一种半导体生产氢气混合装置
By designing a hydrogen mixing device for semiconductor production, a continuous mixing of hydrogen and inert gas is achieved using an electrolytic cell and a Venturi mixer. This solves the problems of inconvenience and high cost in hydrogen mixing, improves the purity and safety of the mixed gas, and meets the process requirements of semiconductor production.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- TIANJIN JINMEI HYDROGEN SOURCE TECH DEV CO LTD
- Filing Date
- 2025-08-18
- Publication Date
- 2026-07-17
AI Technical Summary
In existing technologies, mixing hydrogen in semiconductor production is inconvenient and costly, and there is a risk of leakage, making it difficult to meet process performance requirements.
Design a hydrogen mixing device for semiconductor production, including an electrolyzer, a gas-water separator, a dehydration tube, a deoxygenation tube, and a mixing device. Hydrogen is generated by electrolysis and mixed with an inert gas. A Venturi mixer is used to achieve quantitative mixing and output of the gas.
This technology enables continuous hydrogen production and efficient mixing, reduces hydrogen procurement costs, ensures the purity and safety of the mixed gas, and meets the process requirements of semiconductor manufacturing.
Smart Images
Figure CN224506997U_ABST
Abstract
Claims
1. A semiconductor hydrogen production mixing device comprising an electrolytic cell (22), characterized by, The inlet of the electrolytic cell (22) is connected to the water supply equipment; The hydrogen outlet of the electrolyzer (22) is connected to the inlet of the gas-water separator (19), and the outlet of the gas-water separator (19) is connected to the gas mixing device via a dehydration pipe (15) and a deoxygenation pipe (12); and, The gas mixing device is also connected to an inert gas supply device. The gas mixing device mixes hydrogen and inert gas and then discharges the mixture.
2. The semiconductor hydrogen gas mixing device according to claim 1, wherein The water supply equipment includes an inlet pump (26), the outlet of which is connected to a filter assembly (27), the outlet of which is connected to a water tank (25), and the water tank (25) is connected to an electrolytic cell (22) via a water supply pump (24).
3. The semiconductor hydrogen gas mixing device according to claim 2, wherein The return water inlet of the electrolytic cell (22) is connected to the water tank (25) through the radiator (20), and the outlet of the gas-water separator (19) at the bottom is connected to the water tank (25).
4. The semiconductor hydrogen gas mixing device according to claim 3, wherein It also includes a support frame (16), a mounting plate (1) on one side of the support frame (16), and multiple layers of partitions (28) inside the support frame (16); and, The pure water column (23), water supply pump (24), water tank (25), water inlet pump (26), filter assembly (27), gas-water separator (19), radiator (20) and electrolytic cell (22) are all installed on the partition (28), and the gas-water separator (19) is located above the water tank (25); The support frame (16) is also equipped with a controller, which is electrically connected to the inlet pump (26), the supply pump (24) and the electrolytic cell (22).
5. The semiconductor hydrogen gas mixing device according to claim 4, wherein The heat sink (20) and the electrolytic cell (22) are both located on one side inside the support frame (16). Two exhaust fans (21) are installed on the side of the support frame (16). The exhaust fans (21) correspond to the heat sink (20) and the electrolytic cell (22) respectively. The exhaust fans (21) are electrically connected to the controller.
6. The semiconductor hydrogen gas mixing device according to claim 5, wherein The number of deoxygenation tube (12) and dehydration tube (15) is at least one, and both are detachably installed on the fixing plate (14). The fixing plate (14) is installed in layers on one side of the support frame (16).
7. The semiconductor hydrogen gas mixing device according to claim 6, wherein The gas mixing device includes a first mixing pipe (3), and two opposite air inlet connectors (2) are provided on the side of the first mixing pipe (3). One air inlet connector (2) is connected to the outlet of the deoxygenation pipe (12), and the other air inlet connector (2) is connected to the inert gas supply device. One end of the first mixing tube (3) is connected to the Venturi mixer (4), and the other end of the Venturi mixer (4) is connected to the second mixing tube (5). The second mixing tube (5) is provided with a connector (29) for discharging the mixed gas.
8. The semiconductor hydrogen gas mixing device according to claim 7, wherein The inert gas supply device includes two sets of steel cylinders (6). Valves are detachably provided on the outlets of the two sets of steel cylinders (6). The two sets of valves are respectively installed on the first gas supply pipe (30). The two first gas supply pipes (30) are connected to the second gas supply pipe (31). The end of the second gas supply pipe (31) is connected to the inlet connector (2). A gas pressure monitor (17) and a flow control valve (18) are installed on the second gas supply pipe (31). Each first gas supply pipe (30) is equipped with an electric control valve (13). The electric control valve (13), the gas pressure monitor (17) and the flow control valve (18) are electrically connected to the controller.
9. The semiconductor hydrogen gas mixing device according to claim 8, wherein Two sets of steel cylinders (6) are located on both sides of the support plate (9), and the two ends of the support plate (9) are respectively set on the support (7) by brackets (8); Multiple pairs of stops (10) are provided on both sides of the support plate (9). A cavity for placing the steel cylinder (6) is formed between each pair of stops (10). The cavity ports are detachably provided with limiting plates (11) to limit the position of the steel cylinder (6).