A polishing device for the production of electrolytic copper foil

Abstract

This utility model discloses a polishing device for the production of electrolytic copper foil, including a cathode roller body and symmetrically arranged clamping machine tools. The cathode roller body is installed between the two clamping machine tools. A polishing mechanism for polishing the cathode roller body is provided on the outer side of the clamping machine tools. A polishing liquid treatment mechanism for separating polishing liquid and polishing debris is provided between the two clamping machine tools. The polishing liquid treatment mechanism includes a collection frame, a support plate, and a reciprocating scraping assembly. The collection frame is located directly below the cathode roller body, and the support plate is fixedly installed inside the collection frame with a gap between it and the inner bottom surface of the collection frame. The reciprocating scraping assembly is located above the support plate. This utility model can effectively prevent the polishing liquid from splashing during the polishing process and can effectively collect and recover polishing debris.

Description

Technical Field

[0001] This utility model relates to the field of copper foil processing technology, and in particular to a polishing device for the production of electrolytic copper foil. Background Technology

[0002] The cathode roller is a core component of the foil-making machine, a core piece of equipment for electrolytic copper foil production. It is made of titanium and is extremely prone to oxidation in an oxygen environment, forming a passivation layer. It needs to be frequently polished.

[0003] A search revealed that utility model patent document CN222843805U discloses a cathode roller polishing device, comprising: a base with a clamping groove, a receiving box mounted on the upper end of the base; a lifting mechanism mounted on both sides of the receiving box for lifting the cathode roller; a clamping and rotating mechanism mounted in the clamping groove for clamping the cathode roller and driving it to rotate; a spraying mechanism mounted on the base for wetting the cathode roller; the spraying mechanism includes a spray box mounted on the base, a spray seat mounted in the receiving box, a plurality of spray nozzles mounted on the spray seat, the spray seat being connected to the spray box via a spray pipe, and a spray pump mounted on the spray pipe; and a polishing mechanism mounted on the upper end of the base for polishing the cathode roller.

[0004] In the polishing process of the cathode roller described above, the polishing liquid is sprayed from bottom to top from inside the spray seat, which causes the polishing liquid to splash everywhere during the polishing process and makes it difficult to collect and process the polishing debris. Furthermore, the polishing process is carried out by rotating the cathode roller so that the polishing pad can polish the cathode roller. The polishing pad itself can only move laterally and cannot rotate for polishing, which reduces the polishing effect of the cathode roller. Utility Model Content

[0005] The purpose of this invention is to provide a polishing device for the production of electrolytic copper foil, which can effectively prevent the splashing of polishing liquid during the polishing process and effectively collect and recover polishing debris.

[0006] The present invention adopts the following technical solution:

[0007] A polishing device for the production of electrolytic copper foil includes a cathode roller body and symmetrically arranged clamping machine tools. The cathode roller body is installed between the two clamping machine tools. A polishing mechanism for polishing the cathode roller body is provided on the outside of the clamping machine tools. A polishing liquid treatment mechanism for separating polishing liquid and polishing debris is provided between the two clamping machine tools.

[0008] The polishing fluid treatment mechanism includes a collection frame, a support plate, and a reciprocating scraping assembly. The collection frame is located directly below the cathode roller body, the support plate is fixedly installed inside the collection frame and has a gap between it and the inner bottom surface of the collection frame, and the reciprocating scraping assembly is located above the support plate.

[0009] Optionally, the support plate includes a support plate surface and symmetrically arranged filter plate surfaces, with the two filter plate surfaces symmetrically arranged on both sides of the support plate surface, and an inclined plate surface connecting the filter plate surface and the support plate surface.

[0010] Optionally, the reciprocating scraping assembly includes a reciprocating screw and a drive roller shaft. The drive roller shaft is rotatably engaged with the collection frame and is positioned above the support plate. The drive roller shaft contacts the circumferential surface of the cathode roller body. The reciprocating screw is rotatably engaged with the collection frame and is positioned below the drive roller shaft and perpendicular to it. A partition is fixedly installed inside the collection frame, and there is a gap between the partition and the support plate. The reciprocating screw is positioned on the right side of the partition.

[0011] Optionally, a pulley is fixedly installed on one side of the circumferential surface of the transmission roller shaft, a rotating shaft is rotatably installed on the inner wall of the collection frame, a bevel gear and a pulley are fixedly installed on the surface of the rotating shaft, the pulleys correspond to each other, and a transmission belt is installed between the pulleys. A bevel gear is fixedly installed on one side of the circumferential surface of the reciprocating screw, which meshes with the bevel gear.

[0012] Optionally, a slider is installed on the surface of the reciprocating screw to cooperate with the reciprocating screw. The slider slides in contact with the support plate surface and the partition of the support plate. A movable plate is fixedly installed on the side of the slider and slides on the support plate surface of the support plate.

[0013] Optionally, a scraper is provided below the cathode roller body near the drive roller shaft. The scraper is fixed to the inner wall of the partition and the collection frame, and the upper end of the scraper is in contact with the circumferential surface of the cathode roller body.

[0014] Optionally, the polishing mechanism includes a support platform, a support plate, a polishing roller, and a protective cover. The support platform is installed on the outer side of the machine tool, the support plate is positioned above the support platform, the polishing roller is positioned above the support plate, the protective cover is installed on the outer side of the polishing roller, and a connecting seat is fixedly connected between the middle surface of the support plate and the protective cover.

[0015] Optionally, a fixed seat is fixedly installed on the upper end face of the support platform near the side. Hinges are symmetrically installed on both sides of the fixed seat. Hinges are fixedly installed at the four corner positions on the lower surface of the support plate. Two of the hinges corresponding to the hinges are hinged to the hinges. Telescopic cylinders are hinged below the other two hinges. Mounting seats are hinged at the lower end of the fixed part of the telescopic cylinder. The mounting seats are fixedly installed on the ground.

[0016] Optionally, the upper surface of the support plate is symmetrically fixed with support seats, the polishing roller is rotatably disposed between the two support seats, and the two ends of the cathode roller body pass through the two sides of the protective cover and are rotatably engaged.

[0017] Optionally, a water inlet pipe is fixedly installed on the upper inner wall of the protective cover. One end of the water inlet pipe is closed, and the other end is connected to a connecting pipe. The connecting pipe passes through the protective cover and is connected to an external polishing liquid pumping device. The water inlet pipe has an inclined surface, and several nozzles connected to the water inlet pipe are fixedly installed on the inclined surface of the water inlet pipe. An inclined water guide plate is fixedly installed at the lower outlet of the protective cover.

[0018] In summary, this utility model has the following beneficial effects:

[0019] 1. In this utility model, the polishing waste liquid can be collected through the polishing liquid treatment mechanism, and the liquid and polishing debris in the polishing liquid can be separated, which facilitates the recycling of the polishing liquid;

[0020] 2. In this utility model, the second support plate is rotated at a certain angle by a telescopic cylinder, so that the polishing roller approaches and contacts the circumferential surface of the fixed cathode roller body. Then, the cathode roller body is polished by the polishing roller. This makes it convenient to hoist and transport the cathode roller body before and after polishing.

[0021] 3. In this utility model, the protective cover can block the polishing liquid during the polishing process, preventing the polishing liquid from splashing everywhere during processing;

[0022] 4. In this utility model, the rotation of the cathode roller body drives the transmission roller shaft below to rotate, and then the reciprocating screw drives the slider to move back and forth, so that the moving plate can slide on the support plate surface of the first support plate, thereby pushing the polishing liquid on the support plate surface, so that the polishing liquid and polishing debris are quickly separated, and the recycling efficiency of the polishing liquid is improved.

[0023] 5. In this utility model, the cathode roller body rotates under the drive of the clamping machine tool, and at the same time, the polishing roller performs rotational polishing on the cathode roller body, which greatly improves the polishing effect of the cathode roller body. Attached Figure Description

[0024] Figure 1 This is a schematic diagram of the overall structure of this utility model;

[0025] Figure 2 This is a schematic diagram of the polishing mechanism of this utility model;

[0026] Figure 3 This is a cross-sectional view of the polishing mechanism of this utility model;

[0027] Figure 4 This is a cross-sectional view of the present invention;

[0028] Figure 5 This is a schematic diagram of the polishing fluid treatment mechanism of this utility model;

[0029] Figure 6 In this utility model Figure 5 A magnified view of the details at point A.

[0030] In the diagram: 1. Clamping machine tool; 2. Cathode roller body; 3. Polishing liquid treatment mechanism; 4. Polishing mechanism; 31. Collection frame; 32. Partition plate; 33. Support plate; 331. Support plate surface; 332. Filter plate surface; 34. Transmission roller shaft; 341. Pulley one; 35. Scraper; 36. Moving plate; 37. Transmission belt; 38. Reciprocating screw; 381. Bevel gear one; 382. Slider; 39. Rotating shaft; 391. Bevel gear two; 392. Pulley two; 41. Support platform; 411. Fixed seat; 412. Hinge shaft; 42. Support plate; 43. Hinge seat; 44. Mounting seat; 441. Telescopic cylinder; 45. Protective cover; 451. Connecting seat; 46. Water inlet pipe; 461. Connecting pipe; 462. Nozzle; 47. Support seat; 48. Polishing roller; 49. Water guide plate. Detailed Implementation

[0031] The principles and spirit of this utility model will be explained in detail below with reference to several representative embodiments.

[0032] Please see Figure 1-6 The present invention will now be described in detail with reference to the accompanying drawings and embodiments:

[0033] like Figure 1 As shown, a polishing device for producing electrolytic copper foil includes a cathode roller body 2 and symmetrically arranged clamping machine tools 1. The clamping machine tools 1 clamp and fix the cathode roller body 2 to be processed, and drive the cathode roller body 2 to rotate, so that the circumferential surface of the cathode roller body 2 can be better polished. A polishing mechanism 4 for polishing the cathode roller body 2 is arranged on the outside of the clamping machine tools 1. A polishing liquid treatment mechanism 3 is arranged between the two clamping machine tools 1. The polishing liquid treatment mechanism 3 can collect polishing waste liquid and separate the liquid and polishing debris in the polishing liquid, which facilitates the recycling of polishing liquid.

[0034] The aforementioned clamping machine tool 1 is existing technology and will not be drawn or described in detail here.

[0035] like Figure 2-4As shown, in this embodiment, the polishing mechanism 4 includes a support platform 41, a second support plate 42, a polishing roller 48, and a protective cover 45. The support platform 41 is installed on the outer side of the clamping machine tool 1, the second support plate 42 is disposed above the support platform 41, the polishing roller 48 is disposed above the second support plate 42, and the protective cover 45 is installed on the outer side of the polishing roller 48. A connecting seat 451 is fixedly connected between the middle surface of the second support plate 42 and the protective cover 45. The protective cover 45 is used to shield the polishing roller 48 and prevent the polishing liquid from splashing during the polishing process.

[0036] A fixed seat 411 is fixedly installed on the upper end face of the support platform 41 near the side. Hinges 412 are symmetrically installed on both sides of the fixed seat 411. Hinges 43 are fixedly installed at the four included corner positions on the lower surface of the second support plate 42. Two of the hinges 43 corresponding to the hinges 412 are hinged to the hinges 412. Telescopic cylinders 441 are hinged below the other two hinges 43. Mounting seats 44 are hinged to the lower end of the fixed part of the telescopic cylinder 441. The mounting seats 44 are fixedly installed on the ground.

[0037] Specifically, the second support plate 42 is rotated at a certain angle by the telescopic cylinder 441, so that the polishing roller 48 approaches and contacts the circumferential surface of the fixed cathode roller body 2, and then the cathode roller body 2 is polished by the polishing roller 48.

[0038] like Figure 2-4 As shown, in this embodiment, support seats 47 are symmetrically fixed on the upper surface of the second support plate 42, and the polishing roller 48 is rotatably disposed between the two support seats 47. A drive motor is fixedly installed on the outer side of one of the support seats 47, and the polishing roller 48 is driven to rotate by the drive motor. The drive motor is prior art and will not be drawn or described in detail here.

[0039] like Figure 2-4 As shown, in this embodiment, the two end shafts of the cathode roller body 2 pass through the two sides of the protective cover 45 and are rotated together.

[0040] A water inlet pipe 46 is fixedly installed on the upper inner wall of the protective cover 45. One end of the water inlet pipe 46 is closed, and the other end is connected to a connecting pipe 461. The connecting pipe 461 passes through the protective cover 45 and is connected to an external polishing liquid pumping device. The water inlet pipe 46 is provided with an inclined surface. When the second support plate 42 drives the protective cover 45 to rotate to the polishing position, the inclined surface faces the cathode roller body 2. At this time, the polishing roller 48 is in contact with the circumferential surface of the cathode roller body 2, and the protective cover 45 is not in contact with the cathode roller body 2.

[0041] Several nozzles 462 connected to the water inlet pipe 46 are fixedly installed on the inclined surface of the water inlet pipe 46. The polishing liquid pumping device is existing technology and will not be drawn or described in detail here.

[0042] Specifically, the polishing liquid is pumped into the connecting pipe 461 by the polishing liquid pumping device, and then introduced into the water inlet pipe 46. Subsequently, the polishing liquid is sprayed onto the circumferential surface of the cathode roller body 2 through the nozzle 462 on the inclined surface of the water inlet pipe 46, so that the polishing roller 48 below can polish the cathode roller body 2.

[0043] like Figure 2-4 As shown, in this embodiment, an inclined water guide plate 49 is fixedly installed at the lower outlet of the protective cover 45. The polishing liquid inside the protective cover 45 can be guided to the polishing liquid treatment mechanism 3 for treatment through the water guide plate 49.

[0044] like Figure 4-6 As shown, in this embodiment, the polishing liquid treatment mechanism 3 includes a collection frame 31, a first support plate 33, and a reciprocating scraping assembly. The collection frame 31 is located directly below the cathode roller body 2 and is used to collect and process the polishing liquid and polishing debris. The first support plate 33 is fixedly installed inside the collection frame 31 and has a gap between it and the inner bottom surface of the collection frame 31, which is used to store the polishing liquid after it is separated from the polishing debris.

[0045] The first support plate 33 includes a support plate surface 331 and symmetrically arranged filter plate surfaces 332. The sieving holes on the surface of the filter plate surface 332 can separate the polishing liquid and polishing debris. An inclined plate surface connects the filter plate surface 332 and the support plate surface 331. The polishing liquid containing polishing debris on the support plate surface 331 is pushed back and forth by a reciprocating scraping component and pushed onto the filter plate surfaces 332 on both sides for filtration and separation. The separated polishing debris stays on the filter plate surface 332 and is periodically collected and processed. The separated polishing liquid enters the gap below the first support plate 33 and is recycled by a pumping device. This pumping device is prior art and will not be drawn or described in detail here.

[0046] like Figure 4-6 As shown, in this embodiment, the reciprocating scraping assembly includes a reciprocating screw 38 and a transmission roller shaft 34. The transmission roller shaft 34 is rotatably engaged with the collection frame 31 and is disposed above the first support plate 33. The transmission roller shaft 34 is in contact with the circumferential surface of the cathode roller body 2. The rotation of the cathode roller body 2 drives the rotation of the transmission roller shaft 34. The reciprocating screw 38 is rotatably engaged with the collection frame 31 and is disposed below the transmission roller shaft 34 and perpendicular to the transmission roller shaft 34.

[0047] A partition 32 is fixedly installed inside the collection frame 31. There is a gap between the partition 32 and the first support plate 33. The partition 32 is used to prevent polishing liquid from falling onto the reciprocating screw 38.

[0048] like Figure 5-6 As shown, in this embodiment, a pulley 341 is fixedly provided on one side of the circumferential surface of the transmission roller shaft 34, and a rotating shaft 39 is rotatably provided on the inner wall of the collection frame 31. A bevel gear 391 and a pulley 392 are fixedly installed on the surface of the rotating shaft 39. The pulley 341 and the pulley 392 correspond to each other, and a transmission belt 37 is installed between the pulley 341 and the pulley 392. The rotation of the transmission roller shaft 34 is transmitted to the rotating shaft 39 through the transmission belt 37.

[0049] A bevel gear 381 that meshes with a bevel gear 391 is fixedly installed on one side of the circumferential surface of the reciprocating screw 38. The rotation of the bevel gear 391 is driven by the rotating shaft 39, which in turn drives the rotation of the reciprocating screw 38.

[0050] A slider 382 is mounted on the surface of the reciprocating screw 38 to cooperate with the reciprocating screw 38. The slider 382 is in sliding cooperation with the support plate surface 331 and the partition plate 32 of the first support plate 33. A movable plate 36 is fixedly provided on the side of the slider 382. The movable plate 36 slides on the support plate surface 331 of the first support plate 33. The reciprocating screw 38 drives the slider 382 to reciprocate, so that the movable plate 36 can slide on the support plate surface 331 of the first support plate 33, thereby pushing the polishing liquid on the support plate surface 332.

[0051] like Figure 4-5 As shown, in this embodiment, a scraper 35 is provided below the cathode roller body 2 near the transmission roller shaft 34. The scraper 35 is fixed to the inner wall of the partition plate 32 and the collection frame 31, and the upper end of the scraper 35 is in contact with the circumferential surface of the cathode roller body 2. The scraper 35 can scrape most of the polishing liquid on the circumferential surface of the cathode roller body 2 onto the support plate surface 331, so as to prevent the polishing liquid from splashing outside during the rotation of the cathode roller body 2.

[0052] The specification and claims use certain terms to refer to specific components. Those skilled in the art will understand that hardware manufacturers may use different names to refer to the same component. This specification and claims do not distinguish components based on differences in name, but rather on differences in function. The term "comprising" throughout the specification and claims is an open-ended term and should be interpreted as "comprising but not limited to." "Approximately" means that within an acceptable margin of error, those skilled in the art can solve the technical problem and substantially achieve the technical effect within a certain margin of error.

[0053] It should be noted that the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a product or system comprising a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a product or system. Without further limitation, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the product or system that includes said element.

[0054] The foregoing description illustrates and describes several preferred embodiments of this application. However, as previously stated, it should be understood that this application is not limited to the forms disclosed herein and should not be construed as excluding other embodiments. It can be used in various other combinations, modifications, and environments, and can be altered within the scope of the application concept described herein through the foregoing teachings or techniques or knowledge in related fields. Any modifications and variations made by those skilled in the art that do not depart from the spirit and scope of this application should be within the protection scope of the appended claims.

Claims

1. A polishing apparatus for electrolytic copper foil production, characterized by: It includes a cathode roller body and symmetrically arranged clamping machine tools. The cathode roller body is installed between the two clamping machine tools. A polishing mechanism for polishing the cathode roller body is provided on the outside of the clamping machine tools. A polishing liquid treatment mechanism for separating polishing liquid and polishing debris is provided between the two clamping machine tools. The polishing fluid treatment mechanism includes a collection frame, a support plate, and a reciprocating scraping assembly. The collection frame is located directly below the cathode roller body, the support plate is fixedly installed inside the collection frame and has a gap between it and the inner bottom surface of the collection frame, and the reciprocating scraping assembly is located above the support plate.

2. The polishing apparatus for electrolytic copper foil production according to claim 1, characterized by: The support plate includes a support plate surface and symmetrically arranged filter plate surfaces. The two filter plate surfaces are symmetrically arranged on both sides of the support plate surface, and an inclined plate surface connects the filter plate surface and the support plate surface.

3. The polishing apparatus for producing copper foil by electrolysis according to claim 2, characterized in that: The reciprocating scraping assembly includes a reciprocating screw and a drive roller shaft. The drive roller shaft is rotatably engaged with the collection frame and is positioned above the support plate. The drive roller shaft is in contact with the circumferential surface of the cathode roller body. The reciprocating screw is rotatably engaged with the collection frame and is positioned below the drive roller shaft and perpendicular to it. A partition is fixedly installed inside the collection frame, and there is a gap between the partition and the support plate. The reciprocating screw is positioned on the right side of the partition.

4. The polishing apparatus for producing copper foil by electrolysis according to claim 3, characterized in that: A pulley is fixedly installed on one side of the circumferential surface of the transmission roller shaft. A rotating shaft is rotatably installed on the inner wall of the collection frame. A bevel gear and a pulley are fixedly installed on the surface of the rotating shaft. The pulleys correspond to each other and a transmission belt is installed between the pulleys. A bevel gear is fixedly installed on one side of the circumferential surface of the reciprocating screw, which meshes with the bevel gear.

5. The polishing apparatus for producing copper foil by electrolysis according to claim 3, characterized in that: A slider is installed on the surface of the reciprocating screw to cooperate with the reciprocating screw. The slider slides in contact with the support plate surface and the partition of the support plate. A movable plate is fixedly installed on the side of the slider and slides on the support plate surface of the support plate.

6. The polishing apparatus for producing copper foil by electrolysis according to claim 3, characterized by: A scraper is installed below the cathode roller body near the drive roller shaft. The scraper is fixed to the inner wall of the partition and the collection frame, and the upper end of the scraper is in contact with the circumferential surface of the cathode roller body.

7. The polishing apparatus for electrolytic copper foil production of claim 1, wherein: The polishing mechanism includes a support platform, a support plate, a polishing roller, and a protective cover. The support platform is installed on the ground outside the clamping machine tool, the support plate is set above the support platform, the polishing roller is set above the support plate, the protective cover is installed on the outside of the polishing roller, and a connecting seat is fixedly connected between the middle surface of the support plate and the protective cover.

8. The polishing apparatus for producing copper foil by electrolysis according to claim 7, characterized in that: A fixed seat is fixedly installed on the upper end face of the support platform near the side. Hinges are symmetrically installed on both sides of the fixed seat. Hinges are fixedly installed at the four corner positions on the lower surface of the support plate. Two of the hinges corresponding to the hinges are hinged to the hinges. Telescopic cylinders are hinged below the other two hinges. Mounting seats are hinged at the lower end of the fixed part of the telescopic cylinder. The mounting seats are fixedly installed on the ground.

9. The polishing apparatus for producing copper foil by electrolysis according to claim 8, characterized in that: Support seats are symmetrically fixed on the upper surface of the support plate. The polishing roller is rotatably positioned between the two support seats. The shafts at both ends of the cathode roller body pass through the two sides of the protective cover and are rotated together.

10. The polishing apparatus for producing copper foil by electrolysis according to claim 7, characterized by: The upper inner wall of the protective cover is fixedly provided with a water inlet pipe, one end of the water inlet pipe is closed, and the other end is communicated with a connecting pipe, the connecting pipe penetrates through the protective cover and is communicated with the polishing liquid pumping device outside, the water inlet pipe is provided with an inclined surface, a plurality of nozzles in communication with the water inlet pipe are fixedly arranged on the inclined surface of the water inlet pipe, and an inclined water guide plate is fixedly arranged at the lower outlet of the protective cover.

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