一种真空烘箱的加热结构
By employing a symmetrical heater and sensor layout design, combined with main controller adjustment and L-shaped protective plate protection, the problem of uneven temperature in the vacuum oven was solved, achieving both temperature uniformity and sensor protection.
CN224517325UActive Publication Date: 2026-07-17NANJING YAOTIAN DRYING EQUIP
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- NANJING YAOTIAN DRYING EQUIP
- Filing Date
- 2025-09-03
- Publication Date
- 2026-07-17
Smart Images
Figure CN224517325U_ABST
Abstract
本实用新型涉及真空烘箱组件技术领域，且公开了一种真空烘箱的加热结构，包括控制设备，控制设备连接有监测加热设备，监测加热设备包括呈对称状设置的两个扩口罩，扩口罩两侧壁中心位置之间开设有通槽，且通槽内固定安装有加热器，两个加热器相向一端设置有加热头，扩口罩内侧外围呈等角度状固定安装有四个温度传感器。本实用新型通过采用优化的加热元件布局结构设计，其采用对称式的加热器结构设计，其可均匀分布在烘箱内两侧，并于其两侧加热器处均匀分布设置有多个温度传感器，便于进行箱内的多区温度监测，以便于分析箱内温度状况，进而经由主控器分别对应调节加热器，提升了箱内温度均匀性。
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