一种用于承载晶圆的装置
By combining a base, guide slot, arc-shaped guide rail, and driver, high-precision adaptation to different wafer sizes is achieved without stopping the machine. This solves the problems of low replacement efficiency and unstable positioning in traditional devices, thereby improving production efficiency and device reliability.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- XIAN ESWIN MATERIAL TECHNOLOGY CO LTD
- Filing Date
- 2025-08-28
- Publication Date
- 2026-07-17
Smart Images

Figure CN224521613U_ABST
Abstract
Claims
1. An apparatus for carrying a wafer, characterized by, include: The base has a plurality of guide grooves that extend radially from the center point of the base. Multiple support members are correspondingly disposed in the multiple guide slots to jointly support the wafer and define the bearing radius; Multiple arc-shaped guide rails are configured to guide the multiple supports to move in the multiple guide grooves to adjust the load-bearing radius when the base and the multiple arc-shaped guide rails rotate relative to each other about an axis passing through the center point; A driver is used to drive the base and / or the plurality of arc-shaped guide rails to generate the rotation.
2. The apparatus for carrying a wafer of claim 1, wherein, The device also includes a planetary gear set for transmitting power from the drive to the base and / or the plurality of arc-shaped guide rails.
3. The apparatus for carrying wafers according to claim 2, wherein, The sun gear of the planetary gear set is directly driven by the driver, and the internal gear ring of the planetary gear set is fixed to the base.
4. The apparatus for carrying a wafer according to any one of claims 1 to 3, characterized in that, Each support has an electrostatic adsorption structure on its top for adsorbing the wafer.
5. The apparatus for carrying a wafer according to any one of claims 1 to 3, wherein, The surface of the guide groove that contacts the support member is coated with a silicon nitride ceramic coating.
6. The apparatus for carrying a wafer according to any one of claims 1 to 3, wherein, The driver is a stepper motor.
7. The apparatus for carrying wafers of claim 1, wherein, The device further includes a closed-loop control system, which includes: A position sensor is configured to measure the position information of the plurality of support members; A controller, electrically connected to the driver and the position sensor, is configured to control the driver based on the position information fed back by the position sensor, so as to bring the plurality of supports to a target position.
8. The apparatus for carrying wafers according to claim 7, wherein, The position sensor is a laser interferometer.
9. The apparatus for carrying a wafer according to claim 7 or 8, characterized by, The device further includes a locking mechanism configured to lock the plurality of supports after the plurality of supports have reached the target position.
10. The apparatus for carrying wafers according to claim 9, wherein, The locking mechanism is a piezoelectric ceramic brake.