A wafer baking basket

By designing a mirror-symmetrical connecting plate and shelf structure, the problem of uneven material flow during wafer furnace baking was solved, achieving uniform heating and efficient baking of the wafer surface, and improving operational safety and production efficiency.

CN224521577UActive Publication Date: 2026-07-17KUNSHAN INBORE ELECTRONICS TECH

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
KUNSHAN INBORE ELECTRONICS TECH
Filing Date
2025-07-30
Publication Date
2026-07-17

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Abstract

This invention proposes a wafer baking basket, comprising two vertically arranged support bodies. Between the two support bodies are a pair of mirror-symmetrical first connecting plates and a pair of mirror-symmetrical second connecting plates. The two first connecting plates are face-to-face, and the two second connecting plates are side-by-side, located on a common side of the two first connecting plates, with the distance between the two second connecting plates being less than the distance between the two first connecting plates. Several spaced first and second supports are arrayed along the length of each of the two first and two second connecting plates, arranged side-by-side. The first and second supports in the same row form a wafer placement area that matches the wafer. This invention allows multiple wafers to be loaded simultaneously in a single basket, increasing the baking capacity and efficiency per cycle compared to equipment that can only process a small number or a single wafer at a time, while reducing costs.
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Description

Technical Field

[0001] This utility model relates to the field of wafer manufacturing technology, specifically, it demonstrates a wafer baking basket. Background Technology

[0002] In the processing of 5-inch and 6-inch wafers, high-temperature baking in furnace tubes is an essential process. During furnace tube baking, a wafer tray is indispensable. Currently, the wafer trays used for 5-inch and 6-inch wafers are horizontal, meaning the tray is laid flat and the wafer is placed vertically. For example, Chinese patent CN205863152U discloses a wafer baking tray for the wafer perimeter. This method is very unfavorable for baking wafers with fluid materials. These fluid materials will flow in one direction under gravity, causing uneven baking and affecting the baking effect. Utility Model Content

[0003] The purpose of this invention is to provide a wafer baking basket that enables batch baking operations, saving time and effort.

[0004] The technical solution is as follows:

[0005] A wafer baking basket includes two supports arranged vertically, a pair of mirror-symmetrical first connecting plates and a pair of mirror-symmetrical second connecting plates disposed between the two supports, the two first connecting plates being arranged face to face, the two second connecting plates being arranged laterally and the intersection of the central axes of the two second connecting plates being located between the two first connecting plates, the two second connecting plates being located on the common side of the two first connecting plates and the distance between the two second connecting plates being less than the distance between the two first connecting plates.

[0006] Among them, the inner sides of the two first connecting plates and the two second connecting plates are respectively arranged in a series of first and second supports along the length direction. The first supports and the second supports are arranged side by side, and the first supports and the second supports in the same row constitute a wafer placement area that matches the wafer.

[0007] In addition, the above embodiments of this utility model may also have the following additional technical features:

[0008] According to one embodiment of this utility model, a pair of mirror-symmetrical limiting shafts are provided between the two supports. The two limiting shafts are located on the common other side of the two first connecting plates, and the ends of the limiting shafts are all hinged to the supports via a swing member. The hinge point between the swing member and the support does not exceed the inner side of the first connecting plate. When the limiting shafts are in the retracted state (e.g., before being loaded into the furnace tube or during transportation), they can be rotated inward to a position close to the first connecting plate to restrict the wafer from sliding outward, preventing the wafer in the basket from accidentally colliding with or scratching the furnace tube wall, equipment, or other components, thereby improving operational safety and ensuring wafer quality.

[0009] Furthermore, two spaced notches are provided on the outer side wall of one of the supports to limit the maximum rotation angle of the limiting shaft, and the upper part of the limiting shaft can be engaged into the notches. The engagement of the limiting shaft into different notches means that it has reached the set position, and the operator can quickly and accurately rotate and position the limiting shaft.

[0010] Furthermore, the upper diameter of the notch in the slot is larger than its lower diameter, and a positioning body is movably coupled to the top of the limiting shaft. The diameter of the positioning body is between the lower diameter of the notch in the slot and its upper diameter. The positioning body serves as an anti-loosening locking design for the limiting shaft, ensuring that the limiting shaft remains stationary when the baking basket is moved.

[0011] According to one embodiment of the present invention, the bottom surfaces of both the first and second supports are constructed as downward-sloping surfaces, while the top surfaces of both supports are constructed as flat surfaces parallel to the support body. The flat top surfaces of the first and second supports provide the largest and most stable support plane for contact with the wafer, while the sloped bottom surfaces of the first and second supports prevent liquid from accumulating at the bottom during baking.

[0012] According to one embodiment of this utility model, a plurality of perforations are formed on the walls of the two first connecting plates. During high-temperature baking, the perforations provide additional gas flow channels, which facilitates more uniform circulation of hot air inside the oven basket and penetration of each wafer layer, reduces local temperature differences, and further improves baking uniformity and consistency.

[0013] According to one embodiment of this utility model, handles are provided on the outer sides of each of the two first connecting plates. This facilitates the operator's stable grip on the basket for loading, unloading, inserting / exiting the furnace tube, and daily handling operations, greatly reducing the difficulty and risk of operation.

[0014] According to one embodiment of this utility model, the support body has several through holes. The through holes on the support body provide more and more comprehensive hot airflow circulation channels.

[0015] According to one embodiment of this utility model, a plurality of pads are provided at the bottom end of the lower support body, and the pads are distributed in a rotationally symmetrical manner. The pads improve the stability of the baking basket.

[0016] Compared with the prior art, the beneficial effects of this utility model are as follows:

[0017] 1. The design of two supports constituting the wafer placement area ensures that the wafer is placed horizontally on the supports, which fundamentally solves the uniformity problem caused by the unidirectional downward flow of liquid materials due to gravity in the background technology. The material can be heated and solidified / reacted more evenly on the wafer surface, improving the baking quality and process uniformity.

[0018] 2. The two racks are arrayed along the length of the two connecting plates, allowing multiple wafers to be loaded in a single basket at the same time. Compared with equipment that can only process a small number or a single wafer at a time, this significantly improves the capacity and efficiency of a single baking cycle and reduces the unit cost.

[0019] 3. The upper and lower support bodies and the two connecting plates on the left and right sides together form a rigid and stable frame. The mirror symmetry design ensures structural balance and uniform load-bearing, ensuring overall stability after loading multiple layers of wafers.

[0020] 4. The distance between the two second connecting plates is less than the distance between the two first connecting plates, and the intersection of their central axes is located between the two first connecting plates. This layout can better support the circular wafer (with edge support) and, together with the first connecting plates, form a "U"-shaped or trapezoidal frame, which improves the overall rigidity of the basket and the positioning accuracy of the wafer placement area. Attached Figure Description

[0021] Figure 1 This is a schematic diagram of a wafer baking basket according to Embodiment 1 of this utility model;

[0022] Figure 2 This is a schematic diagram of the first connecting plate and the second connecting plate in Embodiment 1 of this utility model;

[0023] Figure 3 This is a schematic diagram of the first connecting plate in Embodiment 1 of this utility model;

[0024] Figure 4 This is a bottom view schematic diagram of the wafer baking basket according to Embodiment 1 of this utility model;

[0025] Figure 5 This is a schematic diagram of a wafer baking basket according to Embodiment 2 of this utility model;

[0026] Figure 6 This is an enlarged view of the support portion in Embodiment 2 of this utility model;

[0027] The relevant markings in the attached diagram are: 1-support body, 2-first connecting plate, 3-second connecting plate, 4-limiting shaft, 5-sculpted piece, 6-positioning body, 7-handle piece, 8-pad body; 11-slot notch, 12-through hole, 21-first shelf, 22-cutout, 31-second shelf. Detailed Implementation

[0028] Next, the technical solutions in the embodiments of the present utility model will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present utility model. Obviously, the described embodiments are only a part of the embodiments of the present utility model, rather than all the embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present utility model.

[0029] Embodiment 1

[0030] An embodiment of the present utility model provides a wafer baking basket, which mainly includes a pair of support bodies 1, a pair of first connecting plates 2, and a pair of second connecting plates 3.

[0031] Referring to Figure 1 As shown, the two support bodies 1 are arranged in parallel at an interval up and down. Between the two support bodies 1, the above-mentioned pair of mirror-symmetrical first connecting plates 2 and a pair of mirror-symmetrical second connecting plates 3 are arranged, that is, both the first connecting plates 2 and the second connecting plates 3 are perpendicular to the support bodies 1. The two first connecting plates 2 are arranged in parallel face to face. The two second connecting plates 3 are both arranged laterally, and the intersection of the central axes of the two second connecting plates 3 is located between the two first connecting plates 2. That is to say, the two second connecting plates 3 are axially symmetrically distributed with the axis between the two first connecting plates 2 as the center line. It should be noted that the two second connecting plates 3 are located on the same side of the two first connecting plates 2, and the distance between the two second connecting plates 3 is less than the distance between the two first connecting plates 2. The two first connecting plates 2 and the two second connecting plates together form a frame similar to a "square" shape or a trapezoid, which is beneficial to put the wafer into it from one side of the basket, and the wafer cannot be taken or placed from the other side of the basket.

[0032] The upper and lower support bodies and the two connecting plates on the left and right sides together form a rigid and stable frame. The mirror-symmetrical design ensures the structural balance and load-bearing uniformity, ensuring the overall stability after loading multiple layers of wafers; obviously, the material of the wafer baking basket needs to be made of high-temperature resistant materials, such as ceramics, metal alloys, etc.

[0033] Referring to Figure 2As shown, several first shelf bodies 21 and second shelf bodies 31 are arrayed along their respective length directions on the inner sides of the two first connecting plates 2 and the two second connecting plates 3. Both the first shelf bodies 21 and the second shelf bodies 31 are horizontal, and are arranged side-by-side. The first shelf bodies 21 and the second shelf bodies 31 in the same row constitute a wafer placement area that matches the wafer. The two shelf bodies are arrayed along the length directions of the two connecting plates, allowing multiple wafers to be loaded simultaneously in a single basket. Compared to equipment that can only process a small number or a single wafer at a time, this significantly improves the capacity and efficiency of a single baking cycle, reduces unit costs, and ensures that the wafer is placed horizontally on the shelf bodies, fundamentally solving the uniformity problem caused by the downward flow of liquid materials due to gravity in the prior art.

[0034] See Figure 2 As shown, the bottom surface of the first shelf 21 and the bottom surface of the second shelf 31 are both constructed as downward inclined surfaces with an inclination angle not exceeding 15°. The upper surface of the first shelf 21 and the upper surface of the second shelf 31 are both constructed as flat surfaces parallel to the support body 1.

[0035] The upper surface of the first shelf 21 / second shelf 31 is flat, providing the largest and most stable support plane for contact with the wafer, ensuring that the wafer is placed horizontally without shaking or local stress concentration; the lower surface of the first shelf 21 / second shelf 31 is inclined, which allows dripping material to slide more easily down the inclined surface onto the side wall of the connecting plate, rather than accumulating at the bottom of the shelf, reducing contaminant accumulation and facilitating cleaning and maintenance.

[0036] See Figure 3 As shown, several perforations 22 are arrayed on the wall surfaces of the two first connecting plates 2, and the design of the first shelf does not interfere with the arrangement of the perforations.

[0037] During high-temperature baking, the perforations provide additional gas flow channels, which facilitates more even circulation of hot air within the basket and penetration of each wafer placement area, reducing local temperature differences and further improving baking uniformity and consistency. Additionally, removing some material effectively reduces the overall weight of the basket, making it easier for operators to handle and retrieve, reducing labor intensity and lowering costs to some extent.

[0038] See Figure 1As shown, handle members 7 are provided on the outer sides of the two first connecting plates 2, and the handle members are arranged obliquely. A clear and ergonomic gripping position is provided (especially with better combined effect with the weight reduction by perforations), facilitating the operator to stably hold the basket with both hands for loading, unloading, entering and exiting the furnace tube, and daily handling operations, greatly reducing the operation difficulty and risk, especially when the basket is heavy and there is a risk of high-temperature scalding.

[0039] Refer to Figure 4 As shown, a number of through holes 12 are provided on the support body 1. The through holes are of regular and irregular shapes, but the through holes are symmetrically designed as a whole. The through holes on the support body provide more and more comprehensive hot air flow circulation channels, especially in the region where the connecting plate and the support body meet, making the temperature inside and around the basket more uniform, which is beneficial to the uniform flow and exchange of the process gas in the furnace tube, preventing dead zones, and further reducing the weight of the basket.

[0040] Refer to Figure 4 As shown, a number of cushion bodies 8 are provided at the bottom end of the lower support body 1, and the cushion bodies 8 are rotationally symmetrically distributed around the center of the support body 1. The cushion bodies increase the actual contact points between the lower support body and the placement surface (such as the slide rail / tray in the furnace tube, transportation platform). The rotationally symmetric distribution ensures that the center of gravity of the basket is stable when placed and is not prone to tilting and shaking, especially in the fully loaded state; compared with large-area direct contact, the cushion bodies reduce the contact surface to several points / small areas, which helps to reduce the heat conducted from the bottom of the basket to components such as the furnace inner slide rail, and also reduces the risk of adhesion between the bottom of the basket and the support surface due to thermal expansion at high temperatures.

[0041] Embodiment 2

[0042] The technical solution of this embodiment is based on the above Embodiment 1.

[0043] The two first connecting plates 2 and the two second connecting plates 3 together form a frame similar to a "square" shape or a trapezoid, which is beneficial for placing the wafer into it from one side of the basket, and the wafer cannot be taken or placed from the other side of the basket.

[0044] To further enhance the safety during the baking process, corresponding limit design can be carried out on the side of the basket opening to prevent the wafer from accidentally sliding out from the opening side of the basket.

[0045] Refer to Figure 5 As shown, a pair of mirror-symmetric limit shaft bodies 4 are provided between the two support bodies 1. The two limit shaft bodies 4 are located on the common other side of the two first connecting plates 2, and the ends of the limit shaft bodies 4 are hingedly connected to the support body 1 through a mounting member 5. The hinge point between the mounting member 5 and the support body 1 does not exceed the inner side of the first connecting plate 2. That is to say, the limit shaft body can rotate in the left-right direction through the mounting member, forming a function similar to a "door".

[0046] When the limiting shaft is in the retracted state (e.g., before loading into the furnace tube or during transportation), it can rotate inward to a position close to the first connecting plate to restrict the wafer from sliding outward (the limiting shaft is positioned by the rotational damping force between the swing element and the support body), preventing the wafer in the basket from accidentally colliding with or scratching the furnace tube wall, equipment, or other components, thus improving operational safety and ensuring wafer quality. When it is necessary to pick up or put down the wafer in the basket, the limiting shaft can be swung outward (away from the connecting plate) to stop blocking the wafer, making it easier for the operator to safely load and unload the wafer, reducing operational risks and improving efficiency.

[0047] See Figure 6 As shown, two spaced notches 11 are provided on the outer side wall of one of the supports 1. The two notches 11 are distributed on both sides of the hinge point between the ornament 5 and the support 1 to limit the limit rotation angle of the limiting shaft, that is, the upper part of the limiting shaft can be inserted into the notch.

[0048] The notch provides two clear and fixed locking positions (usually the retracted position and the working / expanded position). When the limiting shaft is engaged in different notches, it means that it has reached the set position, allowing the operator to quickly and accurately position the shaft. When the limiting shaft is engaged in the notch, it provides a mechanical locking function, preventing the limiting shaft from accidentally loosening or rotating during handling, operation, or in the furnace environment (airflow, vibration), ensuring that it remains reliably stable in the required position. By knowing which notch the limiting shaft is engaged in, the operator can intuitively determine whether the limiting shaft is in the retracted (safe) state or the unfolded (working) state, improving the standardization and safety of operation.

[0049] See Figure 6 As shown, the upper diameter of the notch 11 is larger than its lower diameter. A positioning body 6 is movably coupled to the top of the limiting shaft 4, meaning the positioning body 6 can slide up and down on the top of the limiting shaft 4. The diameter of the positioning body 6 is between the lower diameter and the upper diameter of the notch 11. The positioning body serves as an anti-loosening locking design for the limiting shaft, ensuring that the limiting shaft remains stationary when the baking basket is moved. Specifically: the operator pulls the positioning body upward and rotates the limiting shaft, causing the upper part of the limiting shaft to engage with the notch. Then, the operator releases the positioning body, causing it to fall into the upper part of the notch, i.e., the positioning body is "stuck" in the notch, at which point the limiting shaft cannot rotate. When it is necessary to rotate the limiting shaft again, the operator simply pulls the positioning body upward to separate it from the notch.

[0050] The above descriptions are merely some embodiments of this utility model. For those skilled in the art, various modifications and improvements can be made without departing from the inventive concept of this utility model, and all such modifications and improvements fall within the protection scope of this utility model.

Claims

1. A wafer baking basket comprising two support bodies (1) in an upper and lower position, characterized in that, A pair of mirror-symmetrical first connecting plates (2) and a pair of mirror-symmetrical second connecting plates (3) are provided between the two support bodies (1). The two first connecting plates (2) are set facing each other, and the two second connecting plates (3) are set laterally. The intersection of the central axes of the two second connecting plates (3) is located between the two first connecting plates (2). The two second connecting plates (3) are located on the common side of the two first connecting plates (2), and the distance between the two second connecting plates (3) is smaller than the distance between the two first connecting plates (2). Among them, the inner sides of the two first connecting plates (2) and the two second connecting plates (3) are respectively arranged with a number of first shelves (21) and second shelves (31) at intervals along the length direction. The first shelves (21) and the second shelves (31) are arranged side by side. The first shelves (21) and the second shelves (31) in the same row constitute a wafer placement area that matches the wafer.

2. The wafer baking basket of claim 1, wherein, A pair of mirror-symmetrical limiting shafts (4) are provided between the two support bodies (1). The two limiting shafts (4) are located on the common other side of the two first connecting plates (2), and the ends of the limiting shafts (4) are all hinged to the support body (1) through a swing piece (5). The hinge point between the swing piece (5) and the support body (1) does not exceed the inner side of the first connecting plate (2).

3. The wafer baking basket of claim 2, wherein, Two spaced notches (11) are provided on the outer side wall of one of the supports (1) to limit the extreme rotation angle of the limiting shaft (4), and the upper part of the limiting shaft (4) can be inserted into the notches (11).

4. The wafer baking basket of claim 3, wherein, The upper diameter of the notch (11) is greater than its lower diameter, and the top of the limiting shaft (4) is movably coupled to a positioning body (6), the diameter of which is between the lower diameter and the upper diameter of the notch (11).

5. The wafer baking basket of claim 1, wherein, The bottom surface of the first shelf (21) and the bottom surface of the second shelf (31) are both constructed as downward inclined surfaces, and the top surface of the first shelf (21) and the top surface of the second shelf (31) are both constructed as flat surfaces parallel to the support (1).

6. The wafer baking basket of claim 1, wherein, Several perforations (22) are made on the wall surface of the two first connecting plates (2).

7. The wafer baking basket of claim 1, wherein, Each of the two first connecting plates (2) is provided with a handle (7) on its outer side.

8. The wafer baking basket of claim 1, wherein, The support (1) has several through holes (12).

9. A wafer baking basket according to claim 1, characterized in that, The bottom end of the support (1) located below is provided with several pads (8), which are distributed in a rotationally symmetrical manner.