一种用于液晶显示面板反射膜的制备系统
By combining equipment such as PET chip feeding tank, hollow organosilicon microsphere preparation device and twin-screw extruder, efficient and continuous production of reflective film for liquid crystal display panels has been achieved, solving the problems of low reflectivity, high specific gravity and uneven optical performance, and meeting the high performance and lightweight requirements of liquid crystal display panels.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- JIANGSU SHUANGXING COLOR PLASTIC NEW MATERIALS
- Filing Date
- 2025-09-17
- Publication Date
- 2026-07-17
AI Technical Summary
Existing LCD panel reflective films have low reflectivity, high specific gravity, and uneven optical performance, making it difficult to meet the requirements of high reflectivity and lightweight design. Furthermore, the production process is decentralized and complex, making it difficult to achieve continuous and automated production.
A combined system consisting of a PET chip feeding tank, a hollow organosilicon microsphere preparation device, a twin-screw extruder, a co-extrusion die, a longitudinal stretching mechanism, a transverse stretching mechanism, and a cooling and shaping module is adopted. By rationally combining existing equipment, continuous and efficient industrial production is achieved to prepare reflective films with high reflectivity and low specific gravity.
It achieves high reflectivity (greater than 95% for visible light 450-770 nm), low specific gravity (less than 1.15 g/cm³), good light scattering uniformity, and high production efficiency, making it suitable for LCD panel backlight modules.
Smart Images
Figure CN224510349U_ABST
Abstract
Claims
1. A system for preparing a reflective film for a liquid crystal display panel, characterized in that, The device includes a PET chip feeding tank, a hollow silicone microsphere preparation device, a functional layer feeding tank, a first twin-screw extruder, a second twin-screw extruder, a co-extrusion die, a longitudinal stretching mechanism, a transverse stretching mechanism, a cooling and shaping module, and a winding module. Specifically: the PET chip feeding tank is connected via pipes to the inlets of the first and second twin-screw extruders; the outlet of the hollow silicone microsphere preparation device is connected via a pipe to the inlet of the second twin-screw extruder; the functional layer feeding tank is connected via a pipe to the inlet of the second twin-screw extruder; the outlets of the first and second twin-screw extruders are respectively connected to the cavities of the co-extrusion die; and the outlet of the co-extrusion die is sequentially connected to the longitudinal stretching mechanism, the transverse stretching mechanism, the cooling and shaping module, and the winding module.
2. The preparation system according to claim 1, characterized in that, The co-extrusion die has two cavities. The melt output from the first twin-screw extruder is transported to the upper cavity of the co-extrusion die through a pipeline, and the melt output from the second twin-screw extruder is transported to the lower cavity of the co-extrusion die through a pipeline. The two melts form a double-layer thick sheet in the co-extrusion die.
3. The preparation system according to claim 1, characterized in that, The co-extrusion die has three cavities. The melt output from the first twin-screw extruder is transported through pipelines to the two side cavities of the co-extrusion die, and the melt output from the second twin-screw extruder is transported through pipelines to the middle cavity of the co-extrusion die. The three layers of melt form three thick sheets in the co-extrusion die.
4. The preparation system according to any one of claims 1 to 3, characterized in that, The hollow organosilicon microsphere preparation device includes a feeding system, a reaction vessel, a washing and drying tank, and a discharging device connected in sequence by pipelines. The feeding system adds raw materials to the reaction vessel in predetermined weight proportions through pipelines. The outlet of the reaction vessel is connected to the washing and drying tank. After the reaction is completed in the reaction vessel, the hollow silica microspheres obtained are transported to the washing and drying tank through pipelines. The outlet of the washing and drying tank is connected to the discharging device. The dried microspheres are transported from the washing and drying tank to the discharging device through pipelines. The outlet of the discharging device is connected to a second twin-screw extruder. The microspheres are then transported to the second twin-screw extruder through pipelines by the discharging device.
5. The preparation system according to claim 4, characterized in that, The reactor is equipped with a stirring device and a temperature control module.