A tensioning device for silicon wafer coating
By employing a tensioning device with a bidirectional active tensioning mechanism in both the longitudinal and transverse directions during the silicon wafer coating process, the problem of transverse wrinkles in the thin film was solved, achieving close adhesion between the thin film and the silicon wafer surface, and improving the flatness and quality of the coating.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- DONGGUAN HANJAE INFORMATION TECH CO LTD
- Filing Date
- 2025-07-25
- Publication Date
- 2026-07-17
Smart Images

Figure CN224512799U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of silicon wafer coating production technology, and in particular to a tensioning device for silicon wafer coating. Background Technology
[0002] In semiconductor manufacturing, optoelectronic displays, and precision electronic component processing, surface coating of silicon wafers (such as glass substrates, wafers, and LED chip substrates) is a crucial step in protecting the device surface or connecting the silicon wafer to an otherwise unconnected frame. During the coating process, the film must be smoothly adhered to the silicon wafer surface. The core requirement is a tight, bubble-free, and wrinkle-free bond between the film and the silicon wafer to ensure the accuracy and reliability of subsequent processing.
[0003] Currently, the silicon wafer coating process commonly uses a tensioning mechanism to pre-stretch the film, straightening it in the longitudinal direction and maintaining stable tension. This avoids misalignment or local accumulation caused by film relaxation, facilitating subsequent processing. However, existing tensioning mechanisms can only achieve unidirectional tensioning in the longitudinal direction of the film. Due to the lack of active tension control in the transverse direction, transverse wrinkles are very likely to occur during the coating process, resulting in wavy wrinkles at the film edge area, which in turn reduces the coating effect of the silicon wafer.
[0004] Therefore, a new technical solution needs to be researched to address the above problems. Utility Model Content
[0005] In view of this, the present invention addresses the deficiencies of the existing technology, and its main objective is to provide a tensioning device for silicon wafer coating.
[0006] To achieve the above objectives, the present invention adopts the following technical solution:
[0007] A tensioning device for silicon wafer coating includes a fixing plate, a guiding assembly, and a tensioning assembly. The guiding assembly is located at the bottom of the fixing plate and is used to guide the thin film. The tensioning assembly includes a tensioning drive and two sets of clamping components. The tensioning drive is located at the center of the fixing plate. The two sets of clamping components are movably connected to the fixing plate and are respectively connected to the tensioning drive for clamping both ends of the thin film in the lateral direction. The tensioning drive drives the two sets of clamping components to move away from each other to straighten both ends of the thin film in the lateral direction.
[0008] As further explained, the output end of the tensioning drive is connected to a rotating plate; the rotating plate is provided with two sets of symmetrically distributed swing arms; one end of the swing arm is rotatably connected to the rotating plate, and the other end is rotatably connected to the clamping component.
[0009] As further explained, the clamping component includes a clamping seat, a support block, and a pressure block; the clamping seat is movably connected to the fixed plate; the support block and the pressure block are disposed on the clamping seat from the left and right; the support block has a horizontally extending horizontal portion at its end, and the pressure block is located above the horizontal portion; a clamping drive is provided between the pressure block and the clamping seat, and the clamping drive drives the pressure block to move closer to or away from the horizontal portion.
[0010] As a further explanation, a protective layer is provided on the side of the pressure block near the horizontal part.
[0011] As further explained, the clamping seat is provided with a sensing plate on the side near the tensioning drive member, and one end of the sensing plate is provided with a sensing part; the fixing plate is provided with a limit sensor, and the limit sensor is located between the clamping seat and the tensioning drive member.
[0012] As further explained, an adjustment seat is provided between the limit sensor and the fixed plate; the adjustment seat is provided with an adjustment groove, and the limit sensor and the adjustment groove are connected by a locking bolt.
[0013] As further explained, a slide rail is provided between the clamping seat and the fixing plate, and the clamping seat is slidably connected to the slide rail.
[0014] As further explained, the guiding assembly includes two sets of guiding components, which are symmetrically arranged at the bottom end of the fixed plate, and the tensioning assembly is located between the two sets of guiding components.
[0015] As further explained, the guiding component includes two sets of vertically and staggered rollers, which are inclined; both ends of the two sets of rollers are fixed to the fixing plate by connecting seats, and the rollers are fixedly connected to the fixing plate.
[0016] As further explained, the fixing plate is provided with a first connecting block and a second connecting block on one side; the fixing plate is provided with a protective cover for wrapping the tensioning component.
[0017] Compared with the prior art, this utility model has obvious advantages and beneficial effects. Specifically, as can be seen from the above technical solution:
[0018] By setting up a tensioning assembly, the film is first stretched longitudinally by the clamping components. At the same time, the tensioning drive drives the two sets of clamping components to move away from each other, directly applying controllable tension to both ends of the film in the lateral direction. This forms a bidirectional active tensioning mechanism in both the longitudinal and lateral directions, so that the film is in a planar stretched state before coating. This effectively eliminates edge wrinkles caused by lateral stress imbalance, ensures that the film is completely bonded to the silicon wafer surface, and significantly improves the flatness of the coating. Attached Figure Description
[0019] To more clearly illustrate the technical solutions in the embodiments of this application, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.
[0020] Figure 1 A schematic diagram of the overall structure of a tensioning device for silicon wafer coating provided by this utility model;
[0021] Figure 2 A partial structural schematic diagram of a tensioning device for silicon wafer coating provided by this utility model;
[0022] Figure 3 This is a schematic diagram of the overall structure of the tensioning component provided by this utility model.
[0023] The following are the labeling elements in the figure:
[0024] 10. Fixing plate; 11. Limit sensor; 12. Adjusting seat; 121. Adjusting groove; 13. Slide rail; 14. First connecting block; 15. Second connecting block;
[0025] 20. Guide assembly; 21. Roller; 22. Connecting seat;
[0026] 30. Tensioning assembly; 31. Tensioning drive component; 311. Rotating plate; 312. Swing arm;
[0027] 32. Clamping component; 321. Clamping seat; 322. Support block; 322a. Horizontal part; 323. Pressure block; 323a. Protective layer; 324. Clamping drive component; 325. Sensing plate; 325a. Sensing part. Detailed Implementation
[0028] To make the technical problems, technical solutions, and beneficial effects to be solved by this application clearer, the following detailed description is provided in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative and are not intended to limit the scope of this application.
[0029] It should be noted that when a component is referred to as being "fixed to" or "set on" another component, it can be directly on or indirectly on that other component. When a component is referred to as being "connected to" another component, it can be directly connected to or indirectly connected to that other component.
[0030] It should be understood that the terms "length", "width", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this application.
[0031] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this application, "multiple" means two or more, unless otherwise explicitly specified.
[0032] To make the objectives, technical solutions, and advantages of this utility model clearer, the present utility model will be further described in detail below with reference to the accompanying drawings and embodiments.
[0033] In one embodiment of this utility model, such as Figure 1-3 As shown, a tensioning device for silicon wafer coating is provided, including a fixing plate 10, a guiding assembly 20, and a tensioning assembly 30. The guiding assembly 20 is disposed at the bottom end of the fixing plate 10 and is used for guiding the film. The tensioning assembly 30 includes a tensioning drive member 31 and two sets of clamping members 32. The tensioning drive member 31 is disposed at the center of the fixing plate 10. The two sets of clamping members 32 are movably connected to the fixing plate 10 and are respectively connected to the tensioning drive member 31 for clamping both ends of the film in the lateral direction. The tensioning drive member 31 drives the two sets of clamping members 32 to move away from each other to straighten both ends of the film in the lateral direction.
[0034] By setting the tensioning component 30, the film is first stretched longitudinally by the clamping component 32. At the same time, the tensioning drive component 31 drives the two sets of clamping components 32 to move away from each other, directly applying controllable tension to both ends of the film in the lateral direction, forming a bidirectional active tensioning mechanism in both the longitudinal and lateral directions. This ensures that the film is in a planar stretched state before coating, effectively eliminating edge wrinkles caused by lateral stress imbalance, ensuring that the film is completely bonded to the silicon wafer surface, and significantly improving the flatness of the coating.
[0035] Preferably, the output end of the tensioning drive 31 is connected to a rotating plate 311, and the tensioning drive 31 is a motor. The rotating plate 311 has two sets of symmetrically distributed swing arms 312. One end of each swing arm 312 is rotatably connected to the rotating plate 311, and the other end is rotatably connected to the clamping component 32. When the film is longitudinally tensioned by the clamping component 32, the tensioning drive 31 is activated, causing the rotating plate 311 and the symmetrically distributed swing arms 312 to move in tandem, converting the rotational motion into linear motion of the clamping component 32. This achieves precise control of the lateral tension, causing the two sets of clamping components 32 to move synchronously in opposite directions, ensuring a uniform distribution of lateral tension. This achieves lateral straightening while simultaneously tensioning longitudinally, ensuring complete adhesion between the film and the silicon wafer surface, and significantly improving the flatness of the coating.
[0036] Preferably, the clamping component 32 includes a clamping seat 321, a support block 322, and a pressure block 323. The clamping seat 321 is movably connected to the fixed plate 10. The support block 322 and the pressure block 323 are disposed on the clamping seat 321. The support block 322 has a horizontally extending horizontal portion 322a at its end, and the pressure block 323 is located above the horizontal portion 322a. A clamping drive component 324 is provided between the pressure block 323 and the clamping seat 321. The clamping drive component 324 can be a cylinder or other linear drive unit. The clamping drive component 324 drives the pressure block 323 to move closer to or away from the horizontal portion 322a.
[0037] The clamping component 32 adopts a separate design of support block 322 and pressure block 323 to form a gripper structure. The clamping drive component 324 drives the pressure block 323 to approach the horizontal part 322a, realizing reliable clamping of the two ends of the film in the lateral direction, so as to facilitate the straightening of the film in the longitudinal and lateral directions. At the same time, after the lamination is completed, the horizontal part 322a on the support block 322 exerts an upward pulling force on the film, so that the film attached to the product edge can be separated from the product, avoiding the inability to straighten the film in the next process due to the product not being separated from the film, thus improving the lamination quality and product qualification rate.
[0038] Furthermore, a protective layer 323a is provided on the side of the pressure block 323 near the horizontal portion 322a. In this embodiment, the protective layer 323a is made of a flexible material, such as rubber or silicone, which provides sufficient friction while preventing the hard clamp from scratching or indenting the film surface, thereby improving the coating quality and product qualification rate.
[0039] Furthermore, a sensing plate 325 is provided on the side of the clamping seat 321 near the tensioning drive member 31, and a sensing part 325a is provided at one end of the sensing plate 325. A limit sensor 11 is provided on the fixing plate 10. The limit sensor 11 can be a grating sensor, and the sensing part 325a can pass through the middle of the limit sensor 11, thereby realizing the detection of the movement position of the clamping member 32. The limit sensor 11 is located between the clamping seat 321 and the tensioning drive member 31. By setting the sensing plate 325 and the limit sensor 11, the position of the clamping seat 321 can be monitored in real time, preventing the clamping member 32 from moving beyond its stroke and preventing the film from breaking due to excessive stretching at both ends.
[0040] Furthermore, an adjustment seat 12 is provided between the limit sensor 11 and the fixed plate 10. The adjustment seat 12 has an adjustment groove 121, and the limit sensor 11 is connected to the adjustment groove 121 by a locking bolt. By providing the adjustment groove 121 and the adjustment seat 12, the adjustment groove 121 within the adjustment seat 12 allows the limit sensor 11 to adjust its position according to different film specifications. The adjusted position of the limit sensor 11 is then fixed by tightening the locking bolt, thus adapting to the production of different film specifications and improving production flexibility.
[0041] Furthermore, a slide rail 13 is provided between the clamping seat 321 and the fixing plate 10, and the clamping seat 321 is slidably connected to the slide rail 13. By providing the slide rail 13, the clamping seat 321 is slidably connected to the fixing plate 10 through the slide rail 13, which reduces the frictional resistance during lateral movement and ensures the smoothness of the tensioning action.
[0042] Preferably, the guiding assembly 20 includes two sets of guiding components symmetrically arranged at the bottom end of the fixing plate 10, and the tensioning assembly 30 is located between the two sets of guiding components. By setting the guiding components, the film is pre-flattened before entering the tensioning assembly 30, eliminating the interference of longitudinal wrinkles on lateral tension.
[0043] Furthermore, the guiding component includes two sets of vertically and staggered rollers 21, which are inclined. Both ends of the two sets of rollers 21 are fixed to the fixing plate 10 via connecting seats 22, and the rollers 21 are fixedly connected to the fixing plate 10. By setting two sets of inclined rollers 21, the film is pre-flattened by the rollers 21, facilitating the clamping component 32 to straighten the film longitudinally and laterally. Simultaneously, since the bottom surface of the film has a certain degree of adhesion, the rotation of the rollers 21 and connecting seats 22 optimizes the contact mode between them from surface contact to line contact, reducing the contact area between them and significantly lowering the adhesion resistance. This ensures a dynamic rolling separation between the film and the rollers 21, avoiding the sticking and dragging phenomenon caused by traditional fixed rollers 21, allowing the film to smoothly and without damage detach from the rollers 21, providing a flat and undisturbed initial state for subsequent bidirectional straightening.
[0044] Preferably, a first connecting block 14 and a second connecting block 15 are provided on one side of the fixing plate 10. A protective cover (not shown) for enclosing the tensioning assembly 30 is provided on the fixing plate 10. In this embodiment, the first connecting block 14 is connected to the moving end (such as a belt) of the transmission mechanism of an external device via a clamping member, allowing the tensioning device to move to a designated position driven by the transmission mechanism. The second connecting block 15 is connected to the chain of the external device; through the guiding effect of the chain, the tensioning device can move smoothly, improving the stability of the tensioning device's movement.
[0045] By setting up a protective cover, the tensioning assembly 30 is protected, which effectively improves the service life of the tensioning assembly 30.
[0046] The above are merely preferred embodiments of the present utility model, and only specifically describe the technical principles of the present utility model. These descriptions are only for explaining the principles of the present utility model and should not be construed as limiting the scope of protection of the present utility model in any way. Based on this explanation, any modifications, equivalent substitutions, and improvements made within the spirit and principles of the present utility model, as well as other specific embodiments of the present utility model that can be conceived by those skilled in the art without creative effort, should be included within the scope of protection of the present utility model.
Claims
1. A tensioning device for a silicon wafer film coating, characterized by, include: Fixing plate; A guiding component, located at the bottom end of the fixing plate, is used for guiding the film; The tensioning assembly includes a tensioning drive and two sets of clamping components; The tensioning drive is located in the center of the fixed plate; two sets of clamping components are movably connected to the fixed plate and respectively connected to the tensioning drive for clamping both ends of the film in the lateral direction; the tensioning drive drives the two sets of clamping components to move away from each other to straighten both ends of the film in the lateral direction.
2. The tensioning device for a film on a silicon wafer according to claim 1, wherein The output end of the tensioning drive is connected to a rotating plate; the rotating plate is provided with two sets of symmetrically distributed swing arms; one end of the swing arm is rotatably connected to the rotating plate, and the other end is rotatably connected to the clamping component.
3. The tensioning device for a film on a silicon wafer according to claim 1, wherein The clamping component includes a clamping seat, a support block, and a pressure block; the clamping seat is movably connected to the fixed plate; the support block and the pressure block are disposed on the clamping seat from the left and right; the end of the support block is provided with a horizontally extending portion, and the pressure block is located above the horizontal portion; a clamping drive is provided between the pressure block and the clamping seat, and the clamping drive drives the pressure block to move closer to or away from the horizontal portion.
4. The tensioning device for coating a silicon wafer according to claim 3, wherein The pressure block has a protective layer on the side near the horizontal part.
5. The tensioning device for coating a silicon wafer according to claim 3, wherein The clamping seat is provided with a sensing plate on the side near the tensioning drive member, and a sensing part is provided at one end of the sensing plate; a limit sensor is provided on the fixing plate, and the limit sensor is located between the clamping seat and the tensioning drive member.
6. The tensioning device for a film on a silicon wafer according to claim 5, wherein An adjustment seat is provided between the limit sensor and the fixed plate; the adjustment seat is provided with an adjustment groove, and the limit sensor and the adjustment groove are connected by a locking bolt.
7. The tensioning device for coating a silicon wafer according to claim 3, wherein A slide rail is provided between the clamping seat and the fixing plate, and the clamping seat is slidably connected to the slide rail.
8. The silicon sheet film tensioning device according to claim 1, wherein The guiding assembly includes two sets of guiding components, which are symmetrically arranged at the bottom end of the fixed plate, and the tensioning assembly is located between the two sets of guiding components.
9. The tensioning device for coating a silicon wafer according to claim 8, wherein The guiding component includes two sets of vertically and staggered rollers, which are inclined; both ends of the two sets of rollers are fixed to the fixing plate by connecting seats, and the rollers are fixedly connected to the fixing plate.
10. The silicon sheet film tensioning device according to claim 1, wherein The fixing plate is provided with a first connecting block and a second connecting block on one side; the fixing plate is provided with a protective cover for wrapping the tensioning component.