An air intake structure for a plasma chemical vapor deposition system

Abstract

This invention discloses an inlet structure for a plasma chemical vapor deposition system, including a reactor. A cathode is disposed inside the reactor, and an anode, cylindrical in shape, surrounds the cathode. When the cathode and anode are powered, an electric arc is generated, which is ejected from the anode outlet to form a plasma jet. A substrate is disposed below the plasma jet, and a cooling device is connected to the bottom of the substrate. A first flow stabilizer is connected to the top left side of the reactor and is connected to a hydrogen outlet pipe, which is also connected to a hydrogen pressure relief pipe. A second flow stabilizer is connected to the upper left side of the reactor and is connected to a methane outlet pipe, which is also connected to a methane pressure relief pipe. An argon outlet pipe is connected to the top right side of the reactor. This invention effectively solves the problems in the prior art and creates better economic benefits.

Description

Technical Field

[0001] This invention belongs to the field of plasma chemical vapor deposition technology, specifically relating to an air intake structure for a plasma chemical vapor deposition system. Background Technology

[0002] Diamond possesses many excellent properties, such as high hardness, low coefficient of friction, high thermal conductivity, and good chemical stability. Therefore, diamond films have broad application prospects in industries such as electronics, optics, and machinery, while diamond particles are also precious decorative items. In recent years, the technology for depositing diamond films and particles under low pressure and low temperature has become increasingly mature, gradually forming a commercialized industry chain.

[0003] In the diamond production process, the design of the gas inlet structure is crucial. Existing gas inlet structures suffer from the following main problems: First, the gas flow of methane and hydrogen into the reactor is unstable, affecting the quality of diamond production. Second, in emergencies such as sudden power outages, residual hydrogen, methane, and argon in the pipelines and equipment cannot be discharged in time, affecting on-site equipment safety. Utility Model Content

[0004] To solve the above technical problems, the inventor, based on his extensive experience in the field of plasma chemical vapor deposition technology, developed an air intake structure for a plasma chemical vapor deposition system.

[0005] To achieve the above technical objectives, the technical solution adopted by this utility model is as follows: An inlet structure for a plasma chemical vapor deposition system includes a reactor. A cathode is disposed inside the reactor, and an anode surrounds the cathode. The anode is cylindrical. When the cathode and anode are powered on, an electric arc is generated. The electric arc is ejected from the outlet of the anode, forming a plasma jet. A substrate is disposed below the plasma jet, and a cooling device is connected to the bottom of the substrate. A first flow stabilizer is connected to the top left side of the reactor. The first flow stabilizer is connected to a hydrogen outlet pipe, and a hydrogen pressure relief pipe is also connected to the hydrogen outlet pipe. A flame arrester is installed on the hydrogen outlet pipe. A second flow stabilizer is connected to the upper left side of the reactor. The second flow stabilizer is connected to a methane outlet pipe, and the methane outlet pipe is also connected to a methane pressure relief pipe. An argon outlet pipe is connected to the top right side of the reactor.

[0006] Furthermore, the cooling device is equipped with a U-shaped tube inside, with a cooling device inlet pipe connected to the left side of the U-shaped tube and a cooling device self-control valve installed on the cooling device inlet pipe, and a cooling device outlet pipe connected to the right side of the U-shaped tube.

[0007] Furthermore, the first current stabilizer has three built-in first current stabilizing plates, each with multiple first current stabilizing holes. The first current stabilizing holes on two adjacent first current stabilizing plates are staggered and not on the same horizontal plane. The first current stabilizer is arranged vertically.

[0008] Furthermore, the second current stabilizer has three built-in second current stabilizing plates, each with multiple second current stabilizing holes. The second current stabilizing holes on adjacent second current stabilizing plates are staggered and not on the same horizontal plane. The diameter of the second current stabilizing hole is smaller than the diameter of the first current stabilizing hole. The second current stabilizer is arranged horizontally.

[0009] Because the demand for hydrogen is greater than that for methane in the diamond production process, the aperture of the second flow stabilizing orifice is smaller than that of the first flow stabilizing orifice. Since the main reactants are hydrogen and methane, the inventors added a flow stabilizer in this application, so even if the argon gas flow is unstable, it has little impact on diamond formation. In actual production, if technicians deem it necessary to add an argon flow stabilizer, they can refer to the structure of the first and second flow stabilizers for configuration.

[0010] Furthermore, a hydrogen self-control valve is installed on the hydrogen outlet pipe, and a hydrogen buffer tank is connected to the other end of the hydrogen outlet pipe. A hydrogen main pipe is connected to the lower left side of the hydrogen buffer tank, and a hydrogen pressure relief valve is installed on the hydrogen pressure relief pipe.

[0011] Furthermore, a methane self-control valve is installed on the methane outlet pipe, and a methane buffer tank is connected to the other end of the methane outlet pipe. A methane main pipe is connected to the lower left side of the methane buffer tank, and a methane pressure relief valve is installed on the methane pressure relief pipe.

[0012] Furthermore, an argon gas self-control valve is installed on the argon gas outlet pipe, and the other end of the argon gas outlet pipe is connected to an argon gas buffer tank. An argon gas main pipe is connected to the lower right side of the argon gas buffer tank. The argon gas outlet pipe is also connected to an argon gas pressure relief pipe, and an argon gas pressure relief valve is installed on the argon gas pressure relief pipe.

[0013] Compared with the prior art, this utility model has the following beneficial effects: 1. This utility model is equipped with a first flow stabilizer and a second flow stabilizer on the hydrogen outlet pipe and the methane outlet pipe, respectively. The flow stabilizer is internally equipped with a flow stabilizing plate and a flow stabilizing hole, which can fully stabilize the flow of hydrogen and methane, thereby ensuring the quality of diamond formation. 2. This utility model adds a hydrogen pressure relief valve, a methane pressure relief valve, and an argon pressure relief valve. In the event of a power outage or other emergency, the above-mentioned pressure relief valves can be opened in time to discharge the hydrogen, methane, and argon remaining in the pipelines and equipment, ensuring the safety of the on-site equipment. Attached Figure Description

[0014] Figure 1 This is a schematic diagram of the structure of this utility model.

[0015] Figure 2 This is a schematic diagram of the first current stabilizer.

[0016] Figure 3 This is a schematic diagram of the second current stabilizer.

[0017] Figure 4 This is a cross-sectional view of the first current stabilizer.

[0018] Figure 5 This is a schematic diagram of the first flow stabilizer.

[0019] Figure 6 This is a cross-sectional view of the second current stabilizer.

[0020] Figure 7 This is a schematic diagram of the second flow stabilizer.

[0021] Figure reference numerals: 1. Reactor; 2. Anode; 3. Cathode; 4. Power supply; 5. Plasma jet; 6. Substrate; 7. Cooling device; 8. U-tube; 9. Cooling device inlet pipe; 10. Cooling device automatic control valve; 11. Cooling device outlet pipe; 12. Methane main pipe; 13. Methane buffer tank; 14. Methane outlet pipe; 15. Methane automatic control valve; 16. Methane pressure relief pipe; 17. Methane pressure relief valve; 18. Hydrogen main pipe; 19. Hydrogen buffer tank; 2 0. Hydrogen outlet pipe; 21. Hydrogen self-control valve; 22. Hydrogen pressure relief pipe; 23. Hydrogen pressure relief valve; 24. Flame arrester; 25. First flow stabilizer; 2501. First flow stabilizer plate; 2502. First flow stabilizer orifice; 26. Argon main pipe; 27. Argon buffer tank; 28. Argon outlet pipe; 29. ​​Argon self-control valve; 30. Argon pressure relief pipe; 31. Argon pressure relief valve; 32. Second flow stabilizer; 3201. Second flow stabilizer plate; 3202. Second flow stabilizer orifice. Detailed Implementation

[0022] To make the technical problems, technical solutions, and beneficial effects of this utility model clearer, the present utility model will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the present utility model and are not intended to limit the present utility model.

[0023] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of them. The following description of at least one exemplary embodiment is actually illustrative only and is in no way intended to limit this application or its application or use. All other embodiments obtained by those skilled in the art based on the embodiments of this application without creative effort are within the scope of protection of this application.

[0024] like Figures 1-7 As shown, the inlet structure of a plasma chemical vapor deposition system includes a reactor 1. A cathode 3 is disposed inside the reactor 1, and an anode 2 is surrounded by the cathode 3. The anode 2 is cylindrical. When the cathode 3 and anode 2 are connected to a power source 4, an electric arc is generated. The electric arc is ejected from the outlet of the anode 2, forming a plasma jet 5. A substrate 6 is disposed below the plasma jet 5, and a cooling device 7 is connected to the bottom of the substrate 6. A first flow stabilizer 25 is connected to the top left side of the reactor 1. The first flow stabilizer 25 is connected to a hydrogen outlet pipe 20. A hydrogen pressure relief pipe 22 is also connected to the hydrogen outlet pipe 20, and a flame arrester 24 is installed on the hydrogen outlet pipe 20. A second flow stabilizer 32 is connected to the upper left side of the reactor 1. The second flow stabilizer 32 is connected to a methane outlet pipe 14. The methane outlet pipe 14 is also connected to a methane pressure relief pipe 16. An argon outlet pipe 28 is connected to the top right side of the reactor 1.

[0025] In this embodiment, a U-shaped pipe 8 is provided inside the cooling device 7. A cooling device water inlet pipe 9 is connected to the left side of the U-shaped pipe 8. A cooling device self-control valve 10 is installed on the cooling device water inlet pipe 9. A cooling device water outlet pipe 11 is connected to the right side of the U-shaped pipe 8.

[0026] In this embodiment, the first current stabilizer 25 has three first current stabilizer plates 2501. The first current stabilizer plates 2501 are provided with a plurality of first current stabilizer holes 2502. The first current stabilizer holes 2502 on two adjacent first current stabilizer plates 2501 are staggered and not on the same horizontal plane.

[0027] In this embodiment, the second flow stabilizer 32 has three built-in second flow stabilizing plates 3201, each with multiple second flow stabilizing holes 3202. The second flow stabilizing holes 3202 on adjacent second flow stabilizing plates 3201 are staggered and not on the same horizontal plane. The diameter of the second flow stabilizing hole 3202 is smaller than the diameter of the first flow stabilizing hole 2502. Because the demand for hydrogen is greater than the demand for methane in the diamond production process, the diameter of the second flow stabilizing hole 3202 is smaller than the diameter of the first flow stabilizing hole 2502.

[0028] In this embodiment, a hydrogen self-control valve 21 is installed on the hydrogen outlet pipe 20, and a hydrogen buffer tank 19 is connected to the other end of the hydrogen outlet pipe 20. A hydrogen main pipe 18 is connected to the lower left side of the hydrogen buffer tank 19, and a hydrogen pressure relief valve 23 is installed on the hydrogen pressure relief pipe 22.

[0029] In this embodiment, a methane self-control valve 15 is installed on the methane outlet pipe 14, and a methane buffer tank 13 is connected to the other end of the methane outlet pipe 14. A methane main pipe 12 is connected to the lower left side of the methane buffer tank 13, and a methane pressure relief valve 17 is installed on the methane pressure relief pipe 16.

[0030] In this embodiment, an argon gas self-control valve 29 is installed on the argon gas outlet pipe 28, and the other end of the argon gas outlet pipe 28 is connected to the argon gas buffer tank 27. An argon gas main pipe 26 is connected to the lower right side of the argon gas buffer tank 27. The argon gas outlet pipe 28 is also connected to an argon gas pressure relief pipe 30, and an argon gas pressure relief valve 31 is installed on the argon gas pressure relief pipe 30.

[0031] In practical use, this invention sequentially introduces hydrogen into reactor 1 by opening hydrogen self-control valve 21, introducing methane into reactor 1 by opening methane self-control valve 15, and introducing argon into reactor 1 by opening argon self-control valve 29. The hydrogen passes through flame arrester 24 on hydrogen outlet pipe 20 and reaches first flow stabilizer 25. In first flow stabilizer 25, the hydrogen sequentially passes through first flow stabilizing holes 2502 on three first flow stabilizing plates 2501, and the stabilized hydrogen then enters reactor 1. Methane reaches second flow stabilizer 32 through methane outlet pipe 14. In the second flow stabilizer 32, methane passes through the second flow stabilizing holes 3202 on the three second flow stabilizing plates 3301 in sequence. After the methane has been stabilized, it enters the reactor 1. Then, the cathode 3 and anode 2 are connected to the power supply 4. The generated electric arc is ejected from the anode 2 port to form a plasma jet 5. Diamond is gradually generated on the substrate 6. During the generation process, the temperature of the substrate 6 will gradually increase. The operator should open the cooling device self-control valve 10 of the cooling device 7 in time to introduce cooling water into the cooling device 7 to cool the substrate 6.

[0032] In the event of an emergency power outage, the hydrogen pressure relief valve 22, methane pressure relief valve 17, and argon pressure relief valve 23 should be opened promptly to purge the hydrogen from the hydrogen outlet pipe 20, the methane from the methane outlet pipe 14, the argon from the argon outlet pipe 28, and the mixed gas in reactor 1, ensuring the safety of the equipment on site.

[0033] The above are merely preferred embodiments of the present utility model and are not intended to limit the present utility model. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of the present utility model should be included within the protection scope of the present utility model.

Claims

1. A gas inlet structure for a plasma chemical vapor deposition system, characterized by: The reactor includes a cathode inside, surrounded by an anode in a cylindrical shape. When the cathode and anode are powered, an electric arc is generated, which is ejected from the anode outlet to form a plasma jet. A substrate is placed below the plasma jet, and a cooling device is connected to the bottom of the substrate. A first flow stabilizer is connected to the top left side of the reactor and is connected to a hydrogen outlet pipe. A hydrogen pressure relief pipe is also connected to the hydrogen outlet pipe, and a flame arrester is installed on the hydrogen outlet pipe. A second flow stabilizer is connected to the upper left side of the reactor and is connected to a methane outlet pipe. The methane outlet pipe is also connected to a methane pressure relief pipe. An argon outlet pipe is connected to the top right side of the reactor.

2. The gas inlet structure of a plasma chemical vapor deposition system according to claim 1, wherein: The cooling device has a U-shaped tube inside. The left side of the U-shaped tube is connected to the cooling device water inlet pipe, and the cooling device self-control valve is installed on the cooling device water inlet pipe. The right side of the U-shaped tube is connected to the cooling device water outlet pipe.

3. The gas inlet structure of a plasma chemical vapor deposition system according to claim 1, wherein: The first current stabilizer has three built-in first current stabilizer plates. Each first current stabilizer plate has multiple first current stabilizer holes. The first current stabilizer holes on two adjacent first current stabilizer plates are staggered and not on the same horizontal plane.

4. The gas inlet structure of a plasma chemical vapor deposition system according to claim 1, wherein: The second current stabilizer has three built-in second current stabilizer plates. Each second current stabilizer plate has multiple second current stabilizer holes. The second current stabilizer holes on two adjacent second current stabilizer plates are staggered and not on the same horizontal plane. The diameter of the second current stabilizer hole is smaller than the diameter of the first current stabilizer hole.

5. The gas inlet structure of a plasma chemical vapor deposition system according to claim 1, wherein: A hydrogen self-control valve is installed on the hydrogen outlet pipe, and a hydrogen buffer tank is connected to the other end of the hydrogen outlet pipe. A hydrogen main pipe is connected to the lower left side of the hydrogen buffer tank, and a hydrogen pressure relief valve is installed on the hydrogen pressure relief pipe.

6. The gas inlet structure of a plasma chemical vapor deposition system according to claim 1, wherein: A methane self-control valve is installed on the methane outlet pipe, and a methane buffer tank is connected to the other end of the methane outlet pipe. A methane main pipe is connected to the lower left side of the methane buffer tank, and a methane pressure relief valve is installed on the methane pressure relief pipe.

7. The gas inlet structure of a plasma chemical vapor deposition system according to claim 1, wherein: An argon gas self-control valve is installed on the argon gas outlet pipe. The other end of the argon gas outlet pipe is connected to an argon gas buffer tank. An argon gas main pipe is connected to the lower right side of the argon gas buffer tank. The argon gas outlet pipe is also connected to an argon gas pressure relief pipe, and an argon gas pressure relief valve is installed on the argon gas pressure relief pipe.

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