基于化学腐蚀的金属金相检测设备
By designing a metallographic inspection device that includes classification, chemical etching, and optical detection components, the problems of low chemical etching efficiency and insufficient adaptability to large-scale applications in existing technologies have been solved. This has enabled automated and batch metallographic inspection, improving inspection efficiency and reducing costs.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- CHENG DU YUAN LIU LI CHUANG KE JI YOU XIAN GONG SI
- Filing Date
- 2025-06-04
- Publication Date
- 2026-07-17
AI Technical Summary
Existing technologies have low chemical etching efficiency for metallographic samples and are not suitable for large-scale applications, making it impossible to achieve automated and batch testing.
Design a metallographic inspection device based on chemical etching, comprising a classification component, a chemical etching component, and an optical inspection component. The components are connected by a sample transport channel. The classification component allocates channels according to the target sample properties. The chemical etching component is equipped with sample holes, and the optical inspection component is equipped with corresponding sample holes, thereby realizing automated sample transfer and information consistency.
It improves the efficiency of collinear detection of large batches of samples with multiple material types, reduces human intervention, lowers detection costs, and ensures the quality and consistency of metallographic structure detection.
Smart Images
Figure CN224518679U_ABST
Abstract
Claims
1. A metallographic inspection apparatus based on chemical etching, characterized by, It includes a classification component (1), a chemical etching component (2), and an optical detection component (3). The classification component (1) and the chemical etching component (2) are connected through the first classification channel (12) of the classification component (1), and the chemical etching component (2) and the optical detection component (3) are connected through the second output channel (23) of the chemical etching component (2). The chemical etching component (2) has a plurality of first sample holes (2201) on its chemical etching station (22). The first sample holes (2201) are set on the first support plate (220) of the chemical etching station (22). The optical detection component (3) has a number of second sample holes (34) equal to the number of the first sample holes (2201) on its optical detection station. The second sample holes (34) are set on the second support plate of the optical detection station. The first sample holes (2201) and the second sample holes (34) correspond one-to-one.
2. The chemical etching-based metallographic examination apparatus according to claim 1, characterized in that, The first sample hole (2201) is a through hole, and the second sample hole (34) is a through hole.
3. The chemical etching-based metallographic examination apparatus according to claim 1, characterized in that, The second sample hole (34) is a blind hole, and the bottom of the blind hole of the second sample hole (34) is made of transparent material.
4. The chemical etching-based metallographic examination apparatus according to claim 1, characterized by The classification component (1) includes a first protective frame (11). The bottom plate of the first protective frame (11) is equipped with a first input channel (16), a first classification channel (12), and a second classification channel. The first classification channel (12) and the second classification channel are arranged in different directions. The classification component (1) is provided with a first scanning mechanism (13) on the side of the first classification channel (12).
5. The chemical etching-based metallographic examination apparatus according to claim 4, characterized in that, The first classification channel (12) includes multiple first sub-channels, and the target sample delivery direction of each first sub-channel is the same.
6. The chemical etching-based metallographic examination apparatus according to claim 4, wherein, The second classification channel includes a second sub-channel (14) and a third sub-channel (15), wherein the target sample delivery directions of the second sub-channel (14) and the third sub-channel (15) are opposite.
7. The chemical etching-based metallographic examination apparatus according to claim 4, wherein, The first camera (18) is also provided on the bottom plate of the first protective frame (11), and the first camera (18) is installed on one side of the first input channel (16).
8. The chemical etching-based metallographic examination apparatus according to claim 4, characterized by The top plate of the first protective frame (11) is equipped with a sorting mechanism (17).
9. The chemical etching-based metallographic examination apparatus according to any one of claims 1 to 8, characterized in that, Includes at least one of the chemical etching components (2), and at least one chemical etching station (22) is installed on the first partition (212) of any of the chemical etching components (2).
10. The chemical etching-based metallographic examination apparatus according to claim 9, characterized in that, The number of groups of the first classification channel (12) is equal to that of the chemical corrosion component (2). One end of the first classification channel (12) is fixed to the bottom plate of the first protective frame (11) of the classification component (1), and the other end of the first classification channel (12) is fixed to the first partition (212) of the corresponding chemical corrosion component (2).