein, The first water valve includes a first valve stem, and the second water valve includes a second valve stem; the movement direction of the first valve stem and the second valve stem between the open state and the closed state is parallel to the insertion and removal direction of the surface cleaning device relative to the base station.

3. The cleaning system of claim 2, wherein, The first valve stem includes a first pressing end, and the second valve stem includes a second pressing end; the first pressing end protrudes from the valve cavity of the first water valve, and / or the second pressing end protrudes from the valve cavity of the second water valve; during the process of placing the surface cleaning device into the base station, the first pressing end and the second pressing end press against each other, causing the first valve stem and the second valve stem to switch from a closed state to an open state.

4. The cleaning system of claim 1, wherein, A sealing structure is provided between the water inlet connection structure and the water replenishment connection structure. The sealing structure is used to seal the water replenishment passage formed by the connection and cooperation of the water replenishment connection structure and the water inlet connection structure.

5. The cleaning system of claim 4, wherein, During the docking process between the water replenishment docking structure and the water inlet docking structure, the sealing engagement of the sealing structure precedes the triggering of the first water valve and the second water valve.

6. The cleaning system of claim 5, wherein, The sealing structure includes a sealing element, the radial end of which is adapted to seal against the inner wall of the water supply docking structure, and the end cross-section of the sealing element gradually decreases.

7. The cleaning system of claim 6, wherein, The water inlet docking structure includes a plug, the water replenishment docking structure includes a slot that engages with the plug, and the sealing element is fitted onto the plug of the water inlet docking structure; and / or, the number of the sealing elements is at least two.

8. The cleaning system of claim 7, wherein, The slot has a flared structure that gradually narrows from top to bottom; after the surface cleaning device is docked with the base station, at least one of the seals on the plug is close to or located on the flared structure.

9. The cleaning system of claim 8, wherein, The static friction between the seal and the slot is less than the weight of the base station.

10. The cleaning system of claim 1, wherein, The base station also includes a counterweight structure for increasing weight; and / or, the base station also includes a suction cup for adsorbing and engaging with a support surface, the suction cup being disposed at the bottom of the base.