一种高效化学气相沉积系统

By introducing a gas-solid separator and a gas recovery component into the rotary kiln system, the problems of waste of undecomposed gas and low production efficiency in traditional rotary kilns have been solved, and the recycling of tail gas and the automation of equipment have been achieved.

CN224513609UActive Publication Date: 2026-07-17CARBON ONE NEW ENERGY GRP CO LTD +2

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
CARBON ONE NEW ENERGY GRP CO LTD
Filing Date
2025-04-28
Publication Date
2026-07-17

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Abstract

本实用新型涉及负极材料制备装置技术领域,尤其涉及一种高效气相回转炉系统。系统包括:回转炉、进气组件、气体回收组件,所述回转炉的一端与进气组件连通,另一端通过管道和所述气体回收组件连接。本系统还包括气固分离器,所述气固分离器下端与回转炉直接连通,气固分离器上端通过管道和所述气体回收组件入口连接。本系统通过在回转炉设置气固分离器,对尾气进行初步处理,同时设置气体分离装置,对未反应原料气逐一分离并进行回收利用,提高原料气的利用率;此外本系统设置热量回收装置,对带有一定热量的尾气进行热量回收处理,减少能源浪费。本装置可以有效的提高原料气的利用率,减少物料浪费,提高生产效率。
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Claims

1. A high efficiency chemical vapor deposition system, characterized by, The deposition system includes: a rotary kiln, an air intake assembly, and a gas recovery assembly. One end of the rotary kiln is connected to the air intake assembly, and the other end is connected to the gas recovery assembly via a pipe. The gas recovery component is one or more of a membrane separator and a gas adsorption separation device; The membrane separator includes one or more of the following types: flat plate type, cylindrical tube type, spiral wound type, or hollow fiber type; The gas adsorption and separation device includes one or more of a fixed bed adsorption device, a moving bed adsorption device, and a fluidized bed adsorption device. The gas recovery assembly is a single-stage or multi-stage series connection.

2. The chemical vapor deposition system of claim 1, wherein: The gas recovery assembly includes multiple separator bodies connected in series. Each separator body is equipped with a gas recovery pipe, which is connected to a gas mixer. The multiple separator bodies are also equipped with an exhaust gas pipe, which is connected to a post-treatment device.

3. The chemical vapor deposition system of claim 1, wherein: The rotary kiln also includes a gas-solid separator at the tail end. The gas-solid separator includes a cylinder. The lower end of the cylinder is sealed and connected to the rotary kiln, and the upper end of the cylinder is connected to the gas recovery assembly by a pipe.

4. The chemical vapor deposition system of claim 3, wherein: The cylindrical body is a straight cylinder, wider at the top and narrower at the bottom, or narrower at the top and wider at the bottom. The inner wall of the cylinder is also uniformly provided with baffles, and there are one or more baffles, which are installed alternately along the inner wall of the cylinder. A metal wire mesh is provided on the cylinder of the gas-solid separator, and the metal wire mesh is installed on the upper part, middle part or both of the cylinder; A backflushing gas pipe is provided at the upper end of the gas-solid separator and / or the tail end of the rotary kiln. The lower end of the cylinder is sealed to the tail end of the rotary kiln by a snap fastener, hinge, or welding. The cylinder is provided with an insulation layer on the outside.

5. The chemical vapor deposition system of claim 1, wherein: The air intake assembly includes a first air intake pipe, a second air intake pipe, a gas mixer, and a third air intake pipe. The first and second air intake pipes are directly connected to the gas mixer. One end of the third air intake pipe is sealed to the gas mixer, and the other end is fixed to the rotary kiln inlet via a rotary joint and extends into the rotary kiln.

6. The chemical vapor deposition system of claim 1, wherein: The rotary kiln is equipped with a material lifting assembly, and multiple material lifting assemblies are provided and distributed along the circumference of the furnace tube; A reverse spiral propeller is installed at the tail end of the rotary kiln.

7. The chemical vapor deposition system of any one of claims 1 to 6, wherein: It also includes a raw material silo and a feed pipe, wherein the raw material silo is connected to the rotary kiln via the feed pipe.

8. The chemical vapor deposition system of claim 3, wherein: It also includes installing a gas detection device on the connecting pipe between the gas-solid separator and the gas recovery assembly; It also includes installing a heat recovery device on the connecting pipe between the gas-solid separator and the gas recovery assembly; It also includes a sample sampling device installed on the gas-solid separator.

9. The chemical vapor deposition system of claim 3, wherein: It also includes a rapping mechanism located around the gas-solid separator to cause it to vibrate; The tilt adjustment machine, installed on the rotary kiln, is used to adjust the tilt angle of the furnace tubes. The temperature control device installed on the rotary kiln is used to heat and cool the furnace tubes.