一种具有快速上料功能的晶圆检测设备

CN224521587UActive Publication Date: 2026-07-17SUZHOU AXTEK PHOTOELECTRIC TECH CO LTD

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
SUZHOU AXTEK PHOTOELECTRIC TECH CO LTD
Filing Date
2025-06-26
Publication Date
2026-07-17

AI Technical Summary

Technical Problem

Traditional wafer inspection relies on cumbersome manual loading, resulting in low inspection efficiency, insufficient positioning accuracy, and a high risk of errors.

Method used

A wafer inspection device with rapid feeding function was designed. The feeding mechanism and the rotating mechanism work together to realize automated rapid feeding and precise positioning of wafers. Combined with the unloading component and the reset component, it realizes flexible unloading and lossless transmission, avoiding surface scratches or particulate contamination that may be caused by traditional mechanical clamping or air blowing unloading.

Benefits of technology

It significantly improves testing efficiency, reduces the risk of contamination caused by human contact, ensures the stability and consistency of wafers, avoids the error and contamination problems of traditional methods, and is suitable for high-volume wafer testing.

✦ Generated by Eureka AI based on patent content.

Smart Images

  • Figure CN224521587U_ABST
    Figure CN224521587U_ABST
Patent Text Reader

Abstract

本实用新型公开了一种具有快速上料功能的晶圆检测设备,包括操作台,操作台上开设有凹槽,操作台上安装有用于检测晶圆的检测装置,操作台上设有上料机构,凹槽内设有转动机构,转动机构包括设置在凹槽内的电机,电机输出端连接转盘,转盘上开设有四组安装槽,安装槽内转动设有安装板,安装板上设有吸盘,吸盘上设有脱料组件。本实用新型通过创新的上料机构与转动机构协同设计,实现了晶圆的自动化快速上料与精准定位,大幅提升了检测效率,通过设备的脱料组件与复位组件协同工作,实现了晶圆的柔性卸料与无损传输,有效避免了表面划伤或微粒污染,相比传统人工操作效率大幅度提升,同时减少了人为接触导致的污染风险。
Need to check novelty before this filing date? Find Prior Art