Chemical polishing apparatus for aluminum alloy workpieces
By designing guide rails and lifting auxiliary mechanisms, rapid lifting and oscillation assistance are achieved for aluminum alloy workpieces, solving the problem of long residual solution residence time, improving separation efficiency and polishing efficiency, and ensuring stable connection of workpieces.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- CHONGQING MICRO-ARC METAL SURFACE TREATMENT TECH CO LTD
- Filing Date
- 2025-05-15
- Publication Date
- 2026-07-17
AI Technical Summary
In the polishing process of aluminum alloy workpieces, the existing technology requires the workpiece to be lifted to the top of the reaction tank to drain the solution residue, which takes a long time and affects the separation efficiency and polishing efficiency.
By employing components such as guide rails, positioning brackets, lifting auxiliary frames, lifting control mechanisms, positioning hangers, oscillation auxiliary mechanisms, and anti-detachment support rings, the workpiece can be rapidly lifted and oscillated, simultaneously separating the solution from the workpiece.
It improves the separation efficiency between the solution and the workpiece, enhances the efficiency of the polishing process, and ensures the stability of the connection between the workpiece and the device.
Smart Images

Figure CN224513625U_ABST