一种混气系统以及半导体工艺设备

Abstract

本实用新型涉及一种混气系统以及半导体工艺设备，包括第一气体输入单元、第二气体输入单元、第一气体混合单元、第二气体混合单元、混合控制单元和第一气体输出单元。其优点在于，通过第一气体输入单元和第二气体输入单元向第一气体混合单元和第二气体混合单元分别输入不同压力的气体，利用两种气体之间压差可实现第一气体和第二气体的快速混合，并使得混气浓度更加稳定；此外，本申请利用道尔顿分压定律进行混气，由于压力释放是一瞬间，可以快速大量制备混气，支持供应超大流量系统依旧可以使用，适配性较高；再有，本实用新型的混气方法可以实现高压气体混配，不受压力限制，可以通入H2气压力为40psi，相对应的N2气压力为960psi进行混配，提升适用性。

Claims

1. A gas mixing system, characterized by, include: A first gas input unit, which is connected to a first gas source, is used to deliver a first gas. The second gas input unit is connected to the second gas source and is used to deliver the second gas; A first gas mixing unit, which is connected to the first gas input unit, is used to store a first gas and mix the first gas with a second gas. The second gas mixing unit is connected to the second gas input unit and is used to store the second gas and mix the second gas with the first gas. A mixing control unit, which is connected to the first gas mixing unit and the second gas mixing unit respectively, is used to connect the first gas mixing unit and the second gas mixing unit in the open state so as to mix the first gas and the second gas. The first gas output unit is connected to the first gas mixing unit and the second gas mixing unit respectively, and is used to output a mixed gas after the first gas and the second gas are mixed.

2. The gas mixing system of claim 1, wherein The first gas input unit includes: A first gas input element is connected to a first gas source and a first gas mixing unit, respectively, and is used to deliver a first gas. A first control element is disposed on the first gas input element and is used to control the flow of gas through the first gas input element; A first pressure regulating element is disposed on the first gas input element and located downstream of the first control element, and is used to regulate the pressure of the first gas input element; A second control element is disposed on the first gas input element and located downstream of the first pressure regulating element, and is used to control the flow of the first gas input element; A first pressure monitoring element is connected to the first gas input element and is located between the first control element and the first pressure regulating element, for monitoring the upstream pressure of the first pressure regulating element; A second pressure monitoring element is connected to the first gas input element and is located between the first pressure regulating element and the second control element, for monitoring the downstream pressure of the first pressure regulating element; A third pressure monitoring element, connected to the first gas input element and located downstream of the second control element, is used to monitor the pressure of the first gas flowing into the first gas mixing unit; and / or The second gas input unit includes: The second gas input element is connected to the second gas source and the second gas mixing unit respectively, and is used to deliver the second gas. A third control element is disposed on the second gas input element and is used to control the flow of the second gas input element; The second pressure regulating element is disposed on the second gas input element and located downstream of the third control element, and is used to regulate the pressure of the second gas input element; A fourth control element is disposed on the second gas input element and located downstream of the second pressure regulating element, and is used to control the flow of the second gas input element; A fourth pressure monitoring element, which is connected to the second gas input element and located between the third control element and the second pressure regulating element, is used to monitor the upstream pressure of the second pressure regulating element; The fifth pressure monitoring element, wherein the third pressure monitoring element is connected to the second gas input element and is located between the second pressure regulating element and the fourth control element, is used to monitor the downstream pressure of the second pressure regulating element; A sixth pressure monitoring element, connected to the second gas input element and located downstream of the second control element, is used to monitor the pressure of the second gas flowing into the second gas mixing unit; and / or The first gas mixing unit includes: A first gas mixing element is connected to the first gas input unit, the mixing control unit, and the first gas output unit, respectively, and is used to store the first gas and mix the first gas with the second gas. The fifth control element is disposed on the first gas mixing element and is used to control the flow between the first gas mixing element and the first gas input unit; A sixth control element is disposed on the first gas mixing element and is used to control the flow between the first gas mixing element and the first gas output unit; A seventh pressure monitoring element, which is connected to the first gas mixing element, is used to monitor the pressure of the first gas mixing element; and / or The second gas mixing unit includes: The second gas mixing element is connected to the second gas input unit, the mixing control unit, and the first gas output unit, respectively, and is used to store the second gas and mix the second gas with the first gas. A seventh control element is disposed on the second gas mixing element and is used to control the flow between the second gas mixing element and the second gas input unit; An eighth control element is disposed on the second gas mixing element and is used to control the flow between the second gas mixing element and the first gas output unit; An eighth pressure monitoring element, which is connected to the second gas mixing element, is used to monitor the pressure of the second gas mixing element; and / or The hybrid control unit includes: A connecting element, which is connected to the first gas mixing unit and the second gas mixing unit respectively, for mixing the first gas and the second gas; A ninth control element, disposed on the communicating element, is used to control the flow within the communicating element; and / or The first gas output unit includes: A first gas output element, which is connected to the first gas mixing unit, is used to deliver the mixed gas; The second gas output element is connected to the second gas mixing unit and is used to deliver the mixed gas; A third gas output element, which is connected to the first gas output element and the second gas output element respectively, is used to deliver a mixed gas; A first vacuum element is disposed on the third gas output element and is used to perform vacuum treatment on the first gas mixing unit and the second gas mixing unit. A tenth control element is disposed on the third gas output element and located downstream of the first vacuum element, and is used to control the flow of the third gas output element; A bypass element is connected to the third gas output element, and the two ends of the bypass element are respectively located upstream and downstream of the first vacuum element, for supplying mixed gas to be transported outward. The eleventh control element is disposed on the bypass element and is used to control the flow of the bypass element.

3. The gas mixing system of any of claims 1-2, wherein Also includes: A first pressure relief unit, connected to the first gas mixing unit, is used to control the pressure of the first gas mixing unit by pressure relief to ensure that the pressure of the first gas meets the mixing requirements; and / or A second pressure relief unit, connected to the second gas mixing unit, is used to control the pressure of the second gas mixing unit by pressure relief to ensure that the pressure of the second gas meets the mixing requirements; and / or Temperature control unit, wherein the temperature control unit is respectively connected to the first gas mixing unit and the second gas mixing unit, and is used to control the temperature of the first gas mixing unit and the second gas mixing unit; and / or A buffer unit, which is connected to the first gas output unit, is used to buffer the mixed gas; The second gas output unit is connected to the buffer unit, the first gas output unit, and the process equipment, and is used to output mixed gas.

4. The gas mixing system of claim 3, wherein The first pressure relief unit includes: The first pressure relief element is connected to the first gas mixing unit and the waste gas treatment equipment respectively, and is used to transport the first gas. A twelfth control element is disposed on the first pressure relief element and is used to control the flow of the first pressure relief element; A first unidirectional element, disposed below the first pressure relief element and downstream of the twelfth control element, is used to allow unidirectional gas flow; and / or The second pressure relief unit includes: The second pressure relief element is connected to the second gas mixing unit and the waste gas treatment equipment respectively, and is used to transport the second gas. The thirteenth control element is disposed on the second pressure relief element and is used to control the flow of the second pressure relief element; A second unidirectional element, disposed below the second pressure relief element and downstream of the thirteenth control element, is used to allow unidirectional gas flow; and / or The temperature control unit includes: A first fluid input element is connected to the first gas mixing unit and a heat exchange device, respectively, and is used to transport a fluid with a first temperature from the heat exchange device to the first gas mixing unit; A first fluid output element is connected to the first gas mixing unit and the heat exchange device, respectively, and is used to transport a fluid with a second temperature from the first gas mixing unit to the heat exchange device. The second fluid input element is connected to the second gas mixing unit and the heat exchange device respectively, and is used to transport the fluid with the first temperature from the heat exchange device to the second gas mixing unit; The second fluid output element is connected to the second gas mixing unit and the heat exchange device respectively, and is used to transport the fluid with the second temperature from the second gas mixing unit to the heat exchange device; The fourteenth control element is disposed on the first fluid input element and is used to control the flow between the first fluid input element and the first gas mixing unit; The fifteenth control element is disposed on the first fluid output element and is used to control the flow between the first fluid output element and the first gas mixing unit; The sixteenth control element is disposed on the second fluid input element and is used to control the flow between the second fluid input element and the second gas mixing unit; A seventeenth control element, disposed on the second fluid output element, is used to control the flow between the second fluid output element and the second gas mixing unit; and / or The first gas mixing unit further includes: A first temperature monitoring element, connected to the first gas mixing unit, is used to monitor the temperature of the first gas mixing unit; and / or The second gas mixing unit further includes: A second temperature monitoring element, connected to the second gas mixing unit, is used to monitor the temperature of the second gas mixing unit; and / or The buffer unit includes: A buffer element, which is connected to the first gas output unit and the second gas output unit respectively, is used to buffer the mixed gas. The eighteenth control element is disposed on the buffer element and is used to control the flow between the buffer element and the first gas output unit; A nineteenth control element, disposed on the buffer element, is used to control the flow between the buffer element and the second gas output unit; and / or The second gas output unit includes: A fourth gas output element, which is connected to the first gas output unit, is used to deliver the mixed gas; The twentieth control element is disposed on the fourth gas output element and is used to control the flow of the fourth gas output element; The fifth gas output element is connected to the fourth gas output element and the buffer unit respectively, and is used to deliver the mixed gas; The twenty-first control element is disposed on the fifth gas output element and is used to control the flow of the fifth gas output element; A third pressure regulating element is disposed on the fifth gas output element and located downstream of the twenty-first control element, and is used to regulate the pressure of the fifth gas output element; The 22nd control element is disposed on the 5th gas output element and located downstream of the 3rd pressure regulating element, and is used to control the flow of the 5th gas output element; At least one sixth gas output element, which is connected to the fifth gas output element and the process equipment respectively, for conveying mixed gas; At least one twenty-third control element, wherein the twenty-third control element is respectively disposed on the corresponding sixth gas output element, for controlling the flow of the sixth gas output element; A ninth pressure monitoring element, which is connected to the fifth gas output element and located between the twentieth control element and the third pressure regulating element, is used to monitor the upstream pressure of the third pressure regulating element; The tenth pressure monitoring element is connected to the fifth gas output element and is located between the third pressure regulating element and the twenty-first control element, and is used to monitor the downstream pressure of the third pressure regulating element.

5. The gas mixing system of claim 3, wherein Also includes: A first analysis unit, connected to both a first gas mixing unit and a second gas mixing unit, is used to analyze a gas mixture formed by mixing the first gas and the second gas; and / or The second analysis unit, which is connected to the second gas output unit, is used to analyze the mixed gas.

6. The gas mixing system of claim 5, wherein The first analysis unit includes: A first analytical gas input element, which is connected to the first gas output unit, is used to deliver a mixed gas. A first analytical element, connected to a first analytical gas input element, is used to monitor the concentration of the mixed gas; The 24th control element is disposed on the first analytical gas input element and is used to control the flow of the first analytical gas input element; The third unidirectional element is disposed at the first analytical gas input element and located downstream of the twenty-fourth control element, and is used to enable unidirectional gas flow. A fourth pressure regulating element is disposed on the first analytical gas input element and located downstream of the third unidirectional element, and is used to regulate the pressure of the first analytical gas input element; An eleventh pressure monitoring element, which is connected to the first analytical gas input element and located downstream of the fourth pressure regulating element, is used to detect the pressure of the first analytical gas input element; and / or The second analysis unit includes: The second analytical gas input element is connected to the second gas output unit and is used to deliver the mixed gas. The second analytical element, which is connected to the second analytical gas input element, is used to monitor the concentration of the mixed gas; The 25th control element is disposed on the 2nd analytical gas input element and is used to control the flow of the 2nd analytical gas input element; A fourth unidirectional element is disposed on the second analytical gas input element and located downstream of the twenty-fifth control element, for enabling unidirectional gas flow; A fifth pressure regulating element is disposed on the second analytical gas input element and located downstream of the fourth one-way element, and is used to regulate the pressure of the second analytical gas input element; The twelfth pressure monitoring element is connected to the second analytical gas input element and is located downstream of the fifth pressure regulating element, and is used to detect the pressure of the second analytical gas input element.

7. The gas mixing system of claim 5, wherein Also includes: An exhaust gas emission unit is connected to the first pressure relief unit, the second pressure relief unit, the first gas output unit, the second gas output unit, the buffer unit, the first analysis unit, and the second analysis unit, respectively, and is used to discharge exhaust gas. A purging unit, connected to the second gas input unit and the exhaust gas emission unit respectively, is used to purge the entire pipeline; and / or The third gas input unit is connected to the third gas source and is used to deliver the third gas; The first analysis unit is connected to both the first gas input unit and the third gas input unit for zero gas calibration; the second analysis unit is connected to both the first gas input unit and the third gas input unit for calibration gas calibration. and / or A backup mixed gas supply unit, which is connected to the second gas output unit, is used to supply mixed gas to the process equipment.

8. The gas mixing system of claim 7, wherein, The exhaust gas emission unit includes: The first exhaust gas emission element is connected to the first pressure relief unit, the second pressure relief unit, and the first gas output unit, respectively, and is used to transport gas. The second exhaust gas emission element is connected to the second gas output unit and is used to transport gas; The third exhaust gas emission element is connected to the first exhaust gas emission element, the second exhaust gas emission element, and the exhaust gas treatment equipment, respectively, and is used to transport gas; A fourth exhaust gas emission element, which is connected to the buffer unit and the first exhaust gas emission element respectively, is used to transport gas; The fifth exhaust gas emission element is connected to the first analysis unit and the first exhaust gas emission element respectively, and is used to transport gas. The sixth exhaust gas emission element is connected to the second analysis unit and the second exhaust gas emission element respectively, and is used to transport gas; The 26th control element is disposed on the first exhaust gas emission element and is used to control the flow of the first exhaust gas emission element; The fifth unidirectional element is disposed in the first exhaust gas emission element and located downstream of the twenty-sixth control element, and is used to enable the gas to flow in one direction. The 27th control element is disposed on the 2nd exhaust gas emission element and is used to control the flow of the 2nd exhaust gas emission element; The 28th control element is disposed on the third exhaust gas emission element and is used to control the flow of the third exhaust gas emission element; A sixth unidirectional element is disposed on the fourth exhaust gas emission element to enable unidirectional gas flow. A seventh unidirectional element is disposed on the fifth exhaust gas emission element to enable unidirectional gas flow. The eighth unidirectional element, disposed on the sixth exhaust gas emission element, is used to enable unidirectional gas flow; and / or The purging unit includes: A purge gas input element is connected to a purge gas source and the second gas input unit, respectively, for delivering purge gas; A first purge gas output element is connected to the exhaust gas emission unit and is used to transport exhaust gas. The second vacuum element is connected to the first purge gas output element and is used to create a vacuum negative pressure at the end of the first purge gas output element; The second purge gas output element is connected to the second vacuum element and the waste gas treatment equipment, respectively, and is used to transport waste gas. A power gas supply element is connected to a power gas source and the second vacuum element, respectively, and is used to supply power gas to the second vacuum element; The 29th control element is disposed on the purge gas input element and is used to control the flow of the purge gas input element; A ninth unidirectional element is disposed on the purge gas input element and located downstream of the twenty-ninth control element, for enabling unidirectional gas flow; The thirtieth control element is disposed on the purge gas input element and located downstream of the ninth unidirectional element, and is used to control the flow of the purge gas input element. The thirty-first control element is disposed on the first purge gas output element and is used to control the flow of the first purge gas output element; The thirty-second control element is disposed on the second purge gas output element and is used to control the flow of the second purge gas output element; The thirty-third control element, disposed on the power gas supply element, is used to control the flow of gas through the power gas supply element; and / or The first gas input unit further includes: A third gas input element is connected to the first gas input element of the first gas input unit and is used to deliver the first gas. A fourth gas input element is connected to the third gas input element and the first analysis unit, respectively, and is used to supply the first gas to the first analysis unit so that the first analysis unit can perform zero gas calibration. A fifth gas input element is connected to the third gas input element and the second analysis unit, respectively, and is used to supply the first gas to the second analysis unit so that the second analysis unit can perform zero gas calibration. The thirty-fourth control element is disposed on the third gas input element and is used to control the flow of the third gas input element; The tenth unidirectional element is disposed on the third gas input element and located downstream of the thirty-fourth control element, and is used to enable unidirectional gas flow. The thirty-fifth control element is disposed on the fourth gas input element and is used to control the flow of the fourth gas input element; The thirty-sixth control element is disposed on the fifth gas input element and is used to control the flow of the fifth gas input element; The third gas input unit includes: A sixth gas input element is connected to a standard gas source and a third gas input element, respectively, and is used to supply standard gas to the first analysis unit and the second analysis unit so that the first analysis unit and the second analysis unit can perform standard gas calibration. The thirty-seventh control element, disposed on the sixth gas input element, is used to control the flow through the sixth gas input element; and / or The backup mixed gas supply unit includes: A backup gas supply element is connected to a backup gas source and the second gas output unit, respectively, and is used to supply mixed gas to the process equipment. The thirty-eighth control element is disposed on the backup gas supply element and is used to control the flow of the backup gas supply element; The thirty-ninth control element is disposed in the backup gas supply element and located downstream of the thirty-eighth control element, and is used to control the flow of the backup gas supply element.

9. A semiconductor process apparatus, characterized by, include: The air-fuel mixing system as described in any one of claims 1 to 8.

10. The semiconductor process apparatus according to claim 9, wherein Also includes: A first gas supply device is connected to the first gas input unit of the gas mixing system; A second gas supply device is connected to the second gas input unit of the gas mixing system; A purging gas supply device, wherein the purging gas supply device is connected to the purging unit of the gas mixing system; A standard gas supply device, wherein the standard gas supply device is connected to the third gas input unit of the gas mixing system; A waste gas treatment device, wherein the waste gas treatment device is connected to the waste gas emission unit of the gas mixing system; A power gas supply device, wherein the power gas supply device is connected to the second vacuum element of the purging unit of the gas mixing system; A backup gas supply device is connected to the backup mixed gas supply unit of the mixing system.

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