一种双槽叠加使用的半导体晶圆清洗槽
By using a semiconductor wafer cleaning tank with two stacked tanks, the problems of low machine utilization and high cost caused by multiple tanks are solved, achieving efficient and low-cost cleaning operations, which are suitable for various cleaning needs of semiconductor wafers.
CN224521546UActive Publication Date: 2026-07-17XIAMEN YINKE QIRUI SEMICON TECH CO LTD
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- XIAMEN YINKE QIRUI SEMICON TECH CO LTD
- Filing Date
- 2025-07-07
- Publication Date
- 2026-07-17
AI Technical Summary
Technical Problem
Existing semiconductor wafer cleaning equipment requires multiple tanks made of different materials, resulting in low equipment utilization, high cost, large space occupation, and inconvenient replacement.
Method used
Design a semiconductor wafer cleaning tank with two stacked tanks. The first tank is made of quartz and the second tank is made of acid-resistant material, sharing a single machine. The cleaning mode can be flexibly changed through a detachable drain pipe, which also shares a single drain pipe.
Benefits of technology
It improves machine utilization, reduces equipment and maintenance costs, facilitates the change of cleaning modes, occupies little space, and enables flexible switching of multiple cleaning functions.
✦ Generated by Eureka AI based on patent content.
Smart Images
Figure CN224521546U_ABST
Abstract
本实用新型提供一种双槽叠加使用的半导体晶圆清洗槽，包括第一槽体、第二槽体、机台，所述第一槽体安装在机台内，所述第一槽体为石英材质的槽体，其内部装有去胶液；所述第二槽体用于盛装强酸溶液，第二槽体可拆卸安装在第一槽体内；所述第一槽体内设有第一排液管，所述第二槽体内设有第二排液管，所述机台上设有第三排液管，所述第一排液管和第二排液管分别与第三排液管可拆卸连接。本实用新型的两个清洗槽体共用一个机台，设备成本低，机台利用率高，显著降低了机台采购成本和维护成本，且拆装第二槽体即可更换清洗模式，更换槽体方便灵活，一个设备可兼顾多种清洗功能。
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