Liquid medicine collecting device for wafer

Abstract

The utility model discloses a kind of liquid medicine collecting devices for wafer, for collecting liquid medicine that wafer is thrown out, the liquid medicine collecting device includes movable first swing arm, outlet is equipped on the first swing arm, the outlet is located above the wafer to carry out liquid medicine spraying to rotating wafer, the liquid medicine collecting device further includes the protective cover that can move in up-down direction, the protective cover includes body and the guide piece connected with the body, one body corresponds one or more guide pieces, adjacent two protective covers or adjacent two guide pieces form a liquid inlet passage. The liquid medicine collecting device of the utility model is relatively simple to operate and saves use cost.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor technology, specifically a liquid collection device for wafers. Background Technology

[0002] In semiconductor manufacturing, wafers need to come into contact with and be sprayed with specific solutions in several key process flows. These solutions are mainly used for cleaning, etching, resist stripping, development, electroplating, and other purposes. The solutions used vary depending on the process. For example, etching is performed by spraying acidic or alkaline solutions (such as hydrofluoric acid, phosphoric acid, etc.); residual photoresist is removed by spraying organic solvents (such as N-methylpyrrolidone) or strong oxidants; and solutions containing target metal ions (such as Cu) are sprayed. 2+ Electroplating is performed using acidic or alkaline electrolytes containing additives such as complexing agents, brighteners, and leveling agents.

[0003] Different chemical solutions have different chemical properties, and multiple solutions cannot be mixed and stored together. For example, mixing acids and bases may release toxic gases, exothermic gases, or even cause an explosion. Therefore, separate equipment is required for each process of spraying chemical solutions. Each piece of equipment is equipped with a protective cover. The main function of the protective cover is to collect the chemical solution ejected from the edge of the wafer. The chemical solution will flow from the top of the protective cover to the bottom for collection or discharge. Since different equipment is required for spraying different chemical solutions, the operation is cumbersome and the operating cost is high. Utility Model Content

[0004] To solve at least one of the above-mentioned technical problems, this utility model provides a liquid collection device for wafers, which is relatively simple to operate and has low operating costs.

[0005] To achieve the above objectives, the present invention adopts the following technical solution:

[0006] A chemical collection device for wafers is disclosed for collecting chemical solutions ejected from the wafers. The chemical collection device includes a movable first swing arm with a liquid outlet located above the wafer to spray the rotating wafer with chemical solutions. The chemical collection device also includes a protective cover movable in the vertical direction. The protective cover includes a body and guide members connected to the body. One body corresponds to one or more guide members, and a liquid inlet channel is formed between two adjacent protective covers or two adjacent guide members.

[0007] In a preferred embodiment, the number of liquid inlet channels is multiple.

[0008] In a preferred embodiment, a liquid inlet channel is formed between two adjacent protective covers, and the liquid inlet channel is distributed in the left-right direction.

[0009] In another preferred embodiment, a liquid inlet channel is formed between two adjacent guide members, and the liquid inlet channel is distributed in the vertical direction.

[0010] In a preferred embodiment, the liquid collection device further includes a second swing arm having a liquid outlet or an air outlet located above the wafer.

[0011] In a preferred embodiment, the liquid medicine collection device further includes a motor and a rotating disk connected to the motor, the motor driving the rotating disk to rotate; the rotating disk is provided with a first airflow channel and a second airflow channel, the second airflow channel and the first airflow channel are connected; the rotating disk is provided with an air inlet at its center, and the width of the second airflow channel gradually decreases from the air inlet.

[0012] In a preferred embodiment, the rotating disk is provided with bosses, the bosses including a first boss and a second boss, the first boss being located on the outermost side of the rotating disk to form a sealing ring layer, and the number of second bosses being multiple, with two adjacent second bosses forming the first airflow channel or the second airflow channel.

[0013] In a preferred embodiment, the liquid collection device further includes a gas-liquid separation mechanism, which includes an inlet, an exhaust port, and a liquid outlet. A partition assembly is provided between the inlet and the liquid outlet. The partition assembly includes an inclined partition plate and a vertical partition plate. The inclined partition plate has a starting end and a ending end. The height of the ending end is lower than the height of the starting end, and the starting end is higher than the height of the exhaust port. The vertical partition plate is connected to the ending end.

[0014] In a preferred embodiment, the vertical partition plate is provided with a plurality of through holes.

[0015] In a preferred embodiment, the liquid collection device further includes a fan filter located above the first swing arm and the second swing arm, and the fan filter is connected to the gas-liquid separation mechanism.

[0016] The present invention adopts the above solution and has the following advantages compared with the prior art:

[0017] The present invention relates to a liquid collection device. During liquid collection, a first swing arm moves back and forth above the wafer and sprays liquid while the wafer rotates continuously to ensure that the liquid completely covers the wafer. By setting multiple protective covers, different liquids can be collected, with one liquid inlet channel corresponding to one liquid. When a certain liquid needs to be collected, the corresponding protective cover and the protective cover above it are raised, or the corresponding guide and the guide above it are raised to collect the liquid in the corresponding liquid inlet channel. Multiple liquids can be collected on one device, reducing equipment occupancy, reducing operating costs, and simplifying operation. Attached Figure Description

[0018] To more clearly illustrate the technical solution of this utility model, the drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0019] Figure 1 This is a schematic diagram of the liquid collection device according to Embodiment 1 of the present invention, in which the wafer is in a cleaning state;

[0020] Figure 2 This is another schematic diagram of the liquid medicine collection device according to Embodiment 1 of the present invention, in which the protective cover is in the initial state;

[0021] Figure 3 This is a schematic diagram of the rotating disk according to Embodiment 1 of the present invention;

[0022] Figure 4 This is a three-dimensional schematic diagram of the gas-liquid separation device according to Embodiment 1 of the present invention;

[0023] Figure 5 This is a front view of the gas-liquid separation device according to Embodiment 1 of the present invention;

[0024] Figure 6 This is a schematic diagram of the liquid medicine collection device according to Embodiment 2 of this utility model.

[0025] in,

[0026] 100. Drug collection device; 101. Wafer;

[0027] 1. First swing arm; 11. Liquid outlet; 2. Second swing arm; 21. Air outlet; 3. Protective cover; 31. Body; 32. Guide; 33. Liquid inlet channel; 34. Liquid outlet; 35. Exhaust outlet; 4. Rotary disk; 41. First airflow channel; 42. Second airflow channel; 43. Air inlet; 44. Boss; 441. First boss; 442. Second boss; 5. Motor; 6. Gas-liquid separation mechanism; 61. Inlet; 62. Exhaust outlet; 63. Liquid outlet; 64. Baffle assembly; 641. Inclined partition plate; 6411. Starting end; 6412. Ending end; 642. Vertical partition plate; 6421. Through hole; 7. Fan filter. Detailed Implementation

[0028] The preferred embodiments of the present invention will now be described in detail with reference to the accompanying drawings, so that the advantages and features of the present invention can be more easily understood by those skilled in the art. It should be noted that the description of these embodiments is for the purpose of aiding understanding the present invention, but does not constitute a limitation thereof. Furthermore, the technical features involved in the various embodiments of the present invention described below can be combined with each other as long as they do not conflict with each other.

[0029] Example 1

[0030] Reference Figures 1 to 5 As shown, this embodiment provides a liquid collection device 100 for wafers, including a first swing arm 1, a second swing arm 2, a protective cover 3, a rotating disk 4, a motor 5, a gas-liquid separation mechanism 6, and a fan filter 7.

[0031] Furthermore, the first swing arm 1 is provided with a liquid outlet 11, located above the wafer 101 to spray the wafer 101 with a chemical solution. Specifically, there are three liquid outlets 11, meaning the first swing arm 1 can spray up to three different chemical solutions onto the wafer disk. Each of the three outlets corresponds to a different pipeline. During spraying, the wafer is always rotating, and the first swing arm's movement path must move at least from the edge of the wafer to its center to ensure comprehensive spraying. The second swing arm 2 has a liquid outlet or an air outlet, located above the wafer. Specifically, in this embodiment, the second swing arm 2 has an air outlet 21, which blows out nitrogen gas. Nitrogen gas is used for wafer drying. After the wafer has been sprayed with the chemical solution and cleaned, nitrogen gas can be sprayed through the air outlet 21 on the second swing arm 2 to achieve the drying purpose. In other embodiments, multiple liquid outlets can be provided on the second swing arm to meet the chemical solutions required for different processes.

[0032] There are multiple protective covers 3, and each protective cover 3 can be raised and lowered independently. The reason for setting up protective covers 3 is that the high-speed rotating wafer will cause the liquid to splash centrifugally, contaminating the inside of the equipment. Some liquids are also corrosive and toxic. The splashing will increase the safety risk. As a physical barrier, the protective cover restricts the sprayed liquid to the inner wall of the protective cover 3 and discharges it through the drain port 34 at the bottom.

[0033] Furthermore, the protective cover 3 includes a body 31 and a guide member 32 connected to the body 31. The body 31 is cylindrical in shape, and its bottom has multiple drain ports 34, through which the liquid flows into a collection device. In this embodiment, there are three protective covers, namely the first protective cover, the second protective cover, and the third protective cover from the inside out. In other embodiments, the number of protective covers is not limited to three. Here, "inside" refers to the direction closer to the wafer, and "outside" refers to the direction farther from the wafer. Each protective cover has a drain port 34 at its bottom, and the drain port 34 is connected to a collection device to collect or discharge the liquid. The bottom of the first protective cover is also provided with multiple exhaust components. The exhaust components are barrel-shaped with a certain height and have an exhaust port 62 in the middle. The exhaust components are set at a certain height to allow the liquid to flow out through the drain port 34 first. The exhaust components mainly serve the function of venting.

[0034] The guide member 32 is an inclined straight section, which is relatively easy to process. The included angle between the guide member 32 and the body 31 is 100-120°. In other embodiments, the guide member 32 can also be arc-shaped. The purpose of setting the guide member 32 is to prevent the liquid from directly contacting the body 31 and then rebounding onto the wafer. Furthermore, in the spraying state, the top of the guide member 32 is higher than the height of the liquid splashed out to ensure that the protective cover 3 can collect the liquid. Here, the top refers to the highest point of the guide member 32. A liquid inlet channel 33 is formed between two adjacent protective covers 3. The liquid flows from the guide member 32 into the liquid inlet channel 33 and finally flows to the bottom of the body 31 and flows out through the drain port 34. There are multiple liquid inlet channels 33, which are distributed in the left and right directions.

[0035] The liquid collection device also includes a motor 5 and a rotating disk 4 connected to the motor 5. The motor 5 drives the rotating disk 4 to rotate. It is located in the middle of the protective cover 3 and is specifically a hollow shaft motor. The hollow shaft motor can not only drive the rotating disk 4 to rotate but also extract the gas between the rotating disk 4 and the wafer 100, so that the wafer 100 can be firmly adsorbed on the rotating disk. Specifically, the central through hole of the central shaft of the hollow shaft motor 4 is used as a vacuum passage. One end is connected to a vacuum pump, and the other end is connected to the rotating disk. When the motor 5 is started, the vacuum pump starts to operate, extracting the air inside the rotating disk 4. As the gas is extracted, the air pressure inside the rotating disk gradually decreases, forming a negative pressure, and the pressure difference between the rotating disk and the wafer increases. According to Pascal's law, the pressure difference causes the rotating disk to generate a strong adsorption force, firmly holding the wafer. How to achieve the connection is existing technology and is not the focus of this utility model, so it will not be elaborated here. Furthermore, the rotating disk 4 is provided with a first airflow channel 41 and a second airflow channel 42, which are connected to the first airflow channel 41; the rotating disk 4 is provided with an air inlet 43 at its center, which is connected to the central through hole of the hollow shaft motor 4; the width of the second airflow channel 42 gradually decreases from the air inlet 43, and the shape of the second airflow channel 42 is triangular in general, which can effectively prevent stress concentration when the rotating disk 4 adsorbs the wafer and avoid wafer breakage.

[0036] Furthermore, the rotating disk 4 is provided with bosses 44, which protrude from the upper surface of the rotating disk 4. Since the surface of the wafer is relatively smooth, setting multiple bosses can increase the friction and achieve an anti-slip effect. Further, the bosses 44 include a first boss 441 and a second boss 442. The first boss 441 is located on the outermost side of the rotating disk 4 to form a sealing ring layer. There are multiple second bosses 442, and two adjacent second bosses 442 form a first airflow channel 41 or a second airflow channel 42. Further, the second bosses 442 are arc-shaped and vary in length. Taking the air inlet 43 as a reference, the closer to the air inlet 43, the shorter the arc length of the second boss 442.

[0037] The fan filter 7, also known as FFU, is located above the first swing arm 1 and the second swing arm 2. It is an indispensable air purification device in modern cleanrooms, responsible for blowing in filtered air to purify the air. The gas-liquid separation mechanism 6 is connected to the fan filter 7 through the exhaust port 35 and is responsible for exhausting the air. The fan filter 7 and the gas-liquid separation mechanism 6 work together to purify the cavity environment of the entire liquid collection device.

[0038] Furthermore, referring to Figure 4 and Figure 5As shown, the gas-liquid separation mechanism 6 includes an inlet 61, an exhaust port 62, and a liquid outlet 63. A baffle assembly 64 is provided between the inlet 61 and the liquid outlet 63. The baffle assembly 64 includes an inclined baffle plate 641 and a vertical baffle plate 642. The inclined baffle plate 641 has a starting end 6411 and a ending end 6412. The starting end 6411 is higher than the height of the exhaust port 62. The vertical baffle plate 642 and the ending end 6412 are connected. Specifically, the inclined baffle plate 641 and the vertical baffle plate 642 are integrally set. The reason for setting the inclined baffle plate 641 is that the sprayed liquid may evaporate and liquefy. By setting the inclined baffle plate 641, the liquid can be prevented from remaining at the exhaust port 62. It should be noted that when there is enough liquid in the innermost protective cover 3 and the height of the liquid exceeds the exhaust component, it may also enter the gas-liquid separation mechanism 6 through the exhaust port 62. Furthermore, the vertical partition plate 642 is provided with multiple through holes 6421, which are directly opposite the exhaust port 62, so that the gas in the gas-liquid separation mechanism 6 can be smoothly discharged from the exhaust port 62.

[0039] In this embodiment, the first, second, and third protective covers are each driven by a set of cylinders or motors to move vertically. By default, all three protective covers are at their lowest point, facilitating the robotic arm's entry and exit for wafer loading and unloading. Each protective cover corresponds to a different cleaning solution. For example, in standard RCA cleaning, APM (a mixture of hydrogen peroxide and ammonia in a specific ratio) and HPM (a mixture of hydrochloric acid and hydrogen peroxide in a specific ratio) are used. One solution is acidic, and the other is alkaline. Traditional processes use multiple separate chambers for collection, resulting in high costs. We define the third protective cover for collecting APM, the second for collecting HPM, and the first for collecting wastewater cleaning solution. The collected wastewater can be filtered and recycled, or it can be discharged separately, reducing pollution and treatment costs. The process spraying sequence is: first APM, then HPM, followed by DIW (deionized water) cleaning, and finally nitrogen spraying to dry the wafer. In operation, the third protective shield rises, motor 5 drives the wafer to rotate at 500 RPM, and the first swing arm 1 sprays and scans, applying APM. After completion, the second protective shield rises, and motor 5 adjusts the wafer rotation speed to 600 RPM (at this point, the motor speed can be selected according to the type of solution). The first swing arm 2 sprays and scans, applying HPM. After completion, the first protective shield rises, and motor 5 adjusts the wafer rotation speed to 1000 RPM. The first swing arm 3 sprays and scans, applying DIW. After completion, motor 5 adjusts the wafer rotation speed to 3000 RPM, and the outlet 21 of the second swing arm 2 scans and sprays nitrogen gas. Under the high-speed rotation and nitrogen drying, the wafer is quickly dried. Each protective shield can collect different solutions. It should be noted that the wafer can only rotate and will not move vertically. The first, second, and third protective shields all have initial positions. Before or after solution collection, the first, second, and third protective shields are in their initial positions. Depending on the process, the nozzles on the swing arm can be ultrasonic cleaning nozzles, atomizing nozzles, or different cleaning solutions. By simply adjusting the arrangement or type of the cleaning solution according to different processes, it can be compatible with various usage scenarios. The three-layer protective cover is for illustration only; it is not limited to three layers and the arrangement and design can be expanded according to the process.

[0040] Example 2

[0041] Reference Figure 6As shown, this embodiment is basically the same as embodiment 1, except that the protective cover 3 in this embodiment has only one body 31, and multiple guide members 32 are provided on one body 31. A liquid inlet channel 33 is provided between two adjacent guide members 32, and the liquid inlet channel 33 is distributed in the vertical direction. Since there is only one body, only one driving mechanism is needed to drive it. When different liquids need to be sprayed, it can be raised or lowered by a certain height accordingly. Except for the drain port of the bottommost protective cover, which is located at the bottom of the body 31, the drain ports 34 of the other protective covers can be located on the body 31.

[0042] As indicated in this specification and claims, the terms "comprising" and "including" only indicate the inclusion of expressly identified steps and elements, and these steps and elements do not constitute an exclusive list; the method or apparatus may also include other steps or elements. The term "and / or" as used herein includes any combination of one or more of the associated listed items.

[0043] It should be noted that, unless otherwise specified, when a feature is referred to as "fixed" or "connected" to another feature, it can be directly fixed or connected to the other feature, or it can be indirectly fixed or connected to the other feature. Furthermore, the descriptions of "upper," "lower," "left," and "right" used in this utility model are only relative to the relative positional relationships of the various components of this utility model in the accompanying drawings.

[0044] The above embodiments are only for illustrating the technical concept and features of this utility model, and are preferred embodiments. Their purpose is to enable those skilled in the art to understand the content of this utility model and implement it accordingly, and should not be construed as limiting the protection scope of this utility model. All equivalent transformations or modifications made based on the principles of this utility model should be covered within the protection scope of this utility model.

Claims

1. A chemical collection device for wafers, used to collect chemical solutions ejected from the wafers, the chemical collection device comprising a movable first swing arm, the first swing arm having a liquid outlet located above the wafer to spray chemical solutions onto the rotating wafer, characterized in that, The liquid collection device also includes a protective cover that can move in the vertical direction. The protective cover includes a body and a guide connected to the body. One body corresponds to one or more guides. A liquid inlet channel is formed between two adjacent protective covers or two adjacent guides.

2. The liquid medicine collection device according to claim 1, characterized in that, There are multiple liquid inlet channels.

3. The liquid medicine collection device according to claim 2, characterized in that, A liquid inlet channel is formed between two adjacent protective covers, and the liquid inlet channel is distributed in the left-right direction.

4. The liquid medicine collection device according to claim 2, characterized in that, A liquid inlet channel is formed between two adjacent guide members, and the liquid inlet channel is distributed in the vertical direction.

5. The liquid medicine collection device according to claim 3 or 4, characterized in that, The liquid collection device further includes a second swing arm, which has a liquid outlet or an air outlet located above the wafer.

6. The liquid medicine collection device according to claim 5, characterized in that, The liquid medicine collection device also includes a motor and a rotating disk connected to the motor. The motor drives the rotating disk to rotate. The rotating disk is provided with a first airflow channel and a second airflow channel, which are connected to the first airflow channel. The rotating disk is provided with an air inlet at its center, and the width of the second airflow channel gradually decreases from the air inlet.

7. The liquid medicine collection device according to claim 6, characterized in that, The rotating disk is provided with protrusions, including a first protrusion and a second protrusion. The first protrusion is located on the outermost side of the rotating disk to form a sealing ring layer. There are multiple second protrusions, and two adjacent second protrusions form the first airflow channel or the second airflow channel.

8. The liquid medicine collection device according to claim 7, characterized in that, The liquid collection device further includes a gas-liquid separation mechanism, which includes an inlet, an exhaust port, and a liquid outlet. A partition assembly is provided between the inlet and the liquid outlet. The partition assembly includes an inclined partition plate and a vertical partition plate. The inclined partition plate has a starting end and a ending end. The height of the ending end is lower than the height of the starting end, and the starting end is higher than the height of the exhaust port. The vertical partition plate is connected to the ending end.

9. The liquid medicine collection device according to claim 8, characterized in that, The vertical partition plate has multiple through holes.

10. The liquid medicine collection device according to claim 8, characterized in that, The liquid collection device also includes a fan filter located above the first swing arm and the second swing arm, and the fan filter is connected to the gas-liquid separation mechanism.

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