一种化学品供应设备输送系统
By introducing a magnetic levitation pump and a diversion mechanism into the chemical supply equipment, the problem of low head of the diaphragm pump was solved, the stability and safety of the system were improved, and the operating cost and maintenance frequency were reduced.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- SHANGHAI ZHICHUN SYST INTEGRATION CO LTD
- Filing Date
- 2025-08-14
- Publication Date
- 2026-07-17
AI Technical Summary
The existing chemical supply equipment has low head for diaphragm pumps or airbag pumps, which leads to pressure fluctuations and water hammer effects, posing safety hazards. In addition, they have short lifespans and require frequent maintenance.
The system employs a magnetic levitation pump and a diversion mechanism. The diversion mechanism pre-pumps liquid to meet the starting conditions of the magnetic levitation pump, and combines a dual filtration mechanism to ensure system stability and safety.
It improves system stability and security, reduces operating costs, extends component life, avoids water hammer effect and frequent maintenance, and improves operating efficiency.
Smart Images
Figure CN224516524U_ABST
Abstract
Claims
1. A chemical supply equipment conveying system, comprising a supply tank for storing liquid media, a buffer tank, and a controller; the supply tank and the buffer tank are connected by a liquid delivery pipeline, wherein the inlet end of the liquid delivery pipeline extends from the outlet at the top of the supply tank into the supply tank, and the outlet end extends from the inlet at the top of the buffer tank into the buffer tank; a first control valve is connected to the liquid delivery pipeline near the outlet of the supply tank, and a second control valve is connected to the liquid delivery pipeline near the inlet of the buffer tank, characterized in that, The infusion line is also connected to a magnetic levitation pump located behind the first control valve for pumping liquid, and a drainage mechanism located behind the magnetic levitation pump for assisting in pumping liquid so that the magnetic levitation pump can obtain enough liquid to meet the start-up conditions. The first control valve, the second control valve, the magnetic levitation pump and the drainage mechanism are all electrically connected to the controller.
2. The chemical supply apparatus delivery system of claim 1, wherein, The drainage mechanism includes a drainage branch connected to the infusion pipeline, and a solenoid valve and a diaphragm drainage pump connected in sequence to the drainage branch. The solenoid valve and the diaphragm drainage pump are both electrically connected to the controller.
3. The chemical supply apparatus delivery system of claim 2, wherein, It also includes a first filtration mechanism, which includes a first automatic valve, a first pressure gauge, a first filtration unit, a second pressure gauge, and a second automatic valve arranged sequentially on the infusion pipeline. A first vent valve is connected to the first filtration unit via a pipeline. The first automatic valve, the first pressure gauge, the second pressure gauge, the second automatic valve, and the first vent valve are all electrically connected to the controller.
4. The chemical supply apparatus delivery system of claim 3, wherein, The infusion line is also connected to a second filtration mechanism in parallel with the first filtration mechanism via a filtration branch. The second filtration mechanism includes a third automatic valve, a third pressure gauge, a second filtration unit, a fourth pressure gauge, and a fourth automatic valve arranged sequentially on the filtration branch. A second vent valve is connected to the second filtration unit via a pipeline. The third automatic valve, the third pressure gauge, the fourth pressure gauge, the fourth automatic valve, and the second vent valve are all electrically connected to the controller.