碳化硅陶瓷真空卡盘
By designing a purge gas channel on a silicon carbide ceramic vacuum chuck, the diffusion of contaminants is prevented, solving the problem of contaminant diffusion in traditional chucks and achieving higher cleanliness and stability.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- 山东华信工业科技有限公司
- Filing Date
- 2025-07-19
- Publication Date
- 2026-07-17
AI Technical Summary
In traditional vacuum chucks, during wafer processing, the tiny gap between the wafer edge and the chuck surface causes contaminants to diffuse into the chuck, resulting in irreversible contamination problems.
A silicon carbide ceramic vacuum chuck is designed, and a purge gas channel is set at the edge of the chuck to blow clean inert gas into the gap between the wafer edges to form an air curtain and prevent the diffusion of contaminants.
It effectively reduces contaminant pollution of the vacuum chuck, improving the chuck's cleanliness and stability.
Smart Images
Figure CN224521628U_ABST
Abstract
Claims
1. A silicon carbide ceramic vacuum chuck, characterized by: The chuck body (1) includes a vacuum chamber (11) and an annular chamber (14) on the bottom surface of the chuck body (1). The annular chamber (14) is distributed around the vacuum chamber (11). Multiple air outlets (15) are provided on the periphery of the chuck body (1) and are connected to the annular chamber (14). The multiple air outlets (15) are distributed in a circle, and the axis of the air outlets (15) is set at an angle to the axis of the chuck body (1). A first annular plate (2) and a suction pipe (3) are fixedly connected in sequence in the bottom end of the chuck body (1). A second annular plate (4) is sleeved on the body of the suction pipe (3). The second annular plate (4) is fixedly connected to the chuck body (1) through a connecting sleeve (5) on the periphery. A gap for gas flow is provided between the second annular plate (4) and the first annular plate (2).
2. The silicon carbide ceramic vacuum chuck of claim 1, wherein: The top surface of the chuck body (1) is provided with a vacuum ring channel (13), which is connected to the vacuum chamber (11) through multiple suction holes (12).
3. The silicon carbide ceramic vacuum chuck of claim 1, wherein: The outer periphery of the chuck body (1) is provided with an annular protrusion (16) integrally formed therewith.
4. The silicon carbide ceramic vacuum chuck as described in claim 1, characterized in that: The chuck body (1) is made of silicon carbide ceramic material sintered.
5. The silicon carbide ceramic vacuum chuck of Claim 1, wherein: Both the vacuum chamber (11) and the annular chamber (14) have openings at their bottom ends.
6. The silicon carbide ceramic vacuum chuck of Claim 1, wherein: The lower surface of the first ring plate (2) is flush with the bottom surface of the chuck body (1).
7. The silicon carbide ceramic vacuum chuck of Claim 1, wherein: The suction pipe (3) is coaxial with the first ring plate (2) and is connected to the vacuum chamber (11).
8. The silicon carbide ceramic vacuum chuck of Claim 1, wherein: The bottom of the second ring plate (4) is fixed with an air inlet pipe (6), which is a 90° bent pipe structure and is connected to the ring cavity (14).
9. The silicon carbide ceramic vacuum chuck of claim 8, wherein: The suction pipe (3) is inserted into and fixed inside the air inlet pipe (6).
10. The silicon carbide ceramic vacuum chuck of claim 9, wherein: O-rings for sealing are embedded on the end of the air intake pipe (3) away from the first ring plate (2) and the end of the air intake pipe (6) away from the second ring plate (4).