一种高纯气体管道的真空置换装置
By combining the support frame and clamps with the venting chamber and vacuum pump, a vacuum environment is formed, which solves the safety problem of venting pipe discharge during the replacement of high-purity gas pipelines, realizes safe and efficient gas collection and pressure control, and improves the safety of the replacement process.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- SHANGHAI SHENGTANG ELECTROMECHANICAL SYST ENG CO LTD
- Filing Date
- 2025-09-03
- Publication Date
- 2026-07-17
AI Technical Summary
In the existing high-purity gas pipeline replacement process, a venting pipe is required for gas discharge, which makes it difficult to guarantee the safety of the replacement environment, especially in special environments.
It adopts a support frame and upper and lower clamps combined with high-purity gas pipelines for stable installation. With the help of the built-in venting chamber and vacuum pump, an internal vacuum environment is formed to quickly collect the vented gas. The gas is continuously collected through a venting tank that can be quickly detached, which improves safety.
It enables safe and efficient replacement of high-purity gas pipelines without considering the venting environment. Through the cooperation of vacuum pumps and venting tanks, it ensures rapid gas collection and pressure monitoring, thereby improving the safety of the replacement process.
Smart Images
Figure CN224516142U_ABST
Abstract
Claims
1. A vacuum displacement device for high-purity gas pipelines, comprising a main frame (1), characterized in that, One side of the main frame (1) is embedded with a pressure relief frame (2), the main frame (1) comprises a lower hoop frame (101), and the bottom ends of the lower hoop frame (101) are fixed with support frames (102) on both sides, the top surfaces of the lower hoop frame (101) are buckled with upper hoop frames (103) at both ends, the two sides of the upper hoop frame (103) are fixed with fastening plates (104), the top end center of the upper hoop frame (103) is fixed with a diffusion chamber (105), and a vacuum cavity (106) is formed in the inside of the diffusion chamber (105), one side of the vacuum cavity (106) is communicated with a vacuum pump (107), the bottom end of the vacuum cavity (106) is fixed with an electromagnetic valve port (108), and the bottom end of the electromagnetic valve port (108) is inserted with a diffusion pipe (109), the top surface center of the diffusion chamber (105) is communicated with a diffusion tank (110), the bottom end of the diffusion tank (110) is fixed with a threaded connector (111), and the inner wall of the threaded connector (111) is fixed with a soft rubber inner sleeve (112).
2. The vacuum displacement apparatus for a high-purity gas pipeline according to claim 1, wherein The upper hoop frame (103) is detachably connected with the lower hoop frame (101) through the two fastening plates (104), and the lower hoop frame (101) is welded and fixed with the support frame (102).
3. The vacuum displacement device for a high-purity gas pipeline according to claim 1, wherein The upper hoop frame (103) is inserted with the diffusion pipe (109) through the electromagnetic valve port (108) at the bottom of the diffusion chamber (105), and one end of the diffusion pipe (109) is communicated with a high-purity gas pipeline.
4. The vacuum displacement apparatus for a high-purity gas pipeline according to claim 1, wherein The vacuum cavity (106) is communicated with the vacuum pump (107) and the diffusion tank (110), and the electromagnetic valve port (108) is fixedly connected with the bottom end of the vacuum cavity (106).
5. The vacuum displacement apparatus for a high-purity gas pipeline according to claim 1, wherein The diffusion tank (110) is threadedly detachably connected with the top end of the diffusion chamber (105) through the threaded connector (111), and the soft rubber inner sleeve (112) is fixed in a central taper along the inner wall of the threaded connector (111).
6. The vacuum displacement apparatus for a high-purity gas pipeline according to claim 1, wherein The pressure relief frame (2) comprises a pressure relief box (201), and one side of the pressure relief box (201) is fixed to one side of the outer wall of the diffusion chamber (105), one side of the pressure relief box (201) is fixed with a pressure gauge (202), and the bottom end of the pressure relief box (201) is fixed with a pressure relief valve pipe (203).
7. The vacuum displacement apparatus for a high-purity gas pipeline according to claim 6, wherein The pressure gauge (202) and the pressure relief valve pipe (203) are communicated with one side of the diffusion chamber (105), and the pressure relief box (201) is fixedly connected with the pressure gauge (202) and the pressure relief valve pipe (203).