A material stirring and dissolving tank for photoresist
By installing a removable filter base and cleaning components in the photoresist mixing and dissolving tank, the problem of easy filter clogging is solved, achieving efficient material filtration and equipment maintenance, convenient component replacement, and improving the stability and efficiency of photoresist production.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- BEIJING GUANGYIN POLYMER TECHNOLOGY CO LTD
- Filing Date
- 2025-08-12
- Publication Date
- 2026-07-21
AI Technical Summary
Existing photoresist material stirring and dissolving tanks suffer from problems such as easy clogging, incomplete filtration, and inconvenient equipment maintenance due to their filtration structure design, which affect the continuity and stability of photoresist production.
The system employs a detachable filter base device, including a base platform, connector, filter mesh, and cleaning components. The cleaning components are driven by the stirring mechanism to perform real-time cleaning, ensuring that the filter mesh does not become clogged and facilitating the cleaning and replacement of the filter components.
This technology enables high-purity filtration of photoresist materials, avoids filter clogging, improves the convenience of equipment maintenance and the efficiency of stirring and dissolving, and ensures the continuity and stability of production.
Smart Images

Figure CN224524531U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the technical field of photoresist production equipment, and in particular to a photoresist material stirring and dissolving tank. Background Technology
[0002] Photoresist, also known as photoresist, is a key material in microelectronics technology. It consists of photosensitive resin, sensitizer, and solvent, and is widely used in integrated circuit chip manufacturing. It is classified into positive and negative types. Its production requires material mixing, and the stirring and dissolving tank is the core equipment. However, due to the high viscosity of photoresist, semi-dissolved material easily adheres to the tank walls, causing waste and affecting the material ratio, which is detrimental to subsequent production.
[0003] A search revealed Chinese patent CN222842000U, which discloses a photoresist material stirring and dissolving tank. The tank includes a tank body with a stirring shaft inside, on which are mounted impellers, a stirring rod, and an inner wall cleaning brush. The tank body also features a multi-layered filter structure, allowing for simultaneous stirring and dissolving of the photoresist, saving steps. The inner wall cleaning brush also simultaneously cleans residual material from the inner sidewalls of the tank, reducing cleaning and maintenance work. The scraped-off residual material can be recycled in real-time through a recovery pipe, reducing material loss during production and improving economic efficiency.
[0004] Based on the above search results and existing technologies, the following findings were made:
[0005] Existing photoresist material mixing and dissolving tanks have significant shortcomings in their filtration structure design. Taking patent CN222842000U as an example, its multi-layer filter structure is horizontally fixed within the tank. This fixed installation method allows undissolved particles to accumulate on the filter screens over long-term use, and because the screens cannot be easily disassembled, thorough cleaning is difficult. Furthermore, this structure lacks dedicated cleaning components for the filters. With increasing usage time, impurities gradually clog the filter pores, hindering material discharge. This not only affects discharge efficiency but also reduces the purity of the discharged material due to incomplete filtration. In addition, the connection structure between the fixed filter screens and the tank is complex. When the filter screens are damaged and need replacement, the operation is extremely cumbersome, significantly increasing the difficulty and cost of equipment maintenance, and seriously affecting the continuity and stability of photoresist production. Utility Model Content
[0006] To address the aforementioned technical problems, this utility model proposes a material stirring and dissolving tank for photoresist, which achieves multiple practical effects through a unique filter base device. This filter base device consists of a base platform, a connector, a filter mesh, and a cleaning component. It is threadedly connected to the bottom groove of the stirring tank, and the cleaning component is aligned with the bottom of the stirring mechanism. This design not only filters undissolved particles from the material using the filter mesh, ensuring the purity of the discharged material, but also utilizes the power of the stirring mechanism to drive the cleaning component to clean the inner wall of the base platform and the filter mesh in real time, preventing blockages and ensuring smooth discharge. Furthermore, the detachable connection makes cleaning and replacement of the filter components more convenient.
[0007] The technical solution to achieve the purpose of this utility model is as follows: a photoresist material stirring and dissolving tank, including a stirring tank body and a sealing tank cover adapted to the top of the stirring tank body, wherein a stirring mechanism is provided inside the stirring tank body, and a drive motor for driving the stirring mechanism is provided on the top of the sealing tank cover, and further includes:
[0008] A bottom groove is formed in the hollowed-out area at the bottom of the mixing tank.
[0009] A filter base device is detachably installed at the bottom of the mixing tank, and the upper end of the filter base device is threadedly connected to a bottom groove opened at the bottom of the mixing tank.
[0010] A discharge pipe device is installed on the outer bottom side of the mixing tank and is connected to the inside of the filter base device.
[0011] The filter base device includes a base platform and a connector connected to the top of the base platform, with the connector threadedly connected to the bottom groove;
[0012] Filter mesh; the filter mesh is formed through the outer wall of the base platform, and the filter mesh is horizontally aligned with the corresponding discharge pipe device;
[0013] The cleaning component is movably disposed at the center of the filter base device and is used to clean the filter mesh on the inner wall of the base platform; and the upper end of the cleaning component is installed vertically connected to the bottom of the stirring mechanism.
[0014] In some embodiments, the stirring mechanism includes a rotating shaft and a plurality of stirring blades fixed to the rotating shaft, the bottom of which is connected to a threaded head with external threads.
[0015] In some embodiments, the cleaning assembly includes a bearing fixed to the inner bottom surface of the base platform, a rotatable driven shaft connected to the inner shaft of the bearing, a plurality of cleaning brush plates connected to the outer side of the driven shaft, and a mating thread groove for threaded connection with a mating threaded head on the top of the driven shaft.
[0016] In some embodiments, a waterproof gasket is fitted onto the bearing component.
[0017] In some embodiments, the bottom of the base platform is provided with an adjustment groove, and a cross handle is installed on the inner bottom surface of the adjustment groove.
[0018] In some embodiments, each of the cleaning brush plates has an L-shaped structure, and the end of each cleaning brush plate slides against the inner wall of the base platform.
[0019] In some embodiments, the filter mesh is provided in four sets on the base platform, and the number of discharge pipe devices outside the mixing tank is the same as the number of filter meshes.
[0020] In some embodiments, the discharge pipe device includes a discharge pipe and a valve mounted on the discharge pipe.
[0021] Compared with existing technologies, the significant advantages of this invention are:
[0022] Firstly, this utility model features a filter base device consisting of a base platform, a connector, a filter screen, and a cleaning component. The filter base device is threadedly connected to the bottom groove of the mixing tank, while the cleaning component is installed by docking with the bottom of the mixing mechanism. This structural design allows the filter base device to effectively filter the stirred photoresist material through the filter screen, intercepting undissolved particulate impurities and ensuring the purity of the discharged material. Simultaneously, the cleaning component, powered by the mixing mechanism, cleans the inner wall of the base platform and the filter screen in real time, preventing impurities from clogging the filter screen and ensuring smooth discharge. Furthermore, the detachable connection between the filter base device and the mixing tank facilitates subsequent cleaning or replacement of the filter components, significantly improving equipment maintenance convenience and achieving multiple functions: filtration, anti-clogging, and easy maintenance.
[0023] Secondly, the stirring mechanism of this utility model adopts a structure of rotating shaft and long rod with multiple sets of stirring blades. Driven by the drive motor, the multiple sets of stirring blades can carry out all-round and thorough stirring of the photoresist material in the stirring tank, promote the uniform mixing of the various components of the material, effectively accelerate the dissolution process of the material, and improve the stirring and dissolution efficiency and quality of the photoresist material.
[0024] Thirdly, this utility model features an adjustment groove with a cross-shaped handle at the bottom of the base platform, providing a convenient force application point for the installation and removal of the filter base device. Operators can directly hold the cross-shaped handle or use clamping tools to easily tighten or loosen the base platform from the bottom of the mixing tank, reducing the difficulty of installing and removing the filter base device and further improving the efficiency of equipment maintenance.
[0025] This invention solves the problems of easy clogging of the filter structure, low purity of the filtered material, inconvenient equipment maintenance, and insufficient stirring and dissolution of the material in existing photoresist stirring and dissolving equipment. Attached Figure Description
[0026] The present invention will be further explained below with reference to the accompanying drawings and embodiments:
[0027] Figure 1 This is a schematic diagram of the internal structure of the material stirring and dissolving tank provided in one embodiment of the present invention;
[0028] Figure 2 This is a side view showing the connection between the stirring mechanism and the filter base device of the material stirring and dissolving tank provided in one embodiment of the present invention;
[0029] Figure 3 This is a schematic diagram of the filter base device provided in one embodiment of the present invention in the state of being pulled out from the bottom of the mixing tank;
[0030] Figure 4 This is a schematic diagram of the structure of the filter base device provided in one embodiment of the present invention installed at the bottom of the mixing tank;
[0031] Figure 5 This is a three-dimensional structural diagram of the filter base device provided in one embodiment of the present invention.
[0032] Explanation of reference numerals in the attached figures:
[0033] 100. Mixing tank body; 101. Bottom trough; 200. Sealing tank cover; 300. Discharge pipe; 301. Valve; 400. Rotary shaft rod; 401. Mixing blade; 402. Threaded head; 500. Drive motor; 600. Base platform; 601. Bearing component; 602. Driven rotating shaft rod; 603. Cleaning brush plate; 604. Filter screen; 605. Waterproof gasket; 606. Connector; 607. Adjustment groove; 608. Threaded groove; 800. Cross handle. Detailed Implementation
[0034] The present invention will now be described in detail, and the technical solutions in the embodiments of the present invention will be clearly and completely described. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the protection scope of the present invention.
[0035] This utility model provides an improved stirring and dissolving vessel for photoresist. The technical solution of this utility model is as follows:
[0036] Figures 1-5This is the preferred embodiment of the present invention, which is described below in conjunction with the appendix. Figures 1-5 The present invention will be further described below.
[0037] like Figure 1 - Figure 5 As shown, a photoresist material stirring and dissolving tank includes a stirring tank body 100, a sealing tank cover 200, a stirring mechanism, a drive motor 500, a bottom groove 101, a filter base device, and a discharge pipe device. The sealing tank cover 200 is fitted onto the top of the stirring tank body 100. The stirring mechanism is located inside the stirring tank body 100. The drive motor 500 is mounted on the top of the sealing tank cover 200 and drives the stirring mechanism. The bottom groove 101 is formed in a hollowed-out area at the bottom of the stirring tank body 100. The filter base device is detachably mounted on the bottom of the stirring tank body 100, and its upper end is threadedly connected to the bottom groove 101. The discharge pipe device is installed on the outer bottom side of the stirring tank body 100 and communicates with the interior of the filter base device.
[0038] like Figure 1 , Figure 2 , Figure 3 As shown, in one embodiment, the filter base device includes a base platform 600, a connector 606, a filter mesh 604, and a cleaning component. The connector 606 is connected to the top of the base platform 600 and threadedly connected to the bottom groove 101. The filter mesh 604 is formed through the outer wall of the base platform 600 and corresponds horizontally to the discharge pipe device. The cleaning component is movably disposed in the center of the filter base device and its upper end is installed vertically with the bottom of the stirring mechanism. Through the detachable connection design between the filter base device and the stirring tank 100, when the filter component needs to be cleaned or replaced, the filter base device can be easily removed from the bottom of the stirring tank 100, greatly improving the convenience of maintenance. At the same time, the filter mesh 604 can filter the photoresist material after stirring, intercepting undissolved particulate impurities and ensuring the purity of the discharged material. The cleaning component can promptly clean the impurities attached to the inner wall of the base platform 600 and the filter mesh 604, preventing the filter mesh 604 from clogging and ensuring smooth discharge.
[0039] like Figure 1 , Figure 2As shown, in one embodiment, the stirring mechanism includes a rotating shaft 400, multiple sets of stirring blades 401, and a threaded head 402. The stirring blades 401 are fixed on the rotating shaft 400, and the threaded head 402 has external threads and is connected to the bottom of the stirring blades 401. The rotating shaft 400 is driven to rotate by a drive motor 500, which in turn drives the multiple sets of stirring blades 401 to rotate synchronously. During the rotation, the multiple sets of stirring blades 401 can fully stir the photoresist material in the stirring tank 100, so that the components of the material are evenly mixed and the dissolution process is accelerated. The threaded head 402 provides a structural basis for the docking of the stirring mechanism and the cleaning component, realizing the transmission of power.
[0040] like Figure 2 , Figure 3 As shown, in one embodiment, the cleaning assembly includes a bearing 601, a driven rotating shaft 602, multiple sets of cleaning brush plates 603, and a threaded groove 608. The bearing 601 is fixed to the inner bottom surface of the base 600. The driven rotating shaft 602 is connected to the inner shaft of the bearing 601 and is rotatable. The cleaning brush plates 603 are connected to the outer side of the driven rotating shaft 602. The threaded groove 608 is formed at the top of the driven rotating shaft 602 and is threadedly connected to the threaded head 402. When stirring... When the mechanism is working, the long shaft 400 drives the driven shaft 602 to rotate through the threaded connection between the threaded head 402 and the threaded groove 608. The driven shaft 602 rotates stably under the support of the bearing 601 and drives the cleaning brush plate 603 to move synchronously. Since the cleaning brush plate 603 slides against the inner wall of the base 600, it can effectively remove the material impurities attached to the inner wall, prevent the accumulation of impurities from clogging the filter screen 604, and ensure the smooth operation of the filtration and discharge process.
[0041] like Figure 4 As shown, in one embodiment, a waterproof gasket 605 is fitted onto the bearing component 601. With the waterproof gasket 605, when the base platform 600 is connected to the bottom groove 101 through the connector 606, the waterproof gasket 605 can fill the tiny gaps at the connection, enhance the sealing of the connection, and effectively prevent the aqueous solution in the mixing tank 100 from leaking out from the connection between the connector 606 and the bottom groove 101, ensuring the sealing performance of the equipment and avoiding material waste and environmental pollution.
[0042] like Figure 3 , Figure 4As shown, in one embodiment, the bottom of the base platform 600 is provided with an adjustment groove 607, and a cross handle 800 is installed on the inner bottom surface of the adjustment groove 607. When it is necessary to install or remove the filter base device, the operator can directly hold the cross handle 800 or use a clamping tool to clamp the cross handle 800. By applying rotational force, the base platform 600 can be fastened or loosened to the bottom of the mixing tank 100. This structural design provides a convenient force application point for the installation and removal of the filter base device, reduces the difficulty of operation, and improves maintenance efficiency.
[0043] like Figure 1 As shown, in one embodiment, each cleaning brush plate 603 is an L-shaped structure, and the end of each cleaning brush plate 603 slides against the inner wall surface of the base platform 600. The L-shaped cleaning brush plate 603 can clean the inner side wall and inner bottom surface of the base platform 600 at the same time, expanding the cleaning range and ensuring that impurities in all corners inside the base platform 600 can be effectively removed, further improving the cleaning effect and ensuring the unobstructed flow of the filter mesh 604.
[0044] like Figure 1 , Figure 3 As shown, in one embodiment, four sets of filter mesh 604 are provided on the base platform 600, and the number of discharge pipe devices outside the mixing tank 100 is the same as the number of filter mesh 604. The discharge pipe device includes a discharge pipe 300 and a valve 301 installed on the discharge pipe 300. The multiple sets of filter mesh 604 and the corresponding discharge pipe devices can increase the material discharge channels and improve the discharge efficiency. At the same time, by controlling the opening and closing state of the valve 301, the discharge status of each discharge pipe 300 can be flexibly controlled, which is convenient for operation according to actual needs and improves the flexibility of equipment use.
[0045] Working principle and usage process of this utility model:
[0046] Working principle: The drive motor 500 provides power to rotate the rotating shaft 400 and stirring blade 401 of the stirring mechanism, stirring and dissolving the photoresist material in the stirring tank 100; the stirred material enters the filter base device, is filtered through the filter mesh 604, and can be discharged through the discharge pipe device; while the stirring mechanism is working, it is connected to the threaded groove 608 of the cleaning component through the threaded head 402, driving the driven rotating shaft 602 and the cleaning brush plate 603 to rotate, cleaning the inner wall of the base 600 and the filter mesh 604 to prevent clogging; the waterproof gasket 605 ensures the sealing of the equipment, and the cross handle 800 facilitates the installation and removal of the filter base device.
[0047] Operating Procedure: First, check that all components of the equipment are installed correctly, ensuring that the sealing tank cover 200 is tightly closed, and that the filter base device is securely connected to the bottom groove 101 of the mixing tank 100 via the connector 606. All valves 301 should be closed. Next, open the sealing tank cover 200 and add the photoresist material to be dissolved into the mixing tank 100. Then, close the sealing tank cover 200 tightly. Next, start the drive motor 500. The drive motor 500 drives the rotating shaft rod 400 to rotate, and the stirring blades 401 on the rotating shaft rod 400 rotate with it, stirring and dissolving the material. Simultaneously, the threaded head 402 at the bottom of the rotating shaft rod 400 drives the threaded groove 608 at the top of the driven rotating shaft rod 602, causing the driven rotating shaft rod 602 to rotate under the support of the bearing 601. This, in turn, causes the cleaning brush plate 603 to slide against the inner wall of the base platform 600, initiating the cleaning operation. After the material has been stirred and dissolved, open the valve 301 on the corresponding discharge pipe 300 as needed. The stirred material is filtered through the filter screen 604 on the base platform 600 to remove undissolved impurities, and then discharged through the discharge pipe 300 into a designated container. During the discharge process, the cleaning brush plate 603 continues to work to prevent impurities from clogging the filter screen 604 and ensure smooth discharge. When it is necessary to clean or maintain the filter base device, turn off the drive motor 500. After the equipment stops running, hold or use a tool to clamp the cross handle 800 at the bottom of the base platform 600, rotate the base platform 600, and remove it from the bottom of the mixing tank 100 for cleaning or replacement of parts. After completion, reinstall it in its original position by reversing the steps.
[0048] The technical means disclosed in this utility model are not limited to those described above, but also include technical solutions composed of equivalent substitutions of the above technical features. Matters not covered in this utility model are common knowledge to those skilled in the art.
Claims
1. A photoresist material stirring and dissolving vessel, comprising a stirring vessel body (100) and a sealing vessel cover (200) adapted to the top of the stirring vessel body (100), characterized in that: The mixing tank (100) is equipped with a stirring mechanism inside, and a drive motor (500) for driving the stirring mechanism is installed on the top of the sealed tank cover (200). It also includes: Bottom groove (101), the bottom groove (101) is opened in the hollow part at the bottom of the mixing tank (100); A filter base device is detachably installed at the bottom of the mixing tank (100), and the upper end of the filter base device is threadedly connected to the bottom groove (101) opened at the bottom of the mixing tank (100). A discharge pipe device is installed on the outer bottom side of the mixing tank (100) and the discharge pipe device is connected to the inside of the filter base device. The filter base device includes a base platform (600) and a connector (606) connected to the top of the base platform (600), and the connector (606) is threadedly connected to the bottom groove (101). Filter mesh (604); The filter mesh (604) is formed through the outer wall of the base (600), and the filter mesh (604) is horizontally aligned with the corresponding discharge pipe device; The cleaning component is movably disposed at the center of the filter base device and is used to clean the filter mesh (604) on the inner wall of the base platform (600); and the upper end of the cleaning component is connected and installed vertically with the bottom of the stirring mechanism.
2. The photoresist material stirring and dissolving tank according to claim 1, characterized in that: The stirring mechanism includes a rotating shaft (400) and multiple sets of stirring blades (401) fixed on the rotating shaft (400). The bottom of the stirring blades (401) is connected to a mating thread head (402) with external threads.
3. The photoresist material stirring and dissolving tank according to claim 1, characterized in that: The cleaning assembly includes a bearing (601) fixed on the inner bottom surface of the base (600). A rotatable driven shaft (602) is connected to the inner shaft of the bearing (601). Multiple sets of cleaning brush plates (603) are connected to the outer side of the driven shaft (602). A mating thread groove (608) is provided on the top of the driven shaft (602) for threaded connection with the mating thread head (402).
4. The photoresist material stirring and dissolving tank according to claim 3, characterized in that: A waterproof washer (605) is fitted onto the bearing component (601).
5. The photoresist material stirring and dissolving tank according to claim 3, characterized in that: The bottom of the base (600) is provided with an adjustment groove (607), and a cross handle (800) is installed on the inner bottom surface of the adjustment groove (607).
6. The photoresist material stirring and dissolving tank according to claim 5, characterized in that: Each of the cleaning brush plates (603) has an L-shaped structure, and the end of each cleaning brush plate (603) slides against the inner wall of the base platform (600).
7. The photoresist material stirring and dissolving tank according to claim 1, characterized in that: The filter mesh (604) has four sets on the base (600), and the number of discharge pipe devices outside the mixing tank (100) is the same as the number of filter mesh (604).
8. The photoresist material stirring and dissolving tank according to claim 1, characterized in that: The discharge pipe device includes a discharge pipe (300) and a valve (301) installed on the discharge pipe (300).