一种喷头及沉积设备

By improving the nozzle structure, uniform and staggered spraying of various reaction precursor gases was achieved, solving the problem of poor film uniformity and improving the quality and efficiency of the deposition process.

CN224513610UActive Publication Date: 2026-07-17HUAWEI TECH CO LTD

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
HUAWEI TECH CO LTD
Filing Date
2025-05-30
Publication Date
2026-07-17

AI Technical Summary

Technical Problem

When existing spray heads spray various reactive precursor gases, the uniformity of the thin film is poor, which affects the quality of the deposition process.

Method used

A nozzle structure was designed, including multiple flow channels and jet orifice groups. The jet orifice groups are arranged in an array and connected to the storage device through the flow channels to ensure uniform and staggered spraying of different precursor gases. Baffles are used to avoid gas mixing and improve the directness of airflow control and deposition uniformity.

Benefits of technology

This method achieves uniform distribution of various precursor gases on the substrate surface, improves the uniformity and quality of thin film deposition, reduces the complexity of the production process, and avoids contamination caused by unexpected reactions.

✦ Generated by Eureka AI based on patent content.

Smart Images

  • Figure CN224513610U_ABST
    Figure CN224513610U_ABST
Patent Text Reader

Abstract

本申请实施例公开了一种喷头及沉积设备,涉及沉积设备技术领域,改善了喷淋头喷射多种反应前驱体气体所形成薄膜的均匀性不佳的问题。喷头包括具有朝向待处理件的第一壁的腔室,腔室内设有分别用于与沉积设备中存储不同前驱体的存储装置连通的多个流道。第一壁上设有多个阵列分布的第一喷气孔组,任一第一喷气孔组包括呈阵列分布的多个第一喷气孔。同一第一喷气孔组中多个第一喷气孔与多个流道分别连通。或第一壁上设有多个第二喷气孔组,任一第二喷气孔组包括多个第二喷气孔,多个第二喷气孔呈圆形阵列分布以形成环形。同一第二喷气孔组中多个第二喷气孔与同一个流道连通。多个第二喷气孔组呈同心圆环间隔均匀分布,且分别交错与多个流道连通。
Need to check novelty before this filing date? Find Prior Art

Claims

1. A showerhead for a deposition apparatus, characterized by, The nozzle includes: The chamber has multiple flow channels, which are respectively used to communicate with a storage device in the deposition equipment for storing different precursors; the chamber has a first wall, which is oriented toward the workpiece to be processed. The first wall is provided with a plurality of arrayed first jet hole groups, each of which includes a plurality of first jet holes arranged in an array; the plurality of first jet holes in the same first jet hole group are respectively connected to the plurality of flow channels; Alternatively, the first wall may be provided with a plurality of second jet hole groups, each of which includes a plurality of second jet holes, the plurality of second jet holes being arranged in a circular array to form a ring; the plurality of second jet holes in the same second jet hole group are all connected to the same flow channel; the plurality of second jet hole groups are evenly distributed in concentric rings and are respectively staggered and connected to the plurality of flow channels.

2. The showerhead of claim 1, wherein The outer periphery of the plurality of first jet holes on the first wall is circular or rectangular.

3. The showerhead of claim 1 or 2, wherein, The first jet holes in the first jet hole group are distributed in a rectangular or circular array.

4. The showerhead of claim 3, wherein, The multiple flow channels are stacked sequentially and correspond to any row or column of the multiple first jet holes in the multiple first jet hole groups.

5. The showerhead of claim 4, wherein, The first jet holes in the first jet hole group are arranged in an M×N rectangular array; where M is the number of rows and N is the number of columns; the number of flow channels is S; M, N, and S are all positive integers greater than 1. If S = K × M, where K is a positive integer; each of the K flow channels in the S flow channels is stacked sequentially and corresponds to a row of multiple first jet holes in the multiple first jet hole groups; If S = P × N, where P is a positive integer; each of the P flow channels in the S flow channels is stacked sequentially, and each corresponds to one of the multiple first jet holes in a column of the multiple first jet hole groups.

6. The showerhead of claim 1, wherein The diameter of the second jet orifice ranges from 0.1 mm to 1 mm; and / or the spacing between two adjacent second jet orifices is from 3 mm to 30 mm.

7. The showerhead of claim 1 or 6, wherein Each of the flow channels includes an air inlet channel, a connecting channel, and an air extraction channel connected in sequence. The air inlet channel is used to communicate with the storage device for storing the precursor, and the connecting channel is used to communicate with a plurality of second air jets in the second air jet group. The air extraction channel is used to communicate with a pump in the deposition equipment to eject the precursor in the storage device from the second air jets through the air inlet channel and the connecting channel. The air intake channel and the air extraction channel in the plurality of flow channels extend radially along the second jet hole group and are spaced apart in the circumferential direction; and the air intake channel and the air extraction channel in the same flow channel are adjacent to each other.

8. The showerhead of claim 1 or 2, wherein, The outer side of the first wall is also provided with a plurality of baffles, which are provided at least between two adjacent first jet hole groups in the plurality of first jet hole groups, or between two adjacent second jet hole groups in the plurality of second jet hole groups.

9. The showerhead of claim 8, wherein, The height of the baffle plate ranges from 3mm to 3cm.

10. A deposition apparatus, characterized by, include: A reaction chamber, wherein a stage for fixing the workpiece to be processed is provided inside the reaction chamber; The showerhead of any one of claims 1-9, disposed within a reaction chamber, and a first wall of the chamber in the showerhead faces the substrate table; a plurality of storage devices respectively for storing different precursors and respectively in communication with a plurality of flow channels in the showerhead.

11. The deposition apparatus of claim 10, wherein Any one of the flow channels in the showerhead comprises a gas inlet channel, a connecting channel and a gas outlet channel in sequence; the gas inlet channels in the plurality of flow channels are in communication with the plurality of storage devices, and the connecting channels are in communication with a plurality of second gas injection holes in the second group of gas injection holes; The deposition apparatus further comprises a plurality of pumps respectively in communication with the gas outlet channels in the plurality of flow channels.