一种紫外到近红外的超宽带减反射膜

Abstract

本实用新型涉及一种紫外到近红外的超宽带减反射膜，所述减反射膜采用了多层膜干涉结构，包括设置在石英基底表面上的十层膜层，所述十层膜层离石英基底从近至远第一层为Al2O3膜层，第二层为SiO2膜层，第三层为TiO2膜层，第四层为SiO2膜层，第五层为TiO2膜层，第六层为SiO2膜层，第七层为TiO2膜层，第八层为SiO2膜层，第九层为TiO2膜层，第十层为MgF2膜层，通过多种折射率材料的组合优化，本实用新型能够实现在360nm‑1064nm超宽带的减反射效果。

Claims

1. An ultraviolet to near-infrared, ultra-broadband antireflective film, characterized by: The antireflective coating comprises ten layers on the surface of a quartz substrate. The ten layers, from closest to farthest from the quartz substrate, are as follows: the first layer is a 16.82 nm thick Al₂O₃ transition layer; the second layer is a 59.93 nm thick SiO₂ low-refractive-index material layer; the third layer is an 11.63 nm thick TiO₂ high-refractive-index material layer; the fourth layer is a 45.15 nm thick SiO₂ low-refractive-index material layer; and the fifth layer is a 26.94 nm thick TiO₂ high-refractive-index material layer. The antireflective coating consists of three layers: a sixth layer of SiO2 low-refractive-index material with a thickness of 18.99 nm, a seventh layer of TiO2 high-refractive-index material with a thickness of 129.54 nm, an eighth layer of SiO2 low-refractive-index material with a thickness of 24.59 nm, a ninth layer of TiO2 high-refractive-index material with a thickness of 19.80 nm, and a tenth layer of MgF2 low-refractive-index protective layer with a thickness of 105.89 nm. The reflectivity of the antireflective coating in the 360 ​​nm-1064 nm wavelength range is less than 1.5%.

2. The ultraviolet to near-infrared super-wideband antireflection film according to claim 1, characterized by: The refractive index of the Al2O3 film is 1.62-1.65, the refractive index of the SiO2 film is 1.43-1.50, the refractive index of the TiO2 film is 2.20-2.50, and the refractive index of the MgF2 film is 1.38-1.40.

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