供化学机械研磨设备用的管路切换装置、清洗模块及设备

By using a drive component and quick-change disc structure in the chemical mechanical grinding equipment to achieve pipeline switching, the problem that the cleaning module can only deliver a single cleaning fluid is solved, thereby improving cleaning efficiency and the applicability of the machine.

CN224507819UActive Publication Date: 2026-07-17HANGZHOU HFC SEMICONDUCTOR CO

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
HANGZHOU HFC SEMICONDUCTOR CO
Filing Date
2025-08-07
Publication Date
2026-07-17

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Abstract

本实用新型提供一种供化学机械研磨设备用的管路切换装置、清洗模块及设备,管路切换装置包括:驱动部件、至少两个快换盘以及多条输送管路;一个快换盘通过输送管路分别与多个容置有不同清洗液的供液装置连接;另一个快换盘通过输送管路分别与机台以及多个废液池连接;快换盘包括中转管、固定部和旋转部,输送管路伸入固定部中,中转管的至少一部分设置于旋转部上,驱动部件与旋转部连接,用于驱动旋转部转动,以使得中转管能够与不同的输送管路对接,形成不同的输送通路。如此配置,通过增设驱动部件和快换盘,并驱动旋转部转动,从而使得中转管与不同的输送管路连通,形成不同的输送通路,进而适配不同的清洗液且拓宽了机台的适用范围。
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Claims

1. A line switching device for a chemical mechanical polishing apparatus, characterized by comprising: include: Drive components, at least two quick-change discs, and multiple delivery lines; One of the quick-change discs is connected to multiple liquid supply devices containing different cleaning solutions via the delivery pipeline; another quick-change disc is connected to the machine and multiple waste liquid tanks via the delivery pipeline; at least two quick-change discs are connected to each other via the delivery pipeline. The quick-change disc includes a transfer pipe, a fixed part, and a rotating part. The delivery pipe extends into the fixed part, and at least a portion of the transfer pipe is disposed on the rotating part. The driving component is connected to the rotating part and is used to drive the rotating part to rotate, so that the transfer pipe can connect with different delivery pipes to form different delivery paths and deliver different cleaning solutions.

2. The line switching device for a chemical mechanical polishing apparatus according to Claim 1, wherein The fixing part is provided with a groove, and the rotating part is accommodated in the groove; The transfer pipe has an inlet section and an outlet section, with at least the outlet section disposed on the rotating part. The inlet section and the outlet section are arranged at an angle, and the angle between the inlet section and the outlet section can be adjusted or fixed.

3. The line switching device for a chemical mechanical polishing apparatus according to Claim 2, wherein The pipeline switching device includes a first quick-change disc, on which multiple conveying pipeline groups are provided, and the multiple conveying pipeline groups are used to convey different cleaning solutions. Each of the aforementioned conveying pipeline groups is provided with a first inlet pipeline and a first outlet pipeline. The inlet section and outlet section of the transfer pipe are respectively connected to the first inlet pipeline and the first outlet pipeline in the same conveying pipeline group to form the conveying passage. Among them, one end of the first inlet pipeline is connected to the liquid supply device, and the other end extends into the fixing part. One end of the first outlet pipeline extends into the fixing part, and the other end is connected to other quick-change discs through another conveying pipeline.

4. The line switching device for a chemical mechanical polishing apparatus according to Claim 3, wherein Both the inlet section and the outlet section are mounted on the rotating part. The driving component drives the rotating part to rotate so that the inlet section and the outlet section rotate synchronously. The included angle between the inlet section and the outlet section is fixed and is adapted to the included angle between the extension direction of the inlet pipe and the extension direction of the outlet pipe in any of the conveying pipe groups.

5. The line switching device for a chemical mechanical polishing apparatus according to Claim 3, wherein Multiple delivery pipeline assemblies are evenly arranged around the edge of the first quick-change disc.

6. The line switching device for a chemical mechanical polishing apparatus according to Claim 2, wherein The pipeline switching device includes a second quick-change plate, on which a second inlet pipeline and multiple second outlet pipelines are provided; The inlet section of the transfer pipe is connected to the second inlet pipe, and the outlet section of the transfer pipe is connected to different second outlet pipes to form different delivery paths. One end of the second liquid inlet pipe is used to connect with other quick-change discs through another conveying pipe, and the other end extends into the fixed part. One end of each of the multiple second liquid outlet pipes extends into the fixed part, and the other end is connected to the machine base and the multiple waste liquid pools respectively.

7. The line switching device for a chemical mechanical polishing apparatus according to Claim 6, wherein The second inlet pipe and the second outlet pipe are arranged at an angle; the inlet section is disposed on the fixed part, the outlet section is disposed on the rotating part, and the driving component drives the rotating part to rotate so as to drive the outlet section to rotate.

8. The line switching device for a chemical mechanical polishing apparatus according to Claim 6, wherein The second liquid outlet pipelines are evenly arranged around the edge of the second quick-change disc.

9. A cleaning module for a chemical mechanical polishing apparatus, characterized by, The application relates to a pipeline switching device for a chemical mechanical polishing equipment. The spraying part is connected with the conveying pipeline of the pipeline switching device, and is used for spraying different cleaning liquids to the wafer surface to be cleaned; and the brushing part is used for brushing the wafer surface while the spraying part sprays the cleaning liquid to the wafer surface, so that the wafer surface is cleaned. The application relates to a cleaning module for a chemical mechanical polishing equipment.

10. A chemical mechanical polishing apparatus characterized by comprising: ​