衬底退火工装及退火炉
By designing a vertically stacked array of multiple sub-tools and a set of accommodating grooves with gradually changing inner diameters in the substrate annealing fixture, the problem of temperature non-uniformity during substrate annealing was solved, achieving radially uniform heating of the substrate and improving the surface quality.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- ZHEJIANG JINGRUI ELECTRONIC MATERIALS CO LTD
- Filing Date
- 2025-06-12
- Publication Date
- 2026-07-17
AI Technical Summary
In the prior art, temperature non-uniformity exists during substrate annealing, resulting in poor surface quality. In particular, in vertical coil annealing furnaces, uneven radial heating of the substrate affects the surface improvement effect.
Design a substrate annealing fixture that stacks multiple sub-fixtures vertically, dividing them into accommodating slots of different inner diameters, and uses the heating capacity of a vertically wound heating coil to achieve uniform radial heating of the substrate. The substrate is made of alumina, silicon carbide, or ceramic materials and is equipped with a temperature measuring ring and a protective cover to ensure temperature control and protection.
This method achieves uniform radial heating during substrate annealing, improves surface quality, reduces temperature difference, and enhances annealing efficiency and surface improvement.
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Figure CN224521535U_ABST
Abstract
Claims
1. A substrate anneal tool (1000) comprising: The device includes multiple vertically stacked sub-tools (100), each sub-tool (100) including a base (110), the base (110) having a first receiving groove (111) for receiving a heating element (R), and the base (110) having a second receiving groove (112) above the first receiving groove (111) for receiving a substrate (S). Multiple sub-tools (100) are defined to be stacked from top to bottom to form a first tooling group (a), a second tooling group (b), and a third tooling group (c). The inner diameter of the first receiving groove (111) in the second tooling group (b) is configured to be smaller than the inner diameter of the first receiving groove (111) in the first tooling group (a) and the third tooling group (c).
2. The substrate anneal fixture (1000) of claim 1, wherein, The inner diameter of the first receiving groove (111) in the second tooling group (b) is configured to be 140mm to 160mm, and the inner diameter of the first receiving groove (111) in the first tooling group (a) and the third tooling group (c) is configured to be 240mm to 260mm.
3. The substrate anneal fixture (1000) of claim 1, wherein, The cross-sections of the first receiving groove (111) and the second receiving groove (112) are both circular, and the center of the cross-section of the first receiving groove (111) and the center of the cross-section of the second receiving groove (112) are coaxial in the vertical direction.
4. The substrate anneal fixture (1000) of claim 1, wherein, The base (110) has a first connecting part (113) at the bottom and a second connecting part (114) at the top. The first connecting part (113) is used to abut against the second connecting part (114).
5. The substrate anneal fixture (1000) of claim 4, wherein, The first connecting part (113) and the second connecting part (114) are connected by snap-fit or magnetic attraction.
6. The substrate anneal fixture (1000) of claim 1, wherein, Temperature measuring rings (115) are provided in the second receiving groove (112) of the first tooling group (a), the second tooling group (b) and the third tooling group (c), and the temperature measuring rings (115) are used to detect the temperature of the substrate (S).
7. The substrate anneal fixture (1000) of claim 1, wherein, A protective cover plate (116) is provided above the second receiving groove (112) in the first tooling assembly (a), and the protective cover plate (116) is connected to the top of the base (110).
8. The substrate anneal fixture (1000) of claim 1, wherein, The substrate (110) is made of alumina, silicon carbide or ceramic material.
9. An annealing furnace (2000), characterized in that, include: Furnace body (200); The substrate annealing fixture (1000) as described in any one of claims 1-8, wherein the substrate annealing fixture (1000) is disposed within the furnace body (200); and A heating coil (300) is disposed on the outer periphery of the furnace body (200) and distributed in the vertical direction, and the projection of the heating coil (300) in the length direction of the furnace body (200) covers the projection of the substrate annealing fixture (1000) in the length direction of the furnace body (200).
10. The annealing furnace (2000) according to claim 9, characterized in that The substrate annealing fixture (1000) is covered with graphite felt (400) on its outer surface. The substrate annealing fixture (1000) is provided with a support member (500) at its bottom. The support member (500) has a vertical degree of freedom of movement.