一种芯片研磨辅助结构

By designing a chip grinding auxiliary structure, including pads, enclosure components, and filling materials, the problems of unevenness and misalignment during the grinding of small-sized chips are solved, achieving higher grinding accuracy and efficiency, reducing costs, and improving operational convenience.

CN224509327UActive Publication Date: 2026-07-17YIZHIFA TECH (SHENZHEN) CO LTD

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
YIZHIFA TECH (SHENZHEN) CO LTD
Filing Date
2025-08-12
Publication Date
2026-07-17

AI Technical Summary

Technical Problem

During chip polishing, especially for delamination operations on small-sized chips (less than 500μm×500μm), it is difficult to achieve uniform pressure control, resulting in uneven polishing and misalignment, which affects the accuracy and reliability of failure analysis.

Method used

The chip grinding auxiliary structure includes a pad, a chip support area, a baffle assembly, and a filler material. The pad provides stable support, the baffle assembly forms a closed inner cavity and is consistent with the chip height, and the filler material is coplanar with the chip surface after filling, ensuring the flatness of the grinding process.

Benefits of technology

It improves the flatness and precision of chip grinding, reduces costs, enhances operational convenience and applicability, significantly improves grinding efficiency and yield, and avoids grinding unevenness and misalignment problems caused by excessively small chip size.

✦ Generated by Eureka AI based on patent content.

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Abstract

本实用新型的芯片研磨辅助结构包括垫片、芯片承载区、围挡组件和填充材料。芯片承载区位于垫片的中心区域,用于放置待研磨的芯片。围挡组件设置于垫片上,围挡组件包括多个围挡单元,多个围挡单元围绕设置于芯片承载区的周围,以形成一封闭内腔,每个围挡单元的高度均与芯片承载区上的芯片的高度一致。围挡组件的设置为填充材料提供了稳定的边界,防止填充材料在固化前溢出。同时,围挡组件的高度与芯片高度一致,确保了研磨过程中各部分受力均匀,进一步增强了研磨的稳定性。填充材料填充于封闭内腔内,填充材料的上表面与芯片的上表面及围挡组件的上表面共平面。能够提高芯片去层的效率和精准度。
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Claims

1. A chip grinding aid structure, characterized by, include: Gasket; The chip carrier area, located in the central region of the pad, is used to place the chip to be polished; A barrier assembly is disposed on the pad. The barrier assembly includes multiple barrier units, which are disposed around the chip carrier area to form a closed inner cavity. The height of each barrier unit is the same as the height of the chip on the chip carrier area. A filling material is filled into the closed inner cavity, and the upper surface of the filling material is coplanar with the upper surface of the chip and the upper surface of the enclosure assembly.

2. The chip grinding aid structure of claim 1, wherein, The gasket is a silicon gasket, and the thickness of the gasket is between 400μm and 600μm.

3. The chip grinding aid structure of claim 1, wherein, The enclosure unit is a silicon wafer.

4. The chip grinding aid structure of claim 1, wherein, The enclosure assembly has anti-slip texture on the side near the enclosed inner cavity.

5. The chip grinding aid structure of claim 1, wherein The chip to be ground has a size of less than 500μm × 500μm.

6. The chip dicing aid structure according to claim 1, wherein The filler material is AB glue.

7. The chip dicing aid structure according to claim 1, wherein The shortest distance between the enclosure assembly and the chip to be ground is between 1000μm and 3000μm.

8. The chip grinding aid structure of claim 1, wherein, The shape of the enclosure unit is rectangular.

9. The chip grinding aid structure of claim 1, wherein, Also includes: An adhesive is disposed between the chip carrier area and the chip to be ground, and between the enclosure assembly and the gasket.