排气装置及半导体设备

Abstract

本申请涉及一种排气装置及半导体设备，排气装置包括：排气管路，包括连通的第一端和第二端，第一端与热处理腔室连通；汇合管，排气管路的第二端与汇合管连通；稀释剂喷管，与汇合管连通，用于向汇合管中喷出稀释剂，以溶解汇合管内壁的结晶物；液气分离管，液气分离管包括入口端、废液排出端和气体排出端，入口端与汇合管的底端连通，废液排出端用于排出溶解结晶物后的稀释剂废液，气体排出端与工厂排气端连通，以进行排气。本申请的排气装置，能正常进行排气的同时，还能自动清洁排气管道内壁的结晶物，并且，能减少设备宕机时间和提高产品良率。

Claims

1. An exhaust device characterized by, include: An exhaust pipe, the exhaust pipe including a first end and a second end connected together, the first end being connected to a heat treatment chamber; The manifold is connected to the second end of the exhaust pipe; A diluent nozzle, connected to the manifold, is used to spray diluent into the manifold to dissolve the crystals on the inner wall of the manifold. The liquid-gas separator includes an inlet end, a waste liquid discharge end, and a gas discharge end. The inlet end is connected to the bottom end of the manifold. The waste liquid discharge end is used to discharge the diluent waste liquid after dissolving the crystals. The gas discharge end is connected to the factory exhaust end for exhaust.

2. The exhaust apparatus according to claim 1, characterized by A control valve is provided between the liquid-gas separation pipe and the manifold; When the diluent nozzle sprays diluent into the manifold, the control valve closes under the control of the first electrical signal, thereby sealing the pipeline between the liquid-gas separation pipe and the manifold. The diluent sprayed from the diluent nozzle is stored in the manifold to dissolve the crystals on the inner wall of the manifold. After the dissolution process is completed, the control valve opens under the control of a second electrical signal, connecting the liquid-gas separation pipe and the manifold pipe. This allows the diluent waste liquid after dissolving the crystals to be discharged from the manifold pipe into the liquid-gas separation pipe and then discharged from the waste liquid discharge end of the liquid-gas separation pipe.

3. The exhaust apparatus according to claim 2, characterized by The control valve includes a valve body, a drive end, and a control end. The valve body is disposed in the pipeline between the liquid-gas separation pipe and the manifold pipe. The drive end is connected to the valve body and is used to provide driving force to drive the valve body to rotate, so as to close or open the pipeline between the liquid-gas separation pipe and the manifold pipe. The control terminal is electrically connected to the drive terminal, and the control terminal is used to generate a first electrical signal or a second electrical signal to control the drive terminal to provide driving force.

4. The exhaust apparatus according to claim 3, characterized by The valve body includes a baffle; the driving end includes a cylinder; and the control end includes a solenoid valve.

5. The exhaust apparatus according to claim 2, characterized by The liquid-gas separation pipe includes a "U"-shaped pipe. One of the two ports at the top of the "U"-shaped pipe is the inlet end, and the other is the gas outlet end. The waste liquid outlet end is located at the bottom end of the arc-shaped area of ​​the "U"-shaped pipe.

6. The exhaust apparatus according to claim 3, characterized by The exhaust device also includes a diluent supply end, the diluent nozzle is connected to the diluent supply end, the diluent supply end is used to supply diluent to the diluent nozzle, and control the on / off of the diluent in the diluent nozzle; The exhaust device also includes a liquid level sensor, which is used to detect the liquid level of the diluent stored in the manifold. When the liquid level sensor detects that the liquid level of the diluent stored in the manifold has reached the target liquid level value, it sends a stop liquid supply signal to the diluent supply end. When the diluent supply end receives the stop liquid supply signal, it stops supplying diluent to the diluent nozzle.

7. The exhaust apparatus according to claim 6, characterized by An exhaust pressure gauge is provided between the gas discharge end and the factory exhaust end, and the exhaust pressure gauge is used to detect the gas pressure in the pipeline. When the exhaust pressure gauge detects that the gas pressure in the pipeline is less than the preset pressure value, the exhaust pressure gauge sends a liquid supply signal to the diluent supply end. When the diluent supply end receives the liquid supply signal, it supplies diluent to the diluent nozzle.

8. The exhaust apparatus according to claim 7, characterized by When the exhaust pressure gauge detects that the gas pressure in the pipeline is less than the preset pressure value, the exhaust pressure gauge also sends a closing signal to the control valve. When the control valve receives the closing signal, it closes under the control of the first electrical signal.

9. The exhaust apparatus according to claim 1, characterized by The diluent nozzle may be one or more; when there are multiple diluent nozzles, the multiple diluent nozzles are connected to the confluence pipe from different directions. The exhaust pipe may be one or more, and the heat treatment chamber may be one or more. The first end of one exhaust pipe is connected to the corresponding heat treatment chamber, and the second ends of multiple exhaust pipes are all connected to the confluence pipe.

10. A semiconductor device, characterized by comprising: include: The exhaust device according to any one of claims 1-9; A heat treatment chamber for heat treating wafers, the heat treatment chamber being connected to an exhaust pipe in the exhaust device for venting during the heat treatment.

11. The semiconductor device according to claim 10, wherein The semiconductor device further includes a process chamber for performing semiconductor processing on the wafer, the semiconductor processing including coating, developing, deposition, etching or cleaning. The heat treatment chamber is used to perform heat treatment on the wafer after or before semiconductor processing is performed in the process chamber.

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