一种硅片清洗甩干装置、生产设备

Abstract

本申请提供一种硅片清洗甩干装置、生产设备，包括：箱体，其内设有用于置放片篮的容腔，在容腔内设有滚筒；支撑组件，其被配置于所述滚筒内，包括若干承载片篮的托架及用于控制所述托架上下升降的升降机构；监控组件，其被配设于所述箱体侧壁，用于监控所述托架位置，以确定片篮是否放置于所示托架内；控制所述滚筒旋转以带动所述托架及硅片一同旋转，以甩干硅片表面溶液。本申请一种硅片清洗甩干装置，可批量对硅片进行甩干，并可精准监控片篮位置，可消除因片篮变形或机械结构松动而导致的掉篮及硅片碎裂风险，提高甩干质量，自动化程度高且甩干效率高；结构简单且安全可控，成本低且运行稳定。

Claims

1. A silicon wafer cleaning and spin-drying apparatus, characterized by comprising: include: The box has a cavity for holding the tray, and a roller is installed inside the cavity; A support assembly, which is disposed within the roller, includes a plurality of brackets for carrying trays and a lifting mechanism for controlling the up and down movement of the brackets; A monitoring component, which is disposed on the side wall of the housing, is used to monitor the position of the bracket to determine whether the tray is placed in the bracket shown. The roller is controlled to rotate, thereby rotating the bracket and the silicon wafer together to dry the solution on the surface of the silicon wafer.

2. A silicon wafer cleaning spin-dry apparatus according to claim 1, wherein The cavity has a columnar structure, and the brackets are arranged side by side inside the cavity.

3. A silicon wafer cleaning spin-dry apparatus according to claim 1 or 2, wherein The bracket is constructed as a cuboid structure, with an outer edge for supporting the basket on its upper surface, and a slot for cooperating with the lifting mechanism on its side along its length.

4. A silicon wafer cleaning and spin-drying apparatus according to claim 3, wherein The slot has a U-shaped structure with its opening facing downwards. The end of the support rod in the lifting mechanism is embedded in the slot, driving the support rod to rise and fall. The slot can also drive the bracket to move up and down in the upper part of the roller.

5. A silicon wafer cleaning and spin-drying apparatus according to claim 4, wherein The lifting mechanism also includes a lifting cylinder for moving the bracket up and down, which is vertically arranged inside the drum.

6. The silicon wafer cleaning and spin-drying apparatus according to any one of claims 1-2, 4-5, wherein The monitoring component includes an upper sensor and a lower sensor, which are fixed to the side wall of the enclosure by a mounting bracket; each bracket is equipped with a set of the upper sensor and the lower sensor.

7. A spin-rinse-dry apparatus for cleaning silicon wafers as defined in claim 6, wherein Each set of upper and lower sensors is fixed in the same housing, with the upper sensor positioned 1-2 mm above the tray placement position and the lower sensor positioned 1-2 mm below the tray placement position.

8. The silicon wafer cleaning and spin-drying apparatus according to any one of claims 1-2, 4-5, 7, wherein It also includes a lid that mates with the box body, and the inner side of the lid has a groove to avoid the position of the bracket.

9. A silicon wafer cleaning spin-dry apparatus according to claim 8, wherein An annular sealing strip adapted to the roller is provided on the top of the box cover; an observation window is also provided at the groove position.

10. A production apparatus characterized by comprising: It is equipped with a silicon wafer cleaning and spin-drying device as described in any one of claims 1-9.

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