一种改进的单轴环抛设备

By employing a quartz glass plate side clamping and sway adjustment mechanism in a single-axis ring polishing device, the problem of glass cracking was solved, achieving a highly safe polishing process.

CN224509323UActive Publication Date: 2026-07-17江油神光石英科技有限公司

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
江油神光石英科技有限公司
Filing Date
2025-08-07
Publication Date
2026-07-17

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Abstract

本实用新型提供一种改进的单轴环抛设备,属于研磨设备技术领域。该改进的单轴环抛设备包括:工作台、供液系统和玻璃夹具;所述工作台的顶面为工作面;所述工作面上设置有抛光圆盘;所述玻璃夹具滑动设置在所述抛光圆盘的上表面上,其具有连接头、固定圆环框、聚四氟乙烯圆板和连接件;所述连接头位于所述固定圆环框的上方;所述连接件的两端分别与所述连接头、所述固定圆环框连接;所述聚四氟乙烯圆板贴合设置在所述圆环框的下表面上,其位于所述固定圆环框内侧的部分上开设有玻璃板固定窗口。本实用新型中石英玻璃板通过侧面卡持方式固定在聚四氟乙烯圆板上的玻璃板固定窗口内,石英玻璃板的上表面无压力,即可避免压裂现象,安全系数高。
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Claims

1. An improved single-axis ring-throwing apparatus, characterized in that, The utility model discloses a polishing machine for quartz glass plate, which comprises a workbench, a polishing disc, a liquid supply system and a glass clamp. The top surface of the workbench is a work surface, and the polishing disc is arranged on the work surface and driven to rotate by a first driving motor arranged in the workbench. The liquid supply system comprises a pump and a liquid delivery pipe for delivering polishing liquid onto the upper surface of the polishing disc. The glass clamp is slidably arranged on the upper surface of the polishing disc and comprises a connecting head, a fixed circular ring frame, a polytetrafluoroethylene circular plate and a connecting piece.

2. The improved single-axis annular polishing apparatus according to claim 1, wherein, The connecting head is located above the fixed circular ring frame.

3. The improved single spindle ring polisher apparatus of claim 1 wherein, The two ends of the connecting piece are respectively connected with the connecting head and the fixed circular ring frame.

4. The improved single-axis annular polishing apparatus according to claim 1, wherein, The polytetrafluoroethylene circular plate is arranged on the lower surface of the circular ring frame.

5. The improved single-axis annular polishing apparatus according to claim 4, wherein, A glass plate fixing window is formed in the part of the polytetrafluoroethylene circular plate located inside the fixed circular ring frame.

6. The improved single spindle ring polisher apparatus of claim 1 wherein, The two ends of the connecting piece are respectively hingedly connected with the connecting head and the fixed circular ring frame.

7. The improved single spindle ring polisher apparatus according to any one of claims 1 to 6, wherein, A first rotating shaft is arranged at the center of the lower surface of the polishing disc.

8. The improved single-axial annular polishing apparatus according to claim 7, wherein The first rotating shaft is in transmission connection with the first driving motor through a worm and a worm gear. The work surface has a circular groove with a diameter larger than that of the polishing disc. The polishing disc is located in the circular groove. An annular liquid collecting groove is formed in the edge of the groove bottom of the circular groove. An exhaust pipe is arranged outside the groove bottom of the circular groove. A surrounding barrier is arranged on the work surface corresponding to the edge of the polishing disc.

9. The improved single-axial annular polishing apparatus according to claim 8, wherein, The polishing machine further comprises an up-and-down swing adjusting mechanism and a horizontal swing mechanism. One end of the up-and-down swing adjusting mechanism is connected with the connecting head. The up-and-down swing adjusting mechanism is used to adjust the tightness of the contact between the glass clamp and the polishing disc by using the lever principle.

10. The improved single-axis annular polishing apparatus according to claim 8 or 9, characterized by One end of the horizontal swing mechanism is connected with the up-and-down swing adjusting mechanism. The horizontal swing mechanism drives the up-and-down swing adjusting mechanism to reciprocate in a direction approximately parallel to the polishing disc. The up-and-down swing adjusting mechanism comprises a support column, a rectangular frame support seat, a telescopic support arm, a rubber fixing head, a counterweight and a thimble. The support column is vertically arranged on the work surface. The rectangular frame support seat is movably arranged on the top of the support column. The telescopic support arm passes through the hollow interior of the rectangular frame support seat and is connected with the rectangular frame support seat through a pin shaft. The telescopic support arm has a rubber fixing head arranged at the free end of the telescopic support arm. A counterweight is threadedly connected to the other end of the telescopic support arm. The thimble is arranged in the rubber fixing head. The thimble is arranged in the bearing embedded in the connecting head. The axis of the limiting stopper is intersected with the telescopic support arm, and the intersection point is located between the pin shaft and the free end of the telescopic support arm. The gas cylinder is obliquely arranged on the top of the rectangular frame support seat. The axis of the gas cylinder is intersected with the telescopic support arm, and the intersection point is located between the pin and the free end of the telescopic support arm. The horizontal swing mechanism comprises a second rotating shaft and a second driving motor. The second rotating shaft is vertically movably arranged on the work surface and is in transmission connection with the second driving motor arranged in the workbench. A rotating disc is arranged on the top of the second rotating shaft, and a connecting column is arranged vertically at the edge position of the rotating disc; A telescopic connecting arm is movably connected to one end of the connecting column, and the other end is flexibly connected to the fixed part of the telescopic supporting arm.